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    • 22. 发明授权
    • Photosensitive resin composition and a photosensitive element structure
    • 感光树脂组合物和感光元件结构
    • US6030749A
    • 2000-02-29
    • US842186
    • 1992-03-20
    • Katsuhiro Takahashi
    • Katsuhiro Takahashi
    • G03F7/004G03F7/00G03F7/029G03F7/031G03F7/105G03C1/76G03F7/11
    • G03F7/105G03F7/029Y10S430/124
    • A photosensitive resin composition comprising (A) a binder polymer and/or a prepolymer; (B) an ethylenically unsaturated compound; (C) a radical producer capable of producing a free radical upon exposure to an ultraviolet ray of 300 to 400 nm; and (D) an anthraquinone dye capable of exhibiting a color change upon exposure to an ultraviolet ray having a wavelength in the range of 300 to 400 nm in the presence of the radical producer (C). This photosensitive resin composition, upon exposure through a negative mask to an ultraviolet ray of a wavelength in a specific range and of a quantity larger than a threshold value, can form a photoresin product having image and non-image portions which are different in color from each other, and, hence, this composition can advantageously be used in the fields of printing plates and resists. Especially when this composition is used in the production of a flexographic printing plate, image relief and non-image portions which are different in color are formed, thereby enabling production of a flexographic printing plate which has a good contrast between the relief and non-image portions and therefore is greatly improved in working efficiency and accuracy for positioning when the printing plate is mounted onto the cylinder of a printing machine, as compared to the conventional printing plate comprising relief and non-image portions both having substantially the same color.
    • PCT No.PCT / JP91 / 01588 Sec。 371日期:1992年3月20日 102(e)1992年3月20日PCT PCT 1991年11月19日PCT公布。 第WO92 / 09011号公报。 日期:1992年5月29日一种包含(A)粘合剂聚合物和/或预聚物的感光性树脂组合物; (B)烯属不饱和化合物; (C)能够在暴露于300〜400nm的紫外线时产生自由基的自由基生成剂; 和(D)在自由基生成物(C)的存在下,在暴露于波长在300〜400nm的范围内的紫外线时能够显示变色的蒽醌染料。 该感光性树脂组合物在通过负面掩模曝光到特定范围的波长的紫外线并且大于阈值的量时,可以形成具有不同颜色的图像和非图像部分的光致树脂产品 因此,该组合物可以有利地用于印刷版和抗蚀剂领域。 特别是当这种组合物用于制造柔性版印刷版时,形成了不同颜色的图像浮雕和非图像部分,从而可以生产在浮雕和非图像之间具有良好对比度的柔版印刷版 与现有的具有基本上相同颜色的浮雕和非图像部分的印版相比,印刷版安装在印刷机的滚筒上时,工作效率和定位精度大大提高。
    • 28. 发明授权
    • Surface treatment method, manufacturing method of color filter substrate, and manufacturing method of electro-optical device
    • 表面处理方法,滤色器基板的制造方法以及电光装置的制造方法
    • US07713593B2
    • 2010-05-11
    • US11424957
    • 2006-06-19
    • Kei HirumaKatsuhiro Takahashi
    • Kei HirumaKatsuhiro Takahashi
    • H05H1/22
    • B29C59/14B29L2011/0066
    • A surface treatment method using a plasma treatment apparatus which has an electric discharge generation portion facing a surface of a substrate with a gap therebetween, the substrate being placed on a supporting body, and a construction in which the gap is supplied with a treatment gas, the method includes: applying different voltages between the electric discharge generation portion and the supporting body such that plasma is obtained from the treatment gas supplied to the gap; moving one of the electric discharge generation portion and the substrate relative to the other in a first direction, while the surface of the substrate being exposed to the plasma; and moving, after the relative movement in the first direction and the exposure above referenced, one of the electric discharge generation portion and the substrate relative to the other in a second direction opposite to the first direction, while the surface of the substrate being exposed to the plasma.
    • 一种使用等离子体处理装置的表面处理方法,该等离子体处理装置具有与基板的表面相对的放电产生部,其间具有间隙,基板被放置在支撑体上,以及其中间隙被供给处理气体的结构, 该方法包括:在放电产生部分和支撑体之间施加不同的电压,使得从提供给间隙的处理气体获得等离子体; 在所述基板的表面暴露于所述等离子体的同时,使所述放电产生部和所述基板中的一个相对于另一个移动; 并且在第一方向上的相对运动和上述曝光之后,在与第一方向相反的第二方向上的放电产生部分和衬底之一相对于另一个移动,同时衬底的表面暴露于 等离子体。
    • 29. 发明申请
    • SURFACE TREATMENT METHOD, MANUFACTURING METHOD OF COLOR FILTER SUBSTRATE, AND MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE
    • 表面处理方法,彩色滤光片基板的制造方法及电光器件的制造方法
    • US20070199919A1
    • 2007-08-30
    • US11424957
    • 2006-06-19
    • Kei HirumaKatsuhiro Takahashi
    • Kei HirumaKatsuhiro Takahashi
    • H01B13/00B29D11/00G01L21/30
    • B29C59/14B29L2011/0066
    • A surface treatment method using a plasma treatment apparatus which has an electric discharge generation portion facing a surface of a substrate with a gap therebetween, the substrate being placed on a supporting body, and a construction in which the gap is supplied with a treatment gas, the method includes: applying different voltages between the electric discharge generation portion and the supporting body such that plasma is obtained from the treatment gas supplied to the gap; moving one of the electric discharge generation portion and the substrate relative to the other in a first direction, while the surface of the substrate being exposed to the plasma; and moving, after the relative movement in the first direction and the exposure above referenced, one of the electric discharge generation portion and the substrate relative to the other in a second direction opposite to the first direction, while the surface of the substrate being exposed to the plasma.
    • 一种使用等离子体处理装置的表面处理方法,该等离子体处理装置具有与基板的表面相对的放电产生部,其间具有间隙,基板被放置在支撑体上,以及其中间隙被供给处理气体的结构, 该方法包括:在放电产生部分和支撑体之间施加不同的电压,使得从提供给间隙的处理气体获得等离子体; 在所述基板的表面暴露于所述等离子体的同时,使所述放电产生部和所述基板中的一个相对于另一个移动; 并且在第一方向上的相对运动和上述曝光之后,在与第一方向相反的第二方向上的放电产生部分和衬底之一相对于另一个移动,同时衬底的表面暴露于 等离子体。