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21. 发明授权

US07887988B2 Positive resist composition and pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07887988B2
公开(公告)日：2011-02-15
申请号：US11717645
申请日：2007-03-14
申请人： Kazuyoshi Mizutani , Kaoru Iwato , Kunihiko Kodama , Masaomi Makino
发明人： Kazuyoshi Mizutani , Kaoru Iwato , Kunihiko Kodama , Masaomi Makino
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
摘要翻译：一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

22. 发明授权

US08722319B2 Pattern forming method, chemical amplification resist composition and resist film 有权
标题翻译：图案形成方法，化学放大抗蚀剂组合物和抗蚀剂膜
公开(公告)号：US08722319B2
公开(公告)日：2014-05-13
申请号：US13245326
申请日：2011-09-26
申请人： Kaoru Iwato , Keita Kato
发明人： Kaoru Iwato , Keita Kato
IPC分类号： G03F7/26
CPC分类号： G03F7/0382 , G03F7/0048 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325 , G03F7/38 , G03F7/40
摘要： A pattern forming method includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a tertiary alcohol; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.
摘要翻译：图案形成方法包括：（i）从化学放大抗蚀剂组合物形成膜，其包含（A）树脂，（B）在通过光化射线或辐射照射时能够产生酸的化合物和（C）醇; （ii）曝光胶片; 和（iii）通过使用含有有机溶剂的显影剂进行显影。

23. 发明申请

US20070218407A1 Positive resist composition and pattern forming method using the same 有权
标题翻译：正型抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US20070218407A1
公开(公告)日：2007-09-20
申请号：US11717645
申请日：2007-03-14
申请人： Kazuyoshi Mizutani , Kaoru Iwato , Kunihiko Kodama , Masaomi Makino
发明人： Kazuyoshi Mizutani , Kaoru Iwato , Kunihiko Kodama , Masaomi Makino
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
摘要翻译：一种抗蚀剂组合物，其包含：（A）含有由式（I）表示的重复单元的树脂; 和（B）能够在用光化射线或辐射照射时能产生酸的化合物：其中AR表示苯环或萘环; R表示氢原子，烷基，环烷基或芳基; Z表示与AR一起形成环的连接基团; A表示选自氢原子，烷基，卤素原子，氰基和烷氧基羰基的原子或基团，以及使用该抗蚀剂组合物的图案形成方法。

24. 发明授权

US08617788B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
标题翻译：光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US08617788B2
公开(公告)日：2013-12-31
申请号：US13257403
申请日：2010-03-30
申请人： Takayuki Kato , Hiroshi Saegusa , Kaoru Iwato , Shuji Hirano , Yusuke Iizuka , Shuhei Yamaguchi , Akinori Shibuya
发明人： Takayuki Kato , Hiroshi Saegusa , Kaoru Iwato , Shuji Hirano , Yusuke Iizuka , Shuhei Yamaguchi , Akinori Shibuya
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物，其中当由光化射线敏感或辐射敏感性树脂组合物形成膜厚度为100nm的膜时，该膜对于光线具有55至80％的透射率在波长193nm下，提供使用该组合物的图案形成方法。

25. 发明申请

US20120015301A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物和耐蚀膜和使用组合物的图案形成方法
公开(公告)号：US20120015301A1
公开(公告)日：2012-01-19
申请号：US13258898
申请日：2010-03-31
申请人： Masahiro Yoshidome , Shuji Hirano , Hiroshi Saegusa , Kaoru Iwato , Yusuke Iizuka
发明人： Masahiro Yoshidome , Shuji Hirano , Hiroshi Saegusa , Kaoru Iwato , Yusuke Iizuka
IPC分类号： G03F7/20 , G03F7/075 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0758 , G03F7/2041 , G03F7/38 , Y10S430/108 , Y10S430/111
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.
摘要翻译：本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含：（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，所述树脂含有（a）由下式表示的重复单元（AN-01），（B）能够在用光化射线或辐射照射时能够产生酸的化合物，和（C）含有至少一个氟原子或硅原子的树脂，并且含有具有能够通过碱显影剂的作用分解以提高在碱性显影剂中的溶解度的组：其中式（AN-01）中的变量在说明书中定义。

26. 发明申请

US20110236828A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US20110236828A1
公开(公告)日：2011-09-29
申请号：US13139074
申请日：2009-12-11
申请人： Shuji Hirano , Kaoru Iwato , Hiroshi Saegusa , Yusuke Iizuka
发明人： Shuji Hirano , Kaoru Iwato , Hiroshi Saegusa , Yusuke Iizuka
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： C07D307/93 , C07D407/12 , C07D493/08 , C07D493/18 , C07D495/18 , C08F24/00 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（C）至少具有氟原子或硅原子的树脂，并含有（c）具有至少两个以上极性转换基团的重复单元。

