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21. 发明授权

US06741367B1 Image forming apparatus having data compression/decompression system 有权
标题翻译：具有数据压缩/解压缩系统的图像形成装置
公开(公告)号：US06741367B1
公开(公告)日：2004-05-25
申请号：US09536909
申请日：2000-03-28
申请人： Takeo Watanabe
发明人： Takeo Watanabe
IPC分类号： G06F312
CPC分类号： G06K15/00 , G06K2215/0002 , G06K2215/0014 , G06K2215/0071
摘要： A PC supplies previously compressed print data to a printer. In the printer, image data are generated based on the supplied print data, and the generated image data are developed in an image memory. Since the print data are compressed, a compressor/decompressor decompresses the print data. If available free area in the image memory is insufficient for developing the image data, the compressor/decompressor compresses the image data previously stored in the image memory, and the image memory is refreshed with the compressed image data. The compressed image data are decompressed by the compressor/decompressor before output to a printer engine. The compressor/decompressor is available for decompressing the print data during a period since the data reception from the PC until a sheet of paper onto which an image is formed reaches a predetermined position. When the sheet of the paper reaches the predetermined position, the compressor/decompressor is switched to decompress only the image data in the image memory.
摘要翻译： PC将以前压缩的打印数据提供给打印机。在打印机中，基于所提供的打印数据生成图像数据，并且生成的图像数据被显影在图像存储器中。由于打印数据被压缩，压缩器/解压缩器解压缩打印数据。如果图像存储器中的可用空闲区域不足以显影图像数据，则压缩器/解压缩器压缩先前存储在图像存储器中的图像数据，并且利用压缩图像数据刷新图像存储器。在输出到打印机引擎之前，压缩器/解压缩器对压缩的图像数据进行解压缩。压缩/解压缩器可用于在从PC的数据接收到形成图像的纸张到达预定位置之前的一段时间期间对打印数据进行解压缩。当纸张的纸张到达预定位置时，压缩机/解压缩器被切换以仅对图像存储器中的图像数据进行解压缩。

22. 发明授权

US06316089B1 Photocurable prepreg sheet for waterproofing, method and apparatus for production of prepreg sheet, and waterproofing method using the sheet 失效
标题翻译：用于防水的光固化性预浸片，用于生产预浸片的方法和设备以及使用该片的防水方法
公开(公告)号：US06316089B1
公开(公告)日：2001-11-13
申请号：US09205227
申请日：1998-12-04
申请人： Kazuo Ohtani , Tomio Yamamoto , Hidetake Sendai , Toshihiko Kadota , Shuichi Sugita , Hirotoshi Kamata , Takeo Watanabe
发明人： Kazuo Ohtani , Tomio Yamamoto , Hidetake Sendai , Toshihiko Kadota , Shuichi Sugita , Hirotoshi Kamata , Takeo Watanabe
IPC分类号： C08F29006
CPC分类号： C08J3/243 , B29C70/504 , C08J5/24 , C08J2367/06 , Y10T428/1359 , Y10T428/24124 , Y10T428/249942 , Y10T428/24995
摘要： A photocurable prepreg sheet for waterproofing includes (1) a fiber-reinforced resin layer which comprises a sheet-shaped inorganic or organic fibrous reinforcing material impregnated with a resin composition comprising: (A) an unsaturated polyester resin and/or vinyl ester resin: 100 parts by weight, and (B) at least two photopolymerization initiators having photosensitivity in different wavelength ranges from ultraviolet range to near infrared range: 0.01 to 10 parts by weight, and which is treated with light of a specific wavelength to thereby undergo prepolymerization which causes at least one of the polymerization initiators and radical-polymerizable unsaturated groups to remain partially intact; and (2) film which covers an upper surface and a back surface of the fiber-reinforced resin layer. The waterproofing material does not require resin impregnation work, can be installed within a short time with successful resin setting, is free form the risk and cumbersome procedure which are caused when a peroxide catalyst is directly handled, and permits adjustment of the pot life. Also disclosed are method and apparatus for production of the prepreg sheet, and waterproofing method using the sheet.
摘要翻译：用于防水的光固化性预浸料片包括（1）纤维增强树脂层，其包含浸渍有树脂组合物的片状无机或有机纤维增强材料，所述树脂组合物包含：（A）不饱和聚酯树脂和/或乙烯基酯树脂：100 （B）至少两种具有紫外线范围至近红外范围的不同波长范围内的光敏性的光聚合引发剂：0.01〜10重量份，用特定波长的光进行处理，从而进行预聚合，至少一种聚合引发剂和可自由基聚合的不饱和基团保持部分完整; 和（2）覆盖纤维增强树脂层的上表面和后表面的膜。防水材料不需要树脂浸渍工作，可以在短时间内安装成功的树脂固化，自由形成直接处理过氧化物催化剂时引起的风险和麻烦的程序，并允许调整适用期。还公开了制备预浸渍片材的方法和设备，以及使用该片材的防水方法。

