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21. 发明申请

US20100194824A1 PIEZOELECTRIC MATERIAL, METHOD FOR PRODUCING PIEZOELECTRIC MATERIAL, PIEZOELECTRIC DEVICE AND LIQUID DISCHARGE DEVICE 有权
标题翻译：压电材料，压电材料的生产方法，压电装置和液体放电装置
公开(公告)号：US20100194824A1
公开(公告)日：2010-08-05
申请号：US12698792
申请日：2010-02-02
申请人： Takami Arakawa , Yuichi Okamoto , Yoshikazu Hishinuma
发明人： Takami Arakawa , Yuichi Okamoto , Yoshikazu Hishinuma
IPC分类号： B41J2/045 , H01L41/18 , B32B9/00 , B32B9/04
CPC分类号： H01L41/316 , C04B35/493 , C04B2235/3239 , C04B2235/3251 , C04B2235/3294 , C04B2235/768 , C04B2235/79 , C04B2235/81 , C23C14/08 , C23C14/088 , C23C14/3414 , H01L27/20 , H01L41/0477 , H01L41/0973 , H01L41/1876
摘要： A piezoelectric material of the invention includes a perovskite oxide (P) (which may contain inevitable impurities) represented by the formula below: Pba(Zrx,Tiy,Mb-x-y)bOc (P) (wherein M represents one or two or more metal elements; wherein 0
摘要翻译：本发明的压电材料包括由下式表示的钙钛矿氧化物（P）（其可含有不可避免的杂质）：Pba（Zrx，Tiy，Mb-xy）bOc（P）（其中M表示一种或两种以上金属元素;其中0

22. 发明授权

US08354777B2 Piezoelectric film and piezoelectric device including the same, and liquid discharge apparatus 有权
标题翻译：压电膜和包括该压电膜的压电装置和液体排出装置
公开(公告)号：US08354777B2
公开(公告)日：2013-01-15
申请号：US12566298
申请日：2009-09-24
申请人： Takami Arakawa , Yoshikazu Hishinuma
发明人： Takami Arakawa , Yoshikazu Hishinuma
IPC分类号： H01L41/087
CPC分类号： B41J2/161 , B41J2/155 , B41J2/1646 , B41J2202/03 , H01L41/0805 , H01L41/1876 , H01L41/316
摘要： A piezoelectric film of a perovskite oxide represented by a general expression (P) below and has a pyrochlore free single phase perovskite structure with a/b≦1.06. Pba(Zrx,Tiy,Mb-x-y)bOc (P) (where, M represents one or more types of metal elements, 0
摘要翻译：由以下通式（P）表示的钙钛矿氧化物的压电膜，具有不含绿烧石的单相钙钛矿结构，具有a / b＆nlE; 1.06。 Pba（Zrx，Tiy，Mb-xy）bOc（P）（其中，M表示一种或多种类型的金属元素，0

23. 发明授权

US08215753B2 Piezoelectric material, method for producing piezoelectric material, piezoelectric device and liquid discharge device 有权
标题翻译：压电材料，压电材料制造方法，压电装置和液体排出装置
公开(公告)号：US08215753B2
公开(公告)日：2012-07-10
申请号：US12698792
申请日：2010-02-02
申请人： Takami Arakawa , Yuichi Okamoto , Yoshikazu Hishinuma
发明人： Takami Arakawa , Yuichi Okamoto , Yoshikazu Hishinuma
IPC分类号： B41J2/045 , H01L41/18 , B32B27/32 , B32B9/00 , B32B9/04
CPC分类号： H01L41/316 , C04B35/493 , C04B2235/3239 , C04B2235/3251 , C04B2235/3294 , C04B2235/768 , C04B2235/79 , C04B2235/81 , C23C14/08 , C23C14/088 , C23C14/3414 , H01L27/20 , H01L41/0477 , H01L41/0973 , H01L41/1876
摘要： A piezoelectric material of the invention includes a perovskite oxide (P) (which may contain inevitable impurities) represented by the formula below: Pba(Zrx,Tiy,Mb-x-y)bOc (P) (wherein M represents one or two or more metal elements; wherein 0
摘要翻译：本发明的压电材料包括由下式表示的钙钛矿氧化物（P）（其可含有不可避免的杂质）：Pba（Zrx，Tiy，Mb-xy）bOc（P）（其中M表示一种或两种以上金属元素;其中0

24. 发明申请

US20090058953A1 PROCESS FOR FORMING A FERROELECTRIC FILM, FERROELECTRIC FILM, FERROELECTRIC DEVICE, AND LIQUID DISCHARGE APPARATUS 有权
标题翻译：形成电解膜，电解膜，电解装置和液体放电装置的方法
公开(公告)号：US20090058953A1
公开(公告)日：2009-03-05
申请号：US12203596
申请日：2008-09-03
申请人： Takami Arakawa , Takamichi Fijii
发明人： Takami Arakawa , Takamichi Fijii
IPC分类号： B41J2/045 , C23C14/00 , H01L41/00 , H01L41/18
CPC分类号： C23C14/088 , B41J2/14233 , B41J2/155 , B41J2202/03 , C04B35/493 , C04B2235/3227 , C04B2235/3251 , C04B2235/3258 , C04B2235/3298 , C04B2235/72 , C23C14/3407 , H01L41/0805 , H01L41/1876 , H01L41/316
摘要： A ferroelectric film containing a perovskite type oxide represented by Formula (P) is formed on a substrate, which stands facing a target, by a sputtering technique under conditions of a height of a shield, which surrounds an outer periphery of the target on the substrate side in a non-contact state and comprises shielding layers superposed one upon another at intervals, such that a difference between a plasma potential and a floating potential is at most 35V, and under conditions such that a temperature of the substrate is at least 400° C.: (Pb1−x+δMx) (ZryTi1−y)O═ (P) wherein M represents at least one kind of element selected from Bi and lanthanide elements, 0.05≦x≦0.4, and 0
摘要翻译：在通过溅射技术的基板上形成含有由式（P）表示的钙钛矿型氧化物的铁电体膜，该基板围绕基板上的靶的外周围的屏蔽体的高度一侧处于非接触状态，并且包括间隔叠加的屏蔽层，使得等离子体电位和浮动电位之间的差最多为35V，并且在使得基板的温度为至少400°的条件下（Pb1-x + deltaMx）（ZryTi1-y）O-（P）<？在线公式描述其中M表示选自Bi和镧系元素中的至少一种元素，0.05 <= x <= 0.4，0

