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21. 发明授权

US06365223B1 Process for tinting a resin for optical materials 有权
标题翻译：光学材料用树脂着色方法
公开(公告)号：US06365223B1
公开(公告)日：2002-04-02
申请号：US09493100
申请日：2000-01-28
申请人： Yuichi Yoshimura , Motoharu Takeuchi , Atsuki Niimi , Hiroshi Horikoshi , Masaaki Takasuka
发明人： Yuichi Yoshimura , Motoharu Takeuchi , Atsuki Niimi , Hiroshi Horikoshi , Masaaki Takasuka
IPC分类号： B05D118
CPC分类号： G02B1/041 , C08G75/08 , D06P1/622 , D06P1/65118 , D06P1/653 , D06P1/67316 , C08L85/00
摘要： A process for tinting a resin for optical materials, the resin containing sulfur, includes dipping the resin for optical materials into a liquid containing an inorganic acid and/or an organic acid and thereafter tinting the resin. Where the organic acid is included in the liquid, the organic acid is a mixture of a first compound (I) having sulfo group and a second compound (II) having phenolic hydroxyl group but not having sulfo group, with a ratio (I)/(II) of the first compound to the second compound, in an amount by weight, being 0.01 to 2.0.
摘要翻译：用于光学材料树脂着色的方法，含有硫的树脂包括将用于光学材料的树脂浸入含有无机酸和/或有机酸的液体中，然后着色树脂。当液体中含有有机酸时，有机酸是具有磺基的第一化合物（I）和具有酚羟基但不具有磺基的第二化合物（II）的混合物，其比例（I）/ （II）与第二化合物的重量比为0.01〜2.0。

22. 发明授权

US5945504A Episulfide compound 失效
标题翻译：二硫化合物
公开(公告)号：US5945504A
公开(公告)日：1999-08-31
申请号：US782720
申请日：1997-01-13
申请人： Akikazu Amagi , Nobuyuki Uemura , Motoharu Takeuchi , Kenichi Takahashi , Minoru Ohashi , Hiroshi Horikoshi , Masanori Shimuta
发明人： Akikazu Amagi , Nobuyuki Uemura , Motoharu Takeuchi , Kenichi Takahashi , Minoru Ohashi , Hiroshi Horikoshi , Masanori Shimuta
IPC分类号： C07D331/02 , C07D409/12 , C07D409/14 , C08G59/30 , C08G75/06 , G02B1/04 , C08G75/08
CPC分类号： C07D409/14 , C07D331/02 , C07D409/12 , C08G59/302 , C08G75/06 , G02B1/041
摘要： An episulfide which has an alicyclic, aromatic or heterocyclic skeleton and has two or more moieties represented by the formula ##STR1## wherein X is S or O, and S is in an amount of 50% or more, on the average, of the total of S and O constituting a three-membered ring. A cured material obtained by polymerizing this episulfide compound is a desirable optical material for various uses, particularly as a lens material for spectacles.
摘要翻译：具有脂环族，芳族或杂环骨架并具有两个或多个由下式表示的部分的环硫化物：其中X为S或O，S为总量的50％或更多，S和 O构成三元环。通过聚合该环硫化合物获得的固化材料是用于各种用途的所需光学材料，特别是作为眼镜用透镜材料。

23. 发明授权

US08786089B2 Manufacturing method of semiconductor device, semiconductor device and electronic apparatus 有权
标题翻译：半导体器件，半导体器件和电子设备的制造方法
公开(公告)号：US08786089B2
公开(公告)日：2014-07-22
申请号：US13359075
申请日：2012-01-26
申请人： Kazuto Watanabe , Atsushi Matsushita , Hiroshi Horikoshi , Iwao Sugiura , Yuuji Nishimura , Syota Yamabata
发明人： Kazuto Watanabe , Atsushi Matsushita , Hiroshi Horikoshi , Iwao Sugiura , Yuuji Nishimura , Syota Yamabata
IPC分类号： H01L23/48
CPC分类号： H01L21/76841 , H01L27/14621 , H01L27/14627 , H01L27/14683 , H01L27/14685 , H01L27/14687 , H01L2224/02166 , H01L2224/48463 , H01L2924/01021 , H01L2924/10253 , H01L2924/13091 , H01L2924/3025 , H01L2924/00
摘要： A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer.
摘要翻译：半导体器件的制造方法包括在半导体衬底的一个表面侧上暴露由包括具有不同标准电极电位的两种或更多种类型的金属的合金形成的布线层，并且执行等离子体处理，其允许由包括氮气和惰性气体的混合气体或由包含氮气的气体产生的等离子体，以照射包括布线层的暴露表面的范围。

