专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US09406817B2 Lead frame package for solar concentrators 有权
标题翻译：太阳能集热器引线框架封装
公开(公告)号：US09406817B2
公开(公告)日：2016-08-02
申请号：US13613891
申请日：2012-09-13
申请人： Ayman A. Alabduljabbar , Abdullah I. Alboiez , Yaseen G. Alharbi , Alhassan Badahdah , Supratik Guha , Hussam Khonkar , Yves C. Martin , Theodore Gerard van Kessel , Robert L. Sandstrom , Naim Moumen
发明人： Ayman A. Alabduljabbar , Abdullah I. Alboiez , Yaseen G. Alharbi , Alhassan Badahdah , Supratik Guha , Hussam Khonkar , Yves C. Martin , Theodore Gerard van Kessel , Robert L. Sandstrom , Naim Moumen
IPC分类号： H01L31/042 , H01L31/02 , H01L31/052 , H01L31/054
CPC分类号： H01L31/02013 , H01L31/02008 , H01L31/052 , H01L31/0547 , H01L2924/0002 , Y02E10/52 , H01L2924/00
摘要： Techniques for providing high-capacity, re-workable connections in concentrated photovoltaic devices are provided. In one aspect, a lead frame package for a photovoltaic device is provided that includes a beam shield; and one or more lead frame connectors affixed to the beam shield, wherein the lead frame connectors are configured to provide connection to the photovoltaic device when the photovoltaic device is assembled to the lead frame package. A photovoltaic apparatus is also provided that includes a lead frame package assembled to a photovoltaic device. The lead frame package includes a beam shield and one or more lead frame connectors affixed to the beam shield, wherein the lead frame connectors are configured to provide connection to the photovoltaic device.
摘要翻译：提供了在集中光伏器件中提供大容量，可重新连接的连接的技术。一方面，提供一种用于光伏器件的引线框架封装，其包括光束屏蔽; 以及一个或多个引线框架连接器，其固定到所述梁屏蔽件，其中所述引线框架连接器被配置为当所述光伏器件组装到所述引线框架封装件时提供到所述光伏器件的连接。还提供了一种光伏装置，其包括组装到光伏器件的引线框封装。引线框架封装包括梁屏蔽和固定到梁屏蔽的一个或多个引线框连接器，其中引线框架连接器被配置为提供到光伏器件的连接。

22. 发明申请

US20110109740A1 Method and Apparatus for In Situ Solar Flat Panel Diagnostics 有权
标题翻译：用于现场太阳能平板诊断的方法和装置
公开(公告)号：US20110109740A1
公开(公告)日：2011-05-12
申请号：US12616683
申请日：2009-11-11
申请人： Supratik Guha , Yves C. Martin , Robert L. Sandstrom , Theodore Gerard van Kessel
发明人： Supratik Guha , Yves C. Martin , Robert L. Sandstrom , Theodore Gerard van Kessel
IPC分类号： H04N7/18 , G06K9/62
CPC分类号： G06T7/0004 , G06T2207/10048
摘要： Techniques for analyzing performance of solar panels and/or cells are provided. In one aspect, a method for analyzing an infrared thermal image taken using an infrared camera is provided. The method includes the following steps. The infrared thermal image is converted to temperature data. Individual elements are isolated in the infrared thermal image. The temperature data for each isolated element is tabulated. A performance status of each isolated element is determined based on the tabulated temperature data. The individual elements can include solar panels and/or solar cells. In another aspect, an infrared diagnostic system is provided. The infrared diagnostic system includes an infrared camera which can be remotely positioned relative to one or more elements to be imaged; and a computer configured to receive thermal images from the infrared camera, via a communication link, and analyze the thermal images.
摘要翻译：提供了用于分析太阳能电池板和/或电池的性能的技术。一方面，提供了一种用于分析使用红外线照相机拍摄的红外热像的方法。该方法包括以下步骤。红外热像被转换为温度数据。单个元件在红外热图像中被隔离。列出每个隔离元件的温度数据。基于列表的温度数据确定每个隔离元件的性能状态。各个元件可以包括太阳能电池板和/或太阳能电池。另一方面，提供红外诊断系统。红外线诊断系统包括可以相对于要成像的一个或多个元件远程定位的红外相机; 以及计算机，被配置为经由通信链路从红外相机接收热图像，并分析热图像。

