会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明授权
    • Input/output signal processing circuit and input/output signal processing method
    • 输入/输出信号处理电路和输入/输出信号处理方法
    • US09344148B2
    • 2016-05-17
    • US14755686
    • 2015-06-30
    • Yi-Min ShiuChao-Chi ChenPei-Sheng Tsu
    • Yi-Min ShiuChao-Chi ChenPei-Sheng Tsu
    • H03K9/06H04B3/54G11C5/14G11C11/4096G11C11/4074
    • H04B3/54G06F1/26G06F13/4282G09G2300/0408G09G2310/0289G11C5/14G11C11/4074G11C11/4096
    • The present invention discloses an input/output (I/O) signal processing circuit and processing method. The I/O signal processing circuit includes a level adjustable I/O circuit and an adjustment circuit. The I/O signal processing circuit includes an output driver and/or an input comparator. The output driver transmits an output signal via a signal transmission line according to an output data. The output driver has an adjustable high operation voltage level and an adjustable low operation voltage level, which determine a high level and a low level of the output signal, respectively. The input comparator receives an input signal via the signal transmission line and comparing the input signal with an adjustable reference voltage, so as to generate an input data. The adjustment circuit generates an adjustment signal according to voltage drop related information, to correspondingly adjust the adjustable high and low operation voltage level and/or the adjustable reference voltage.
    • 本发明公开了一种输入/输出(I / O)信号处理电路及其处理方法。 I / O信号处理电路包括电平可调I / O电路和调整电路。 I / O信号处理电路包括输出驱动器和/或输入比较器。 输出驱动器根据输出数据通过信号传输线传输输出信号。 输出驱动器具有可调节的高工作电压电平和可调节的低工作电压电平,分别决定输出信号的高电平和低电平。 输入比较器经由信号传输线接收输入信号,并将输入信号与可调参考电压进行比较,以产生输入数据。 调整电路根据电压降相关信息生成调整信号,相应地调整可调高低电平操作电压和/或可调参考电压。
    • 24. 发明授权
    • Method for forming a trench capacitor
    • 形成沟槽电容器的方法
    • US07425486B2
    • 2008-09-16
    • US11285449
    • 2005-11-21
    • Chao-Chi ChenChuan-Ping Hou
    • Chao-Chi ChenChuan-Ping Hou
    • H01L21/8242H01L21/20H01L21/30
    • H01L27/1087H01L27/10829H01L29/945
    • A method for forming a trench capacitor is presented in the following process steps. A trench is formed on a semiconductor substrate. A first trench dielectric is deposited into the trench without reaching a full height thereof. An etch stop layer is formed on the first trench dielectric and along inner surfaces of the trench. A second trench dielectric is deposited on the etch stop layer. The second trench dielectric and the etch stop layer are removed to expose the first trench dielectric in the trench. A conductive layer is formed on the first trench dielectric in the trench, such that the conductive layer, the first trench dielectric and the semiconductor substrate function as a trench capacitor.
    • 用于形成沟槽电容器的方法在以下工艺步骤中呈现。 在半导体衬底上形成沟槽。 第一沟槽电介质沉积到沟槽中而不达到其整个高度。 蚀刻停止层形成在第一沟槽电介质上并且沿着沟槽的内表面。 第二沟槽电介质沉积在蚀刻停止层上。 去除第二沟槽电介质和蚀刻停止层以暴露沟槽中的第一沟槽电介质。 导电层形成在沟槽中的第一沟槽电介质上,使得导电层,第一沟槽电介质和半导体衬底用作沟槽电容器。