23. 发明授权

US5130475A Derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide, herbicidal compositions containing the derivative and process for producing the derivative 失效
标题翻译： 1,5-二苯基-1H-1,2,4-三唑-3-羧酰胺的衍生物，含有衍生物的除草剂组合物和用于生产衍生物的方法
公开(公告)号：US5130475A
公开(公告)日：1992-07-14
申请号：US798007
申请日：1991-11-26
申请人： Takafumi Shida , Hideo Arabori , Takeo Watanabe , Shiro Yamazaki , Hiroyasu Shinkawa
发明人： Takafumi Shida , Hideo Arabori , Takeo Watanabe , Shiro Yamazaki , Hiroyasu Shinkawa
IPC分类号： A01N43/653 , C07C65/21 , C07C67/14 , C07C69/734 , C07C235/42 , C07D249/10 , C07D263/42 , C07D263/48
CPC分类号： C07C65/21 , A01N43/653 , C07D249/10 , C07D263/48
摘要： Disclosed herein is a derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide represented by the following formula (I): ##STR1## wherein R represents an alkyl group of 2 to 10 carbon atoms, which is substituted by fluorine atom(s), and X represents a hydrogen atom or a fluorine atom, a process for producing the derivative and a herbicidal compositions containing the derivative of 1,5-diphenyl-1H-1,2,4-triazole-3-carboxamide as an active ingredient.

24. 发明授权

US4551168A Herbicidal 2-(1,3,5-1H-triazin-2-one)-tetrahydrobenzothiazole derivatives, and compositions therefor 失效
标题翻译：除草剂2-（1,3,5-1H-三嗪-2-酮） - 四氢苯并噻唑衍生物及其组合物
公开(公告)号：US4551168A
公开(公告)日：1985-11-05
申请号：US596928
申请日：1984-04-05
申请人： Katsumichi Aoki , Takafumi Shida , Satoru Kumazawa , Susumu Shimizu , Yohichi Kanda , Keigo Satake , Shiro Yamazaki , Hiroyasu Shinkawa , Tsuneaki Chida , Hideo Arabori , Takeo Watanabe
发明人： Katsumichi Aoki , Takafumi Shida , Satoru Kumazawa , Susumu Shimizu , Yohichi Kanda , Keigo Satake , Shiro Yamazaki , Hiroyasu Shinkawa , Tsuneaki Chida , Hideo Arabori , Takeo Watanabe
IPC分类号： A01N43/78 , C07D417/04 , A01N43/64
CPC分类号： C07D417/04 , A01N43/78
摘要： Disclosed herein are a derivative of tetrahydrobenzothiazole represented by the formula (I): ##STR1## wherein R.sup.1 and R.sup.2 represent respectively a straight chain alkyl group having 1 to 6 carbon atoms or a branched chain alkyl group having 1 to 6 carbon atoms, and a herbicidal composition containing the same as an active ingredient.
摘要翻译：本文公开了由式（I）表示的四氢苯并噻唑的衍生物：其中R 1和R 2分别代表具有1至6个碳原子的直链烷基或具有1至6个碳原子的支链烷基，以及含有该活性成分的除草组合物。

