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21. 发明授权

US07636165B2 Displacement measurement systems lithographic apparatus and device manufacturing method 有权
标题翻译：位移测量系统光刻设备和器件制造方法
公开(公告)号：US07636165B2
公开(公告)日：2009-12-22
申请号：US11384834
申请日：2006-03-21
申请人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B9/02
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
摘要翻译：一种位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

22. 发明授权

US07515281B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07515281B2
公开(公告)日：2009-04-07
申请号：US11224308
申请日：2005-09-13
申请人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van der Pasch
发明人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van der Pasch
IPC分类号： G01B11/02 , G01D5/36
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes a displacement measuring system configured to measure the position of a substrate table in at least three degrees of freedom. The displacement measuring system includes a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor. The first and second x-sensor and first and second y-sensors are encoder type sensors configured to measure the position of each of the sensors with respect to at least one grid plate. The displacement measuring system is configured to selectively use, depending on the position of the substrate table, three of the first and second x-sensors and the first and second y-sensors to determine the position of the substrate table in three degrees of freedom.
摘要翻译：光刻设备包括位移测量系统，其配置成以至少三个自由度来测量衬底台的位置。位移测量系统包括构造成测量第一方向上的衬底台的位置的第一x传感器和被配置为在第二方向上测量衬底台的位置的第一和第二y传感器。所述位移测量系统还包括第二x传感器。第一和第二x传感器以及第一和第二y传感器是构造成测量每个传感器相对于至少一个格栅板的位置的编码器型传感器。位移测量系统被配置为根据衬底台的位置选择性地使用第一和第二x传感器中的三个以及第一和第二y传感器，以确定衬底台在三个自由度中的位置。

23. 发明授权

US07230676B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07230676B1
公开(公告)日：2007-06-12
申请号：US11373529
申请日：2006-03-13
申请人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70775 , G03F7/70341
摘要： A lithographic apparatus includes a liquid confinement system to confine liquid in a space between a final element of a projection system and a substrate, and a first and a second substrate stage that are configured to mutually cooperate in order to perform a joint movement for bringing the lithographic apparatus from a first configuration, in which the liquid is confined between a first substrate held by the first substrate stage and the final element, towards a second configuration, in which the liquid is confined between a second substrate held by the second substrate stage and the final element, such that during the joint movement the liquid is essentially confined within the space with respect to the final element. The apparatus also includes a position measurement system configured to at least during the joint movement measure the position of the first and second substrate stages.
摘要翻译：光刻设备包括液体限制系统，用于将液体限制在投影系统的最终元件与基板之间的空间中;以及第一和第二基板台，其被配置为相互配合以执行关节运动，以使光刻设备，其中液体被限制在由第一基板台保持的第一基板和最终元件之间的第一配置朝向第二配置，其中液体被限制在由第二基板台保持的第二基板和最终元件，使得在联合运动期间，液体基本上被限制在相对于最终元件的空间内。该装置还包括位置测量系统，其配置为至少在联合移动期间测量第一和第二基板台的位置。

24. 发明申请

US20140192337A1 LITHOGRAPHIC APPARATUS, METHOD OF SETTING UP A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面设备，设置平面设备的方法和设备制造方法
公开(公告)号：US20140192337A1
公开(公告)日：2014-07-10
申请号：US14236299
申请日：2012-07-24
申请人： Arno Jan Bleeker , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beerens
发明人： Arno Jan Bleeker , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Danny Maria Hubertus Philips , Ruud Antonius Catharina Maria Beerens
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/7005 , G03F7/70275 , G03F7/70291 , G03F7/70308 , G03F7/70391 , G03F7/704 , G03F7/70825
摘要： A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.
摘要翻译：一种具有可编程图案形成装置和投影系统的光刻设备。可编程图案形成装置被配置为提供多个辐射束。投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。焦点调节器具有基本上为零光功率的光学元件。

25. 发明授权

US07542127B2 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US07542127B2
公开(公告)日：2009-06-02
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

26. 发明授权

US07116399B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07116399B2
公开(公告)日：2006-10-03
申请号：US10844570
申请日：2004-05-13
申请人： Wilhelmus Josephus Box , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Josephus Jacobus Smits , Marc Wilhelmus Maria Van Der Wijst
发明人： Wilhelmus Josephus Box , Antonius Johannes Josephus Van Dijsseldonk , Dominicus Jacobus Petrus Adrianus Franken , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Josephus Jacobus Smits , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/42 , G03B27/54 , G02B7/02
CPC分类号： G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70858 , G03F7/70891 , G03F7/709 , G03F7/70991
摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.
摘要翻译：光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

27. 发明申请

US20100165319A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。

28. 发明授权

US07656502B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07656502B2
公开(公告)日：2010-02-02
申请号：US11472566
申请日：2006-06-22
申请人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
发明人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。

29. 发明申请

US20080073602A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080073602A1
公开(公告)日：2008-03-27
申请号：US11472566
申请日：2006-06-22
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
IPC分类号： G01N21/86
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。

30. 发明授权

US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method 有权
标题翻译：平版印刷设备，光谱纯度滤光片和器件制造方法
公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20 , B82Y10/00 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译：一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度过滤器具有彼此不同的辐射过滤结构。

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