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    • 26. 发明授权
    • Plasma wake field XUV radiation source
    • 等离子体尾流场XUV辐射源
    • US5637962A
    • 1997-06-10
    • US489312
    • 1995-06-09
    • Daniel S. PronoMichael E. Jones
    • Daniel S. PronoMichael E. Jones
    • H05G2/00H05H1/24
    • H05G2/001H05H1/24
    • A XUV radiation source uses an interaction of electron beam pulses with a gas to create a plasma radiator. A flowing gas system (10) defines a circulation loop (12) with a device (14), such as a high pressure pump or the like, for circulating the gas. A nozzle or jet (16) produces a sonic atmospheric pressure flow and increases the density of the gas for interacting with an electron beam. An electron beam is formed by a conventional radio frequency (rf) accelerator (26) and electron pulses are conventionally formed by a beam buncher (28). The rf energy is thus converted to electron beam energy, the beam energy is used to create and then thermalize an atmospheric density flowing gas to a fully ionized plasma by interaction of beam pulses with the plasma wake field, and the energetic plasma then loses energy by line radiation at XUV wavelengths Collection and focusing optics (18) are used to collect XUV radiation emitted as line radiation when the high energy density plasma loses energy that was transferred from the electron beam pulses to the plasma.
    • XUV辐射源使用电子束脉冲与气体的相互作用来产生等离子体辐射器。 流动气体系统(10)限定具有用于循环气体的装置(14),例如高压泵等的循环回路(12)。 喷嘴或喷嘴(16)产生声压大气压力流,并增加用于与电子束相互作用的气体密度。 电子束由常规射频(RF)加速器(26)形成,电子脉冲通常由束束(28)形成。 因此,射频能量被转换成电子束能量,射束能量用于通过射束脉冲与等离子体尾流场的相互作用产生大气密度流动气体至完全电离等离子体,然后,能量等离子体然后通过 XUV波长的线辐射当高能量密度等离子体损失从电子束脉冲转移到等离子体的能量时,收集和聚焦光学器件(18)用于收集作为线辐射发射的XUV辐射。