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21. 发明申请

US20070070099A1 METHODS AND APPARATUS FOR INKJET PRINTING ON NON-PLANAR SUBSTRATES 审中-公开
标题翻译：用于印刷非平板基板的方法和装置
公开(公告)号：US20070070099A1
公开(公告)日：2007-03-29
申请号：US11536533
申请日：2006-09-28
申请人： Emanuel Beer , Chang Lin , Shinichi Kurita , Quanyuan Shang , Benjamin Johnston
发明人： Emanuel Beer , Chang Lin , Shinichi Kurita , Quanyuan Shang , Benjamin Johnston
IPC分类号： B41J25/308
CPC分类号： B41J2/0456 , B41J2/0458 , B41J2/04588 , B41J3/28 , B41J3/4073 , B41J11/0035 , B41J25/308 , G02F1/1303 , G02F1/133516
摘要： A sensor apparatus for an inkjet printing device is provided. The sensor apparatus may include 1) at least one print head adapted to deposit ink on a top surface of a substrate, wherein the substrate is in motion relative to the print head, 2) at least one sensor adapted to detect the distance of the at least one sensor from the top surface of the substrate, and 3) a controller adapted to determine the substrate to nozzle distance based on the distance of the sensor to the top surface of the substrate, and adjust the trajectory of the ink being deposited on the substrate based on the substrate to nozzle distance. Numerous other aspects are provided.
摘要翻译：提供了一种用于喷墨打印装置的传感器装置。所述传感器装置可以包括：1）适于将墨水沉积在基底的顶表面上的至少一个打印头，其中所述基底相对于所述打印头运动; 2）至少一个传感器，适于检测所述at 至少一个传感器，以及3）控制器，其适于基于所述传感器与所述基板顶表面的距离来确定所述基板与喷嘴的距离，并且调整沉积在所述基板上的所述油墨的轨迹基板基于基板与喷嘴的距离。提供了许多其他方面。

22. 发明申请

US20070000608A1 Chamber isolation valve RF grounding 有权
标题翻译：室内隔离阀RF接地
公开(公告)号：US20070000608A1
公开(公告)日：2007-01-04
申请号：US11174229
申请日：2005-07-01
申请人： Ke Lee , Shinichi Kurita , Emanuel Beer
发明人： Ke Lee , Shinichi Kurita , Emanuel Beer
IPC分类号： C23F1/00
CPC分类号： F16K3/0227 , F16K51/02 , H01J37/32844 , H01J2237/166 , H01L21/67126 , Y02C20/30 , Y02P70/605 , Y10S277/919 , Y10S277/92 , Y10T137/8242
摘要： A method and apparatus for grounding a chamber isolation valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively ground a chamber isolation valve and/or isolation valve door while avoiding metal-to-metal contact between moving parts in the processing system. In one embodiment, the elastomeric member is attached to and in electrical communication with the door of the chamber isolation valve. The elastomeric member is brought into contact with a grounded component of the plasma processing system when the door is in the closed position. In another embodiment, the conductive elastomeric member is attached to a bracing member of the isolation valve and is brought into contact with a grounded component of the plasma processing system when the bracing member is deployed to hold the isolation valve door in place during substrate processing. Other configurations are also provided.
摘要翻译：提供了一种用于使室隔离阀接地的方法和装置。通常，该方法利用导电弹性体构件来有效地将室隔离阀和/或隔离阀门接地，同时避免处理系统中移动部件之间的金属与金属的接触。在一个实施例中，弹性体构件附接到腔室隔离阀的门并且与腔室隔离阀的门电连通。当门处于关闭位置时，弹性体构件与等离子体处理系统的接地部件接触。在另一个实施例中，当支撑构件展开以在衬底处理期间将隔离阀门保持在适当位置时，导电弹性构件附接到隔离阀的支撑构件并与等离子体处理系统的接地构件接触。还提供其他配置。

23. 发明授权

US08327878B2 Chamber isolation valve RF grounding 有权
标题翻译：室内隔离阀RF接地
公开(公告)号：US08327878B2
公开(公告)日：2012-12-11
申请号：US12333043
申请日：2008-12-11
申请人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
发明人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
IPC分类号： H01J37/32
CPC分类号： F16K3/0227 , F16K51/02 , H01J37/32844 , H01J2237/166 , H01L21/67126 , Y02C20/30 , Y02P70/605 , Y10S277/919 , Y10S277/92 , Y10T137/8242
摘要： Methods and apparatus for grounding a chamber isolation valve for a processing system are provided. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
摘要翻译：提供了用于处理系统的室隔离阀接地的方法和装置。在一个实施例中，描述了用于等离子体处理系统的接地室隔离阀。腔室隔离阀包括门和可移动地附接到门并与其相对的支撑构件以及与门电连通的至少一个导电构件，所述至少一个导电构件包括设置在支撑件上的一个或多个反应缓冲器当门处于关闭位置时，适于接触等离子体处理系统的至少一个接地部件的构件。

