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21. 发明申请

US20100291491A1 Resist pattern slimming treatment method 审中-公开
标题翻译：抗皱图案减肥治疗方法
公开(公告)号：US20100291491A1
公开(公告)日：2010-11-18
申请号：US12662343
申请日：2010-04-13
申请人： Masahiro Yamamoto , Yoshihiro Kondo , Atsushi Ookouchi , Toyohisa Tsuruda
发明人： Masahiro Yamamoto , Yoshihiro Kondo , Atsushi Ookouchi , Toyohisa Tsuruda
IPC分类号： G03F7/38
CPC分类号： G03F7/38 , H01L21/0273
摘要： A resist pattern slimming treatment method of performing a slimming treatment on a resist pattern formed on a substrate includes: a slimming treatment step of performing a slimming treatment on the resist pattern by applying a reactant solubilizing the resist pattern onto the resist pattern, then performing a heat treatment on the resist pattern under a heat treatment condition determined in advance, and then performing a developing treatment on the resist pattern; and a first line width measurement step of measuring a line width of the resist pattern before the slimming treatment step. The heat treatment condition is determined based on a measurement value of the line width measured in the first line width measurement step.
摘要翻译：对形成在基板上的抗蚀剂图案进行减肥处理的抗蚀剂图案减肥处理方法包括：减肥处理步骤，通过将抗蚀剂图案溶解在抗蚀剂图案上来进行抗蚀剂图案的减肥处理，然后进行在预先确定的热处理条件下对抗蚀剂图案进行热处理，然后对抗蚀剂图案进行显影处理; 以及第一线宽测量步骤，用于在减肥处理步骤之前测量抗蚀剂图案的线宽。基于在第一线宽测量步骤中测量的线宽的测量值来确定热处理条件。

22. 发明授权

US08545119B2 Substrate cleaning apparatus, coating and developing apparatus having the same and substrate cleaning method 有权
标题翻译：基板清洁装置，具有该基板清洁装置的涂覆和显影装置和基板清洁方法
公开(公告)号：US08545119B2
公开(公告)日：2013-10-01
申请号：US13181832
申请日：2011-07-13
申请人： Atsushi Ookouchi , Junji Kume
发明人： Atsushi Ookouchi , Junji Kume
IPC分类号： G03D5/00 , G03D15/00 , B08B1/00
CPC分类号： H01L21/67051 , H01L21/02087
摘要： A substrate cleaning apparatus includes a substrate holding and rotating unit for holding a center of a rear surface of a substrate and rotating the substrate; a cleaning unit including a first cleaning member, a second cleaning member provided around the first cleaning member and a base to which the first and second cleaning members are secured; an elevating unit for moving the substrate holding and rotating unit and the cleaning unit relative to each other so as to allow the first and second cleaning members to come into contact with the rear surface of the substrate held by the substrate holding and rotating unit; and a driving unit for driving the substrate and the cleaning unit relative to each other in a direction along the rear surface of the substrate so as to allow part of the second cleaning member to be exposed to the outside of the substrate.
摘要翻译：基板清洗装置包括用于保持基板的后表面的中心并旋转基板的基板保持和旋转单元; 清洁单元，包括第一清洁构件，设置在第一清洁构件周围的第二清洁构件和固定有第一和第二清洁构件的基座; 升降单元，用于相对于彼此移动所述基板保持旋转单元和所述清洁单元，以使得所述第一和第二清洁构件与由所述基板保持旋转单元保持的所述基板的后表面接触; 以及用于在沿着基板的后表面的方向上相对于彼此驱动基板和清洁单元的驱动单元，以允许第二清洁部件的一部分暴露于基板的外部。

23. 发明申请

US20100291490A1 Resist pattern slimming treatment method 有权
标题翻译：抗皱图案减肥治疗方法
公开(公告)号：US20100291490A1
公开(公告)日：2010-11-18
申请号：US12662632
申请日：2010-04-27
申请人： Toyohisa Tsuruda , Yoshihiro Kondo , Atsushi Ookouchi , Masahiro Yamamoto
发明人： Toyohisa Tsuruda , Yoshihiro Kondo , Atsushi Ookouchi , Masahiro Yamamoto
IPC分类号： G03F7/20
CPC分类号： G03F7/40 , H01L21/67155
摘要： A resist pattern slimming treatment method includes: a slimming treatment step of performing a slimming treatment on a resist pattern by applying a solution containing an acid onto a substrate having the resist pattern formed thereon, then performing a heat treatment, and then performing a developing treatment. A database storing kinds of resist material for the resist pattern, concentrations of acid contained in a solution to be applied onto the substrate having the resist pattern formed thereon, and line widths of the resist pattern corresponding to the kinds of resist material and the concentrations of acid is prepared in advance. The concentration of the acid contained in the solution used in the slimming treatment step is based on a concentration of the acid obtained from the database, using, as search keys, the kind of resist material and a target value of the line width of the resist pattern.
摘要翻译：抗蚀剂图案减肥处理方法包括：减肥处理步骤，通过将含有酸的溶液涂布在其上形成有抗蚀剂图案的基材上，然后进行热处理，然后进行显影处理，对抗蚀剂图案进行减肥处理。存储抗蚀剂图案的各种抗蚀剂材料的数据库，涂布在其上形成有抗蚀剂图案的基板上的溶液中所含的酸的浓度，以及与抗蚀剂材料的种类对应的抗蚀剂图案的线宽度预先准备酸。在减肥处理步骤中使用的溶液中所含的酸的浓度基于从数据库中获得的酸的浓度，使用作为搜索关键字的抗蚀剂材料的种类和抗蚀剂的线宽度的目标值模式。

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