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21. 发明专利

NL1031119C2 Blootstellingswerkwijze van een patroon en inrichting. 未知
公开(公告)号：NL1031119C2
公开(公告)日：2008-02-12
申请号：NL1031119
申请日：2006-02-10
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , YAMAGUCHI TSUYOSHI , MARUYAMA SHIGENOBU
IPC分类号： G03F7/20 , G02B26/12

22. 发明专利

DE102008038835A1 未知
公开(公告)号：DE102008038835A1
公开(公告)日：2009-03-26
申请号：DE102008038835
申请日：2008-08-13
申请人： HITACHI VIA MECHANICS LTD
发明人： NAITO YOSHITATSU , SUZUKI MITSUHIRO , KATOH TOMOTSUGU
IPC分类号： G03F7/20 , H05K3/00
摘要： A laser beam direct imaging apparatus and an imaging method which can precisely determine a back-surface-side position with respect to a front-surface-side position even if any kind of photosensitive material is used. In the laser direct imaging apparatus, a laser beam is deflected toward a main scanning direction (X-axis direction) while a workpiece mounted on a table is moved in a sub-scanning direction (Y-axis direction) so that a pattern is imaged on the surface of the workpiece. Hollow pins are disposed on the table so that the tips of the hollow pins 20 project over the surface of the table by a predetermined distance. The workpiece is sucked onto the table so that indentations (indentations by the tips of the hollow pins) are formed on the back surface of the workpiece. When a pattern is imaged on the back surface, imaging is performed with reference to the indentations.

23. 发明专利

GB2413393B Pattern exposure method comprising sequentially exposing a location to at least two beam spots from a scanning beam array 未知
公开(公告)号：GB2413393B
公开(公告)日：2008-05-14
申请号：GB0504957
申请日：2005-03-10
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , UCHIYAMA BUNJI , YAMAGUCHI TSUYOSHI
IPC分类号： G02B26/10 , G03F7/20 , G02B26/12 , G03B27/54 , G03F7/22
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

24. 发明专利

DE102005011339A1 未知
公开(公告)号：DE102005011339A1
公开(公告)日：2005-10-20
申请号：DE102005011339
申请日：2005-03-11
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , UCHIYAMA BUNJI , YAMAGUCHI TSUYOSHI
IPC分类号： G02B26/10 , G02B26/12 , G03B27/54 , G03F7/20 , G03F7/22
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

25. 发明专利

DE102008038837A1 未知
公开(公告)号：DE102008038837A1
公开(公告)日：2009-04-30
申请号：DE102008038837
申请日：2008-08-13
申请人： HITACHI VIA MECHANICS LTD
发明人： NAITO YOSHITATSU , OSHIDA YOSHITADA , SUZUKI MITSUHIRO
IPC分类号： G03F7/20
摘要： A laser direct imaging apparatus which can expose photosensitive materials having various sensitivities and which can correct an imaging position in accordance with deformation of a workpiece. In the laser direct imaging apparatus, the workpiece is moved in a sub-scanning direction while a cylindrical lens is used to converge a laser beam, which has been modulated based on raster data, in the sub-scanning direction and deflect the laser beam toward a main scanning direction so as to image a desired pattern on the workpiece. The cylindrical axis of the cylindrical lens is designed to be able to rotate horizontally and to be able to change an angle with respect to the main scanning direction.

26. 发明专利

GB2445282B Pattern exposure method and pattern exposure apparatus 未知
公开(公告)号：GB2445282B
公开(公告)日：2008-11-05
申请号：GB0725243
申请日：2005-03-10
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , UCHIYAMA BUNJI , YAMAGUCHI TSUYOSHI
IPC分类号： G02B26/10 , G03F7/20 , G02B26/12 , G03B27/54 , G03F7/22
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

27. 发明专利

GB2442821B A pattern exposure apparatus comprising a multi-beam spot forming optical system 未知
公开(公告)号：GB2442821B
公开(公告)日：2008-10-15
申请号：GB0714234
申请日：2005-03-10
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , UCHIYAMA BUNJI , YAMAGUCHI TSUYOSHI
IPC分类号： G02B26/10 , G03F7/20 , G02B26/12 , G03B27/54 , G03F7/22

28. 发明专利

DE102007024961A1 未知
公开(公告)号：DE102007024961A1
公开(公告)日：2007-12-06
申请号：DE102007024961
申请日：2007-05-30
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , YAMAGUCHI TSUYOSHI , MARUYAMA SHIGENOBU
IPC分类号： G02B26/10 , G02B17/04 , G03F7/20
摘要： A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.

29. 发明专利

DE102006006797A1 未知
公开(公告)号：DE102006006797A1
公开(公告)日：2006-09-28
申请号：DE102006006797
申请日：2006-02-14
申请人： HITACHI VIA MECHANICS LTD
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITUHIRO , YAMAGUCHI TSUYOSHI , MARUYAMA SHIGENOBU
IPC分类号： G02B26/10

30. 发明专利

JP2009210726A Maskless exposure apparatus 审中-公开
标题翻译： MASKLESS EXPOSURE APPARATUS
公开(公告)号：JP2009210726A
公开(公告)日：2009-09-17
申请号：JP2008052273
申请日：2008-03-03
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITSUHIRO
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a maskless exposure apparatus capable of aligning optical axes of beams exiting from the respective semiconductor lasers into parallel beams with high work efficiency even when a large number of semiconductor lasers are used as a light source. SOLUTION: Each group of a plurality of laser light sources (LD) 12 is provided with a beam angle controlling means 2 comprising a shaping lens 13 that adjusts an exiting angle of a laser beam into a desired angle, controlling lenses 2011, 2012 and a holding means of the controlling lens 2012, the means capable of positioning the controlling lens 2012 in a direction orthogonal to the optical axis. The beam angle controlling means 2 is disposed between the laser light source 12 and an interaxial pitch changing device 14 in such a manner that the optical axes of the controlling lenses 2011, 2012 are parallel to a designed optical axis of the laser light source 12. The optical axis of the laser beam is aligned parallel to the designed optical axis by moving the controlling lens 2012 in a direction orthogonal to the optical axis. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：即使当使用大量的半导体激光器作为光源时，提供一种能够将从各个半导体激光器退出的光束的光轴以高工作效率对准的无掩模曝光装置。解决方案：多个激光源（LD）12中的每一组设置有光束角度控制装置2，该光束角控制装置2包括将激光束的出射角调节到期望角度的成形透镜13，控制透镜2011， 2012和控制透镜2012的保持装置，能够将控制透镜2012定位在与光轴正交的方向上的装置。光束角度控制装置2以控制透镜2011，2012的光轴与激光光源12的设计光轴平行的方式设置在激光光源12和轴间间距改变装置14之间。通过在与光轴正交的方向上移动控制透镜2012，激光束的光轴平行于设计的光轴对准。版权所有（C）2009，JPO＆INPIT

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