23. 发明授权

US09231139B2 Structure and design of concentrator solar cell assembly receiver substrate 有权
标题翻译：集中器太阳能电池组件接收器基板的结构与设计
公开(公告)号：US09231139B2
公开(公告)日：2016-01-05
申请号：US13249686
申请日：2011-09-30
申请人： Michael A. Gaynes , Yves C. Martin , Jay E. Pogemiller , Aparna Prabhakar , Theodore G. van Kessel , Brent A. Wacaser
发明人： Michael A. Gaynes , Yves C. Martin , Jay E. Pogemiller , Aparna Prabhakar , Theodore G. van Kessel , Brent A. Wacaser
IPC分类号： H01L31/0232 , H01L31/052 , H01L31/02 , H01L31/054
CPC分类号： H01L31/052 , H01L31/02008 , H01L31/0521 , H01L31/0543 , Y02E10/52
摘要： A substrate has a top side and a bottom side. A solar cell is secured to the top side of the substrate and has an anode and a cathode. A heat transfer element is secured to the bottom side of the substrate. An anode pad is formed on the top side of the substrate and is coupled to the anode of the solar cell; similarly, a cathode pad is formed on the top side of the substrate and is coupled to the cathode of the solar cell. The substrate coefficient of thermal expansion and the solar cell coefficient of thermal expansion match within plus or minus ten parts per million per degree C.
摘要翻译：基板具有顶侧和底侧。太阳能电池固定到基板的顶侧，并具有阳极和阴极。传热元件固定到基底的底侧。阳极焊盘形成在衬底的顶侧，并且耦合到太阳能电池的阳极; 类似地，阴极焊盘形成在衬底的顶侧上并耦合到太阳能电池的阴极。基板的热膨胀系数和太阳能电池的热膨胀系数在每摄氏度百万分之内加上十度以内。

24. 发明授权

US08944151B2 Method and apparatus for chip cooling 有权
标题翻译：芯片冷却方法和装置
公开(公告)号：US08944151B2
公开(公告)日：2015-02-03
申请号：US12128290
申请日：2008-05-28
申请人： Matteo Flotta , Yves C. Martin , Lubomyr T. Romankiw , Theodore G. Van Kessel
发明人： Matteo Flotta , Yves C. Martin , Lubomyr T. Romankiw , Theodore G. Van Kessel
IPC分类号： F28D15/00 , H01L23/473
CPC分类号： H01L23/4735 , H01L2924/0002 , H05K7/20327 , H05K7/20381 , H05K7/20772 , H01L2924/00
摘要： In one embodiment, the invention is a method and apparatus for chip cooling. One embodiment of an apparatus for cooling a heat-generating device includes an inlet for receiving a fluid, a manifold comprising a plurality of apertures formed therein for decreasing the pressure of the fluid from a first pressure by adiabatic expansion for impinging the fluid on the heat-generating device once the pressure of the fluid is decreased from the first pressure.
摘要翻译：在一个实施例中，本发明是用于芯片冷却的方法和装置。用于冷却发热装置的装置的一个实施例包括用于接收流体的入口，歧管，其包括形成在其中的多个孔，用于通过绝热膨胀减小来自第一压力的流体的压力，以将流体冲击在热一旦流体的压力从第一压力减小，则产生装置。

25. 发明授权

US08791355B2 Homogenizing light-pipe for solar concentrators 有权
标题翻译：太阳能集热器均质光管
公开(公告)号：US08791355B2
公开(公告)日：2014-07-29
申请号：US13090304
申请日：2011-04-20
申请人： Richard A. Haight , Yves C. Martin , Theodore G. van Kessel
发明人： Richard A. Haight , Yves C. Martin , Theodore G. van Kessel
IPC分类号： H01L31/042
CPC分类号： G02B3/08 , F24S23/10 , F24S23/30 , G02B3/0056 , G02B5/1876 , G02B5/1885 , G02B5/32 , G02B19/0028 , G02B19/0042 , H01L31/0543 , H01L31/0547 , Y02E10/40 , Y02E10/52
摘要： A light pipe that can be employed for a Concentrator Photo-Voltaic (CPV) system is provided. The light pipe homogenizes light by diffusion and/or refraction, and can be embodied in a structure that has a low aspect ratio. The diffusion and/or refraction can be effected by concave or convex surfaces of a transparent medium that forms a body of the light pipe, by light diffracting particles, and/or by a diffracting surface. Optionally, multiple transparent media can be employed with a refracting and/or diffracting interface therebetween. The reduced aspect ratio of the light pipe can improve reliability of mechanical alignment in the CPV system as well as reducing the cost of manufacturing and/or aligning the light pipe within the CPV system.
摘要翻译：提供可用于集中器光伏（CPV）系统的光管。光管通过扩散和/或折射使光均匀化，并且可以以具有低纵横比的结构体现。扩散和/或折射可以通过形成光管的主体，通过光衍射颗粒和/或衍射表面的透明介质的凹面或凸面实现。可选地，可以使用多个透明介质，其间具有折射和/或衍射界面。光管的减小的纵横比可以提高CPV系统中的机械对准的可靠性，并且降低CPV系统内的光管的制造和/或对准的成本。

