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21. 发明授权

US5827101A Anode for flat panel display 失效
标题翻译：平板显示器阳极，降低环境光的反射率
公开(公告)号：US5827101A
公开(公告)日：1998-10-27
申请号：US40129
申请日：1998-03-17
申请人： David A. Cathey , Charles M. Watkins , James J. Hofmann
发明人： David A. Cathey , Charles M. Watkins , James J. Hofmann
IPC分类号： H01J9/22 , H01J29/08 , H01J29/18 , H01J29/89 , H01J31/12 , H01J29/32
CPC分类号： H01J29/896 , H01J29/085 , H01J31/127 , H01J2329/08 , H01J2329/892
摘要： An anode of a flat panel display besides having a glass substrate, a patterned black grille on the substrate, a conductive layer covering the grille and the substrate, and a phosphor layer covering, also has one or more additional transparent layers that reduce the reflectance of the flat panel display from 14% down to 1%-4%. These additional layers are placed between the black matrix grille and the substrate, and between the conductive layer and phosphor layer. The two additional layers are selected and designed to reduce the reflectance that occurs at these respective interfaces.
摘要翻译：平板显示器的阳极除了具有玻璃基板，基板上的图案化黑色格栅，覆盖格栅和基板的导电层和覆盖的荧光体层之外，还具有一个或多个附加的透明层，其降低了反射率平板显示器从14％下降到1％-4％。这些附加层被放置在黑矩阵格栅和基板之间以及导电层和荧光体层之间。选择和设计两个附加层以减少在这些各个界面处发生的反射率。

22. 发明授权

US06495296B1 Method for limiting particle aggregation in a mask deposited by a colloidal suspension 失效
标题翻译：用于限制由胶体悬浮液沉积的掩模中的颗粒聚集的方法
公开(公告)号：US06495296B1
公开(公告)日：2002-12-17
申请号：US09251766
申请日：1999-02-17
申请人： David H. Wells , James J. Hofmann
发明人： David H. Wells , James J. Hofmann
IPC分类号： G03F900
CPC分类号： H01L51/0011
摘要： A method, composition, and article for patterning and depositioning a substrate employing a colloidal suspension includes the step of agitating the colloidal suspension to eliminate aggregations of colloidal particles in the substrate. The colloidal suspension may include a plurality of colloidal particles in a suspension medium which may comprise deionized water, a resist such as photoresist, and a solvent.
摘要翻译：用于使用胶态悬浮液图案化和沉积底物的方法，组合物和制品包括搅拌胶态悬浮液以消除基质中胶体颗粒的聚集的步骤。胶态悬浮液可以包括可以包含去离子水，抗蚀剂如光致抗蚀剂和溶剂的悬浮介质中的多个胶体颗粒。

23. 发明授权

US06172454B2 FED spacer fibers grown by laser drive CVD 失效
标题翻译：通过激光驱动CVD生长的FED间隔纤维
公开(公告)号：US06172454B2
公开(公告)日：2001-01-09
申请号：US09040126
申请日：1998-03-17
申请人： James J. Hofmann
发明人： James J. Hofmann
IPC分类号： H01J162
CPC分类号： H01J9/185 , H01J9/241 , H01J29/864 , H01J2329/863
摘要： Laser-assisted chemical vapor deposition is used to form spacers at desired locations in a field emission display. The spacers can be designed with different shapes to provide increased strength and also to be formed differently depending on the their location on the display.
摘要翻译：激光辅助化学气相沉积用于在场发射显示器中的所需位置形成间隔物。间隔件可以设计成具有不同的形状以提供增强的强度，并且还可以根据它们在显示器上的位置而不同地形成。

