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21. 发明申请

US20110228663A1 HOLOGRAPHIC RECORDING METHOD 审中-公开
标题翻译：全景记录方法
公开(公告)号：US20110228663A1
公开(公告)日：2011-09-22
申请号：US12880828
申请日：2010-09-13
申请人： Masaya Terai , Kazuki Matsumoto , Rumiko Hayase , Yoshiaki Kawamonzen , Norikatsu Sasao , Masahiro Kanamaru
发明人： Masaya Terai , Kazuki Matsumoto , Rumiko Hayase , Yoshiaki Kawamonzen , Norikatsu Sasao , Masahiro Kanamaru
IPC分类号： G11B7/00
CPC分类号： G11B7/0065 , G11B7/083
摘要： A holographic recording method includes the following steps: irradiating an optical recording medium with a coherent reference beam and a coherent information beam to produce a hologram in the optical recording medium while irradiating the optical recording medium with an incoherent pretreatment beam to consume a polymerization inhibitor; irradiating the hologram with the reference beam to extract a reproduction beam while stopping irradiating the optical recording medium with the reference beam; sensing the signal beam with an image pick-up unit to detect an intensity of the signal beam; and calculating a bit error rate with a control unit to irradiate the hologram with the information beam if the bit error rate is larger than a prescribed value, or to stop irradiating the optical recording medium with the reference beam, the information beam and the pretreatment beam if the bit error rate is smaller than the prescribed value.
摘要翻译：全息记录方法包括以下步骤：用光学记录介质照射具有相干参考光束和相干信息光束的光学记录介质，以在光学记录介质中用不相干的预处理光束照射消耗阻聚剂; 用参考光束照射全息图以提取再现光束，同时停止用参考光束照射光学记录介质; 用图像拾取单元感测信号光束以检测信号光束的强度; 如果比特错误率大于规定值，则用控制单元计算与信息光束照射全息图的比特错误率，或停止用参考光束照射光学记录介质，信息光束和预处理光束如果误码率小于规定值。

22. 发明申请

US20100221646A1 HOLOGRAPHIC RECORDING MEDIUM 审中-公开
标题翻译：全息记录介质
公开(公告)号：US20100221646A1
公开(公告)日：2010-09-02
申请号：US12696537
申请日：2010-01-29
申请人： Yoshiaki KAWAMONZEN , Kazuki Matsumoto , Rumiko Hayase , Norikatsu Sasao , Masahiro Kanamaru , Masaya Terai
发明人： Yoshiaki KAWAMONZEN , Kazuki Matsumoto , Rumiko Hayase , Norikatsu Sasao , Masahiro Kanamaru , Masaya Terai
IPC分类号： G03F7/20
CPC分类号： G03H1/02 , G03H2001/0264 , G11B7/0065 , G11B7/083 , G11B7/24044 , G11B7/245 , G11B7/26
摘要： A holographic recording medium includes a recording layer. The recording layer includes a framework being expressed with the following general formula (1), In the above formula (1), Ar represents a substituted or unsubstituted group selected from benzothiophene group, naphthothiophene group, dibenzothiophene group, thienothiophene group, dithienobenzene group, benzothiazole group, naphthothiazole group, benzoisothiazole group, naphthoisothiazole group, phenothiazine group, phenoxathiin group, dithianaphthalene group, thianthrene group, thioxanthene group, and bithiophene group. In addition, n is an integer from 1 to 4.
摘要翻译：全息记录介质包括记录层。记录层包括用以下通式（1）表示的骨架：在上式（1）中，Ar表示取代或未取代的选自苯并噻吩基，萘并噻吩基，二苯并噻吩基，噻吩并噻吩基，二噻吩苯基，苯并噻唑基萘并噻唑基，苯并异噻唑基，萘并噻唑基，吩噻嗪基，吩噻嗪基，二噻吩基，噻蒽基，噻吨基和双噻吩基。另外，n为1〜4的整数。

23. 发明授权

US08956560B2 Method of manufacturing mold 有权
标题翻译：模具制造方法
公开(公告)号：US08956560B2
公开(公告)日：2015-02-17
申请号：US13423543
申请日：2012-03-19
申请人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
发明人： Yasuaki Ootera , Yoshiyuki Kamata , Naoko Kihara , Yoshiaki Kawamonzen , Takeshi Okino , Ryosuke Yamamoto , Tomoyuki Maeda , Norikatsu Sasao , Akiko Yuzawa , Takuya Shimada , Hiroyuki Hieda
IPC分类号： H01L21/00 , B29C33/38 , G11B5/855
CPC分类号： B29C33/3857 , G11B5/855
摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
摘要翻译：在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

24. 发明授权

US08916053B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08916053B2
公开(公告)日：2014-12-23
申请号：US13528348
申请日：2012-06-20
申请人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
发明人： Yoshiaki Kawamonzen , Yasuaki Ootera , Akiko Yuzawa , Naoko Kihara , Yoshiyuki Kamata , Hiroyuki Hieda , Norikatsu Sasao , Ryosuke Yamamoto , Takeshi Okino , Tomoyuki Maeda , Takuya Shimada
IPC分类号： C03C15/00 , C03C25/68 , C23F1/00 , B44C3/08 , B44C5/04 , B81C1/00 , B44C1/22 , H01L21/033 , G03F7/00 , B41M5/00
CPC分类号： B44C1/227 , B41M5/00 , B81C1/0046 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0337 , Y10T156/1041
摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
摘要翻译：根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

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