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    • 23. 发明授权
    • Negative-working radiation-sensitive compositions and imageable materials
    • 负性辐射敏感组合物和可成像材料
    • US07279255B2
    • 2007-10-09
    • US11349376
    • 2006-02-07
    • Ting TaoScott A. Beckley
    • Ting TaoScott A. Beckley
    • G03F7/30G03F7/029G03F7/033G03F7/038
    • G03F7/027B41C1/1008B41C2210/04B41C2210/06B41C2210/22B41C2210/24G03F7/0048G03F7/033Y10S430/115
    • A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This composition also includes a radiation absorbing compound (such as an IR-sensitive dye), a polymeric binder comprising a polymer backbone to which is directly or indirectly linked a pendant group comprising a reactive vinyl group, and a primary additive that is a poly(alkylene glycol) or an ether or ester thereof that has a number average molecular weight of from about 200 and up to 4000 and comprises from about 2 to about 50 weight % based on the total composition solids content. This composition can be used to prepare a negative-working imageable element that can be imaged at relatively low energy and developed without a preheat step.
    • 辐射敏感组合物包括可自由基聚合的组分和硼酸盐引发剂组合物,其能够产生足以在暴露于成像辐射时引发可自由基聚合的组分的聚合的自由基。 该组合物还包括辐射吸收化合物(例如IR敏感染料),包含聚合物骨架的聚合物粘合剂,其直接或间接连接包含反应性乙烯基的侧基和作为聚 亚烷基二醇)或其醚或酯,其数均分子量为约200至高达4000,并且包含基于总组合物固含量的约2至约50重量%。 该组合物可用于制备可在相对较低能量下成像并在没有预热步骤的情况下显影的负性可成像元件。