24. 发明申请

US20080051007A1 Methods and tools for controlling the removal of material from microfeature workpieces 有权
标题翻译：用于控制从微型工件移除材料的方法和工具
公开(公告)号：US20080051007A1
公开(公告)日：2008-02-28
申请号：US11511689
申请日：2006-08-28
申请人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
发明人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
IPC分类号： B24B51/00 , B24B7/30
CPC分类号： B24B37/013 , B24B49/12 , H01L22/26
摘要： Methods and apparatus for controlling the removal of material from microfeature workpieces in abrasive removal processes. An embodiment of such a method comprises irradiating a periodic structure of the workpiece and obtaining an intensity distribution of radiation returning from the periodic structure. The workpiece can be irradiated with a wide spectrum of wavelengths (e.g., white light), or the workpiece can be irradiated with a laser or lamp at specific wavelengths. The intensity distribution can be an image or other signal from which a dimension or other physical parameter of the periodic structure can be determined. For example, the intensity distribution can be an intensity signal of radiation returning from the workpiece in a selected bandwidth (e.g., 200 nm-900 nm) or an image of a diffraction pattern of radiation that has been scattered by the periodic structure. The method further includes outputting a control signal based on the obtained intensity distribution. For example, the control signal can be an endpoint signal indicating the actual endpoint of the abrasive removal process.
摘要翻译：用于控制在磨料去除过程中从微特征工件中去除材料的方法和装置。这种方法的实施例包括照射工件的周期性结构并获得从周期性结构返回的辐射的强度分布。可以用宽的波长范围（例如，白光）照射工件，或者可以用特定波长的激光或灯照射工件。强度分布可以是可以确定周期性结构的尺寸或其他物理参数的图像或其他信号。例如，强度分布可以是在所选择的带宽（例如，200nm-900nm）中从工件返回的辐射的强度信号或由周期性结构散射的辐射的衍射图案的图像。该方法还包括基于获得的强度分布输出控制信号。例如，控制信号可以是指示磨料去除过程的实际终点的端点信号。

25. 发明授权

US06989595B2 Molds configured to pattern masses associated with semiconductor constructions 失效
标题翻译：配置成模制与半导体结构相关的质量的模具
公开(公告)号：US06989595B2
公开(公告)日：2006-01-24
申请号：US10461811
申请日：2003-06-12
申请人： James J. Hofmann
发明人： James J. Hofmann
IPC分类号： H01L23/34
CPC分类号： H01L21/76817 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00 , H01L21/76801 , H01L21/76802 , H01L21/76807 , H01L23/3114 , H01L23/525 , H01L23/5329 , H01L24/11 , H01L2224/05001 , H01L2224/05008 , H01L2224/05023 , H01L2224/05024 , H01L2224/05568 , H01L2224/13099 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01022 , H01L2924/01029 , H01L2924/01074 , H01L2924/01079 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H01L2924/181 , Y10S438/951 , H01L2924/00
摘要： The invention includes methods of forming patterns in low-k dielectric materials by contact lithography. In a particular application, a mold having a first pattern is pressed into a low-k dielectric material to form a second pattern within the material. The second pattern is substantially complementary to the first pattern. The mold is then removed from the low-k dielectric material. The invention also includes a method of forming a mold; and includes a mold configured to pattern a mass over a semiconductor substrate during contact lithography of the mass.
摘要翻译：本发明包括通过接触光刻在低k电介质材料中形成图案的方法。在具体应用中，具有第一图案的模具被压入低k电介质材料中以在材料内形成第二图案。第二图案与第一图案基本上互补。然后将模具从低k电介质材料中取出。本发明还包括一种形成模具的方法; 并且包括配置成在所述物体的接触光刻期间在半导体衬底上图案化的模具。