27. 发明授权

US07632623B2 Positive resist composition and pattern formation method using the positive resist composition 有权
标题翻译：使用正性抗蚀剂组合物的正性抗蚀剂组成和图案形成方法
公开(公告)号：US07632623B2
公开(公告)日：2009-12-15
申请号：US11717083
申请日：2007-03-13
申请人： Kaoru Iwato , Kunihiko Kodama , Yuko Yoshida , Kei Yamamoto
发明人： Kaoru Iwato , Kunihiko Kodama , Yuko Yoshida , Kei Yamamoto
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group, a repeating unit containing a first group selected from groups represented by the formulae (pI) to (pV) as defined herein and a repeating unit containing a second group selected from groups represented by the formulae (pI) to (pV) as defined herein which is different from the first group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.
摘要翻译：一种正性抗蚀剂组合物，其包含：通过酸的作用增加在碱性显影液中的溶解度的树脂，其包含含有内酯结构和氰基的重复单元，含有选自下式（pI）至（pV）和含有选自如本文定义的与第一组不同的由式（pI）至（pV）表示的基团的第二基团的重复单元; 在光化射线或辐射照射时产生酸的化合物; 和溶剂。

28. 发明申请

US20090081581A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND A PATTERN-FORMING METHOD USING THE SAME 有权
标题翻译：正性感光性组合物和使用其的图案形成方法
公开(公告)号：US20090081581A1
公开(公告)日：2009-03-26
申请号：US12055359
申请日：2008-03-26
申请人： Kunihiko Kodama , Kaoru Iwato , Hideaki Tsubaki , Norihiko Taguchi
发明人： Kunihiko Kodama , Kaoru Iwato , Hideaki Tsubaki , Norihiko Taguchi
IPC分类号： G03F7/20 , G03F7/004 , C08F220/26
CPC分类号： G03F7/0397 , C08F220/26 , C08F220/28 , Y10S430/111
摘要： A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.
摘要翻译：正型光敏组合物包含：（A）在用光化射线或辐射照射时产生酸的化合物; 和（B）通过酸的作用增加其在碱性显影剂中的溶解度的树脂，其中树脂（B）具有具有酸分解性基团并由式（I）表示的重复单元：其中Xa1表示氢原子，烷基，氰基或卤素原子; Ry1和Ry2各自独立地表示烷基或环烷基; Rx表示具有2个以上碳原子的烷基或环烷基; Z表示亚烷基。

29. 发明授权

US09017917B2 Resist composition and method of forming pattern therewith 有权
标题翻译：抗蚀剂组合物和形成图案的方法
公开(公告)号：US09017917B2
公开(公告)日：2015-04-28
申请号：US12535240
申请日：2009-08-04
申请人： Kaoru Iwato , Kazuto Kunita
发明人： Kaoru Iwato , Kazuto Kunita
IPC分类号： G03F7/039 , G03F7/004 , G03F7/075 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/0757 , G03F7/0758 , G03F7/2041 , G03F7/30
摘要： A resist composition comprises two or more polymers containing a first polymer and a second polymer and a compound that when exposed to actinic rays or radiation, generates an acid, wherein when the resist composition is formed into a dry resist film, the mixing ratios of at least the first and second polymers in the resist film exhibit a gradient distribution such that the mixing ratios continuously change in entirety or partially in the direction of the depth from the surface of the resist film on the air side toward a support, and wherein the mixing ratio of the first polymer at a superior portion of the resist film is higher than that of the second polymer, while the mixing ratio of the second polymer at an inferior portion of the resist film is higher than that of the first polymer.
摘要翻译：抗蚀剂组合物包括含有第一聚合物和第二聚合物的两种或更多种聚合物和当暴露于光化射线或辐射时产生酸的化合物，其中当抗蚀剂组合物形成干燥抗蚀剂膜时，抗蚀剂膜中的第一和第二聚合物的至少表现出梯度分布，使得混合比在空气侧的抗蚀剂膜的表面朝向载体的深度方向全部或部分地连续变化，并且其中混合抗蚀剂膜的上部的第一聚合物的比例高于第二聚合物，而抗蚀剂膜的下部的第二聚合物的混合比高于第一聚合物的比例。

30. 发明授权

US08795944B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition 有权
标题翻译：光化射线敏感或辐射敏感性树脂组合物和使用该组合物的图案形成方法
公开(公告)号：US08795944B2
公开(公告)日：2014-08-05
申请号：US13139193
申请日：2009-12-11
申请人： Hiroshi Saegusa , Kaoru Iwato , Shuji Hirano , Yusuke Iizuka
发明人： Hiroshi Saegusa , Kaoru Iwato , Shuji Hirano , Yusuke Iizuka
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039 , G03F7/26
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0758 , G03F7/2041
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.
摘要翻译：本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含：（A）能够通过酸的作用增加在碱性显影剂中的溶解性的树脂，（B）在照射时能够产生酸的化合物光化射线或辐射，以及（C）含有（c）具有至少一个极性转换基并且至少具有氟原子或硅原子的重复单元的树脂。

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