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21. 发明授权

US08327878B2 Chamber isolation valve RF grounding 有权
标题翻译：室内隔离阀RF接地
公开(公告)号：US08327878B2
公开(公告)日：2012-12-11
申请号：US12333043
申请日：2008-12-11
申请人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
发明人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
IPC分类号： H01J37/32
CPC分类号： F16K3/0227 , F16K51/02 , H01J37/32844 , H01J2237/166 , H01L21/67126 , Y02C20/30 , Y02P70/605 , Y10S277/919 , Y10S277/92 , Y10T137/8242
摘要： Methods and apparatus for grounding a chamber isolation valve for a processing system are provided. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
摘要翻译：提供了用于处理系统的室隔离阀接地的方法和装置。在一个实施例中，描述了用于等离子体处理系统的接地室隔离阀。腔室隔离阀包括门和可移动地附接到门并与其相对的支撑构件以及与门电连通的至少一个导电构件，所述至少一个导电构件包括设置在支撑件上的一个或多个反应缓冲器当门处于关闭位置时，适于接触等离子体处理系统的至少一个接地部件的构件。

22. 发明授权

US07919972B2 Integrated substrate transfer module 有权
标题翻译：集成基板传输模块
公开(公告)号：US07919972B2
公开(公告)日：2011-04-05
申请号：US12016834
申请日：2008-01-18
申请人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston , Fayez E. Abboud
发明人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston , Fayez E. Abboud
IPC分类号： G01R13/00 , G01R31/02
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： A system and method for supporting and transferring a substrate relative to a plurality of testing columns are provided. The system includes a testing table adapted to support and move the substrate relative to the plurality of testing columns. The testing table may include an end effector disposed therein to transfer the substrate relative to an upper surface of the testing table. The method includes transferring the substrate to the testing table and moving the substrate relative to the plurality of testing columns. Signals indicative of electronic device performance are sensed to determine operability of the devices on the substrate.
摘要翻译：提供了一种用于相对于多个测试柱支撑和传送衬底的系统和方法。该系统包括适于相对于多个测试柱支撑和移动衬底的测试台。测试台可以包括设置在其中的端部执行器，以相对于测试台的上表面传送衬底。该方法包括将衬底转移到测试台并相对于多个测试柱移动衬底。感测指示电子设备性能的信号以确定衬底上的器件的可操作性。

23. 发明申请

US20080291228A1 METHODS AND APPARATUS FOR INKJET PRINTING WITH MULTIPLE ROWS OF PRINT HEADS 审中-公开
标题翻译：用于打印头多个打印头的方法和装置
公开(公告)号：US20080291228A1
公开(公告)日：2008-11-27
申请号：US11751231
申请日：2007-05-21
申请人： JOHN M. WHITE , Fan-Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
发明人： JOHN M. WHITE , Fan-Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
IPC分类号： B41J29/38 , B41J2/145
CPC分类号： B41J2/145 , B41J2/515 , B41J25/003 , B41J2202/09 , H01L51/0005
摘要： According to the present invention, multiple rows of nozzles within a print head may be arranged proximal to and offset from each other to facilitate inkjet printing. Print heads may comprise a single row of nozzles or may comprise a plurality of rows of nozzles. Each row of nozzles may be situated such that the immediately adjacent row of nozzles may be offset by a predetermined distance. In some embodiments, adjacent rows of nozzles may each print with the same color. In this way, adjacent offset rows of nozzles may be used in combination to dispense ink drops into sub-pixel wells in improved patterns and with improved ink distribution within the sub-pixel well. These offset print techniques may also enable tighter grouping of ink drops within a sub-pixel well and enable faster printing operations.
摘要翻译：根据本发明，打印头内的多排喷嘴可以布置成彼此靠近并且彼此偏离，以便于喷墨打印。打印头可以包括单排喷嘴，或者可以包括多排喷嘴。每排喷嘴可以被定位成使得紧邻的喷嘴排可以偏移预定距离。在一些实施例中，相邻排的喷嘴可以以相同的颜色打印。以这种方式，相邻的喷嘴排可以组合使用，以将墨滴以改进的图案分配到子像素阱中，并且改进子像素阱内的油墨分布。这些偏移打印技术还可以使得子像素内的墨滴更紧密地分组并且能够实现更快的打印操作。

