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    • 24. 发明授权
    • Flux composition and soldering method for high density arrays
    • 高密度阵列的焊剂组成和焊接方法
    • US06550667B2
    • 2003-04-22
    • US09726697
    • 2000-11-29
    • William E. BernierDonald W. HendersonJames Spalik
    • William E. BernierDonald W. HendersonJames Spalik
    • B23K35362
    • B23K35/3618B23K35/3612B23K35/3617H05K3/3489
    • A single phase flux composition suitable for use with high density arrays, that comprises dicarboxylic acid in an amount sufficient to react with the oxidized surface area in a high-density array, a first organic solvent, and a second organic solvent having a higher evaporation temperature than that of said first organic solvent. Preferred dicarboxylic acids are adipic, pimelic, suberic, azelaic and sebacic acids. Preferably, the composition comprises greater than 6% dicarboxylic acid, more preferably greater that 6% to about 15%, and even more preferably from about 8% to about 10% of the dicarboxylic acid. Preferred amounts of the first organic solvent are in the range of from about 25% to about 75% by weight and preferred amounts of the second organic solvent are from about 10% to about 35% by weight. Preferably, the ratio of the first organic solvent to the second organic solvent is about 3:1. A method for using the inventive composition to solder high density arrays which, for eutectic lead/tin solder, involves heating at extended dwell times and high temperature relative to typical compositions.
    • 适用于高密度阵列的单相通量组合物,其包含足以与高密度阵列中的氧化表面积反应的二羧酸,第一有机溶剂和具有较高蒸发温度的第二有机溶剂 比所述第一有机溶剂的。 优选的二羧酸是己二酸,庚二酸,辛二酸,壬二酸和癸二酸。 优选地,组合物包含大于6%的二羧酸,更优选大于6%至约15%,甚至更优选约8%至约10%的二羧酸。 第一有机溶剂的优选量为约25重量%至约75重量%,优选的第二有机溶剂的量为约10重量%至约35重量%。 优选地,第一有机溶剂与第二有机溶剂的比例为约3:1。 使用本发明组合物来焊接高密度阵列的方法,对于共晶铅/锡焊料,其涉及相对于典型组合物在延长的停留时间和高温下加热。
    • 26. 发明授权
    • Cutting implement and method of making same
    • 切割工具及其制作方法
    • US4534827A
    • 1985-08-13
    • US527165
    • 1983-08-26
    • Donald W. Henderson
    • Donald W. Henderson
    • A61B17/3211A61B17/32A61F2/00B23P15/40B24B3/36B26B9/00B26B21/58C23F1/00C23F1/06
    • A61B17/3211B26B21/58A61F2002/30084
    • A cutting tool, preferably in the form of a scalpel, microtome or razor blade is fabricated from single crystal material such as aluminum oxide with a preferential etching process to produce a radius of curvature less than 100 Angstroms on the edge. Depending upon the etchant, the crystallographic orientation of the blank and the resulting different etch rates on blade surfaces, the preferential etching process not only sharpens a preformed edge but also, in one embodiment, produces an opposing edge which meets the sharpened edge at a point, thereby to produce a particularly efficient scalpel blade configuration having two cutting edges converging at a point for plunging and cutting. With respect to the sharpening of the cutting edge, consistent with all other blade forming requirements, the subject blade is made to a maximum sharpness by utilizing a maximum ratio of bevel plane etch rate to edge plane etch rate. This maximum ratio maximizes the edge sharpness when a steady state etching geometry has been achieved. In one embodiment, and for a given edge sharpness, blade drag is minimized by selecting the crystallographic orientation and etchant such that the etchant chemically polishes the bevels and maintains the planarity of the bevel planes. In order to achieve identical etching of the bevels meeting at the blade edge and thus maintain original blade geometry, the blank can be oriented such that the edge forming planes are crystallographically identical planes.
    • 优选以手术刀,切片机或剃刀刀片形式的切割工具由诸如氧化铝的单晶材料制成,具有优先蚀刻工艺,以在边缘上产生小于100埃的曲率半径。 取决于蚀刻剂,坯料的晶体取向和叶片表面上产生的不同蚀刻速率,优选的蚀刻工艺不仅可以锐化预成型的边缘,而且在一个实施例中,还产生一个相对的边缘,其在一个点处与锋利的边缘相遇 从而产生特别有效的手术刀刀片构造,其具有两个切削刃在一个点处会聚,用于切入和切割。 关于切削刃的磨削,与所有其他刀片成形要求一致,通过利用斜面平面蚀刻速率与边缘平面蚀刻速率的最大比率使主体刀片达到最大锐度。 当达到稳态蚀刻几何形状时,该最大比率使边缘锐度最大化。 在一个实施例中,并且对于给定的边缘清晰度,通过选择晶体取向和蚀刻剂使刀片阻力最小化,使得蚀刻剂化学抛光斜面并保持斜面的平面度。 为了实现在叶片边缘处相遇的斜面的相同蚀刻,从而保持原始叶片几何形状,坯料可以被定向成使得边缘形成平面在晶体学上是相同的平面。