25. 发明授权

US07858287B2 Photosensitive resin, and photosensitive composition 有权
标题翻译：感光树脂和感光组合物
公开(公告)号：US07858287B2
公开(公告)日：2010-12-28
申请号：US11947850
申请日：2007-11-30
申请人： Takeo Watanabe , Hiroo Kinoshita , Shinichi Yusa , Tomotaka Yamanaka , Masamichi Hayakawa , Yosuke Osawa , Satoshi Ogi , Yoshitaka Komuro
发明人： Takeo Watanabe , Hiroo Kinoshita , Shinichi Yusa , Tomotaka Yamanaka , Masamichi Hayakawa , Yosuke Osawa , Satoshi Ogi , Yoshitaka Komuro
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039 , G08F12/30
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , Y10S430/106 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/123
摘要： A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X−represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).
摘要翻译：感光性树脂可以形成具有良好形状的图案，而不会导致酸产生剂和具有酸解离基团的光致抗蚀剂初级组分聚合物之间的相容性差，以及含有感光性树脂的感光性组合物。光敏树脂包括由式（1）表示的重复单元：（其中R1表示C2-C9直链或支链二价烃基; R2至R5各自表示氢原子或C1-C3直链或支链烃基; R6和R7表示有机基团，其中R6和R7可以一起形成二价有机基团; X代表阴离子）; 由式（2）表示的重复单元中的至少一种：其中R8表示C2-C9直链或支链烃基）和由式（3）表示的重复单元：式（4）表示的重复单元：任选地，式（5）表示的重复单元。

26. 发明申请

US20050101230A1 Clamping jig for glass substrate, buffer sheet, method for processing glass substrate, and glass substrate 审中-公开
标题翻译：玻璃基板夹紧夹具，缓冲片，玻璃基板加工方法及玻璃基板
公开(公告)号：US20050101230A1
公开(公告)日：2005-05-12
申请号：US11003148
申请日：2004-12-03
申请人： Takamasa Yoshikawa , Koji Okuhata , Kensuke Matsuno , Takeo Watanabe
发明人： Takamasa Yoshikawa , Koji Okuhata , Kensuke Matsuno , Takeo Watanabe
IPC分类号： B24B7/24 , B24B9/00 , B24B9/06 , B24B41/06 , C03C19/00 , G11B5/84 , B24B1/00
CPC分类号： B24B9/065 , B24B41/06
摘要： The present invention provides a method which can simultaneously grind inner peripheral edges and outer peripheral edges of a multiplicity of glass substrates used for magnetic storage media or the like. In order to chamfer the outer edges of the glass substrates g, a multiplicity of annular glass substrates g are firstly stacked with buffer sheets 5 interposed between the glass substrates to make a glass substrate block G. Then, a first plates 1, 1 of the above described clamping jig are applied to both sides of the glass substrate block G, and a first fastening tool 3 is inserted through center holes of the first plates 1, 1 and the glass substrate block G. Next, the glass substrate block G is clamped from an inside thereof for chamfering the outer edges with a grindstone 6.
摘要翻译：本发明提供一种可以同时研磨用于磁存储介质等的多个玻璃基板的内周边缘和外周边缘的方法。为了对玻璃基板g的外边缘进行倒角，首先将多个环形玻璃基板g与夹在玻璃基板之间的缓冲片5堆叠起来，制成玻璃基板块G.然后，将第一板将上述夹持夹具施加到玻璃基板块G的两侧，并且将第一紧固工具3插入穿过第一板1,1和玻璃基板块G的中心孔。接下来，玻璃基板块G被夹紧从其内侧用磨石6倒角外边缘。

