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    • 25. 发明授权
    • Photocurable composition
    • 可光固化组合物
    • US06486225B1
    • 2002-11-26
    • US09441954
    • 1999-11-17
    • Hirotoshi KamataTakeo WatanabeKazuhiko OogaToshio Koshikawa
    • Hirotoshi KamataTakeo WatanabeKazuhiko OogaToshio Koshikawa
    • C08F248
    • C09D175/16C08G18/672C08G18/673C08G18/6795C08G18/792C08K5/0041C08K5/55C08G18/48C08L75/16
    • A photocurable composition comprising (A) 100 parts by weight of a compound having an ethylenically unsaturated group, (B) from 0.001 to 5 parts by weight of a cationic dye having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm represented by formula (1: D+·A1−  (1) wherein D+ represents a cation having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm, and A1 31 represents an anion, and (C) from 0.005 to 10 parts by weight of a quaternary borate-type compound represented by formula (2): wherein R1, R2, R3 and R4 each independently represents an alkyl group, an aryl group, an aralkyl group, an alkenyl group, an alkynyl group, a silyl group, a heterocyclic group or a halogen atom, and Z+ represents a cation, wherein from 5 to 95 wt % of (A) the compound having an ethylenically unsaturated group is a urethane (meth)acrylate oligomer obtained by the reaction of a polyisocyanate having three or more isocyanate groups within one molecule with a hydroxyl group-containing (meth)acrylic acid ester.
    • 一种可光固化组合物,其包含(A)100重量份具有烯键式不饱和基团的化合物,(B)0.001至5重量份在波长范围为400至1200nm的吸收最大波长的阳离子染料, (1)其中D +表示波长范围为400〜1200nm的吸收最大波长的阳离子,A131表示阴离子,(C)0.005〜10重量份的季硼酸盐型 由式(2)表示的化合物:其中R1,R2,R3和R4各自独立地表示烷基,芳基,芳烷基,烯基,炔基,甲硅烷基,杂环基或卤素原子 ,Z +表示阳离子,其中,(A)具有烯键式不饱和基团的化合物的5〜95重量%是通过在1分子w内具有3个以上异氰酸酯基的多异氰酸酯反应得到的聚氨酯(甲基)丙烯酸酯低聚物 具有羟基的(甲基)丙烯酸酯。
    • 27. 发明授权
    • Resist patterns and method of forming resist patterns
    • 抗蚀剂图案和形成抗蚀剂图案的方法
    • US5326672A
    • 1994-07-05
    • US964715
    • 1992-10-22
    • Toshihiko TanakaMitsuaki MorigamiIwao HigashikawaTakeo Watanabe
    • Toshihiko TanakaMitsuaki MorigamiIwao HigashikawaTakeo Watanabe
    • G03F7/30G03C5/00
    • G03F7/30
    • In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.
    • 根据所提出的抗蚀剂图案形成方法,将抗蚀剂表面和冲洗液之间的接触角调节到预定范围内,将不保持干燥的挥发性表面活性剂在冲洗液中混合以降低表面张力, 冲洗液在冲洗的临界条件下干燥,以免引起表面张力。 因此抗蚀剂图案之间的吸引力的发生可能被削弱或消失,从而可以有效地防止图形的下降,这在形成精细抗蚀剂图案或高方面的抗蚀剂图案时经常发生。 另一方面,根据所述抗蚀剂图案的结构,可以有效地防止聚集抗蚀剂图案的最外面的主要图案掉落。 通过提供这种效果,产品的产量增加。 此外,本发明还可以应用于光,电子,X射线,离子束等的光刻照明源
    • 28. 发明授权
    • Herbicidal composition containing a derivative of 1,2,4-triazole as an
active ingredient
    • 含有1,2,4-三唑衍生物作为活性成分的除草组合物
    • US4795484A
    • 1989-01-03
    • US858531
    • 1986-04-24
    • Katsumichi AokiTakafumi ShidaTakeo WatanabeKeigo SatakeHiroyasu ShinkawaShiro Yamazaki
    • Katsumichi AokiTakafumi ShidaTakeo WatanabeKeigo SatakeHiroyasu ShinkawaShiro Yamazaki
    • A01N43/653C07D249/10
    • A01N43/653C07D249/10
    • Disclosed herein is herbicidal composition comprising a derivative of 1,2,4-triazole as an active ingredient, represented by the general formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom, a halogen atom or a C.sub.1 -C.sub.2) alkyl group; R.sup.2 represents a hydrogen atom, a halogen atom, a (C.sub.1 -C.sub.2) alkyl group fluoromethyl group (--CH.sub.2 F),3,3,3-trifluoropopyl group, methoxy group, cyano group, methoxymethyl group, methylthio group, methoxycarbonyl group or isopropoxycarbonyl group and R.sup.3 represents a thiocarbamoyl group or a group represented by the general formula (II): ##STR2## wherein R.sup.4 represents a hydrogen atom, a (C.sub.1 -C.sub.2) alkyl group or a hydroxy (C.sub.1 -C.sub.2) alkyl group and R.sup.5 represents a hydrogen atom, a C.sub.1 -C.sub.2) alkyl group, halogeno (C.sub.1 -C.sub.2) alkyl group, hydroxy (C.sub.1 -C.sub.2) alkyl group, cyanomethyl group, acetyl group, halogenoacetyl group, methoxyacetyl group, amino group, phenyl group, methoxy group, hydroxyl group, (C.sub.2 -C.sub.3) alkenyl group, halogeno (C.sub.2 -C.sub.3) alkenyl group, isopropylcarbonyl group, methylthiocarbamoyl group or 2-methoxyethyl group, the proviso that R.sup.2 is not a hydrogen atom, halogen atom or (C.sub.1 -C.sub.2) alkyl group when both of R.sup.4 and R.sup.5 represent hydrogen atoms, and herbicidally acceptable carrier(s) or diluent(s).
    • 本文公开了包含由通式(I)表示的1,2,4-三唑衍生物作为活性成分的除草组合物:其中R1表示氢原子,卤素原子或C1- C2)烷基; R2表示氢原子,卤素原子,(C1-C2)烷基氟甲基(-CH2F),3,3,3-三氟戊酰基,甲氧基,氰基,甲氧基甲基,甲硫基,甲氧基羰基或异丙氧基羰基 基团,R 3表示硫代氨基甲酰基或由通式(II)表示的基团:其中R 4表示氢原子,(C 1 -C 2)烷基或羟基(C 1 -C 2)烷基) R5为氢原子,C1-C2)烷基,卤代(C1-C2)烷基,羟基(C1-C2)烷基,氰基甲基,乙酰基,卤代乙酰基,甲氧基乙酰基,氨基,苯基 ,甲氧基,羟基,(C2-C3)烯基,卤代(C2-C3)烯基,异丙基羰基,甲硫基氨基甲酰基或2-甲氧基乙基,条件是R2不是氢原子,卤素原子或(C1 -C 2)烷基,当R4和R5都表示氢原子,除草可接受的载体或稀释剂( s)。