25. 发明申请

US20050189518A1 Method of producing a fluorescent particle 审中-公开
标题翻译：荧光体的制造方法
公开(公告)号：US20050189518A1
公开(公告)日：2005-09-01
申请号：US11063618
申请日：2005-02-24
申请人： Takami Arakawa
发明人： Takami Arakawa
IPC分类号： C09K11/08 , C09K11/58 , H05B33/14
CPC分类号： C09K11/584 , H05B33/14
摘要： A method of producing a fluorescent particle, which comprises sintering a raw fluorescent powder in the presence of a 40 wt % to 99.9 wt % flux to the total weight of said raw fluorescent powder and said flux; a fluorescent particle obtained by the above producing method; and an electroluminescence device, comprising the above fluorescent particle.
摘要翻译：一种荧光体颗粒的制造方法，其特征在于，在所述原料荧光粉和所述助熔剂的总重量为40重量％〜99.9重量％的助熔剂的存在下烧结原料荧光粉末; 通过上述制备方法获得的荧光颗粒; 以及包含上述荧光体的电致发光元件。

26. 发明申请

US20070204865A1 Aerosol generating apparatus and method, and film forming apparatus and method using the same 审中-公开
标题翻译：气溶胶发生装置和方法，以及使用该装置和方法的成膜装置及方法
公开(公告)号：US20070204865A1
公开(公告)日：2007-09-06
申请号：US11707118
申请日：2007-02-16
申请人： Takami Arakawa
发明人： Takami Arakawa
IPC分类号： A62B7/00 , A61M15/00 , A62B9/00
CPC分类号： B22F9/026 , B22F7/08 , C23C24/04
摘要： An aerosol generating apparatus capable of stably generating an aerosol with controlled concentration, and a film forming apparatus using the aerosol generating apparatus. The aerosol generating apparatus includes a powder containing chamber formed with an opening for leading out powder contained therein, an assist gas lead-in part for assisting lead-out of the powder when the powder is led out from the opening, and a dispersion gas lead-in part for supplying a gas for dispersing the powder led out from the opening. Further, the film forming apparatus includes the aerosol generating apparatus, a substrate stage for holding a substrate, and a nozzle for injecting the aerosol generated by the aerosol generating apparatus toward the substrate.
摘要翻译：能够稳定地产生具有受控浓度的气溶胶的气溶胶发生装置和使用该气溶胶发生装置的成膜装置。气溶胶发生装置包括形成有用于引出其中所含的粉末的开口的粉末容纳室，辅助气体引入部分，用于在粉末从开口引出时辅助引出粉末;以及分散气体引线 - 用于供应用于分散从开口引出的粉末的气体的一部分。此外，成膜装置包括气溶胶发生装置，用于保持基板的基板台和用于将由气溶胶发生装置产生的气溶胶喷射到基板的喷嘴。

27. 发明申请

US20070197370A1 Lead zirconate titanate type composition, process for producing the same, piezoelectric body, and piezoelectric device 审中-公开
标题翻译：铅钛酸铅型组合物，其制造方法，压电体和压电装置
公开(公告)号：US20070197370A1
公开(公告)日：2007-08-23
申请号：US11709710
申请日：2007-02-23
申请人： Takashi Nakamura , Takami Arakawa
发明人： Takashi Nakamura , Takami Arakawa
IPC分类号： C04B35/00
CPC分类号： C04B35/499 , C04B35/493 , C04B2235/3224 , C04B2235/3229 , C04B2235/3251 , C04B2235/3279 , C04B2235/3284 , C04B2235/79 , H01L41/187
摘要： A lead zirconate titanate type composition contains a three-component system lead zirconate titanate (X), which may be represented by the general formula of Pb(Ni, Nb)O3—PbZrO3—PbTiO3, an (A) constituent, which is Pb in excess of a quantity conforming to a stoichiometric ratio, a (B) constituent, which is Zn, and a (C) constituent, which is at least one kind of rare earth element selected from the group consisting of Ce, Yb, and Dy, the (A) constituent, the (B) constituent, and the (C) constituent being added to the three-component system lead zirconate titanate (X).
摘要翻译：锆钛酸铅型组合物含有三元体系锆酸铅（X），其可以由通式Pb（Ni，Nb）O 3 -PbZrO 3 （A）成分，Pb超过符合化学计量比的量，作为Zn的（B）成分和（C）成分是选自Ce，Yb和Dy中的至少一种稀土元素，（A）成分，（B）成分和（C）成分添加到三成分体系中锆钛酸铅（X）。

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