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    • 27. 发明申请
    • Mask blanks production method and mask production method
    • 面膜坯料生产方法和面膜生产方法
    • US20060121359A1
    • 2006-06-08
    • US10548270
    • 2004-03-31
    • Hideo Kobayashi
    • Hideo Kobayashi
    • G03F1/00
    • G03F1/48H01L21/0271
    • To prevent foreign matters from adhering to a substrate, etc., thereby causing inconveniences during storing and transporting a mask blank, or during manufacturing the mask blank and a mask. Thin films 2 and 3 formed in a mask thin film forming step of a mask blank manufacturing steps are covered by a dust-free protective film 5 formed of water-soluble material, thereby preventing foreign matters from adhering to the surface of the mask blank itself and preventing the surface of the mask blank from being damaged in the subsequent step, and when the mask blank is used, the dust-free protective film is removed.
    • 为了防止异物粘附到基板等上,从而在掩模坯料的存储和传送期间或在制造掩模坯料和掩模期间引起不便。 由掩模坯制造步骤的掩模薄膜形成步骤形成的薄膜2和3被由水溶性材料形成的无尘保护膜5覆盖,从而防止异物粘附到掩模坯料本身的表面 并且防止掩模坯料的表面在随后的步骤中被损坏,并且当使用掩模坯料时,除去无尘保护膜。