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21. 发明授权

US06280274B1 Fiber spacers in large area vacuum displays and method for manufacture 失效
标题翻译：大面积真空显示器中的纤维间隔件和制造方法
公开(公告)号：US06280274B1
公开(公告)日：2001-08-28
申请号：US09652290
申请日：2000-08-31
申请人： James J. Hofmann , Jason B. Elledge
发明人： James J. Hofmann , Jason B. Elledge
IPC分类号： H01J900
CPC分类号： H01J29/028 , H01J9/185 , H01J9/242 , H01J29/864 , H01J31/123 , H01J2329/8625 , H01J2329/863 , H01J2329/864 , H01J2329/8645 , H01J2329/866
摘要： A process for fabricating high-aspect ratio support structures comprising: creating a rectangular fiber bundle by stacking selectively etchable glass strands having rectangular cross-sections; slicing the fiber bundle into rectangular tiles; adhering the tiles to an electrode plate of an evacuated display; and selectively removing glass strands, thereby creating support structures.
摘要翻译：一种用于制造高纵横比支撑结构的方法，包括：通过堆叠具有矩形横截面的可选择性蚀刻的玻璃纤维束来产生矩形纤维束; 将纤维束切成矩形砖; 将瓦片粘合到真空显示器的电极板上; 并选择性地除去玻璃丝束，从而形成支撑结构。

22. 发明授权

US4769291A Transparent coatings by reactive sputtering 失效
标题翻译：透明涂层通过反应溅射
公开(公告)号：US4769291A
公开(公告)日：1988-09-06
申请号：US10023
申请日：1987-02-02
申请人： Abraham I. Belkind , Erik Bjornard , James J. Hofmann , Donald V. Jacobson , Steven J. Nadel
发明人： Abraham I. Belkind , Erik Bjornard , James J. Hofmann , Donald V. Jacobson , Steven J. Nadel
IPC分类号： C23C14/14 , C03C17/22 , C03C17/245 , C03C17/34 , C03C17/36 , C23C14/08 , C23C14/10 , C23C14/34 , C23C14/18
CPC分类号： C03C17/3644 , C03C17/22 , C03C17/225 , C03C17/245 , C03C17/3417 , C03C17/3435 , C03C17/36 , C23C14/08 , C23C14/10 , C03C2217/23 , C03C2217/281 , C03C2217/29 , C03C2217/78 , C03C2218/155 , Y10T428/12597 , Y10T428/12611 , Y10T428/12674 , Y10T428/12736 , Y10T428/12792 , Y10T428/12896
摘要： A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.

23. 发明授权

US07527545B2 Methods and tools for controlling the removal of material from microfeature workpieces 有权
标题翻译：用于控制从微型工件移除材料的方法和工具
公开(公告)号：US07527545B2
公开(公告)日：2009-05-05
申请号：US11511689
申请日：2006-08-28
申请人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
发明人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
IPC分类号： B24B7/22 , B24B49/12
CPC分类号： B24B37/013 , B24B49/12 , H01L22/26
摘要： Methods and apparatus for controlling the removal of material from microfeature workpieces in abrasive removal processes. An embodiment of such a method comprises irradiating a periodic structure of the workpiece and obtaining an intensity distribution of radiation returning from the periodic structure. The workpiece can be irradiated with a wide spectrum of wavelengths (e.g., white light), or the workpiece can be irradiated with a laser or lamp at specific wavelengths. The intensity distribution can be an image or other signal from which a dimension or other physical parameter of the periodic structure can be determined. For example, the intensity distribution can be an intensity signal of radiation returning from the workpiece in a selected bandwidth (e.g., 200 nm-900 nm) or an image of a diffraction pattern of radiation that has been scattered by the periodic structure. The method further includes outputting a control signal based on the obtained intensity distribution. For example, the control signal can be an endpoint signal indicating the actual endpoint of the abrasive removal process.
摘要翻译：用于控制在磨料去除过程中从微特征工件中去除材料的方法和装置。这种方法的实施例包括照射工件的周期性结构并获得从周期性结构返回的辐射的强度分布。可以用宽的波长范围（例如，白光）照射工件，或者可以用特定波长的激光或灯照射工件。强度分布可以是可以确定周期性结构的尺寸或其他物理参数的图像或其他信号。例如，强度分布可以是在所选择的带宽（例如，200nm-900nm）中从工件返回的辐射的强度信号或由周期性结构散射的辐射的衍射图案的图像。该方法还包括基于获得的强度分布输出控制信号。例如，控制信号可以是指示磨料去除过程的实际终点的端点信号。