27. 发明授权

US06845635B2 METHOD OF MANUFACTURING GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIA, GLASS SUBSTRATE FOR INFORMATION RECORDING MEDIA MANUFACTURED USING THE METHOD, AND INFORMATION RECORDING MEDIUM USING THE GLASS SUBSTRATE 有权
标题翻译：用于制造用于信息记录介质的玻璃基板的方法，用于使用该方法制造的信息记录介质的玻璃基板和使用玻璃基板的信息记录介质
公开(公告)号：US06845635B2
公开(公告)日：2005-01-25
申请号：US09992961
申请日：2001-11-05
申请人： Takeo Watanabe , Takao Miwa , Satoshi Jibiki , Masamichi Kezuka , Kensuke Matsuno
发明人： Takeo Watanabe , Takao Miwa , Satoshi Jibiki , Masamichi Kezuka , Kensuke Matsuno
IPC分类号： B23K26/06 , B23K26/067 , B23K26/08 , C03B29/00 , C03B29/02 , C03C3/083 , C03C3/085 , C03C3/087 , C03C10/00 , C03C19/00 , C03C21/00 , C03C23/00 , G11B5/73 , G11B5/84 , G11B7/00 , G11B7/253 , G11B7/26 , C03B21/00
CPC分类号： C03C19/00 , B23K26/0604 , B23K26/0619 , B23K26/067 , B23K26/0823 , C03B29/00 , C03B29/02 , C03C23/0025 , G11B5/7315 , G11B5/8404 , G11B7/00 , G11B7/2531 , G11B7/26
摘要： There are provided a method of manufacturing a glass substrate for information recording media that allows the inner and outer peripheral edge surfaces of the glass substrate for information recording media to be smoothed easily and inexpensively, a glass substrate for information recording media manufactured using this method, and an information recording medium using this glass substrate. A donut-shaped glass disk for information recording media having an outer peripheral edge surface and an inner peripheral edge surface is prepared. At least one of the outer peripheral edge surface and the inner peripheral edge surface of the glass disk is smoothed by melt-heating to a temperature at or above the softening point of the glass by irradiating with at least one laser beam. As a result, at least one of the outer peripheral edge surface and the inner peripheral edge surface of the glass disk becomes smooth and rounded, and hence a polishing step used in a conventional method can be omitted, and moreover chamfering in a grinding step can also be omitted.
摘要翻译：提供了一种制造用于信息记录介质的玻璃基板的方法，其允许用于信息记录介质的玻璃基板的内周边和外周边表面易于且廉价地平滑，使用该方法制造的用于信息记录介质的玻璃基板，以及使用该玻璃基板的信息记录介质。准备具有外周边缘面和内周边缘面的信息记录介质的环形玻璃盘。通过用至少一个激光束照射，玻璃盘的外周边缘表面和内周边缘表面中的至少一个通过熔融加热至玻璃软化点之上或之上的温度来平滑。结果，玻璃盘的外周边缘面和内周缘面中的至少一个变得光滑圆滑，因此可以省略常规方法使用的抛光步骤，而且在研磨步骤中可以进行倒角也可以省略。