24. 发明申请

US20070073443A1 METHODS AND APPARATUS FOR POSITIONING A SUBSTRATE RELATIVE TO A SUPPORT STAGE 失效
标题翻译：用于定位与支持阶段相关的基板的方法和装置
公开(公告)号：US20070073443A1
公开(公告)日：2007-03-29
申请号：US11562309
申请日：2006-11-21
申请人： Shinichi Kurita , Emanuel Beer
发明人： Shinichi Kurita , Emanuel Beer
IPC分类号： G06F19/00
CPC分类号： H01L21/67265 , Y10S414/135 , Y10S414/136 , Y10S414/141
摘要： In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.
摘要翻译：在第一方面，一种基板定位系统包括围绕适于支撑基板的台阶间隔设置的多个推动器。每个推动器适于采取缩回位置，以便允许将基板装载到载物台上并从载物台上卸载，朝向由载物台支撑的基板的边缘延伸，接触基板的边缘，并且继续延伸以使基板相对于载物台移动，直到基板被校准到载物台。提供了许多其他方面。

25. 发明授权

US07151981B2 Methods and apparatus for positioning a substrate relative to a support stage 失效
公开(公告)号：US07151981B2
公开(公告)日：2006-12-19
申请号：US10782507
申请日：2004-02-19
申请人： Shinichi Kurita , Emanuel Beer
发明人： Shinichi Kurita , Emanuel Beer
IPC分类号： G06F7/00
CPC分类号： H01L21/68728 , G03F7/70666 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70791 , G03F7/70825 , G03F9/7011 , H01L21/67265 , H01L21/68778 , Y10S414/135 , Y10S414/136 , Y10S414/141
摘要： In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.

26. 发明申请

US20060157340A1 Transfer chamber for vacuum processing system 有权
公开(公告)号：US20060157340A1
公开(公告)日：2006-07-20
申请号：US11386257
申请日：2006-03-21
申请人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Wendell Blonigan
发明人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Wendell Blonigan
IPC分类号： C23C14/00
CPC分类号： H01L21/67196 , C23C14/566 , C23C16/54 , H01L21/67126 , H01L21/67739 , H01L21/67748 , Y10S414/135
摘要： A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.

27. 发明申请

US20060092436A1 Methods and apparatus for inkjet printing of color filters for displays 审中-公开
标题翻译：用于显示器的彩色滤光片的喷墨打印的方法和装置
公开(公告)号：US20060092436A1
公开(公告)日：2006-05-04
申请号：US11061148
申请日：2005-02-18
申请人： John White , Fan Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
发明人： John White , Fan Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
IPC分类号： G06K15/02
CPC分类号： B41J3/407 , B41J2/04505 , B41J2/04541 , B41J2/04581 , B41J2/04588 , B41J2/0459 , B41J2/04593 , B41J2/125 , B41J3/28 , B41J3/543 , B41J25/001 , B41J25/003 , B41J25/005 , B41J29/15 , B41J29/393
摘要： Methods and apparatus are provided wherein data representative of an image is received, the data being indicative of a plurality of theoretical ink jetting drop positions. The data may be converted into an image data file, the image data file being indicative of a plurality of actual physical ink jetting drop positions, each physical ink jetting drop position corresponding to a theoretical ink jetting drop position. A print system may be controlled based on the image data file, wherein the actual physical ink jetting drop positions may each be selected based upon being within a predefined percentage of a print resolution in a printing direction of a corresponding one of the theoretical ink jetting drop positions.
摘要翻译：提供了方法和装置，其中接收到表示图像的数据，该数据表示多个理论喷墨滴落位置。数据可以被转换为图像数据文件，图像数据文件指示多个实际物理喷墨滴落位置，每个物理喷墨滴下位置对应于理论喷墨滴落位置。可以基于图像数据文件来控制打印系统，其中可以基于理论喷墨滴的相应一个的打印方向上的打印分辨率的预定百分比内的每一个来选择实际物理喷墨落下位置职位

28. 发明申请

US20060038554A1 Electron beam test system stage 审中-公开
标题翻译：电子束测试系统阶段
公开(公告)号：US20060038554A1
公开(公告)日：2006-02-23
申请号：US11190320
申请日：2005-07-27
申请人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Benjamin Johnston , Fayez Abboud
发明人： Shinichi Kurita , Emanuel Beer , Hung Nguyen , Benjamin Johnston , Fayez Abboud
IPC分类号： G01R31/28
CPC分类号： G01R31/305
摘要： A method and integrated system for electron beam testing a substrate is provided. In one aspect, the integrated system includes an electron beam testing chamber having a substrate table disposed therein. The substrate table is capable of moving a substrate within the testing chamber in both horizontal and vertical directions. The system also includes a load lock chamber disposed adjacent a first side of the testing chamber, and a prober storage assembly disposed beneath the testing chamber. A prober transfer assembly is disposed adjacent a second side of the testing chamber and arranged to transfer one or more probers between the prober storage assembly and the testing chamber. Further, one or more electron beam testing devices are disposed on an upper surface of the testing chamber.
摘要翻译：提供了一种用于电子束测试衬底的方法和集成系统。一方面，集成系统包括电子束测试室，其具有设置在其中的衬底台。衬底台能够在水平和垂直方向上移动测试室内的衬底。该系统还包括邻近测试室的第一侧设置的负载锁定室，以及设置在测试室下方的探测器存储组件。探测器传送组件设置在测试室的第二侧附近，并布置成在探测器存储组件和测试室之间传送一个或多个探测器。此外，一个或多个电子束测试装置设置在测试室的上表面上。

