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21. 发明申请

US20060243906A1 Inspection method and inspection system using charged particle beam 有权
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US20060243906A1
公开(公告)日：2006-11-02
申请号：US11412976
申请日：2006-04-28
申请人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/1501 , H01J2237/1508 , H01J2237/2449 , H01J2237/24507
摘要： In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
摘要翻译：在具有高分辨能力的电浸透镜中，加速从样本产生的二次电子，以抑制由物镜施加到其上的二次电子的旋转作用对二次电子的能级的依赖性，并且当选择性地检测低角度和高角度时通过插入在电子源和物镜之间的环形检测器从二次电子产生位置观察的仰角和方位的分量，二次电子通过ExB偏转器被调节和偏转，使得二次电子的中心轴在加速度下精细收敛与低仰角信号检测系统的中心轴一致，二次电子偏离高仰角信号检测系统的孔径。

22. 发明申请

US20060186351A1 Inspection method and inspection apparatus using charged particle beam 有权
标题翻译：使用带电粒子束的检查方法和检查装置
公开(公告)号：US20060186351A1
公开(公告)日：2006-08-24
申请号：US11349974
申请日：2006-02-09
申请人： Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki
发明人： Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki
IPC分类号： G21G5/00
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/24495 , H01J2237/2817
摘要： To establish a technique that enables sorting of the elevation and azimuth angle in the direction of emitting secondary electrons and obtaining images with emphasized contrast, in order to perform the review and analysis of shallow asperities and microscopic foreign particles in a wafer inspection during the manufacture of semiconductor devices, an electromagnetic overlapping objective lens is used to achieve high resolution, an electron beam is narrowly focused using the objective lens, an electric field for accelerating secondary electrons in the vicinity of a wafer in order to suppress the dependence on secondary electron energy of the rotation of secondary electrons generated by irradiation of the electron beam, a ring-shaped detector plate is disposed between an electron source and the objective lens, and the low angle components of the elevation angle of the secondary electrons, as viewed from the place of generation, and the high angle components are separated and also the azimuth components are separated and detected.
摘要翻译：为了建立能够在发射二次电子的方向上对高程和方位角进行排序并获得具有强调对比度的图像的技术，以便在制造期间对晶片检查中的浅凹凸和微观异物进行检查和分析半导体器件使用电磁重叠物镜实现高分辨率，电子束使用物镜窄聚焦，用于加速晶片附近的二次电子的电场，以抑制对二次电子能量的依赖性通过电子束的照射产生的二次电子的旋转，环状检测器板设置在电子源和物镜之间，并且从二次电子的位置观察二次电子的仰角的低角分量并且高角度分量被分离，也是azimu 分离和检测。

23. 发明授权

US07462828B2 Inspection method and inspection system using charged particle beam 有权
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US07462828B2
公开(公告)日：2008-12-09
申请号：US11412976
申请日：2006-04-28
申请人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/1501 , H01J2237/1508 , H01J2237/2449 , H01J2237/24507
摘要： In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
摘要翻译：在具有高分辨能力的电浸透镜中，加速从样本产生的二次电子，以抑制由物镜施加到其上的二次电子的旋转作用对二次电子的能级的依赖性，并且当选择性地检测低角度和高角度时通过插入在电子源和物镜之间的环形检测器从二次电子产生位置观察的仰角和方位的分量，二次电子通过ExB偏转器被调节和偏转，使得二次电子的中心轴在加速度下精细收敛与低仰角信号检测系统的中心轴一致，二次电子偏离高仰角信号检测系统的孔径。

24. 发明授权

US08153969B2 Inspection method and inspection system using charged particle beam 有权
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US08153969B2
公开(公告)日：2012-04-10
申请号：US12323167
申请日：2008-11-25
申请人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/1501 , H01J2237/1508 , H01J2237/2449 , H01J2237/24507
摘要： In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
摘要翻译：在具有高分辨能力的电浸透镜中，加速从样本产生的二次电子，以抑制由物镜施加到其上的二次电子的旋转作用对二次电子的能级的依赖性，并且当选择性地检测低角度和高角度时通过设置在电子源和物镜之间的环形检测器从二次电子产生位置观察的仰角和方位的分量，二次电子通过E×B偏转器被调节和偏转，使得中心轴线在加速度下精细收敛的二次电子与低仰角信号检测系统的中心轴一致，二次电子偏离高仰角信号检测系统的孔径。