24. 发明授权

US08586766B2 Method for producing episulfide compound 有权
标题翻译：产生环硫化合物的方法
公开(公告)号：US08586766B2
公开(公告)日：2013-11-19
申请号：US13577298
申请日：2011-02-21
申请人： Mineki Kubo , Hiroshi Horikoshi
发明人： Mineki Kubo , Hiroshi Horikoshi
IPC分类号： C07D331/02 , C07D409/12 , C07D303/00
CPC分类号： C07D331/02 , C08G75/08 , C08L81/02
摘要： A problem to be solved by the present invention is to provide an episulfide compound efficiently from an epoxy compound with no need of a measure against odor or corrosion, or a neutralization step. The present invention solved the above-described problem by a method for producing an episulfide compound in which an epoxy compound and a thiourea are reacted with each other in the presence of an ammonium compound.
摘要翻译：本发明要解决的问题是从环氧化合物中有效地提供环硫化合物，而不需要防止气味或腐蚀或中和步骤。本发明通过其中环氧化合物和硫脲在铵化合物的存在下彼此反应的环硫化合物的制备方法解决了上述问题。

25. 发明授权

US08524594B2 Solid-state imaging device, method for manufacturing the same, and electronic apparatus 有权
标题翻译：固态成像装置及其制造方法以及电子装置
公开(公告)号：US08524594B2
公开(公告)日：2013-09-03
申请号：US13137775
申请日：2011-09-12
申请人： Hiroshi Horikoshi
发明人： Hiroshi Horikoshi
IPC分类号： H01L21/44
CPC分类号： H01L27/146 , H01L27/1462 , H01L27/14621 , H01L27/14625 , H01L27/14627 , H01L27/14629 , H01L27/14636 , H01L27/14683 , H01L27/14685 , H01L2224/48091 , H01L2924/13091 , H01L2924/00014 , H01L2924/00
摘要： A method for manufacturing a solid-state imaging device includes: forming pixels that receive incident light in a pixel array area of a substrate; forming pad electrodes in a peripheral area located around the pixel array area of the substrate; forming a carbon-based inorganic film on an upper surface of each of the pad electrodes including a connection surface electrically connected to an external component; forming a coated film that covers upper surfaces of the carbon-based inorganic films; and forming an opening above the connection surface of each of the pad electrodes to expose the connection surface.
摘要翻译：一种制造固态成像装置的方法，包括：形成在基板的像素阵列区域中接收入射光的像素; 在位于所述基板的像素阵列区域周围的周边区域中形成焊盘电极; 在每个焊盘电极的上表面上形成碳基无机膜，包括电连接到外部部件的连接表面; 形成覆盖碳基无机膜的上表面的涂膜; 并且在每个焊盘电极的连接表面上方形成开口以露出连接表面。

26. 发明授权

US08389671B2 Resin composition for optical member and optical member obtained from the same 有权
标题翻译：用于光学部件的树脂组合物和由其获得的光学部件
公开(公告)号：US08389671B2
公开(公告)日：2013-03-05
申请号：US12529918
申请日：2008-03-11
申请人： Motoharu Takeuchi , Hiroshi Horikoshi , Hiroaki Tanaka , Hirohito Ishizuka
发明人： Motoharu Takeuchi , Hiroshi Horikoshi , Hiroaki Tanaka , Hirohito Ishizuka
IPC分类号： B32B27/30 , G02B1/00 , G02B1/04
CPC分类号： C08F12/30 , C08F212/08 , C08F212/14 , C08F212/36 , C08F216/1466 , C08F220/38 , C08F2222/1013 , C08G75/08 , G02B1/04 , C08L81/00
摘要： The present invention can provide a composition for optical members, which contains (a) a compound having one or more of any group selected from the group consisting of an acryloyl group, a methacryloyl group, an allyl group and a vinyl group and one or more β-epithiopropyl groups in a molecule. In a preferable embodiment of the present invention, the composition for optical members further contains at least one compound selected from (b) a compound having one or more β-epithiopropyl groups in a molecule while having no polymerizable unsaturated bond group, (c) an inorganic compound having a sulfur atom and/or a selenium atom, (d) a compound having one or more thiol groups in a molecule, (e) a compound having one or more amino groups in a molecule while having no heterocyclic ring, and (f) a compound having one or more of at least one group selected from the group consisting of a vinyl group, an acryloyl group, a methacryloyl group and an allyl group in a molecule.
摘要翻译：本发明可以提供一种光学部件用组合物，其含有（a）具有选自丙烯酰基，甲基丙烯酰基，烯丙基和乙烯基中的一个或多个的一种或多种的化合物和一种或多种一个分子中的β-二硫丙基。在本发明的优选实施方案中，用于光学部件的组合物还含有至少一种选自（b）分子中具有一个或多个β-伯硫丙基的化合物中的化合物，同时不具有可聚合的不饱和键基，（c）具有硫原子和/或硒原子的无机化合物，（d）分子中具有一个或多个硫醇基的化合物，（e）分子中具有一个或多个氨基但不具有杂环的化合物，以及（f）在分子中具有一个或多个选自乙烯基，丙烯酰基，甲基丙烯酰基和烯丙基中的至少一个基团的化合物。