24. 发明授权

US06823693B1 Anodic bonding 失效
标题翻译：阳极结合
公开(公告)号：US06823693B1
公开(公告)日：2004-11-30
申请号：US09036291
申请日：1998-03-06
申请人： James J. Hofmann , Glenn W. Piper
发明人： James J. Hofmann , Glenn W. Piper
IPC分类号： C03C2700
CPC分类号： H01J9/185 , C03B37/01205 , C03B37/028 , C03B2203/40 , C03C27/02 , C03C27/06 , H01J9/242 , H01J2329/8625
摘要： A controller is used with an anodic bonding system that has a charge flowpath for supplying charge to bond materials together. The controller includes a switch and a circuit. The switch is configured to control a flow of the charge through the charge flowpath. The circuit is configured to monitor a rate of the flow, use the rate to determine an amount of the charge supplied for bonding, and based on the amount or rate, operate the switch to control the flow.
摘要翻译：控制器与阳极接合系统一起使用，该系统具有用于向粘结材料提供电荷的电荷流动路径。控制器包括开关和电路。开关被配置为控制通过电荷流动路径的电荷的流动。该电路被配置为监测流量的速率，使用速率来确定为粘合提供的电荷的量，并且基于数量或速率，操作开关以控制流量。

25. 发明授权

US06794704B2 Method for enhancing electrode surface area in DRAM cell capacitors 失效
标题翻译：提高DRAM单元电容器电极表面积的方法
公开(公告)号：US06794704B2
公开(公告)日：2004-09-21
申请号：US10050390
申请日：2002-01-16
申请人： Donald L. Yates , Garry A. Mercaldi , James J. Hofmann
发明人： Donald L. Yates , Garry A. Mercaldi , James J. Hofmann
IPC分类号： H01L27108
CPC分类号： H01L27/1085 , H01L27/10852 , H01L28/65 , H01L28/82 , H01L28/84 , H01L28/91
摘要： Lower electrodes of capacitors composed of a texturizing underlayer and a conductive material overlayer are provided. The lower electrodes have an upper roughened surface. In one embodiment, the texturizing layer is composed of porous or relief nanostructures comprising a polymeric material, for example, silicon oxycarbide. In another embodiment, the texturizing underlayer is in the form of surface dislocations composed of annealed first and second conductive metal layers, and the conductive metal overlayer is agglomerated onto the surface dislocations as nanostructures in the form of island clusters.
摘要翻译：提供了由纹理化底层和导电材料覆盖层组成的电容器的下部电极。下部电极具有上部粗糙表面。在一个实施方案中，组织化层由包含聚合物材料的多孔或释放纳米结构组成，例如碳氧化硅。在另一个实施方案中，所述织构化底层是由退火的第一和第二导电金属层组成的表面位错的形式，并且所述导电金属覆层作为岛簇形式的纳米结构聚集到所述表面位错上。

