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21. 发明授权

US07549140B2 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography 有权
标题翻译：将半导体器件图案分解为无铬相光刻的相位和铬区域的方法和装置
公开(公告)号：US07549140B2
公开(公告)日：2009-06-16
申请号：US11035737
申请日：2005-01-18
申请人： Doug Van Den Broeke , Jang Fung Chen , Thomas Laidig , Kurt E. Wampler , Stephen Hsu
发明人： Doug Van Den Broeke , Jang Fung Chen , Thomas Laidig , Kurt E. Wampler , Stephen Hsu
IPC分类号： G06F17/50 , G06F19/00 , G21K5/00 , G03F1/00
CPC分类号： G03F1/34 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70466 , G03F7/70941
摘要： A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).
摘要翻译：一种生成用于在基板上印刷目标图案的掩模的方法。该方法包括以下步骤：（a）使用形成在掩模中的相位结构来确定要在基板上成像的特征的最大宽度; （b）识别具有等于或小于最大宽度的宽度的目标图案中包含的所有特征; （c）从目标图案提取具有等于或小于最大宽度的宽度的所有特征; （d）在对应于在步骤（b）中识别的所有特征的掩模中形成相位结构; 和（e）在执行步骤（c）之后，在掩模中形成不透明结构以保持目标图案中的所有特征。

22. 发明授权

US07354681B2 Scattering bar OPC application method for sub-half wavelength lithography patterning 有权
标题翻译：散射棒用于半波长光刻图案的OPC应用方法
公开(公告)号：US07354681B2
公开(公告)日：2008-04-08
申请号：US10880376
申请日：2004-06-30
申请人： Thomas Laidig , Kurt E. Wampler , Douglas Van Den Broeke , Jang Fung Chen
发明人： Thomas Laidig , Kurt E. Wampler , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G03F9/00
CPC分类号： G03F1/36
摘要： A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.
摘要翻译：一种形成具有光学邻近校正特征的掩模的方法，其包括以下步骤：获得要成像的特征的目标图案，扩大要成像的特征的宽度，修改掩模以包括邻近边缘的辅助特征的要成像的特征，其中辅助特征具有对应于要成像的特征的扩展宽度的长度，以及将要成像的特征从扩展宽度返回到对应于目标图案的宽度。

23. 发明授权

US07231629B2 Feature optimization using enhanced interference mapping lithography 有权
标题翻译：使用增强干涉映射光刻技术的特征优化
公开(公告)号：US07231629B2
公开(公告)日：2007-06-12
申请号：US10976306
申请日：2004-10-29
申请人： Thomas Laidig
发明人： Thomas Laidig
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： Disclosed concepts include a method of, and program product for, optimizing an intensity profile of a pattern to be formed in a surface of a substrate relative to a given mask using an optical system. Steps include mathematically representing resolvable feature(s) from the given mask, generating a mathematical expression, an eigenfunction, representing certain characteristics of the optical system, modifying the mathematical the eigenfunction by filtering, generating an interference map in accordance with the filtered eigenfunction and the mathematical expression of the given mask, and determining assist features for the given mask based on the interference map. As a result, undesired printing in the surface of the substrate may be minimized.
摘要翻译：公开的概念包括使用光学系统优化相对于给定掩模在衬底表面中形成的图案的强度分布的方法和程序产品。步骤包括在数学上表示来自给定掩模的可解析特征，产生表示光学系统的某些特性的数学表达式，本征函数，通过滤波修改数学本征函数，根据滤波后的特征函数产生干涉图，给定掩模的数学表达式，以及基于干涉图确定给定掩模的辅助特征。结果，可以使衬底表面中不期望的印刷最小化。

24. 发明申请

US20060010417A1 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems 有权
标题翻译：用于抑制使用光刻系统打印的特征的波纹的装置，方法和程序产品
公开(公告)号：US20060010417A1
公开(公告)日：2006-01-12
申请号：US11092983
申请日：2005-03-30
申请人： Markus Franciscus Eurlings , Melchior Mulder , Thomas Laidig , Uwe Hollerbach
发明人： Markus Franciscus Eurlings , Melchior Mulder , Thomas Laidig , Uwe Hollerbach
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.
摘要翻译：一种当使用掩模在衬底的表面上成像时最小化特征波纹的方法。该方法包括以下步骤：在设计的多个部分的每个部分的多个评估点中的每一个处确定设计的第一表示和设计的图像的第二表示之间的偏差; 基于所述多个评价点的评价来确定每个部分处的所述设计的修改量; 并在每个部分修改设计在上一步确定的量。

