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    • 26. 发明授权
    • Multiple layered functional thin films
    • 多层功能薄膜
    • US6020175A
    • 2000-02-01
    • US926493
    • 1997-09-10
    • Mitsuhiko OndaYuri LvovKatsuhiko ArigaToyoki Kunitake
    • Mitsuhiko OndaYuri LvovKatsuhiko ArigaToyoki Kunitake
    • B01J19/00B05C3/18B05D1/20B32B9/00C07K17/04C09B67/02C12N11/00C12N11/04H01L51/50H05B33/10C07K17/00C07K17/08C12N11/08
    • C09B67/0097C07K17/04C12N11/00C12N11/04Y10S530/81Y10S530/811Y10S530/813Y10S530/815Y10S530/817
    • Multiple layered functional thin films fixed on a solid support are provided which comprise multiple layers of functional molecules (such as enzymes and other proteins, pigments and dyes) admixed with polymer ions in combination with multiple layers of polymer ions without the functional molecules. The films are prepared by immersing a solid support having an electric charge in an admixed polymer ion-functional molecule solution having a net electric charge opposite to that of the solid support followed by immersing the solid support in a polymer ion solution having a net electric charge opposite to that of the admixed polymer ion-functional molecule solution, and repeating at least once the immersings of the solid support in the solutions. Alternatively, the films are prepared by immersing the solid support in a polymer ion solution having a net electric charge opposite to that of the solid support followed by immersing the solid support in an admixed polymer ion-functional molecule solution having a net electric charge opposite to that of the polymer ion solution, and repeating at least once the immersings of the solid support in the solutions.
    • 提供了固定在固体支持物上的多层功能性薄膜,其包含与聚合物离子混合的多层功能分子(如酶和其他蛋白质,颜料和染料),并与多层聚合物离子结合而没有功能分子。 通过将具有电荷的固体支持物浸渍在具有与固体支持物的电荷相反的净电荷的混合聚合物离子功能分子溶液中,然后将固体支持物浸入具有净电荷的聚合物离子溶液中来制备膜 与混合的聚合物离子功能分子溶液相反,并且至少一次将固体载体沉积在溶液中。 或者,通过将固体支持物浸入具有与固体支持物的电荷相反的净电荷的聚合物离子溶液中,然后将固体支持物浸入与电荷相反的混合聚合物离子功能分子溶液中来制备膜 聚合物离子溶液的重量,并且至少一次将固体载体浸入溶液中。
    • 29. 发明授权
    • Process for producing dielectric insulating thin film, and dielectric insulating material
    • 电介质绝缘薄膜的制造方法以及介电绝缘材料
    • US07407895B2
    • 2008-08-05
    • US10550016
    • 2004-03-26
    • Toyoki KunitakeYoshitaka Aoki
    • Toyoki KunitakeYoshitaka Aoki
    • H01L21/00
    • C23C18/1216C23C18/1212C23C18/1225C23C18/1245C23C18/1254C23C18/1275H01L21/31683
    • Provided is a method for producing, in a simple manner, a general-purpose dielectric insulating thin film that has a varying dielectric constant and accepts an accurate film thickness control and a control of the composition, the structure and the thickness thereof. The process includes a step (A) of making a substrate having a hydroxyl group in its surface or having a hydroxyl group introduced into its surface, adsorb a metal compound having a functional group capable of reacting with a hydroxyl group for condensation and capable of forming a hydroxyl group through hydrolysis, a step (B) of removing the excessive metal compound from the substrate surface, a step (C) of hydrolyzing the metal compound to form a metal oxide layer, and a step (D) of treating the metal oxide layer according to any one treating method selected from the group consisting of oxygen plasma treatment, ozone oxidation treatment, firing treatment and rapid thermal annealing treatment to thereby obtain a dielectric insulating thin film.
    • 本发明提供一种简单的制造具有不同介电常数的通用介电绝缘薄膜的方法,该方法能够接受精确的膜厚度控制以及其组成,结构和厚度的控制。 该方法包括在其表面制备具有羟基或具有引入其表面的羟基的基材的步骤(A),吸附具有能够与羟基反应的官能团的金属化合物用于冷凝并能够形成 通过水解的羟基,从基材表面除去过量的金属化合物的工序(B),将金属化合物水解形成金属氧化物层的工序(C),以及处理金属氧化物的工序(D) 根据选自氧等离子体处理,臭氧氧化处理,烧成处理和快速热退火处理的任一种处理方法,从而获得介电绝缘薄膜。