27. 发明授权

US07352041B2 Magnetic memory device 失效
标题翻译：磁存储器件
公开(公告)号：US07352041B2
公开(公告)日：2008-04-01
申请号：US10919337
申请日：2004-08-17
申请人： Hiroshi Horikoshi
发明人： Hiroshi Horikoshi
IPC分类号： H01L29/82
CPC分类号： H01L43/12 , B82Y10/00 , G11C11/16 , H01L27/222 , H01L27/228
摘要： A magnetic memory device and a method of manufacturing the same, which are advantageous not only in that both the improvement of storage sensitivity and the reduction of power consumption can be achieved, but also in that a buried wiring having low resistance and high reliability can be formed in reduced time in a stable manner. Soft magnetic material layers forming the cladding structure of a word line and a bit line constituting an MRAM are formed by electroless plating, and the soft magnetic material layers are formed around main wirings (especially copper) of the word line and bit line so that the soft magnetic material layers individually have a uniform, satisfactory thickness, and further they are deposited with improved uniformity on the surface with which the electroless plating solution is in contact, and therefore the uniformity of cladding is improved at not only the bottom surface but also the sidewall of a wiring trench.
摘要翻译：一种磁存储器件及其制造方法，不仅可以实现存储灵敏度的提高和功耗的降低，而且可以实现具有低电阻和高可靠性的埋地布线以稳定的方式缩短时间。通过化学镀形成形成字线的包层结构的软磁性层和构成MRAM的位线，并且在字线和位线的主布线（特别是铜）周围形成软磁性材料层，使得软磁性材料层分别具有均匀且令人满意的厚度，并且在化学镀溶液接触的表面上进一步沉积具有改善的均匀性，因此不仅底面而且包覆层的均匀性均得到改善布线沟槽的侧壁。

28. 发明授权

US07169845B2 Polymerization regulators and compositions for resin 有权
标题翻译：聚合调节剂和树脂组合物
公开(公告)号：US07169845B2
公开(公告)日：2007-01-30
申请号：US10297383
申请日：2002-04-04
申请人： Masaki Tamura , Takahiro Matsui , Masanori Shimuta , Yuichi Yoshimura , Motoharu Takeuchi , Hiroshi Horikoshi , Hiroyuki Okada
发明人： Masaki Tamura , Takahiro Matsui , Masanori Shimuta , Yuichi Yoshimura , Motoharu Takeuchi , Hiroshi Horikoshi , Hiroyuki Okada
IPC分类号： C08L81/00 , C08K3/16
CPC分类号： C08G75/08 , C07D331/02
摘要： In the present invention, an episulfide compound having, in one molecule, at least one epithio structure represented by the following Formula 2: wherein R5 is C1–C10 hydrocarbylene or single bond, R6, R7 and R8 are each independently C1–C10 hydrocarbyl or hydrogen, Y is O, S, Se or Te, p is an integer from 1 to 5 and q is an integer from 0 to 5, is polymerized in the presence of a halide of a 13–16 group element of the long periodic table and/or a polymerization regulator represented by the following Formula 1: wherein R1, R2 and R3 are each C1–C10 hydocarbyl or hydrogen, R4 is C1–C10 hydrocarbylene or single bond, X is F, Cl, Br, I, As, SH, OH, C1–C10 alkoxyl, C1–C10 alkylthio, or C1–C10 mercaptoalkythio, and m is an integer from 1 to 5, to produce a cured resin suitable as an optical material. By using the polymerization regulator, the polymerization rate of the episulfide compound can be suitably regulated to obtain a cured resin with less defect. By using the halide, the increase in the viscosity of the starting composition during the storage or the casting operation can be prevented.
摘要翻译：在本发明中，在一个分子中具有由下式2表示的至少一个环硫结构的环硫化合物：其中R 5是C 1 -C 10亚烃基或单键，R 6 R 7和R 8各自独立地为C 1 -C 10烃基或氢，Y为O，S，Se或Te，p为1的整数至5和q为0至5的整数，在长周期表的13-16族元素的卤化物和/或由下式1表示的聚合调节剂的存在下聚合：其中R“ 1，R 2和R 3各自为C 1 -C 10氢碳基或氢，R 4为C 1 -C 10亚烃基或单键，X为F，Cl，Br，I，As，SH，OH，C 1 -C 10烷氧基，C 1 -C 10烷硫基或C 1 -C 10巯基偶氮，m为1〜5的整数，作为光学材料。通过使用聚合调节剂，可以适当调节环硫化合物的聚合速度，得到缺陷少的固化树脂。通过使用卤化物，可以防止在储存或铸造操作期间起始组合物的粘度的增加。