25. 发明申请

US20050149900A1 Feature optimization using enhanced interference mapping lithography 有权
标题翻译：使用增强干涉映射光刻技术的特征优化
公开(公告)号：US20050149900A1
公开(公告)日：2005-07-07
申请号：US10976306
申请日：2004-10-29
申请人： Thomas Laidig
发明人： Thomas Laidig
IPC分类号： G03F1/00 , G03F1/36 , H01L21/027 , G06F17/50
CPC分类号： G03F1/36
摘要： Disclosed concepts include a method of, and program product for, optimizing an intensity profile of a pattern to be formed in a surface of a substrate relative to a given mask using an optical system. Steps include mathematically representing resolvable feature(s) from the given mask, generating a mathematical expression, an eigenfunction, representing certain characteristics of the optical system, modifying the mathematical the eigenfunction by filtering, generating an interference map in accordance with the filtered eigenfunction and the mathematical expression of the given mask, and determining assist features for the given mask based on the interference map. As a result, undesired printing in the surface of the substrate may be minimized.
摘要翻译：公开的概念包括使用光学系统优化相对于给定掩模在衬底表面中形成的图案的强度分布的方法和程序产品。步骤包括在数学上表示来自给定掩模的可解析特征，产生表示光学系统的某些特性的数学表达式，本征函数，通过滤波修改数学本征函数，根据滤波后的特征函数产生干涉图，给定掩模的数学表达式，以及基于干涉图确定给定掩模的辅助特征。结果，可以使衬底表面中不期望的印刷最小化。

26. 发明授权

US06851103B2 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography 有权
公开(公告)号：US06851103B2
公开(公告)日：2005-02-01
申请号：US10395903
申请日：2003-03-25
申请人： Doug Van Den Broeke , Jang Fung Chen , Thomas Laidig , Kurt E. Wampler , Stephen Hsu
发明人： Doug Van Den Broeke , Jang Fung Chen , Thomas Laidig , Kurt E. Wampler , Stephen Hsu
IPC分类号： G03F1/00 , G03F7/20 , H01L21/027 , G06F17/50 , G03F9/00 , G06F19/00 , G21K5/00
CPC分类号： G03F1/34 , G03F1/36 , G03F7/70125 , G03F7/70425 , G03F7/70466 , G03F7/70941
摘要： A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c).

27. 发明授权

US08914143B1 Method and system for handling substrates 有权
标题翻译：处理基板的方法和系统
公开(公告)号：US08914143B1
公开(公告)日：2014-12-16
申请号：US13098296
申请日：2011-04-29
申请人： Jeffrey Kaskey , Thomas Laidig , Dave Markle , Jang-Fung Chen
发明人： Jeffrey Kaskey , Thomas Laidig , Dave Markle , Jang-Fung Chen
IPC分类号： G06F19/00 , G03F9/00
CPC分类号： G03F9/7023 , G03F7/707 , G03F7/70791 , G03F7/7085 , G03F7/709
摘要： System and method for handling substrates in a lithography manufacturing process are disclosed. In one embodiment, a system for handling substrates in a lithography manufacturing process includes a plurality of porous chucks positioned above a substrate for imaging, a plurality of pressure sources configured to apply pressured air towards the substrate through the plurality of porous chucks, a plurality of vacuums configured to apply suction force away from the substrate, and a controller with control logic configured to hold the substrate in place by controlling the pressured air applied by the plurality of pressure sources and the suction force generated by the plurality of vacuums.
摘要翻译：公开了在光刻制造工艺中处理衬底的系统和方法。在一个实施例中，用于在光刻制造工艺中处理衬底的系统包括多个位于衬底上用于成像的多孔卡盘，多个压力源被配置为通过多个多孔卡盘向衬底施加加压空气，多个构造成将吸力施加离开基底的真空器，以及具有控制逻辑的控制器，其配置成通过控制由多个压力源施加的加压空气和由多个真空产生的吸力来将基板保持在适当位置。