25. 发明申请

US20130270435A1 ELECTRON BEAM DEVICE 有权
标题翻译：电子束装置
公开(公告)号：US20130270435A1
公开(公告)日：2013-10-17
申请号：US13879051
申请日：2011-10-05
申请人： Yasunari Sohda , Takeyoshi Ohashi , Tasuku Yano , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Yasunari Sohda , Takeyoshi Ohashi , Tasuku Yano , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： H01J37/02
CPC分类号： H01J37/023 , H01J37/153 , H01J37/28 , H01J2237/1534
摘要： The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.
摘要翻译：电子束装置包括电子源和物镜偏转器。电子束装置基于通过投射的电子束从材料发射的二次电子等的信号获得图像。电子束装置还包括偏置色差校正元件，该偏置色差校正元件还包括位于比物镜偏转器更靠近电子源的电磁偏转器和具有比电磁偏转器更窄的内径的静电偏转器，在电磁偏转器内，使得材料的高度位置与电磁偏转器重叠，并且能够施加偏移电压。因此，可以提供一种电子束装置，通过该电子束装置可以减轻由偏转引起的几何像差（寄生像差），并且在高分辨率的宽视角上实现偏转。

26. 发明授权

US08735814B2 Electron beam device 有权
标题翻译：电子束装置
公开(公告)号：US08735814B2
公开(公告)日：2014-05-27
申请号：US13879051
申请日：2011-10-05
申请人： Yasunari Sohda , Takeyoshi Ohashi , Tasuku Yano , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Yasunari Sohda , Takeyoshi Ohashi , Tasuku Yano , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/023 , H01J37/153 , H01J37/28 , H01J2237/1534
摘要： The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.
摘要翻译：电子束装置包括电子源和物镜偏转器。电子束装置基于通过投射的电子束从材料发射的二次电子等的信号获得图像。电子束装置还包括偏置色差校正元件，该偏置色差校正元件还包括位于比物镜偏转器更靠近电子源的电磁偏转器和具有比电磁偏转器更窄的内径的静电偏转器，在电磁偏转器内，使得材料的高度位置与电磁偏转器重叠，并且能够施加偏移电压。因此，可以提供一种电子束装置，通过该电子束装置可以减轻由偏转引起的几何像差（寄生像差），并且在高分辨率的宽视角上实现偏转。

27. 发明申请

US20120286160A1 CHARGED PARTICLE INSTRUMENT 有权
标题翻译：充电颗粒仪
公开(公告)号：US20120286160A1
公开(公告)日：2012-11-15
申请号：US13451596
申请日：2012-04-20
申请人： Takeyoshi OHASHI , Yasunari Sohda , Makoto Ezumi , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Takeyoshi OHASHI , Yasunari Sohda , Makoto Ezumi , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/1532 , H01J2237/1536 , H01J2237/2811
摘要： A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.
摘要翻译：一种带电粒子仪器，包括用于控制带电粒子源的控制和操作单元，偏转装置和聚焦改变装置，以及通过由检测器检测的电信号为图像提供数据;以及记录单元，用于保持记录的校正系数在每次图像获取期间，控制和操作单元在改变焦点的同时获取多个图像，并且控制光学条件，使得当基于以下步骤获得用于测量的图像时，带电粒子束的着陆角变为垂直图像中的标记的位置偏移量和登记到记录单元的校正系数。

