会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明授权
    • IR absorber for laser-induced thermal dye transfer
    • 用于激光诱导热染料转移的IR吸收剂
    • US5256620A
    • 1993-10-26
    • US992233
    • 1992-12-17
    • Mitchell S. BurberryLee W. TuttMichael R. Detty
    • Mitchell S. BurberryLee W. TuttMichael R. Detty
    • B41M5/382B41M5/385B41M5/388B41M5/39B41M5/392B41M5/46B41M5/035B41M5/38
    • B41M5/465B41M5/392Y10S428/913Y10S428/914Y10S430/146
    • This invention relates to a dye donor element for laser-induced thermal dye transfer comprising a support having thereon a dye layer comprising an image dye in a binder and an infrared-absorbing material associated therewith, and wherein the infrared-absorbing material is a telluro- or seleno-squarylium dye having the following formula: ##STR1## wherein: R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently represents hydrogen or a substituted or unsubstituted alkyl, aryl or hetaryl group;R.sub.5 and R.sub.6 each independently represents hydrogen, halogen, cyano, alkoxy, aryloxy, acyloxy, aryloxycarbonyl, alkoxycarbonyl, sulfonyl, carbamoyl, acyl, acylamido, alkylamino, arylamino, or a substituted or unsubstituted alkyl, aryl or hetaryl group;X represents Se or Te; andY represents O, S, Se, Te, TeCl.sub.2 or TeBr.sub.2, with the proviso that when X and Y are both Se and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represents t-butyl, then R.sub.5 and R.sub.6 cannot both be hydrogen at the same time; and with the second proviso that when X is Se and Y is O and R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represents t-butyl, then R.sub.5 and R.sub.6 cannot both be hydrogen at the same time.
    • 本发明涉及一种用于激光诱导的热染料转移的染料供体元件,其包括其上具有染料层的载体,所述染料层包含粘合剂中的图像染料和与其相关联的红外线吸收材料,并且其中所述红外线吸收材料是电泳 - 或具有下式的硒代方菁染料:其中:R 1,R 2,R 3和R 4各自独立地表示氢或取代或未取代的烷基,芳基或杂芳基; R 5和R 6各自独立地表示氢,卤素,氰基,烷氧基,芳氧基,酰氧基,芳氧基羰基,烷氧基羰基,磺酰基,氨基甲酰基,酰基,酰氨基,烷基氨基,芳基氨基或取代或未取代的烷基,芳基或杂芳基。 X表示Se或Te; Y表示O,S,Se,Te,TeCl 2或TeBr 2,条件是当X和Y均为Se和R1时,R2,R3和R4各自表示叔丁基,则R5和R6不能同时为氢 同时; 第二个条件是当X为Se且Y为O且R1,R2,R3和R4各自表示叔丁基时,则R5和R6不能同时为氢。
    • 26. 发明申请
    • TOP-EMITTING OLED DEVICE WITH LIGHTS-SCATTERING LAYER AND COLOR-CONVERSION
    • 具有亮度散射层和颜色转换的顶级发光OLED器件
    • US20110248256A1
    • 2011-10-13
    • US13165838
    • 2011-06-22
    • Ronald S. CokAndrew D. ArnoldMitchell S. Burberry
    • Ronald S. CokAndrew D. ArnoldMitchell S. Burberry
    • H01L51/52
    • H01L51/5284H01L27/322H01L51/525H01L51/5253H01L51/5268H01L2251/5315
    • A top-emitting OLED device, comprising: one or more OLEDs formed on a substrate; a light-scattering layer formed over the one or more OLEDs; a transparent cover; one or more color filters formed on the transparent cover; a color-conversion material layer formed over the color filters, or formed over or integral with the light-scattering layer; wherein the substrate is aligned and affixed to the transparent cover so that the locations of the color filters and color conversion material correspond to the location of the OLEDs, and the color-conversion material layer, color filters, and the light-scattering layer are between the cover and substrate, and a low-index gap is formed between the light-scattering layer and the color filters, with no light-scattering layer being positioned between the color conversion material layer and the low-index gap, wherein the color-conversion material layer is formed integrally with the light-scattering layer.
    • 一种顶部发射OLED器件,包括:形成在衬底上的一个或多个OLED; 形成在所述一个或多个OLED上的光散射层; 透明盖子 形成在透明盖上的一个或多个滤色器; 形成在滤色器上方,或形成在光散射层之上或与光散射层成一体的颜色转换材料层; 其中基板被对准并固定到透明盖,使得滤色器和颜色转换材料的位置对应于OLED的位置,并且颜色转换材料层,滤色器和光散射层位于 在光散射层和滤色器之间形成覆盖物和衬底以及低折射率间隙,在颜色转换材料层和低折射率间隙之间没有光散射层,其中颜色转换 材料层与光散射层一体地形成。
    • 29. 发明申请
    • COMPONENT FABRICATION USING THERMAL RESIST MATERIALS
    • 使用耐热材料的组件制造
    • US20090092928A1
    • 2009-04-09
    • US11869008
    • 2007-10-09
    • Mitchell S. BurberryLee W. Tutt
    • Mitchell S. BurberryLee W. Tutt
    • G03C5/00
    • H05K3/0082H01L21/0272H01L29/66969H01L29/7869H05K3/061H05K2203/107
    • A method for producing a patterned material for electronic or photonic circuits, comprising the steps of:p) providing a substrate;q) coating the substrate with a polymer layer;r) coating a thermal resist solution over the polymer layer to form a thermal resist layer, wherein the polymer layer is substantially immiscible in the thermal resist solution;s) exposing predetermined areas of the thermal resist layer, corresponding to a desired image pattern, using infrared light;t) removing portions of the thermal resist layer corresponding to a desired image pattern, using a developer;u) removing the polymer layer where the thermal resist layer has been previously removed and undercutting a portion of the remaining thermal resist layer by an etching process;v) depositing a material using a substantially anisotropic process; and removing the remaining thermal resist layer and any overlying material with a solvent for the polymer or thermal resist layers leaving the material in a desired pattern.
    • 一种用于制造用于电子或光子电路的图案化材料的方法,包括以下步骤:p)提供衬底; q)用聚合物层涂覆基材; r)在所述聚合物层上涂覆热抗蚀剂溶液以形成热阻层,其中所述聚合物层基本上不混溶在所述耐热溶液中; s)使用红外光曝光对应于所需图像图案的热抗蚀剂层的预定区域; t)使用显影剂去除与所需图像图案相对应的热阻层的部分; u)除去先前已除去热阻层的聚合物层,然后通过蚀刻工艺对其余热阻层的一部分进行底切; v)使用基本上各向异性的工艺沉积材料; 以及用聚合物或热抗蚀剂层的溶剂除去剩余的热阻层和任何上覆材料,使材料以期望的图案离开。