26. 发明授权

US06561864B2 Methods for fabricating spacer support structures and flat panel displays 失效
标题翻译：制造间隔支撑结构和平板显示器的方法
公开(公告)号：US06561864B2
公开(公告)日：2003-05-13
申请号：US10162339
申请日：2002-06-03
申请人： James J. Hofmann , Jason B. Elledge
发明人： James J. Hofmann , Jason B. Elledge
IPC分类号： H01J924
CPC分类号： H01J29/028 , H01J9/185 , H01J9/242 , H01J29/864 , H01J31/123 , H01J2329/8625 , H01J2329/863 , H01J2329/864 , H01J2329/8645 , H01J2329/866
摘要： A process for fabricating high-aspect ratio support structures comprising: creating a rectangular fiber bundle by stacking selectively etchable glass strands having rectangular cross-sections; slicing the fiber bundle into rectangular tiles; adhering the tiles to an electrode plate of an evacuated display; and selectively removing glass strands, thereby creating support structures.
摘要翻译：一种用于制造高纵横比支撑结构的方法，包括：通过堆叠具有矩形横截面的可选择性蚀刻的玻璃纤维束来产生矩形纤维束; 将纤维束切成矩形砖; 将瓦片粘合到真空显示器的电极板上; 并选择性地除去玻璃丝束，从而形成支撑结构。

27. 发明授权

US06554671B1 Method of anodically bonding elements for flat panel displays 有权
标题翻译：用于平板显示器的阳极结合元件的方法
公开(公告)号：US06554671B1
公开(公告)日：2003-04-29
申请号：US09631003
申请日：2000-08-02
申请人： James J. Hofmann , Jason B. Elledge
发明人： James J. Hofmann , Jason B. Elledge
IPC分类号： H01J924
CPC分类号： H01J9/185 , H01J9/242 , H01J31/127
摘要： A process is disclosed for anodically bonding an array of spacer columns to one of the inner major faces on one of the generally planar plates of an evacuated, flat-panel video display. The process includes the steps of: providing a generally planar plate having a plurality of spacer column attachment sites; providing electrical interconnection between all attachment sites; coating each attachment site with a patch of oxidizable material; providing an array of unattached permanent glass spacer columns, each unattached permanent spacer column being of uniform length and being positioned longitudinally perpendicular to a single plane, with the plane intersecting the midpoint of each unattached spacer column; positioning the array such that an end of one permanent spacer column is in contact with the oxidizable material patch at each attachment site; and anodically bonding the contacting end of each permanent spacer column to the oxidizable material layer. The invention also includes an evacuated flat panel display having spacer structures which are anodically bonded to an internal major face of the display, as well as a face plate assembly manufactured by the aforestated process.
摘要翻译：公开了一种用于将隔离柱阵列阳极结合到抽空的平板显示器的一个平面板上的内主表面之一的工艺。该方法包括以下步骤：提供具有多个间隔柱附着位点的大致平面的板; 提供所有附件位置之间的电气互连; 用一块可氧化材料涂覆每个附着部位; 提供一组未连接的永久性玻璃间隔柱，每个未连接的永久间隔柱具有均匀的长度并且纵向垂直于单个平面定位，该平面与每个未连接的间隔柱的中点相交; 定位阵列使得一个永久间隔柱的末端在每个附着位置与可氧化材料贴片接触; 并将每个永久间隔柱的接触端阳极结合到可氧化材料层上。本发明还包括具有阳极结合到显示器的内部主面的间隔结构的抽真空平板显示器以及通过前述方法制造的面板组件。

