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    • 21. 发明授权
    • Negative-working radiation-sensitive mixture, and radiation-sensitive
recording material produced with this mixture
    • 负极工作辐射敏感性混合物,以及用这种混合物生产的辐射敏感记录材料
    • US5227276A
    • 1993-07-13
    • US871033
    • 1992-04-20
    • Horst RoeschertGeorg PawlowskiJuergen Fuchs
    • Horst RoeschertGeorg PawlowskiJuergen Fuchs
    • G03F7/00G03F7/004G03F7/028G03F7/038H01L21/027
    • G03F7/0045
    • A negative-working radiation-sensitive mixture containinga) a compound which generates a strong acid under the action of actinic radiation,b) a compound having at least two groups crosslinkable by means of acid andc) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions,wherein the compound (a) contains a 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine which is esterified with two or three arylsulfonic acids or heteroarylsulfonic acids, is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material which has been produced with this mixture is suitable for the production of photoresists, electronic components, printed plates or for chemical milling.
    • 一种负性辐射敏感性混合物,其包含a)在光化辐射的作用下产生强酸的化合物,b)具有至少两个可通过酸交联的基团的化合物,和c)不溶于水的聚合物粘合剂 并且在碱性水溶液中可溶或至少可溶胀,其中化合物(a)含有2,4,6-三 - (2-羟基乙氧基) - [1,3,5]三嗪,其被二或三个芳基磺酸酯化 或杂芳基磺酸在高光谱范围内被高分辨率和高灵敏度区分。 它还显示出高的热稳定性,并且在暴露时不会形成任何腐蚀性光解产物。 用这种混合物生产的辐射敏感记录材料适用于制备光致抗蚀剂,电子部件,印刷板或用于化学研磨。
    • 29. 发明授权
    • Positive-working radiation-sensitive mixture and recording material
produced therewith
    • 正面工作的辐射敏感性混合物和由其生产的记录材料
    • US5736297A
    • 1998-04-07
    • US681081
    • 1996-07-22
    • Horst RoeschertGeorg Pawloski
    • Horst RoeschertGeorg Pawloski
    • C07D271/12G03F7/004G03F7/039H01L21/027G03C1/73
    • C07D271/12G03F7/0045G03F7/039Y10S430/12Y10S430/122Y10S430/126
    • The invention relates to a positive-working radiation-sensitive mixture containing a) a compound which forms acid when exposed to actinic radiation, b) a compound containing at least one C--O--C or C--O--Si bond which can be cleaved by said acid, and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions, wherein the compound a) comprises the structure of the formulae I, II or III: ##STR1## The radiation-sensitive mixture according to the invention is notable for a high resolution and a high sensitivity over a wide spectral range. It also has high thermal stability and does not form any corrosive photolysis products on exposure to light. The invention furthermore relates to a radiation-sensitive recording material produced therefrom which is suitable for producing photoresists, electronic components, printed circuit boards or for chemical milling.
    • 本发明涉及一种正性工作辐射敏感性混合物,其包含a)当暴露于光化辐射时形成酸的化合物,b)包含可被所述酸切割的至少一个COC或CO-Si键的化合物,c )在水性碱性溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂,其中化合物a)包含式I,II或III的结构:(I)根据本发明的接合混合物 在宽光谱范围内具有高分辨率和高灵敏度。 它还具有很高的热稳定性,并且在曝光时不会形成任何腐蚀性光解产物。 本发明还涉及一种适用于生产光致抗蚀剂,电子元件,印刷电路板或用于化学研磨的由其制成的辐射敏感记录材料。