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21. 发明授权

US4933565A Method and apparatus for correcting defects of X-ray mask 失效
标题翻译：用于校正X射线掩模缺陷的方法和装置
公开(公告)号：US4933565A
公开(公告)日：1990-06-12
申请号：US216834
申请日：1988-07-08
申请人： Hiroshi Yamaguchi , Keiya Saito , Mitsuyoshi Koizumi , Akira Shimase , Satoshi Haraichi , Tateoki Miyauchi , Shinji Kuniyoshi , Susumu Aiuchi
发明人： Hiroshi Yamaguchi , Keiya Saito , Mitsuyoshi Koizumi , Akira Shimase , Satoshi Haraichi , Tateoki Miyauchi , Shinji Kuniyoshi , Susumu Aiuchi
IPC分类号： G01Q10/00 , G01Q70/14 , G03F1/00 , G03F1/22 , H01L21/027 , H01L21/30
CPC分类号： G03F1/74 , G03F1/22
摘要： The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a circuit pattern having a defective portion located under the region or setting this circuit pattern to the state near the exposure; detecting one of the secondary electrons, secondary ions, reflected electrons, or absorbing current generated from that region and detecting a true defective position. Then positioning the focused ion beam to the true defective position and irradiating the focused ion beam to the defective portion thereby correcting the defect.

22. 发明授权

US4683378A Apparatus for ion beam work 失效
标题翻译：离子束工作装置
公开(公告)号：US4683378A
公开(公告)日：1987-07-28
申请号：US754930
申请日：1985-07-15
申请人： Akira Shimase , Hiroshi Yamaguchi , Satoshi Haraichi , Tateoki Miyauchi
发明人： Akira Shimase , Hiroshi Yamaguchi , Satoshi Haraichi , Tateoki Miyauchi
IPC分类号： H01J37/28 , G01N23/225 , G21K5/04 , H01J37/22 , H01J37/30 , H01J37/304 , H01J37/305 , H01L21/027 , H01L21/265 , H01L21/30 , H01L21/66 , H01J37/302
CPC分类号： H01J37/3056 , H01J37/3005 , H01J37/304
摘要： This invention discloses an ion beam work apparatus which comprises ion mean radiation means for focusing and radiating an ion beam extracted from an ion source to a target put on a moving mechanism, and scanning two-dimensionally the radiation position; secondary particle detection means for detecting the secondary particles generated from the target upon radiation of the ion beam; and superposition-display means for superposing the secondary particle image with a different kind of image containing such information that is not contained in the secondary particle image, and displaying the resulting image; and which can accurately position the beam radiation position to lower wiring layers of the target such as a semiconductor device that can not be observed by the secondary particle image obtained by scanning the focused ion beam.
摘要翻译：本发明公开了一种离子束加工装置，其包括离子平均辐射装置，用于聚焦和辐射从离子源提取的离子束到放置在移动机构上的靶，并且二维地扫描辐射位置; 二次粒子检测装置，用于在辐射离子束时检测从靶产生的二次粒子; 以及叠加显示装置，用于将二次粒子图像与包含不包含在二次粒子图像中的信息的不同种类的图像叠加，并显示所得到的图像; 并且可以将射束放射位置精确地定位到目标物的下布线层，例如通过扫描聚焦离子束而获得的二次粒子图像不能观察到的半导体器件。

23. 发明授权

US4079230A Laser working apparatus 失效
标题翻译：激光加工设备
公开(公告)号：US4079230A
公开(公告)日：1978-03-14
申请号：US627279
申请日：1975-10-30
申请人： Tateoki Miyauchi , Jun'ichi Nakabayashi , Tomoyoshi Mikoshiba
发明人： Tateoki Miyauchi , Jun'ichi Nakabayashi , Tomoyoshi Mikoshiba
IPC分类号： B23K26/06 , B23K26/08 , G02B26/08 , G02B26/10 , B23K9/00
CPC分类号： G02B26/108 , B23K26/08 , B23K26/082 , G02B26/0891 , G02B26/10
摘要： The laser light emitted from a laser generator is cast on two prisms which have the same angle of deflection and are supported rotatably by support members so as to be rotated about the optical axis of the laser light in the opposite directions at the same speed. The laser beam scanned through the rotations of the two prisms is focussed on a work piece by a convergence lens so that the work piece is linearly scanned for laser-working. Moreover, there are provided a pair of scanning sections, each comprising such a pair of prisms as described above, the scanning sections being so arranged that the directions of scanning the laser beam by the respective sections may be perpendicular to each other. The rotational speeds of the prisms of each scanning section is so controlled as to subject the spot of the laser beam to two-dimensional scanning for laser-working a work piece.
摘要翻译：从激光发生器发射的激光投射在具有相同的偏转角的两个棱镜上，并且由支撑部件可旋转地支撑，以便以相同的速度在相反的方向围绕激光的光轴旋转。通过两个棱镜的旋转扫描的激光束通过会聚透镜聚焦在工件上，使得工件被线性扫描以进行激光加工。此外，提供了一对扫描部分，每个扫描部分包括如上所述的这样的一对棱镜，扫描部分被布置成使得由各个部分扫描激光束的方向可以彼此垂直。对每个扫描部分的棱镜的旋转速度进行控制，以使激光束的光斑进行二维扫描以对工件进行激光加工。

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