26. 发明授权

US06533893B2 Method and apparatus for chemical-mechanical planarization of microelectronic substrates with selected planarizing liquids 失效
标题翻译：用选择的平面液体进行化学机械平面化的微电子基板的方法和装置
公开(公告)号：US06533893B2
公开(公告)日：2003-03-18
申请号：US10102401
申请日：2002-03-19
申请人： Gundu M. Sabde , James J. Hofmann , Michael J. Joslyn , Whonchee Lee
发明人： Gundu M. Sabde , James J. Hofmann , Michael J. Joslyn , Whonchee Lee
IPC分类号： H01L2100
CPC分类号： B24B37/0056 , B24B37/042
摘要： A method and apparatus for planarizing a microelectronic substrate. In one embodiment, the method can include planarizing the microelectronic substrate with a fixed abrasive polishing pad while maintaining the pH of a planarizing liquid adjacent the polishing pad at an approximately constant level by buffering the planarizing liquid. The planarizing liquid can include ammonium hydroxide and ammonium acetate, ammonium citrate, or potassium hydrogen phthalate. In another embodiment, the planarizing liquid can have an initially high pH that has a reduced tendency to decrease during planarization. The planarizing liquid can also include agents, such as isopropyl alcohol, ammonium acetate or polyoxy ethylene ether that can increase the wetted surface area of the microelectronic substrate and/or reduce drag force imparted to the microelectronic substrate by the polishing
摘要翻译：一种用于平面化微电子衬底的方法和装置。在一个实施例中，该方法可以包括用固定的研磨抛光垫平面化微电子衬底，同时通过缓冲平坦化液体将邻近抛光垫的平坦化液体的pH保持在大致恒定的水平。平面化液体可以包括氢氧化铵和乙酸铵，柠檬酸铵或邻苯二甲酸氢钾。在另一个实施方案中，平面化液体可以具有初始高的pH，其在平坦化期间具有降低的降低趋势。平面化液体还可以包括可以增加微电子衬底的润湿表面积和/或通过抛光赋予微电子衬底的拖曳力的试剂，例如异丙醇，乙酸铵或聚氧乙烯醚

27. 发明授权

US4769291A Transparent coatings by reactive sputtering 失效
标题翻译：透明涂层通过反应溅射
公开(公告)号：US4769291A
公开(公告)日：1988-09-06
申请号：US10023
申请日：1987-02-02
申请人： Abraham I. Belkind , Erik Bjornard , James J. Hofmann , Donald V. Jacobson , Steven J. Nadel
发明人： Abraham I. Belkind , Erik Bjornard , James J. Hofmann , Donald V. Jacobson , Steven J. Nadel
IPC分类号： C23C14/14 , C03C17/22 , C03C17/245 , C03C17/34 , C03C17/36 , C23C14/08 , C23C14/10 , C23C14/34 , C23C14/18
CPC分类号： C03C17/3644 , C03C17/22 , C03C17/225 , C03C17/245 , C03C17/3417 , C03C17/3435 , C03C17/36 , C23C14/08 , C23C14/10 , C03C2217/23 , C03C2217/281 , C03C2217/29 , C03C2217/78 , C03C2218/155 , Y10T428/12597 , Y10T428/12611 , Y10T428/12674 , Y10T428/12736 , Y10T428/12792 , Y10T428/12896
摘要： A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12% silicon are especially preferred. Oxygen, nitrogen, compounds of oxygen and compounds of nitrogen are preferred reactive gases. A range of combinations of oxygen and nitrogen are particularly preferred. The method provides durable transparent coatings which may be used as an overcoating for a metal or dielectric coating to provide increased resistance to abrasion and corrosion. In particular, the protected coating may be a metal, dielectric or dielectric-metal-dielectric coating as used in double-glazed window units for buildings or vehicles.

