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21. 发明授权

US06875478B2 Apparatus and process for film deposition 失效
标题翻译：用于膜沉积的装置和方法
公开(公告)号：US06875478B2
公开(公告)日：2005-04-05
申请号：US10066380
申请日：2002-02-05
申请人： Masato Yoshikawa , Yoshinori Iwabuchi , Shingo Ohno , Yukihiro Kusano
发明人： Masato Yoshikawa , Yoshinori Iwabuchi , Shingo Ohno , Yukihiro Kusano
IPC分类号： C23C14/20 , C23C14/56 , D06M11/00 , D06M11/83 , B05D1/04 , C23C14/00 , C23C16/00
CPC分类号： C23C14/562
摘要： A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.
摘要翻译：一种装有真空室的成膜装置，包括用于垂直行进连续片材作为基底的一对辊子和用于在真空室中在片材表面上连续沉积薄膜的一对溅射阴极。阴极垂直布置并水平面对。片材在一对阴极之间行进。使用它的装置和成膜方法使得可以在柔性片的表面上沉积膜，而不会导致诸如膜沉积错误或异常放电的问题，同时确保稳定，连续的长期操作。

22. 发明授权

US5855728A Method for cleaning vulcanization mold 失效
标题翻译：硫化模具清洗方法
公开(公告)号：US5855728A
公开(公告)日：1999-01-05
申请号：US802429
申请日：1997-02-18
申请人： Shinji Saitoh , Shingo Ohno , Nobuko Kato , Kazuo Naito , Yasuhiro Horiike
发明人： Shinji Saitoh , Shingo Ohno , Nobuko Kato , Kazuo Naito , Yasuhiro Horiike
IPC分类号： B08B7/00 , B29C33/72 , B44C1/22
CPC分类号： B29C33/72 , B08B7/0035 , B29D2030/0663 , B29L2030/00
摘要： A cleaning method for realizing uniform ashing of residues at a high efficiency by uniformly injecting neutral active species directly toward the surfaces of vulcanization residues left on a vulcanization mold is described. The method includes setting a ring-shaped cavity in face-to-face reaction with the inner surfaces of a ring-shaped vulcanization mold in a vacuum treating vessel, transmitting a microwave in the cavity, and emitting the microwave via a number of coupling slots formed in the outer side of the cavity toward the inner surfaces of the vulcanization mold whereupon a reaction gas is injected in the space of the treating vessel between the inner surfaces of the vulcanization mold and the cavity, so that a plasma including a major proportion of neutral active species generated from the reaction gas and the emitted microwave, and the elastomer residue is ashed by means of at least one gas selected from the plasma gas and a neutral active species-containing gas. A microwave generator useful for the method is also described.
摘要翻译：描述了通过将中性活性物质直接向残留在硫化模具上的硫化残余物的表面均匀注入来实现高效残余物均匀灰化的清洁方法。该方法包括在真空处理容器中将环状空腔与环形硫化模具的内表面进行面对面反应，在空腔中传输微波，并通过多个耦合槽发射微波在空腔的外侧朝向硫化模的内表面形成，从而在硫化模具的内表面和空腔之间的处理容器的空间中注入反应气体，使得包含主要部分的等离子体由反应气体和发射的微波产生的中性活性物质，并且弹性体残余物通过选自等离子体气体和含中性活性物质的气体中的至少一种气体进行灰化。还描述了对该方法有用的微波发生器。