29. 发明授权

US06979645B2 Method of producing a semiconductor device having copper wiring 失效
标题翻译：制造具有铜布线的半导体器件的方法
公开(公告)号：US06979645B2
公开(公告)日：2005-12-27
申请号：US10680668
申请日：2003-10-07
申请人： Hiroshi Horikoshi , Yuji Segawa , Takeshi Nogami
发明人： Hiroshi Horikoshi , Yuji Segawa , Takeshi Nogami
IPC分类号： C23C18/18 , C23C18/32 , C23C18/50 , C25D5/50 , C25D7/12 , H01L21/28 , H01L21/288 , H01L21/3205 , H01L21/44 , H01L21/4763 , H01L21/768 , H01L23/52
CPC分类号： H01L21/76877 , H01L21/288 , H01L21/76849 , H01L21/76873
摘要： A method of producing a semiconductor device capable of suppressing damages by corrosion on wiring in a catalyst process performed in electroless plating processing on a Co base material, etc. in producing a semiconductor device having wiring of Cu, etc., having steps of forming metal wiring including an additive on a first insulation film formed in a semiconductor substrate, and forming on the metal wiring a barrier layer for preventing diffusion of constituting elements of the metal wiring, wherein said additive is an element to reduce corrosion of the metal wiring at the time of forming the barrier layer in the step of forming the metal wiring.
摘要翻译：一种制造半导体器件的方法，该半导体器件能够抑制对在Co基材等的无电解电镀处理中进行的催化剂工艺中的布线的腐蚀的损伤，以制造具有Cu等布线的半导体器件，其具有形成金属的步骤在半导体基板上形成的第一绝缘膜上具有添加剂的布线，在金属布线上形成防止金属布线构成元件扩散的阻挡层，其中，所述添加剂是减少金属布线的腐蚀的元素在形成金属布线的步骤中形成阻挡层的时间。

30. 发明申请

US20050178672A1 Polishing method, polishing device, and method of manufacturing semiconductor equipment 审中-公开
标题翻译：抛光方法，抛光装置以及制造半导体设备的方法
公开(公告)号：US20050178672A1
公开(公告)日：2005-08-18
申请号：US10512205
申请日：2003-04-22
申请人： Shuzo Sato , Takeshi Nogami , Shingo Takahashi , Naoki Komai , Kaori Tai , Hiroshi Horikoshi , Hiizu Ohtorii
发明人： Shuzo Sato , Takeshi Nogami , Shingo Takahashi , Naoki Komai , Kaori Tai , Hiroshi Horikoshi , Hiizu Ohtorii
IPC分类号： B23H5/08 , B23H3/04 , B23H3/08 , C25D3/16 , C25D7/00 , C25F3/02 , C25F3/22 , C25F7/00 , H01L21/304 , H01L21/306 , H01L21/3063 , B23H3/00
CPC分类号： C25F3/02 , B24B37/042 , B24B37/046 , C25F7/00 , H01L21/30625 , H01L21/3063
摘要： The object is to make it possible to pass an electric current to the object of polishing with a stable current density distribution up to the end point of polishing, to use the same plating apparatus, cleaning apparatus and other apparatuses as those conventionally used, and to carry out the conventional manufacturing process flow. A substrate (1) provided with a metallic film (2) and a opposite electrode (3) are disposed oppositely to each other with a predetermined distance therebetween in an electrolytic solution, and an electric current is passed to the metallic film (2) through the electrolytic solution by an anode (4) set out of contact with the metallic film (2), so as to electropolish the metallic film (2). Simultaneously with the electropolishing, wiping is conducted by sliding a pad on the metallic film.
摘要翻译：本发明的目的是使得可以以直到抛光终点的稳定的电流密度分布将电流传递到抛光对象，使用与常规使用的相同的电镀装置，清洁装置和其他装置，并且执行常规制造工艺流程。设置有金属膜（2）和相对电极（3）的基板（1）在电解液中彼此相对地设置有预定距离，并且电流通过金属膜（2）通过所述电解液通过与所述金属膜（2）不接触的阳极（4），以使所述金属膜（2）电镀。在电抛光的同时，通过在金属膜上滑动垫来进行擦拭。

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