29. 发明授权

US06833717B1 Electron beam test system with integrated substrate transfer module 有权
标题翻译：具有集成衬底传输模块的电子束测试系统
公开(公告)号：US06833717B1
公开(公告)日：2004-12-21
申请号：US10778982
申请日：2004-02-12
申请人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston
发明人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston
IPC分类号： G01R31305
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： A method and integrated system for electron beam testing a substrate is provided. In one aspect, the integrated system includes a transfer chamber having a substrate table disposed therein. The substrate table is capable of moving a substrate within the testing chamber in both horizontal and vertical directions. The substrate table includes a first stage moveable in a first dimension, a second stage moveable in a second dimension, and a third stage moveable in a third dimension. Each stage moves independently in its respective dimension. The system also includes a load lock chamber disposed adjacent a first side of the testing chamber, and a prober storage assembly disposed beneath the testing chamber. A prober stack assembly is disposed adjacent a second side of the testing chamber and arranged to transfer one or more probers between the prober storage assembly and the testing chamber. Further, one or more electron beam testing devices are disposed on an upper surface of the testing chamber.
摘要翻译：提供了一种用于电子束测试衬底的方法和集成系统。一方面，集成系统包括具有设置在其中的衬底台的传送室。衬底台能够在水平和垂直方向上移动测试室内的衬底。基板台包括可在第一维度上移动的第一阶段，可在第二维度中移动的第二阶段和可在第三维度上移动的第三阶段。每个阶段在其各自的维度上独立地移动。该系统还包括邻近测试室的第一侧设置的负载锁定室，以及设置在测试室下方的探测器存储组件。探测器堆叠组件设置在测试室的第二侧附近，并布置成在探测器存储组件和测试室之间传送一个或多个探测器。此外，一个或多个电子束测试装置设置在测试室的上表面上。

30. 发明申请

US20060005771A1 Apparatus and method of shaping profiles of large-area PECVD electrodes 审中-公开
标题翻译：大面积PECVD电极成形轮廓的装置和方法
公开(公告)号：US20060005771A1
公开(公告)日：2006-01-12
申请号：US11143506
申请日：2005-06-02
申请人： John White , Emanuel Beer , Wei Chang , Robin Tiner , Soo Choi
发明人： John White , Emanuel Beer , Wei Chang , Robin Tiner , Soo Choi
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： C23C16/4583 , H01J37/3244 , H01J2237/3325
摘要： An apparatus and method for shaping profiles of a large-area PECVD electrode is provided. A plasma-enhanced CVD chamber for processing a large-area substrate is first provided. The chamber includes a lower electrode that supports a large area substrate. The lower electrode is shaped to selectively conform the supported substrate in a selected orientation under operating conditions. The orientation may be either planar or nonplanar. The substrate complies with the shape of the electrode so the substrate is substantially parallel to an upper electrode in the chamber, and/or to a gas diffusion plate in the chamber. The lower electrode comprises a substrate support fabricated from a material of insufficient strength to support itself at operating temperatures and pressure in the chamber. The shape of the substrate support is adjusted by modifying the dimensions and/or planarity of a supporting base structure, and/or by appropriately varying the thickness of the substrate support.
摘要翻译：提供了一种用于形成大面积PECVD电极的轮廓的装置和方法。首先提供用于处理大面积基板的等离子体增强CVD室。该室包括支撑大面积基板的下电极。下电极被成形为在操作条件下以选定的方向选择性地使受支撑的衬底符合。取向可以是平面或非平面的。基板符合电极的形状，因此基板基本上平行于腔室中的上部电极，和/或腔室中的气体扩散板。下电极包括由强度不足的材料制成的衬底支撑件，以在腔室中的操作温度和压力下自身支撑。通过改变支撑基底结构的尺寸和/或平面度和/或通过适当地改变基底支撑件的厚度来调节基底支撑件的形状。

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