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21. 发明申请

US20050214694A1 Pattern formation method 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20050214694A1
公开(公告)日：2005-09-29
申请号：US11010602
申请日：2004-12-13
申请人： Jin Hong , Hyun-Woo Kim , Myoung-Ho Jung , Gyung-Jin Min
发明人： Jin Hong , Hyun-Woo Kim , Myoung-Ho Jung , Gyung-Jin Min
IPC分类号： H01L21/3065 , G03F7/00 , H01L21/027 , H01L21/311 , H01L21/314 , H01L21/3213 , H01L21/768
CPC分类号： H01L21/31144 , H01L21/0273 , H01L21/0276 , H01L21/3146 , H01L21/32139 , H01L21/76801 , H01L21/76802 , H01L21/76808 , H01L21/76838
摘要： A pattern formation method comprises forming a material layer on a substrate, forming an amorphous carbon layer on the material layer, forming an anti-reflective layer on the amorphous carbon layer, forming a silicon photoresist layer on the anti-reflective layer, forming a silicon photoresist layer pattern by patterning the silicon photoresist layer, etching the anti-reflective layer and the amorphous carbon layer using the silicon photoresist layer pattern as an etch mask to form an amorphous carbon layer pattern, and etching the material layer using the amorphous carbon layer pattern as an etch mask to form a pattern in the material layer.
摘要翻译：图案形成方法包括在基板上形成材料层，在所述材料层上形成无定形碳层，在所述非晶碳层上形成抗反射层，在所述抗反射层上形成硅光致抗蚀剂层，形成硅通过图案化硅光致抗蚀剂层，使用硅光致抗蚀剂层图案蚀刻抗反射层和非晶碳层作为蚀刻掩模以形成无定形碳层图案，并使用无定形碳层图案蚀刻材料层，作为在材料层中形成图案的蚀刻掩模。

22. 发明授权

US09625816B2 Methods of forming patterns using photoresist polymers 有权
公开(公告)号：US09625816B2
公开(公告)日：2017-04-18
申请号：US14886155
申请日：2015-10-19
申请人： Jin Park , Hyun-Woo Kim , Jin-Kyu Han
发明人： Jin Park , Hyun-Woo Kim , Jin-Kyu Han
IPC分类号： G03F7/039 , G03F7/36 , G03F7/32 , G03F7/20 , G03F7/16 , G03F7/26 , G03F7/004 , G03F7/30
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/016 , G03F7/0392 , G03F7/16 , G03F7/168 , G03F7/2004 , G03F7/26 , G03F7/30 , G03F7/327 , G03F7/36 , H01L21/0274 , H01L29/4236
摘要： A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

23. 发明授权

US09147687B2 Methods of fabricating semiconductor devices 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US09147687B2
公开(公告)日：2015-09-29
申请号：US14299495
申请日：2014-06-09
申请人： Cha-Won Koh , Hyun-Woo Kim , Jeon-Il Lee , Hyo-Sung Lee
发明人： Cha-Won Koh , Hyun-Woo Kim , Jeon-Il Lee , Hyo-Sung Lee
IPC分类号： H01L27/112 , H01L21/3065 , H01L21/283
CPC分类号： H01L27/11286 , G03F7/0002 , H01L21/283 , H01L21/3065 , H01L21/31144 , H01L21/32139 , H01L27/11548 , H01L27/11556 , H01L27/11575 , H01L27/11582
摘要： Semiconductor devices and methods of fabricating the same are provided. The methods include preparing a template having a three dimensional (3D) stair type structure formed in intaglio, forming an imprint pattern having the stair type structure using the template, and simultaneously forming stair type patterns on a substrate using the imprint pattern.
摘要翻译：提供半导体器件及其制造方法。所述方法包括制备具有以凹版形成的三维（3D）楼梯型结构的模板，使用该模板形成具有楼梯型结构的压印图案，并且使用压印图案同时在基板上形成阶梯型图案。

24. 发明申请

US20150234278A1 PATTERNING PROCESS 有权
标题翻译：绘图过程
公开(公告)号：US20150234278A1
公开(公告)日：2015-08-20
申请号：US14622306
申请日：2015-02-13
申请人： Jun Hatakeyama , Hyun-Woo Kim
发明人： Jun Hatakeyama , Hyun-Woo Kim
IPC分类号： G03F7/16 , G03F7/30 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/095 , G03F7/2002 , G03F7/325
摘要： There is provided a patterning process that forms a negative pattern by developing using an organic solvent, using a resist top coat composition that not only reduces the effect from the environment on a resist film and effectively blocks OOB light, but also reduces the film loss of a resist pattern and the bridging between patterns, enhances the sensitivity of the resist film, and suppresses the emission of an outgas from the resist film. The patterning process includes the steps of forming a resist top coat on a photoresist film formed on a substrate, with the resist top coat using as a top base material a polymer having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group, in which m is 1 or 2, and p is 0
摘要翻译：提供通过使用有机溶剂显影形成负图案的图案化工艺，使用抗蚀剂面漆组合物，其不仅降低了抗蚀剂膜上的环境的影响并且有效地阻挡OOB光，而且还降低了膜损失抗蚀剂图案和图案之间的桥接，增强了抗蚀剂膜的灵敏度，并且抑制了从抗蚀剂膜发出的气体。图案化工艺包括以下步骤：在形成在基底上的光致抗蚀剂膜上形成抗蚀剂外涂层，其中抗蚀剂外涂层使用作为顶部基材的具有苯乙烯重复单元p的聚合物，其具有1,1,1,3 ，3,3-六氟-2-丙醇基，其中m为1或2，p为0