28. 发明授权

US07847249B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US07847249B2
公开(公告)日：2010-12-07
申请号：US12068417
申请日：2008-02-06
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Hiroyuki Ito , Atsuko Fukada , Masashi Sakamoto , Satoshi Takada
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Hiroyuki Ito , Atsuko Fukada , Masashi Sakamoto , Satoshi Takada
IPC分类号： H01J3/14
CPC分类号： G01N23/225 , H01J37/09 , H01J37/265 , H01J37/28 , H01J2237/14 , H01J2237/2817
摘要： A technology whereby removal of magnetic hysteresis is enabled in short time in parallel with a process for stage transfer, and so forth. There is executed a magnetic hysteresis removal sequence whereby current for exciting an electromagnetic coil prior to acquisition of an image is always set to a predetermined variation value against a target value, thereby obtaining information on an image, and so forth, when a diameter of a primary electron beam, converged on the specimen, becomes smaller than dimensions displayed by one pixel of an image to be acquired.
摘要翻译：与阶段转移的过程并行地在短时间内实现磁滞的消除的技术等等。执行磁滞去除序列，其中在获取图像之前激励电磁线圈的电流总是被设置为相对于目标值的预定变化值，从而获得关于图像的信息，等等会聚在样本上的一次电子束变得小于要获取的图像的一个像素显示的尺寸。

29. 发明申请

US20080302962A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20080302962A1
公开(公告)日：2008-12-11
申请号：US12155038
申请日：2008-05-29
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Hideo Todokoro , Mitsugu Sato
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Hideo Todokoro , Mitsugu Sato
IPC分类号： G01N23/225
CPC分类号： G01N23/225 , H01J37/265 , H01J37/28 , H01J2237/221
摘要： The invention provides a charged particle beam apparatus capable of preventing image errors in a display image and capturing a clear display image. A display image displayed on a display unit has a rectangular shape having sides that are substantially parallel to coordinate axes of a rectangular coordinate system determined by wafer alignment. A charged particle beam is radiated onto an area including a display image in a direction that is not parallel to the coordinate axes of the reference rectangular coordinate system to scan the area. Then, among image information obtained by scanning, only information of a position within the display image is displayed on the image display unit. In this way, a clear display image without brightness variation is obtained.
摘要翻译：本发明提供一种能够防止显示图像中的图像错误并捕获清晰显示图像的带电粒子束装置。在显示单元上显示的显示图像具有与由晶片对准确定的直角坐标系的坐标轴基本平行的侧面的矩形。带电粒子束在与平行于参考直角坐标系的坐标轴不平行的方向上辐射到包括显示图像的区域上以扫描该区域。然后，在通过扫描获得的图像信息中，只有显示图像中的位置的信息被显示在图像显示单元上。以这种方式，可以获得没有亮度变化的清晰显示图像。

30. 发明授权

US09230775B2 Charged particle instrument 有权
标题翻译：带电粒子仪器
公开(公告)号：US09230775B2
公开(公告)日：2016-01-05
申请号：US13451596
申请日：2012-04-20
申请人： Takeyoshi Ohashi , Yasunari Sohda , Makoto Ezumi , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Takeyoshi Ohashi , Yasunari Sohda , Makoto Ezumi , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： H01J37/00 , H01J37/28 , H01J37/26
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/1532 , H01J2237/1536 , H01J2237/2811
摘要： A charged particle instrument including a controlling and operating unit for controlling a charged particle source, deflecting means, and focus changing means and making a data for an image by an electric signal detected by a detector, and a recording unit for preserving a correction coefficient registered at each image-acquisition, in which the controlling and operating unit acquires plural images while changing a focus, and controls an optical condition such that a landing angle of a charged particle beam becomes perpendicular when an image for measurement is acquired on the basis of a position shift amount of a mark in the image and a correction coefficient registered to the recording unit.
摘要翻译：一种带电粒子仪器，包括用于控制带电粒子源的控制和操作单元，偏转装置和聚焦改变装置，以及通过由检测器检测的电信号为图像提供数据;以及记录单元，用于保持记录的校正系数在每次图像获取期间，控制和操作单元在改变焦点的同时获取多个图像，并且控制光学条件，使得当基于以下步骤获得用于测量的图像时，带电粒子束的着陆角变为垂直图像中的标记的位置偏移量和登记到记录单元的校正系数。

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