24. 发明申请

US20080291228A1 METHODS AND APPARATUS FOR INKJET PRINTING WITH MULTIPLE ROWS OF PRINT HEADS 审中-公开
标题翻译：用于打印头多个打印头的方法和装置
公开(公告)号：US20080291228A1
公开(公告)日：2008-11-27
申请号：US11751231
申请日：2007-05-21
申请人： JOHN M. WHITE , Fan-Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
发明人： JOHN M. WHITE , Fan-Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
IPC分类号： B41J29/38 , B41J2/145
CPC分类号： B41J2/145 , B41J2/515 , B41J25/003 , B41J2202/09 , H01L51/0005
摘要： According to the present invention, multiple rows of nozzles within a print head may be arranged proximal to and offset from each other to facilitate inkjet printing. Print heads may comprise a single row of nozzles or may comprise a plurality of rows of nozzles. Each row of nozzles may be situated such that the immediately adjacent row of nozzles may be offset by a predetermined distance. In some embodiments, adjacent rows of nozzles may each print with the same color. In this way, adjacent offset rows of nozzles may be used in combination to dispense ink drops into sub-pixel wells in improved patterns and with improved ink distribution within the sub-pixel well. These offset print techniques may also enable tighter grouping of ink drops within a sub-pixel well and enable faster printing operations.
摘要翻译：根据本发明，打印头内的多排喷嘴可以布置成彼此靠近并且彼此偏离，以便于喷墨打印。打印头可以包括单排喷嘴，或者可以包括多排喷嘴。每排喷嘴可以被定位成使得紧邻的喷嘴排可以偏移预定距离。在一些实施例中，相邻排的喷嘴可以以相同的颜色打印。以这种方式，相邻的喷嘴排可以组合使用，以将墨滴以改进的图案分配到子像素阱中，并且改进子像素阱内的油墨分布。这些偏移打印技术还可以使得子像素内的墨滴更紧密地分组并且能够实现更快的打印操作。

25. 发明申请

US20070073443A1 METHODS AND APPARATUS FOR POSITIONING A SUBSTRATE RELATIVE TO A SUPPORT STAGE 失效
标题翻译：用于定位与支持阶段相关的基板的方法和装置
公开(公告)号：US20070073443A1
公开(公告)日：2007-03-29
申请号：US11562309
申请日：2006-11-21
申请人： Shinichi Kurita , Emanuel Beer
发明人： Shinichi Kurita , Emanuel Beer
IPC分类号： G06F19/00
CPC分类号： H01L21/67265 , Y10S414/135 , Y10S414/136 , Y10S414/141
摘要： In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.
摘要翻译：在第一方面，一种基板定位系统包括围绕适于支撑基板的台阶间隔设置的多个推动器。每个推动器适于采取缩回位置，以便允许将基板装载到载物台上并从载物台上卸载，朝向由载物台支撑的基板的边缘延伸，接触基板的边缘，并且继续延伸以使基板相对于载物台移动，直到基板被校准到载物台。提供了许多其他方面。

26. 发明授权

US07151981B2 Methods and apparatus for positioning a substrate relative to a support stage 失效
公开(公告)号：US07151981B2
公开(公告)日：2006-12-19
申请号：US10782507
申请日：2004-02-19
申请人： Shinichi Kurita , Emanuel Beer
发明人： Shinichi Kurita , Emanuel Beer
IPC分类号： G06F7/00
CPC分类号： H01L21/68728 , G03F7/70666 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70791 , G03F7/70825 , G03F9/7011 , H01L21/67265 , H01L21/68778 , Y10S414/135 , Y10S414/136 , Y10S414/141
摘要： In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.

27. 发明申请

US20060157340A1 Transfer chamber for vacuum processing system 有权
公开(公告)号：US20060157340A1
公开(公告)日：2006-07-20
申请号：US11386257
申请日：2006-03-21
申请人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Wendell Blonigan
发明人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Wendell Blonigan
IPC分类号： C23C14/00
CPC分类号： H01L21/67196 , C23C14/566 , C23C16/54 , H01L21/67126 , H01L21/67739 , H01L21/67748 , Y10S414/135
摘要： A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.

