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    • 22. 发明授权
    • Surround-gate semiconductor device encapsulated in an insulating medium
    • 封装在绝缘介质中的环绕栅极半导体器件
    • US06969878B2
    • 2005-11-29
    • US10409653
    • 2003-04-08
    • Philippe CoronelStephane MonfrayThomas Skotnicki
    • Philippe CoronelStephane MonfrayThomas Skotnicki
    • H01L21/336H01L29/786H01L21/84
    • H01L29/66772H01L29/78648H01L29/78654
    • A semiconductor device is provided that includes a semiconductor channel region extending above a semiconductor substrate in a longitudinal direction between a semiconductor source region and a semiconductor drain region, and a gate region extending in the transverse direction, coating the channel region, and insulated from the channel region. The source, channel, and drain regions are formed in a continuous semiconductor layer that is approximately plane and parallel to the upper surface of the substrate. Additionally, the source, drain, and gate regions are coated in an insulating coating so as to provide electrical insulation between the gate region and the source and drain regions, and between the substrate and the source, drain, gate, and channel regions. Also provided is an integrated circuit that includes such a semiconductor device, and a method for manufacturing such a semiconductor device.
    • 提供一种半导体器件,其包括在半导体源极区域和半导体漏极区域之间沿纵向方向在半导体衬底上方延伸的半导体沟道区域和在横向方向上延伸的栅极区域,涂覆沟道区域并与 渠道区域。 源极,沟道和漏极区域形成在大致平面并平行于衬底的上表面的连续半导体层中。 此外,源极,漏极和栅极区域被涂覆在绝缘涂层中,以便在栅极区域和源极和漏极区域之间以及衬底与源极,漏极,栅极和沟道区域之间提供电绝缘。 还提供了一种包括这种半导体器件的集成电路及其制造方法。
    • 25. 发明授权
    • Method for manufacturing a transistor with parallel semiconductor nanofingers
    • 制造具有并联半导体纳米装置的晶体管的方法
    • US08460978B2
    • 2013-06-11
    • US12063288
    • 2006-08-07
    • Philippe CoronelJessy BustosRomain Wacquez
    • Philippe CoronelJessy BustosRomain Wacquez
    • H01L21/00H01L27/01
    • H01L29/785H01L29/42392H01L29/66772
    • A method of producing a transistor having parallel semiconductor nanofingers. The method includes: forming a monocrystalline layer of a semiconductor material on a layer of a subjacent material which can be selectively etched in relation to the monocrystalline layer; etching parallel partitions in the monocrystalline layer and in the subjacent layer and continuing said etching operation in order to hollow out part of the subjacent layer of material; filling the gap between the partitions and the hollowed-out part with a first insulating material; defining a central part of the partitions and removing the first insulating material from around the central part of the monocrystalline layer, thereby forming a finger of semiconductor material; and filling and coating the central part with a conductor material.
    • 一种制造具有并联半导体纳米装置的晶体管的方法。 该方法包括:在可以相对于单晶层选择性地蚀刻的下层材料层上形成半导体材料的单晶层; 蚀刻单晶层和下层中的平行隔板,并继续进行所述蚀刻操作,以便中断部分下层材料; 用第一绝缘材料填充隔板和中空部分之间的间隙; 限定隔板的中心部分,并且从单晶层的中心部分周围去除第一绝缘材料,从而形成半导体材料的手指; 并用导体材料填充和涂覆中心部分。