26. 发明申请

US20100230048A1 METHOD AND SYSTEM FOR TONE INVERTING OF RESIDUAL LAYER TOLERANT IMPRINT LITHOGRAPHY 有权
标题翻译：用于静止层容忍印刷图像的音调的方法和系统
公开(公告)号：US20100230048A1
公开(公告)日：2010-09-16
申请号：US12787429
申请日：2010-05-26
申请人： Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
发明人： Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
IPC分类号： B29C59/00 , C23C14/34 , C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A system for imprint lithography, which includes a substrate, a patterned mask, an imprint applying unit that imprints, via the patterned mask, a pattern into a resist layer on the substrate, and an overlay device that overlays a cladding layer over the substrate.
摘要翻译：一种用于压印光刻的系统，其包括衬底，图案化掩模，压印施加单元，其通过图案化掩模将图案压印到衬底上的抗蚀剂层中，以及覆盖器件，覆盖衬底上的覆层。

27. 发明授权

US07776628B2 Method and system for tone inverting of residual layer tolerant imprint lithography 失效
标题翻译：残余层容忍压印光刻的色调反转方法和系统
公开(公告)号：US07776628B2
公开(公告)日：2010-08-17
申请号：US11600140
申请日：2006-11-16
申请人： Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
发明人： Matthew E. Colburn , Theodore G. van Kessel , Yves C. Martin , Dirk Pfeiffer
IPC分类号： H01L21/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method (and apparatus) of imprint lithography, includes imprinting, via a patterned mask, a pattern into a resist layer on a substrate, and overlaying a cladding layer over the imprinted resist layer. A portion of the cladding layer is used as a hard mask for a subsequent processing.
摘要翻译：压印光刻的方法（和装置）包括通过图案化掩模将图案压印到衬底上的抗蚀剂层中，并在覆盖的抗蚀剂层上覆盖覆层。包覆层的一部分用作后续处理的硬掩模。

28. 发明申请

US20080180646A1 IMPRINT REFERENCE TEMPLATE FOR MULTILAYER OR MULTIPATTERN REGISTRATION AND METHOD THEREFOR 审中-公开
标题翻译：用于多层或多层注册的引用参考模板及其方法
公开(公告)号：US20080180646A1
公开(公告)日：2008-07-31
申请号：US12061904
申请日：2008-04-03
申请人： Matthew E. Colburn , Yves C. Martin , Charles T. Rettner , Theodore G. van Kessel , Hematha K. Wickramasinghe
发明人： Matthew E. Colburn , Yves C. Martin , Charles T. Rettner , Theodore G. van Kessel , Hematha K. Wickramasinghe
IPC分类号： G03B27/44 , G03F1/00
CPC分类号： G03F7/0002 , B01D2239/045 , B82Y10/00 , B82Y40/00 , G03F9/7011 , G03F9/7019
摘要： A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all of a plurality of mask blanks for a given chip set, and printing sub-patterns on each of the plurality of mask blanks, and aligning the sub-patterns to the at least one reference template alignment mark.
摘要翻译：一种形成多个掩模的方法（和结果）包括使用压印光刻法创建参考模板以在给定芯片组的所有多个掩模坯料上打印至少一个参考模板对准标记，所述多个掩模坯料中的每一个上的图案，以及将所述子图案对准所述至少一个参考模板对准标记。

29. 发明申请

US20080116602A1 CUT-AND-PASTE IMPRINT LITHOGRAPHIC MOLD AND METHOD THEREFOR 有权
标题翻译：切割和抛光印花图案模型及其方法
公开(公告)号：US20080116602A1
公开(公告)日：2008-05-22
申请号：US11924651
申请日：2007-10-26
申请人： Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
发明人： Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
IPC分类号： B29C33/38 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.
摘要翻译：在结构上复制图案的方法（和装置）包括使用压印光刻将形成在第一结构上的图案复制到第二结构的一部分上。

30. 发明申请

US20120321740A1 PNEUMATIC METHOD AND APPARATUS FOR NANO IMPRINT LITHOGRAPHY HAVING A CONFORMING MASK 审中-公开
标题翻译：用于具有一致性掩模的纳米印刷平版印刷术的气动方法和装置
公开(公告)号：US20120321740A1
公开(公告)日：2012-12-20
申请号：US13599694
申请日：2012-08-30
申请人： Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
发明人： Matthew E. Colburn , Yves C. Martin , Theodore G. van Kessel , Hematha K. Wickramasinghe
IPC分类号： B29C59/02 , B82Y40/00
CPC分类号： B29C43/021 , B29C43/003 , B29C43/3642 , B29C2043/025 , B29C2043/3647 , B29C2043/3649 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0273
摘要： An apparatus for nano lithography includes a mask having a pattern formed thereon and a pneumatic pressure driving source for applying a pneumatic pressure to at least one of a surface of the mask and a surface of a workpiece, thereby to uniformly transfer the pattern from the mask to the workpiece.
摘要翻译：纳米光刻装置包括具有形成在其上的图案的掩模和用于向掩模的表面和工件的表面中的至少一个施加气动压力的气动压力驱动源，从而均匀地将图案从掩模到工件。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式