28. 发明授权

US06486225B1 Photocurable composition 失效
标题翻译：可光固化组合物
公开(公告)号：US06486225B1
公开(公告)日：2002-11-26
申请号：US09441954
申请日：1999-11-17
申请人： Hirotoshi Kamata , Takeo Watanabe , Kazuhiko Ooga , Toshio Koshikawa
发明人： Hirotoshi Kamata , Takeo Watanabe , Kazuhiko Ooga , Toshio Koshikawa
IPC分类号： C08F248
CPC分类号： C09D175/16 , C08G18/672 , C08G18/673 , C08G18/6795 , C08G18/792 , C08K5/0041 , C08K5/55 , C08G18/48 , C08L75/16
摘要： A photocurable composition comprising (A) 100 parts by weight of a compound having an ethylenically unsaturated group, (B) from 0.001 to 5 parts by weight of a cationic dye having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm represented by formula (1: D+·A1− (1) wherein D+ represents a cation having an absorption maximum wavelength in the wavelength region of from 400 to 1,200 nm, and A1 31 represents an anion, and (C) from 0.005 to 10 parts by weight of a quaternary borate-type compound represented by formula (2): wherein R1, R2, R3 and R4 each independently represents an alkyl group, an aryl group, an aralkyl group, an alkenyl group, an alkynyl group, a silyl group, a heterocyclic group or a halogen atom, and Z+ represents a cation, wherein from 5 to 95 wt % of (A) the compound having an ethylenically unsaturated group is a urethane (meth)acrylate oligomer obtained by the reaction of a polyisocyanate having three or more isocyanate groups within one molecule with a hydroxyl group-containing (meth)acrylic acid ester.
摘要翻译：一种可光固化组合物，其包含（A）100重量份具有烯键式不饱和基团的化合物，（B）0.001至5重量份在波长范围为400至1200nm的吸收最大波长的阳离子染料，（1）其中D +表示波长范围为400〜1200nm的吸收最大波长的阳离子，A131表示阴离子，（C）0.005〜10重量份的季硼酸盐型由式（2）表示的化合物：其中R1，R2，R3和R4各自独立地表示烷基，芳基，芳烷基，烯基，炔基，甲硅烷基，杂环基或卤素原子，Z +表示阳离子，其中，（A）具有烯键式不饱和基团的化合物的5〜95重量％是通过在1分子w内具有3个以上异氰酸酯基的多异氰酸酯反应得到的聚氨酯（甲基）丙烯酸酯低聚物具有羟基的（甲基）丙烯酸酯。

29. 发明授权

US6165686A Photocurable composition and color reversion preventing method 失效
标题翻译：可光固化组合物和颜色反转防止方法
公开(公告)号：US6165686A
公开(公告)日：2000-12-26
申请号：US81995
申请日：1998-05-21
申请人： Hirotoshi Kamata , Toshio Koshikawa , Takeo Watanabe , Shuichi Sugita
发明人： Hirotoshi Kamata , Toshio Koshikawa , Takeo Watanabe , Shuichi Sugita
IPC分类号： C08F2/50 , C09D4/06 , G03F7/029 , G03C1/73
CPC分类号： G03F7/029 , C09D4/06 , Y10S430/117 , C08F290/14
摘要： Color reversion of photocured products which have been photocured with cationic dyes and quaternary organo borates can be notably suppressed by addition of phenolic compounds, aromatic thiol compounds, amine compounds and/or phosphorous compounds.
摘要翻译：通过添加酚类化合物，芳族硫醇化合物，胺化合物和/或磷化合物，可以显着地抑制用阳离子染料和季有机硼酸盐光固化的光固化产物的颜色反转。

30. 发明授权

US5326672A Resist patterns and method of forming resist patterns 失效
标题翻译：抗蚀剂图案和形成抗蚀剂图案的方法
公开(公告)号：US5326672A
公开(公告)日：1994-07-05
申请号：US964715
申请日：1992-10-22
申请人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
发明人： Toshihiko Tanaka , Mitsuaki Morigami , Iwao Higashikawa , Takeo Watanabe
IPC分类号： G03F7/30 , G03C5/00
CPC分类号： G03F7/30
摘要： In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.
摘要翻译：根据所提出的抗蚀剂图案形成方法，将抗蚀剂表面和冲洗液之间的接触角调节到预定范围内，将不保持干燥的挥发性表面活性剂在冲洗液中混合以降低表面张力，冲洗液在冲洗的临界条件下干燥，以免引起表面张力。因此抗蚀剂图案之间的吸引力的发生可能被削弱或消失，从而可以有效地防止图形的下降，这在形成精细抗蚀剂图案或高方面的抗蚀剂图案时经常发生。另一方面，根据所述抗蚀剂图案的结构，可以有效地防止聚集抗蚀剂图案的最外面的主要图案掉落。通过提供这种效果，产品的产量增加。此外，本发明还可以应用于光，电子，X射线，离子束等的光刻照明源

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