28. 发明申请

US20090181601A1 METHODS AND TOOLS FOR CONTROLLING THE REMOVAL OF MATERIAL FROM MICROFEATURE WORKPIECES 有权
标题翻译：用于控制从微生物工件中去除材料的方法和工具
公开(公告)号：US20090181601A1
公开(公告)日：2009-07-16
申请号：US12410984
申请日：2009-03-25
申请人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
发明人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
IPC分类号： B24B49/04 , B24B49/12
CPC分类号： B24B37/013 , B24B49/12 , H01L22/26
摘要： Methods and apparatus for controlling the removal of material from microfeature workpieces in abrasive removal processes. An embodiment of such a method comprises irradiating a periodic structure of the workpiece and obtaining an intensity distribution of radiation returning from the periodic structure. The workpiece can be irradiated with a wide spectrum of wavelengths (e.g., white light), or the workpiece can be irradiated with a laser or lamp at specific wavelengths. The intensity distribution can be an image or other signal from which a dimension or other physical parameter of the periodic structure can be determined. For example, the intensity distribution can be an intensity signal of radiation returning from the workpiece in a selected bandwidth (e.g., 200 nm-900 nm) or an image of a diffraction pattern of radiation that has been scattered by the periodic structure. The method further includes outputting a control signal based on the obtained intensity distribution. For example, the control signal can be an endpoint signal indicating the actual endpoint of the abrasive removal process.
摘要翻译：用于控制在磨料去除过程中从微特征工件中去除材料的方法和装置。这种方法的实施例包括照射工件的周期性结构并获得从周期性结构返回的辐射的强度分布。可以用宽的波长范围（例如，白光）照射工件，或者可以用特定波长的激光或灯照射工件。强度分布可以是可以确定周期性结构的尺寸或其他物理参数的图像或其他信号。例如，强度分布可以是在所选择的带宽（例如，200nm-900nm）中从工件返回的辐射的强度信号或由周期性结构散射的辐射的衍射图案的图像。该方法还包括基于获得的强度分布输出控制信号。例如，控制信号可以是指示磨料去除过程的实际终点的端点信号。

29. 发明授权

US06716754B2 Methods of forming patterns and molds for semiconductor constructions 有权
标题翻译：形成半导体结构图案和模具的方法
公开(公告)号：US06716754B2
公开(公告)日：2004-04-06
申请号：US10099840
申请日：2002-03-12
申请人： James J. Hofmann
发明人： James J. Hofmann
IPC分类号： H01L21302
CPC分类号： H01L21/76817 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , H01L21/76801 , H01L21/76802 , H01L21/76807 , H01L23/3114 , H01L23/525 , H01L23/5329 , H01L24/11 , H01L2224/05001 , H01L2224/05008 , H01L2224/05023 , H01L2224/05024 , H01L2224/05568 , H01L2224/13099 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01022 , H01L2924/01029 , H01L2924/01074 , H01L2924/01079 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H01L2924/181 , Y10S438/951 , H01L2924/00
摘要： The invention includes methods of forming patterns in low-k dielectric materials by contact lithography. In a particular application, a mold having a first pattern is pressed into a low-k dielectric material to form a second pattern within the material. The second pattern is substantially complementary to the first pattern. The mold is then removed from the low-k dielectric material. The invention also includes a method of forming a mold; and includes a mold configured to pattern a mass over a semiconductor substrate during contact lithography of the mass.
摘要翻译：本发明包括通过接触光刻在低k电介质材料中形成图案的方法。在具体应用中，具有第一图案的模具被压入低k电介质材料中以在材料内形成第二图案。第二图案与第一图案基本上互补。然后将模具从低k电介质材料中取出。本发明还包括一种形成模具的方法; 并且包括配置成在所述物体的接触光刻期间在半导体衬底上图案化的模具。

30. 发明授权

US06447354B1 Fiber spacers in large area vacuum displays and method for manufacture 失效
公开(公告)号：US06447354B1
公开(公告)日：2002-09-10
申请号：US09940003
申请日：2001-08-27
申请人： James J. Hofmann , Jason B. Elledge
发明人： James J. Hofmann , Jason B. Elledge
IPC分类号： H01J924
CPC分类号： H01J29/028 , H01J9/185 , H01J9/242 , H01J29/864 , H01J31/123 , H01J2329/8625 , H01J2329/863 , H01J2329/864 , H01J2329/8645 , H01J2329/866
摘要： A process for fabricating high-aspect ratio support structures comprising: creating a rectangular fiber bundle by stacking selectively etchable glass strands having rectangular cross-sections; slicing the fiber bundle into rectangular tiles; adhering the tiles to an electrode plate of an evacuated display; and selectively removing glass strands, thereby creating support structures.

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