28. 发明申请

US20060092436A1 Methods and apparatus for inkjet printing of color filters for displays 审中-公开
标题翻译：用于显示器的彩色滤光片的喷墨打印的方法和装置
公开(公告)号：US20060092436A1
公开(公告)日：2006-05-04
申请号：US11061148
申请日：2005-02-18
申请人： John White , Fan Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
发明人： John White , Fan Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
IPC分类号： G06K15/02
CPC分类号： B41J3/407 , B41J2/04505 , B41J2/04541 , B41J2/04581 , B41J2/04588 , B41J2/0459 , B41J2/04593 , B41J2/125 , B41J3/28 , B41J3/543 , B41J25/001 , B41J25/003 , B41J25/005 , B41J29/15 , B41J29/393
摘要： Methods and apparatus are provided wherein data representative of an image is received, the data being indicative of a plurality of theoretical ink jetting drop positions. The data may be converted into an image data file, the image data file being indicative of a plurality of actual physical ink jetting drop positions, each physical ink jetting drop position corresponding to a theoretical ink jetting drop position. A print system may be controlled based on the image data file, wherein the actual physical ink jetting drop positions may each be selected based upon being within a predefined percentage of a print resolution in a printing direction of a corresponding one of the theoretical ink jetting drop positions.
摘要翻译：提供了方法和装置，其中接收到表示图像的数据，该数据表示多个理论喷墨滴落位置。数据可以被转换为图像数据文件，图像数据文件指示多个实际物理喷墨滴落位置，每个物理喷墨滴下位置对应于理论喷墨滴落位置。可以基于图像数据文件来控制打印系统，其中可以基于理论喷墨滴的相应一个的打印方向上的打印分辨率的预定百分比内的每一个来选择实际物理喷墨落下位置职位

29. 发明申请

US20060038554A1 Electron beam test system stage 审中-公开
标题翻译：电子束测试系统阶段
公开(公告)号：US20060038554A1
公开(公告)日：2006-02-23
申请号：US11190320
申请日：2005-07-27
申请人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Benjamin Johnston , Fayez Abboud
发明人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Benjamin Johnston , Fayez Abboud
IPC分类号： G01R31/28
CPC分类号： G01R31/305
摘要： A method and integrated system for electron beam testing a substrate is provided. In one aspect, the integrated system includes an electron beam testing chamber having a substrate table disposed therein. The substrate table is capable of moving a substrate within the testing chamber in both horizontal and vertical directions. The system also includes a load lock chamber disposed adjacent a first side of the testing chamber, and a prober storage assembly disposed beneath the testing chamber. A prober transfer assembly is disposed adjacent a second side of the testing chamber and arranged to transfer one or more probers between the prober storage assembly and the testing chamber. Further, one or more electron beam testing devices are disposed on an upper surface of the testing chamber.
摘要翻译：提供了一种用于电子束测试衬底的方法和集成系统。一方面，集成系统包括电子束测试室，其具有设置在其中的衬底台。衬底台能够在水平和垂直方向上移动测试室内的衬底。该系统还包括邻近测试室的第一侧设置的负载锁定室，以及设置在测试室下方的探测器存储组件。探测器传送组件设置在测试室的第二侧附近，并布置成在探测器存储组件和测试室之间传送一个或多个探测器。此外，一个或多个电子束测试装置设置在测试室的上表面上。

30. 发明申请

US20060005771A1 Apparatus and method of shaping profiles of large-area PECVD electrodes 审中-公开
标题翻译：大面积PECVD电极成形轮廓的装置和方法
公开(公告)号：US20060005771A1
公开(公告)日：2006-01-12
申请号：US11143506
申请日：2005-06-02
申请人： John White , Emanuel Beer , Wei Chang , Robin Tiner , Soo Choi
发明人： John White , Emanuel Beer , Wei Chang , Robin Tiner , Soo Choi
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： C23C16/4583 , H01J37/3244 , H01J2237/3325
摘要： An apparatus and method for shaping profiles of a large-area PECVD electrode is provided. A plasma-enhanced CVD chamber for processing a large-area substrate is first provided. The chamber includes a lower electrode that supports a large area substrate. The lower electrode is shaped to selectively conform the supported substrate in a selected orientation under operating conditions. The orientation may be either planar or nonplanar. The substrate complies with the shape of the electrode so the substrate is substantially parallel to an upper electrode in the chamber, and/or to a gas diffusion plate in the chamber. The lower electrode comprises a substrate support fabricated from a material of insufficient strength to support itself at operating temperatures and pressure in the chamber. The shape of the substrate support is adjusted by modifying the dimensions and/or planarity of a supporting base structure, and/or by appropriately varying the thickness of the substrate support.
摘要翻译：提供了一种用于形成大面积PECVD电极的轮廓的装置和方法。首先提供用于处理大面积基板的等离子体增强CVD室。该室包括支撑大面积基板的下电极。下电极被成形为在操作条件下以选定的方向选择性地使受支撑的衬底符合。取向可以是平面或非平面的。基板符合电极的形状，因此基板基本上平行于腔室中的上部电极，和/或腔室中的气体扩散板。下电极包括由强度不足的材料制成的衬底支撑件，以在腔室中的操作温度和压力下自身支撑。通过改变支撑基底结构的尺寸和/或平面度和/或通过适当地改变基底支撑件的厚度来调节基底支撑件的形状。

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