23. 发明授权

US08689390B2 Wiper device 有权
标题翻译：刮水装置
公开(公告)号：US08689390B2
公开(公告)日：2014-04-08
申请号：US13574182
申请日：2011-02-22
申请人： Akihisa Motono , Shingo Ohno , Shunsaku Ohta , Yoshiyuki Kuomo
发明人： Akihisa Motono , Shingo Ohno , Shunsaku Ohta , Yoshiyuki Kuomo
IPC分类号： B60S1/18 , B60S1/24 , B60S1/06
CPC分类号： B60S1/3493 , B60S1/0425 , B60S1/0436 , B60S1/349
摘要： Disclosed is a wiper device provided with a metal frame member (16), which includes a cylindrical receiving portion (26), and a pivot holder (18), which is fixed to the metal frame member (16) and holds a pivot shaft (12). The pivot holder (18) includes holder cylindrical portions (34, 104), which rotationally support the pivot shaft (12), vehicle body attachment legs (38, 108), which extend radially outward from the holder cylindrical parts (34, 104) and are attached to a vehicle body, and fitting portions (40B, 110B), which are securely fitted to the receiving part (26) by inserting the fitting portions (40B, 110B) in the receiving portion (26) and swaging the receiving portion (26). The pivot holder (18) is formed as an integrated component by a metal part and a plastic part (32), which is lighter than the metal part and is integrated with the metal part. At least an outer circumferential portion of the engaged parts (40B, 110B) is formed by the metal part.
摘要翻译：公开了一种设置有金属框架构件（16）的擦拭器装置，该金属框架构件包括圆柱形容纳部分（26）和枢转保持器（18），其固定到金属框架构件（16）并保持枢转轴 12）。枢转保持器（18）包括保持器圆柱形部分（34,104），其旋转地支撑枢转轴（12），从保持器圆柱形部分（34,104）径向向外延伸的车身附接腿部（38,108）并且通过将装配部分（40B，110B）插入到容纳部分（26）中并将接收部分（40）插入到车身中，并将其装配到接收部分（26）上，（26）。枢轴保持器（18）通过金属部件和比金属部件轻的金属部件与塑料部件（32）形成为一体的部件。接合部（40B，110B）的至少外周部由金属部形成。

24. 发明申请

US20120118375A1 SEMICONDUCTOR ELECTRODE, SOLAR CELL IN WHICH SEMICONDUCTOR ELECTRODE IS USED AND SEMICONDUCTOR ELECTRODE MANUFACTURING METHOD 审中-公开
标题翻译：半导体电极，其中使用半导体电极的太阳能电池和半导体电极制造方法
公开(公告)号：US20120118375A1
公开(公告)日：2012-05-17
申请号：US13318244
申请日：2010-04-23
申请人： Masato Yoshikawa , Mari Miyano , Shingo Ohno , Mitsuhiro Nishida , Osamu Shino
发明人： Masato Yoshikawa , Mari Miyano , Shingo Ohno , Mitsuhiro Nishida , Osamu Shino
IPC分类号： H01L31/0224 , H01L21/283 , H01L29/45
CPC分类号： H01G9/2031 , H01G9/2036 , H01G9/2045 , H01G9/2059 , Y02E10/542 , Y02P70/521
摘要： Disclosed is a semiconductor electrode which comprises a transparent electrode that is arranged on the surface of a light-transmitting substrate. The transparent electrode is provided with a metal oxide layer on a surface that is on the reverse side of a surface that is in contact with the substrate. The metal oxide layer contains fine silicon particles, which absorb a specific wavelength (11), and fine metal oxide particles. The fine silicon particles are arranged between the fine metal oxide particles.
摘要翻译：公开了一种半导体电极，其包括布置在透光基板的表面上的透明电极。透明电极在与基板接触的表面的背面的表面上设置有金属氧化物层。金属氧化物层含有吸收特定波长的细硅颗粒（11）和金属氧化物微粒。细硅颗粒布置在细金属氧化物颗粒之间。

25. 发明申请

US20070243718A1 Dye sensitive metal oxide semiconductor electrode, method for manufacturing the same, and dye sensitized solar cell 审中-公开
标题翻译：染料敏感性金属氧化物半导体电极，其制造方法和染料敏化太阳能电池
公开(公告)号：US20070243718A1
公开(公告)日：2007-10-18
申请号：US11730952
申请日：2007-04-05
申请人： Seimei Shiratori , Bin Ding , Katsuhiro Onozuka , Shinichiro Sugi , Shingo Ohno , Masato Yoshikawa
发明人： Seimei Shiratori , Bin Ding , Katsuhiro Onozuka , Shinichiro Sugi , Shingo Ohno , Masato Yoshikawa
IPC分类号： H01L21/31
CPC分类号： H01G9/2031 , H01G9/2059 , Y02E10/542 , Y02P70/521
摘要： Provided are a dye sensitized metal oxide semiconductor electrode having a metal oxide semiconductor film that can adsorb a sufficient amount of dye due to a high specific surface area and exhibits high electrical conductivity due to tight contact of metal oxide particles, and a dye sensitized solar cell that exhibits high power generation efficiency by using this dye sensitized metal oxide semiconductor electrode. The dye sensitized metal oxide semiconductor electrode is produced by forming a metal oxide semiconductor film on a transparent conductive film formed on a substrate. A stock solution containing a metal oxide precursor is jetted onto the transparent conductive film by electrospinning. A nanofiber layer containing a metal oxide precursor is deposited on the transparent conductive film, and this deposited layer is fired.
摘要翻译：提供一种具有金属氧化物半导体膜的染料敏化金属氧化物半导体电极，该金属氧化物半导体膜可以由于高比表面积吸附足量的染料，并且由于金属氧化物颗粒的紧密接触和染料敏化太阳能电池而表现出高导电性通过使用该染料敏化金属氧化物半导体电极显示出高发电效率。通过在形成在基板上的透明导电膜上形成金属氧化物半导体膜来制造染料敏化金属氧化物半导体电极。通过电纺丝将含有金属氧化物前体的储备溶液喷射到透明导电膜上。将包含金属氧化物前体的纳米纤维层沉积在透明导电膜上，并将该沉积层烧制。