28. 发明授权

US07527545B2 Methods and tools for controlling the removal of material from microfeature workpieces 有权
标题翻译：用于控制从微型工件移除材料的方法和工具
公开(公告)号：US07527545B2
公开(公告)日：2009-05-05
申请号：US11511689
申请日：2006-08-28
申请人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
发明人： Nagasubramaniyan Chandrasekaran , Rajshree Kothari , Gundu M. Sabde , James J. Hofmann
IPC分类号： B24B7/22 , B24B49/12
CPC分类号： B24B37/013 , B24B49/12 , H01L22/26
摘要： Methods and apparatus for controlling the removal of material from microfeature workpieces in abrasive removal processes. An embodiment of such a method comprises irradiating a periodic structure of the workpiece and obtaining an intensity distribution of radiation returning from the periodic structure. The workpiece can be irradiated with a wide spectrum of wavelengths (e.g., white light), or the workpiece can be irradiated with a laser or lamp at specific wavelengths. The intensity distribution can be an image or other signal from which a dimension or other physical parameter of the periodic structure can be determined. For example, the intensity distribution can be an intensity signal of radiation returning from the workpiece in a selected bandwidth (e.g., 200 nm-900 nm) or an image of a diffraction pattern of radiation that has been scattered by the periodic structure. The method further includes outputting a control signal based on the obtained intensity distribution. For example, the control signal can be an endpoint signal indicating the actual endpoint of the abrasive removal process.
摘要翻译：用于控制在磨料去除过程中从微特征工件中去除材料的方法和装置。这种方法的实施例包括照射工件的周期性结构并获得从周期性结构返回的辐射的强度分布。可以用宽的波长范围（例如，白光）照射工件，或者可以用特定波长的激光或灯照射工件。强度分布可以是可以确定周期性结构的尺寸或其他物理参数的图像或其他信号。例如，强度分布可以是在所选择的带宽（例如，200nm-900nm）中从工件返回的辐射的强度信号或由周期性结构散射的辐射的衍射图案的图像。该方法还包括基于获得的强度分布输出控制信号。例如，控制信号可以是指示磨料去除过程的实际终点的端点信号。

29. 发明授权

US06823693B1 Anodic bonding 失效
标题翻译：阳极结合
公开(公告)号：US06823693B1
公开(公告)日：2004-11-30
申请号：US09036291
申请日：1998-03-06
申请人： James J. Hofmann , Glenn W. Piper
发明人： James J. Hofmann , Glenn W. Piper
IPC分类号： C03C2700
CPC分类号： H01J9/185 , C03B37/01205 , C03B37/028 , C03B2203/40 , C03C27/02 , C03C27/06 , H01J9/242 , H01J2329/8625
摘要： A controller is used with an anodic bonding system that has a charge flowpath for supplying charge to bond materials together. The controller includes a switch and a circuit. The switch is configured to control a flow of the charge through the charge flowpath. The circuit is configured to monitor a rate of the flow, use the rate to determine an amount of the charge supplied for bonding, and based on the amount or rate, operate the switch to control the flow.
摘要翻译：控制器与阳极接合系统一起使用，该系统具有用于向粘结材料提供电荷的电荷流动路径。控制器包括开关和电路。开关被配置为控制通过电荷流动路径的电荷的流动。该电路被配置为监测流量的速率，使用速率来确定为粘合提供的电荷的量，并且基于数量或速率，操作开关以控制流量。

30. 发明授权

US06794704B2 Method for enhancing electrode surface area in DRAM cell capacitors 失效
标题翻译：提高DRAM单元电容器电极表面积的方法
公开(公告)号：US06794704B2
公开(公告)日：2004-09-21
申请号：US10050390
申请日：2002-01-16
申请人： Donald L. Yates , Garry A. Mercaldi , James J. Hofmann
发明人： Donald L. Yates , Garry A. Mercaldi , James J. Hofmann
IPC分类号： H01L27108
CPC分类号： H01L27/1085 , H01L27/10852 , H01L28/65 , H01L28/82 , H01L28/84 , H01L28/91
摘要： Lower electrodes of capacitors composed of a texturizing underlayer and a conductive material overlayer are provided. The lower electrodes have an upper roughened surface. In one embodiment, the texturizing layer is composed of porous or relief nanostructures comprising a polymeric material, for example, silicon oxycarbide. In another embodiment, the texturizing underlayer is in the form of surface dislocations composed of annealed first and second conductive metal layers, and the conductive metal overlayer is agglomerated onto the surface dislocations as nanostructures in the form of island clusters.
摘要翻译：提供了由纹理化底层和导电材料覆盖层组成的电容器的下部电极。下部电极具有上部粗糙表面。在一个实施方案中，组织化层由包含聚合物材料的多孔或释放纳米结构组成，例如碳氧化硅。在另一个实施方案中，所述织构化底层是由退火的第一和第二导电金属层组成的表面位错的形式，并且所述导电金属覆层作为岛簇形式的纳米结构聚集到所述表面位错上。

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