25. 发明申请

US20130267916A1 PERCUTANEOUS ABSORPTION PREPARATION CONTAINING RIVASTIGMINE 审中-公开
标题翻译：包含RIVASTIGMINE的PERCUTANEOUSO吸收制剂
公开(公告)号：US20130267916A1
公开(公告)日：2013-10-10
申请号：US13994788
申请日：2011-12-22
申请人： Hyun-Suk Yu , Young-Moo Lee , Hyun-Woo Kim , Hee-Sook Kim
发明人： Hyun-Suk Yu , Young-Moo Lee , Hyun-Woo Kim , Hee-Sook Kim
IPC分类号： A61K9/70 , A61K31/27
CPC分类号： A61K9/703 , A61K9/7053 , A61K31/27
摘要： Disclosed is a percutaneous absorption preparation for treatment of dementia that comprises rivastigmine or its pharmaceutically acceptable salt as an active ingredient, a styrene-isoprene-styrene block copolymer, a tackifier resin, and a plasticizer, which preparation contains a small amount of rivastigmine but allows a sufficient amount of the active ingredient penetrated into the skin to achieve an effective treatment of dementia.
摘要翻译：公开了一种用于治疗痴呆的经皮吸收制剂，其包含作为活性成分的利伐斯的明或其药学上可接受的盐，苯乙烯 - 异戊二烯 - 苯乙烯嵌段共聚物，增粘树脂和增塑剂，该制剂含有少量的利凡斯的明但允许足够量的活性成分渗入皮肤以实现痴呆的有效治疗。

26. 发明申请

US20120249490A1 ELECTRONIC PEN, INPUT METHOD USING ELECTRONIC PEN, AND DISPLAY DEVICE FOR ELECTRONIC PEN INPUT 审中-公开
标题翻译：电子笔，使用电子笔的输入方法和用于电子笔输入的显示装置
公开(公告)号：US20120249490A1
公开(公告)日：2012-10-04
申请号：US13435785
申请日：2012-03-30
申请人： Jeong-Seok Lee , Young-Ran Han , Sang-Hun Lee , In-Kuk Yun , Hyun-Woo Kim
发明人： Jeong-Seok Lee , Young-Ran Han , Sang-Hun Lee , In-Kuk Yun , Hyun-Woo Kim
IPC分类号： G06F3/033
CPC分类号： G06F3/03542 , G02F1/133512 , G06F3/0321 , G06F3/042
摘要： A method of inputting a user command on a display using an electronic pen includes emitting light in the direction of the display using a light source of the electronic pen and capturing the display with a camera of the electronic pen. The method includes recognizing a Black Matrix (BM) pattern of the display in the captured image and detecting a location on the display at which the light from the light source is emitted by comparing the recognized BM pattern with pre-stored patterns.
摘要翻译：使用电子笔在显示器上输入用户命令的方法包括使用电子笔的光源在显示方向上发光，并用电子笔的相机拍摄显示。该方法包括识别拍摄图像中的显示的黑矩阵（BM）图案，并通过将识别的BM图案与预先存储的图案进行比较来检测来自光源的光的显示位置。

27. 发明申请

US20110264260A1 SUBSTRATE-PROCESSING APPARATUS AND METHOD OF TRANSFERRING SUBSTRATE IN THE SAME 有权
标题翻译：基板处理装置及其中的基板传输方法
公开(公告)号：US20110264260A1
公开(公告)日：2011-10-27
申请号：US13056413
申请日：2009-04-06
申请人： Sang-Seok Hong , Hyun-Woo Kim
发明人： Sang-Seok Hong , Hyun-Woo Kim
IPC分类号： H01L21/677 , G06F7/00
CPC分类号： H01L21/67781
摘要： Provided is a substrate-processing apparatus including a transfer member loading and taking out a substrate to and from a storage member, and a control unit controlling the transfer member. The transfer member includes a plurality of transfer arms and an arm-driving part moving the respective transfer arms horizontally, and substrates are loaded on the respective transfer arms. The control unit controls a movement velocity and a position of the transfer member and compares movement velocity profiles of the transfer arms, so as to control movement velocities of the respective transfer arms. Accordingly, the simultaneously driven transfer arms simultaneously arrive at target points, and thus the substrate-processing apparatus reduces transfer time and improves productivity.
摘要翻译：提供了一种基板处理装置，其包括将存储部件加载和取出基板的转印部件和控制转印部件的控制部。转印构件包括多个转印臂和臂驱动部分，水平地移动各个转印臂，并且基板被装载在相应的转印臂上。控制单元控制传送构件的移动速度和位置，并且比较传送臂的移动速度分布，以便控制各传送臂的移动速度。因此，同时驱动的传送臂同时到达目标点，因此基板处理装置减少传送时间并提高生产率。

