会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 21. 发明授权
    • Control method for injection molding machines
    • 注塑机的控制方法
    • US5482662A
    • 1996-01-09
    • US152859
    • 1993-11-16
    • Nobuyuki NakamuraTsuyoshi Arai
    • Nobuyuki NakamuraTsuyoshi Arai
    • B22D17/32B29C45/48B29C45/50B29C45/76G05B11/36
    • B29C45/76
    • When an injection speed (final control amount) of a screw as an object subjected to control which is controlled by an actuator, for example, an injection cylinder is controlled so as to be a set value of a previously set molding condition. An intermediate control amount for operating the injection cylinder, for example, a valve differential pressure of a servo valve is detected. An instruction value for operating and controlling the injection cylinder is determined by calculation processing by a computer functional unit on the basis of the detected valve differential pressure and the above-mentioned set value Vs. The determined instruction value is used to operate and control the injection cylinder. In addition, the injection speed is detected, and when a detected value of the detected injection speed reaches a previously set target value, feedback control is made on the basis of the detected value and the set value. Thereby the control similar to feedforward control is made in the transition period, while the feedback control is used together in the steady period, or switching to the feedback control only is performed.
    • 当作为被致动器控制的控制对象的螺杆(例如注射缸)的喷射速度(最终控制量)被控制为预先设定的成型条件的设定值时。 检测用于操作注射缸的中间控制量,例如伺服阀的阀压差。 用于操作和控制注射缸的指令值由计算机功能单元基于检测到的阀压差和上述设定值Vs的计算处理来确定。 确定的指示值用于操作和控制注射缸。 另外,检测出喷射速度,当检测出的喷射速度的检测值达到预先设定的目标值时,根据检测值和设定值进行反馈控制。 因此,在过渡期间进行与前馈控制相似的控制,而反馈控制在稳定周期中一起使用,或仅切换到反馈控制。
    • 26. 发明授权
    • Idle seek calibration method for magnetic disk drive and magnetic disk drive with an intermission calibration
    • 用于中断校准的磁盘驱动器和磁盘驱动器的空闲寻道校准方法
    • US07375917B1
    • 2008-05-20
    • US09517176
    • 2000-03-02
    • Yoshikatsu FujiiTsuyoshi AraiToshiyuki KikutaTakao HoriguchiShinji Matsushita
    • Yoshikatsu FujiiTsuyoshi AraiToshiyuki KikutaTakao HoriguchiShinji Matsushita
    • G11B5/55
    • G11B19/00G11B5/5534G11B19/046
    • When an idle seek operation of a magnetic disk drive is executed under a velocity control utilizing a back electromotive force of a VCM actuator, the accuracy of the velocity control is deteriorated due to temperature variation of the VCM. To eliminate this disadvantage, a calibration of the velocity control is executed by using control information, such as a track number read from the magnetic disk medium. After the velocity control has been executed for an appointed period, by detecting the back electromotive force from the VCM actuator, an MR sense current and a power of a read write LSI are turned on for a time, positioning information on the magnetic disk medium is read out, parameters to be used for the velocity control are calibrated, and thus a stability of the control can be obtained. Hereby, because the positioning information on the magnetic disk medium is not used constantly, the power consumption during the idle seek operation is reduced, and a stable control of the movement can be obtained as well. For a portable system such as a notebook type personal computer in which a magnetic disk drive is employed, the operation is improved with respect to the use of a battery.
    • 当利用VCM致动器的反电动势的速度控制来执行磁盘驱动器的空闲搜索操作时,由于VCM的温度变化,速度控制的精度降低。 为了消除这种缺点,通过使用诸如从磁盘介质读取的轨道号等控制信息来执行速度控制的校准。 在指定时间段内执行速度控制后,通过检测来自VCM致动器的反向电动势,MR读取电流和读取写入LSI的功率一段时间被打开,磁盘介质上的定位信息为 读出,用于速度控制的参数被校准,因此可以获得控制的稳定性。 因此,由于不是不断地使用磁盘介质上的定位信息,因此减少了空闲寻找操作期间的功耗,并且还可以获得稳定的运动控制。 对于诸如使用磁盘驱动器的笔记本式个人计算机的便携式系统,关于使用电池的操作得到改善。
    • 29. 发明申请
    • Exposure apparatus and device manufacturing method
    • 曝光装置和装置制造方法
    • US20060209282A1
    • 2006-09-21
    • US11376241
    • 2006-03-16
    • Tsuyoshi Arai
    • Tsuyoshi Arai
    • G03B27/42
    • G03F7/70341
    • An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and said projection optical system with a space between said projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space; a supply path configured to supply the liquid to said supply nozzle; a bypass which branches from said supply path; and a supply control valve configured to change a flow rate of the liquid supplied from said supply path to said supply nozzle and a flow rate of the liquid supplied from said supply path to said bypass.
    • 曝光装置具有投影光学系统,其配置为将掩模版图案投影到基板上,并且通过所述掩模版和所述投影光学系统将所述基板曝光于所述投影光学系统和填充有液体的所述基板之间的空间。 该装置包括:供给喷嘴,其构造成向该空间供给液体; 供给路径,其构造成将液体供给到所述供给喷嘴; 从所述供应路径分支的旁路; 以及供给控制阀,其被配置为改变从所述供应路径供应到所述供应喷嘴的液体的流量以及从所述供应路径供应到所述旁路的液体的流量。