28. 发明授权

US08390786B2 Optical imaging writer system 有权
标题翻译：光学成像系统
公开(公告)号：US08390786B2
公开(公告)日：2013-03-05
申请号：US12897726
申请日：2010-10-04
申请人： Thomas Laidig
发明人： Thomas Laidig
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70475 , G03F7/70508
摘要： System and method for processing image data between adjacent imaging areas in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying an overlapping region between adjacent imaging areas to be imaged by corresponding SLMs, determining a stitching path for merging the adjacent imaging areas in the overlapping region in accordance with a set of predetermined cost functions, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel using the stitching path.
摘要翻译：公开了在光刻制造工艺中在相邻成像区域之间处理图像数据的系统和方法。在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，接收要写入衬底的掩模数据模式，处理掩模数据形成与衬底的不同区域相对应的多个划分的掩模数据图案，识别由相应的SLM成像的相邻成像区域之间的重叠区域，确定用于根据重叠区域合并相邻成像区域的缝合路径一组预定的成本函数，并且控制所述多个SLM成像单元使用所述缝合路径并行地将所述多个划分的掩模数据图案写入所述基板。

29. 发明授权

US08390781B2 Optical imaging writer system 有权
标题翻译：光学成像系统
公开(公告)号：US08390781B2
公开(公告)日：2013-03-05
申请号：US12960535
申请日：2010-12-05
申请人： Thomas Laidig
发明人： Thomas Laidig
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70275 , G03F7/70258 , G03F7/70291 , G03F7/70508
摘要： System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system having a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying objects in an area of the substrate to be imaged by corresponding SLMs, selecting evaluation points along edges of the objects, configuring the parallel imaging writer system to image the objects using the evaluations points, and performing multiple exposures to image the objects in the area of the substrate by controlling the plurality of SLMs to write the plurality of partitioned mask data patterns in parallel.
摘要翻译：公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。在一个实施例中，该方法包括提供并行成像写入器系统，其具有布置在一个或多个并行阵列中的多个空间光调制器（SLM）成像单元，接收要写入衬底的掩模数据模式，处理掩模数据模式形成对应于基板的不同区域的多个划分的掩模数据图案，通过对应的SLM识别要成像的基板的区域中的对象，沿对象边缘选择评估点，配置并行成像写入器系统以对使用评估点的对象，并且通过控制多个SLM以并行写入多个分割的掩码数据模式，执行多次曝光以对基板区域中的对象进行成像。

30. 发明申请

US20120262465A1 Parallel Image Processing System 有权
标题翻译：并行图像处理系统
公开(公告)号：US20120262465A1
公开(公告)日：2012-10-18
申请号：US13109563
申请日：2011-05-17
申请人： Barry KEANE , Thomas Laidig
发明人： Barry KEANE , Thomas Laidig
IPC分类号： G06F15/80
CPC分类号： G06T1/20 , G03F7/70425 , G06T11/40
摘要： System and method for a parallel image processing mechanism for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the parallel image processing system includes a graphics engine configured to partition an object into a plurality of trapezoids and form an edge list for representing each of the plurality of trapezoids, and a distributor configured to receive the edge list from the graphics engine and distribute the edge list to a plurality of scan line image processing units. The system further includes a sentinel configured to synchronize operations of the plurality of scan line image processing units, and a plurality of buffers configured to store image data from corresponding scan line image processing units and outputs the stored image data using the sentinel.
摘要翻译：公开了一种用于在光刻制造工艺中将掩模数据图案应用于衬底的并行图像处理机构的系统和方法。在一个实施例中，并行图像处理系统包括被配置为将对象分割成多个梯形并形成用于表示多个梯形中的每一个的边缘列表的图形引擎，以及被配置为从图形引擎接收边缘列表的分配器并将边缘列表分发到多个扫描线图像处理单元。该系统还包括被配置为使多个扫描线图像处理单元的操作同步的多个缓冲器以及被配置为存储来自相应的扫描线图像处理单元的图像数据的多个缓冲器，并且使用该前哨输出所存储的图像数据。

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