28. 发明申请

US20060122830A1 Embedded code-excited linerar prediction speech coding and decoding apparatus and method 有权
标题翻译：嵌入式码激励线性预测语音编解码装置及方法
公开(公告)号：US20060122830A1
公开(公告)日：2006-06-08
申请号：US11297686
申请日：2005-12-07
申请人： Mi-Suk Lee , Do-Young Kim , JongMo Sung , Hyun-Woo Kim
发明人： Mi-Suk Lee , Do-Young Kim , JongMo Sung , Hyun-Woo Kim
IPC分类号： G10L19/02
CPC分类号： G10L19/24 , G10L19/083 , G10L19/10
摘要： Provides is an embedded code-excited linear prediction speech coding/decoding apparatus and method that can deal with the capacity change of speech transmission channel by modeling an error signal not coded at a core speech coder based on a transmission rate in a multiple pulse search mode- or gain compensation mode and then transmitting it in an optimum mode. The apparatus includes a core speech coding unit for coding an input speech signal with spectral envelop and an excitation signal, a transmission rate determination unit for allocating the number of bits additionally allowed depending on a capacity of a transmission channel, and an embedded excitation signal coding unit for coding a residual excitation signal that is not coded in the core speech coding unit based on the number of additionally allowed bits using one of a multiple pulse excitation coding mode and a gain compensation mode.
摘要翻译：提供一种嵌入式码激励线性预测语音编码/解码装置和方法，可以通过对基于多脉冲搜索模式中的传输速率的核心语音编码器对未编码的误差信号进行建模来处理语音传输信道的容量变化 - 或增益补偿模式，然后以最佳模式发送。该装置包括：核心语音编码单元，用于对具有频谱包络和激励信号的输入语音信号进行编码;传输速率确定单元，用于根据传输信道的容量分配额外容许的比特数;以及嵌入式激励信号编码用于使用多脉冲激励编码模式和增益补偿模式中的一种，基于使用附加允许位的数量来编码不在核心语音编码单元中编码的残余激励信号的单元。

29. 发明申请

US20060003268A1 Method of forming semiconductor patterns 审中-公开
标题翻译：形成半导体图案的方法
公开(公告)号：US20060003268A1
公开(公告)日：2006-01-05
申请号：US11155341
申请日：2005-06-17
申请人： Jin Hong , Myoung-Ho Jung , Hyun-Woo Kim
发明人： Jin Hong , Myoung-Ho Jung , Hyun-Woo Kim
IPC分类号： G03F7/36
CPC分类号： H01L21/0273 , H01L21/31138 , H01L21/32139 , H01L29/66795 , H01L29/785
摘要： A method of forming a pattern comprises the steps of stacking an inorganic hard mask layer, an organic mask layer, and an anti-reflecting layer on a substrate where a lower layer is formed, forming a photoresist pattern containing silicon on the anti-reflecting layer, performing an O2 plasma ashing to form a conformal layer of an oxide glass on the photoresist pattern containing silicon and to dry etch the anti-reflecting layer and the organic mask layer to form an anti-reflecting pattern and an organic mask pattern, removing the photoresist pattern, the anti-reflecting pattern, and the organic mask pattern, and etching the lower layer using a pattern of the inorganic hard mask layer as an etch mask.
摘要翻译：形成图案的方法包括以下步骤：在形成下层的基板上堆叠无机硬掩模层，有机掩模层和抗反射层，在抗反射层上形成含有硅的光致抗蚀剂图案执行O 2等离子体灰化以在含有硅的光致抗蚀剂图案上形成氧化物玻璃的保形层，并干燥蚀刻抗反射层和有机掩模层以形成抗反射图案和有机掩模图案，去除光致抗蚀剂图案，抗反射图案和有机掩模图案，并且使用无机硬掩模层的图案作为蚀刻掩模蚀刻下层。

30. 发明授权

US10113022B2 Photoresist polymers and methods of forming patterns 有权
公开(公告)号：US10113022B2
公开(公告)日：2018-10-30
申请号：US14804775
申请日：2015-07-21
申请人： Jin Park , Hyun-Woo Kim
发明人： Jin Park , Hyun-Woo Kim
IPC分类号： G03F7/004 , C08F214/14 , C08F214/16 , C08F214/18 , G03F7/038 , G03F7/16 , G03F7/20 , G03F7/34 , C08G75/26 , G03F7/039
摘要： A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.

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