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    • 23. 发明申请
    • ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS
    • 电光设备和电子设备
    • US20110242470A1
    • 2011-10-06
    • US13079203
    • 2011-04-04
    • Minoru Moriwaki
    • Minoru Moriwaki
    • G02F1/1333
    • G02F1/136213G02F2001/13629H01L27/1255
    • An electro-optical device includes: a pixel electrode provided on a substrate; a transistor being provided between the substrate and the pixel electrodes; and a holding capacitor, provided between the pixel electrode and the transistor, configured of a first electrode, a second electrode provided opposing the first electrode via a first capacitor insulation film, and a third electrode provided opposing the first electrode via a second capacitor insulation film. Both the first capacitor insulation film and the second capacitor insulation film have multiple layers; the first capacitor insulation film and the second electrode are formed symmetrical to the second capacitor insulation film and the third electrode when viewed from the first electrode.
    • 电光装置包括:设置在基板上的像素电极; 在所述基板和所述像素电极之间设置晶体管; 以及设置在像素电极和晶体管之间的保持电容器,由第一电极,经由第一电容器绝缘膜与第一电极相对设置的第二电极和经由第二电容器绝缘膜设置成与第一电极相对设置的第三电极 。 第一电容绝缘膜和第二电容绝缘膜都有多层; 当从第一电极观察时,第一电容器绝缘膜和第二电极形成为与第二电容器绝缘膜和第三电极对称。
    • 24. 发明授权
    • Method of manufacturing substrate for electro-optical device, substrate for electro-optical device, electro-optical device, and electronic apparatus
    • 电光装置用基板,电光装置用基板,电光装置及电子装置的制造方法
    • US07226836B2
    • 2007-06-05
    • US10964732
    • 2004-10-15
    • Minoru Moriwaki
    • Minoru Moriwaki
    • H01L21/8242
    • G02F1/136213G02F1/136227
    • Exemplary embodiments provide a method of manufacturing a substrate for an electro-optical device. The method includes sequentially depositing on the substrate a lower conductive layer which is a lower electrode of the capacitor, an intermediate layer which is a dielectric film of the capacitor, and an upper conductive layer which is an upper electrode of the capacitor, in which the lower conductive layer is made of a material having an etching rate lower than an etching rate of a material of the upper conductive layer with respect to a predetermined etching agent; forming a mask having a predetermined planar pattern on the upper conductive layer; patterning the upper conductive layer, the intermediate layer and the lower conductive layer by etching with the mask, in which the etching agent is applied to at least the upper conductive layer and the lower conductive layer; and removing the mask. Accordingly, it is possible to simply manufacture a high reliable capacitor on the substrate.
    • 示例性实施例提供了一种制造用于电光器件的衬底的方法。 该方法包括在基板上依次沉积作为电容器的下电极的下导电层,作为电容器的电介质膜的中间层和作为电容器的上电极的上导电层, 下导电层由蚀刻速率低于上导电层的材料相对于预定蚀刻剂的蚀刻速率的材料制成; 在上导电层上形成具有预定平面图案的掩模; 通过用掩模进行蚀刻来图案化上导电层,中间层和下导电层,其中将蚀刻剂施加到至少上导电层和下导电层; 并取下面罩。 因此,可以简单地在基板上制造高可靠性的电容器。
    • 25. 发明申请
    • Method of manufacturing substrate for electro-optical device, substrate for electro-optical device, electro-optical device, and electronic apparatus
    • 电光装置用基板,电光装置用基板,电光装置及电子装置的制造方法
    • US20050104066A1
    • 2005-05-19
    • US10964732
    • 2004-10-15
    • Minoru Moriwaki
    • Minoru Moriwaki
    • G02F1/1368G02F1/133G02F1/1362G09F9/30H01L21/28H01L21/786H01L29/786H01L31/036
    • G02F1/136213G02F1/136227
    • Exemplary embodiments provide a method of manufacturing a substrate for an electro-optical device. The method includes sequentially depositing on the substrate a lower conductive layer which is a lower electrode of the capacitor, an intermediate layer which is a dielectric film of the capacitor, and an upper conductive layer which is an upper electrode of the capacitor, in which the lower conductive layer is made of a material having an etching rate lower than an etching rate of a material of the upper conductive layer with respect to a predetermined etching agent; forming a mask having a predetermined planar pattern on the upper conductive layer; patterning the upper conductive layer, the intermediate layer and the lower conductive layer by etching with the mask, in which the etching agent is applied to at least the upper conductive layer and the lower conductive layer; and removing the mask. Accordingly, it is possible to simply manufacture a high reliable capacitor on the substrate.
    • 示例性实施例提供了一种制造用于电光器件的衬底的方法。 该方法包括在基板上依次沉积作为电容器的下电极的下导电层,作为电容器的电介质膜的中间层和作为电容器的上电极的上导电层, 下导电层由蚀刻速率低于上导电层的材料相对于预定蚀刻剂的蚀刻速率的材料制成; 在上导电层上形成具有预定平面图案的掩模; 通过用掩模进行蚀刻来图案化上导电层,中间层和下导电层,其中将蚀刻剂施加到至少上导电层和下导电层; 并取下面罩。 因此,可以简单地在基板上制造高可靠性的电容器。