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    • 30. 发明专利
    • DEVICE FOR MANUFACTURING SILICON OXIDE POWDER
    • JP2001220124A
    • 2001-08-14
    • JP2000027838
    • 2000-02-04
    • SHINETSU CHEMICAL CO
    • FUKUOKA HIROFUMIUENO SUSUMUFUKUDA TAKESHI
    • C01B33/113C23C16/32H01M4/48H01M4/02
    • PROBLEM TO BE SOLVED: To provide a device for manufacturing silicon oxide powder by which the silicon oxide powder of high purity can be efficiently and stably manufactured and which can sufficiently correspond with manufacture of an industrial scale. SOLUTION: The device for manufacturing the silicon oxide powder is distinguished by that it is constituted by being provided with a reaction furnace having a muffle in which a reaction chamber for heating a raw material powdery mixture containing the silicon dioxide powder accommodated in a raw material container in an inert gas or under reduced pressure at 1,100 to 1,600 deg.C to generate gaseous silicon oxide is formed, a heater which is disposed in the reaction furnace and heats the raw material powdery mixture and a transportation tube which transports the gaseous silicon oxide generated in the reaction chamber to a depositing chamber in which a cooling substrate is disposed and the gaseous silicon oxide is brought into contact with the cooling substrate to deposit the silicon oxide powder on the cooling substrate and further by that at least one among the muffle, the raw material container, the heater and the transportation tube is formed of a high melting point metal or a compound of the high melting point metal or graphite covered with a silicon carbide film.