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    • 21. 发明授权
    • Combustion chamber of an internal combustion engine
    • 内燃机燃烧室
    • US4259933A
    • 1981-04-07
    • US39183
    • 1979-05-15
    • Kiyoshi NakanishiKazuhiko ItoTakeshi OkumuraIsamu IezukaMasao Yasukawa
    • Kiyoshi NakanishiKazuhiko ItoTakeshi OkumuraIsamu IezukaMasao Yasukawa
    • F02B23/08
    • F02B23/08Y02T10/125
    • An internal combustion engine comprises a first raised portion formed on the inner wall of the cylinder head, a second raised portion formed on the top face of the piston at a position opposite to the first raised portion with respect to the axis of the piston, and a third raised portion formed on the inner wall of the cylinder head above the second raised portion. A first flat squish area is formed between the flat peripheral top face of the piston and the flat bottom face of the first raised portion. A second spherical shell shape squish area is formed between the spherical bottom wall of the third raised portion and the spherical rear face of the second raised portion. The surface areas of the first squish area and the second squish area which are located near said exhaust valve are larger than those of the first squish area and the second squish area which are located near the intake valve.
    • 内燃机包括形成在气缸盖的内壁上的第一凸起部分,在相对于活塞的轴线相对于第一凸起部分的位置形成在活塞顶面上的第二凸起部分,以及 在所述第二凸起部分上方形成在所述气缸盖的内壁上的第三凸起部分。 第一扁平挤压区域形成在活塞的平坦周边顶面和第一凸起部分的平坦底面之间。 在第三凸起部分的球形底壁和第二凸起部分的球形后表面之间形成第二球形壳体挤压区域。 位于所述排气门附近的第一挤压区域和第二挤压区域的表面积大于位于进气门附近的第一挤压区域和第二挤压区域的表面积。
    • 28. 发明授权
    • Substrate processing apparatus and method of aligning substrate carrier apparatus
    • 基板处理装置和基板载体装置的对准方法
    • US06915183B2
    • 2005-07-05
    • US10854163
    • 2004-05-27
    • Naruaki IidaKazuhiko ItoMichio Kinoshita
    • Naruaki IidaKazuhiko ItoMichio Kinoshita
    • B65G49/07H01L21/00H01L21/027H01L21/677H01L21/68G06F7/00
    • H01L21/67754H01L21/6715H01L21/67259H01L21/681Y10S414/139Y10S414/141
    • The present invention has a first optical detection mark having a predetermined positional coordinate in a lateral direction with respect to a carrier opening of a processing unit through which a carrier apparatus enters and exits, a second optical detection mark having a predetermined positional coordinate in a vertical direction with respect to the carrier opening, and an optical sensor provided on the substrate carrier apparatus for detecting the first or second optical detection mark. The substrate carrier apparatus is rotated by a predetermined angle from a position of the substrate carrier apparatus where the optical sensor detects the first optical detection mark, and the substrate carrier apparatus is moved in the vertical direction by a predetermined amount of movement from a position of the substrate carrier apparatus where the optical sensor detects the second optical detection mark. After the substrate carrier apparatus faces the carrier opening of the processing unit, the substrate carrier apparatus is allowed to enter the processing unit to acquire in advance a precise transfer position when transferring a substrate to a predetermined position on a mounting table in the processing unit.
    • 本发明具有第一光学检测标记,该第一光学检测标记相对于载体装置进出的处理单元的载体开口在横向上具有预定的位置坐标,具有在垂直方向上具有预定位置坐标的第二光学检测标记 相对于载体开口的方向,以及设置在用于检测第一或第二光学检测标记的基板载体装置上的光学传感器。 基板载体装置从光学传感器检测到第一光学检测标记的基板载体装置的位置旋转预定角度,并且基板载体装置从垂直方向移动预定量的运动,从 光传感器检测第二光检测标记的基板载体装置。 在衬底载体装置面向处理单元的载体开口之后,允许衬底载体装置进入处理单元,以在将衬底转移到处理单元中的安装台上的预定位置时提前获得精确的转移位置。
    • 29. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US06746197B2
    • 2004-06-08
    • US10202090
    • 2002-07-25
    • Yoshio KimuraIssei UedaMitiaki MatsushitaKazuhiko Ito
    • Yoshio KimuraIssei UedaMitiaki MatsushitaKazuhiko Ito
    • B65G4907
    • H01L21/67778H01L21/67769H01L21/67772Y10S414/137Y10S414/139Y10S414/14
    • A substrate processing apparatus comprises a processing section for performing processing for a substrate, a substrate carrier transfer section into/out of which a substrate carrier holding a plurality of substrates is carried, and a substrate transfer mechanism for taking an unprocessed substrate out of the substrate carrier carried into the substrate carrier transfer section to deliver it to the processing section and for receiving a processed substrate from the processing section to deliver it into the substrate carrier placed on the substrate carrier transfer section. The substrate carrier transfer section shifts the position of the substrate carrier between a first position at which the substrate carrier is carried to/from the outside and a second position at which the substrate in the substrate carrier is delivered to/from the substrate transfer mechanism.
    • 基板处理装置包括:用于对基板进行处理的处理部分,承载保持多个基板的基板载体的基板载体转移部分,以及用于将未处理的基板从基板取出的基板转移机构 携带到基板载体传送部分中的载体传送到处理部分并且用于从处理部分接收经处理的基板,以将其传送到放置在基板载体传送部分上的基板载体。 衬底载体传送部分将衬底载体的载体的第一位置/从外部移动到衬底载体的第一位置和衬底载体中的衬底被输送到衬底传送机构的第二位置之间移动衬底载体的位置。