26. 发明申请

US20050260786A1 Dye-sensitized solar cell 审中-公开
标题翻译：染料敏化太阳能电池
公开(公告)号：US20050260786A1
公开(公告)日：2005-11-24
申请号：US10524261
申请日：2003-08-06
申请人： Masato Yoshikawa , Shingo Ohno , Taichi Kobayashi , Takayuki Sugimura , Yoshinori Iwabuchi , Osamu Shiino , Hideo Sugiyama , Yasuo Horikawa , Shinichi Toyosawa
发明人： Masato Yoshikawa , Shingo Ohno , Taichi Kobayashi , Takayuki Sugimura , Yoshinori Iwabuchi , Osamu Shiino , Hideo Sugiyama , Yasuo Horikawa , Shinichi Toyosawa
IPC分类号： H01G9/20 , H01M10/36 , H01M14/00 , H01L21/00
CPC分类号： H01G9/2009 , H01G9/2031 , Y02E10/542 , Y02P70/521
摘要： An electrolyte for dye-sensitized solar cells, wherein an oxidation-reduction substance is carried by a vulcanized rubber, a phosphazene polymer, a porous body comprising a high molecular material which has a three-dimensional continuous network skeleton structure, or an EVA resin film. A dye-sensitized solar cell comprising dye-sensitized semiconductor electrodes 2, 3, a counter electrode 4 arranged at an opposed position to the electrodes, and an electrolyte 6 between the electrodes 2, 3 and the electrode 4. A solid electrolyte for dye-sensitized solar cells effective in improving the generation efficiency, durability, and safety of dye-sensitized solar cells and can be manufactured inexpensively.
摘要翻译：用于染料敏化太阳能电池的电解质，其中氧化还原物质由硫化橡胶，磷腈聚合物，包含具有三维连续网状骨架结构的高分子材料的多孔体或EVA树脂膜。一种染料敏化太阳能电池，其包含染料敏化半导体电极2,3，配置在与电极相对的位置的对置电极4，以及电极2,3与电极4之间的电解质6.一种染料敏化太阳能电池，敏化太阳能电池有效地提高染料敏化太阳能电池的发电效率，耐久性和安全性，并且可以廉价地制造。

27. 发明授权

US06921465B2 Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film 失效
$Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film$
标题翻译：用于控制干电镀膜的折射率的方法和用于制造干电镀叠层膜的方法
公开(公告)号：US06921465B2
公开(公告)日：2005-07-26
申请号：US10647251
申请日：2003-08-26
申请人： Masato Yoshikawa , Shingo Ohno , Sho Kumagai
发明人： Masato Yoshikawa , Shingo Ohno , Sho Kumagai
IPC分类号： C23C14/00 , C23C14/06 , C23C14/34 , C23C14/54
CPC分类号： C23C14/06 , C23C14/0084 , C23C14/3414 , C23C14/548
摘要： A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.
摘要翻译：制备干电镀叠层膜的方法包括提供碳化硅作为起始源并进行干电镀，同时连续或间歇地改变反应气体的浓度以沉积并在衬底上形成具有不同折射率的薄膜沿其厚度的指数。还描述了一种用于制造溅射组合膜的方法，其包括提供碳化硅作为靶，并且在连续或间歇地向靶提供电力的同时进行溅射，以沉积并形成沿着其的折射率不同的薄膜厚度。

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