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21. 发明申请

WO1995020243A1 ELECTROSTATIC DISCHARGE PROTECTION OF ISFET SENSORS 审中-公开
标题翻译：静电放电保护ISFET传感器
公开(公告)号：WO1995020243A1
公开(公告)日：1995-07-27
申请号：PCT/US1995000426
申请日：1995-01-12
申请人： GENERAL SIGNAL CORPORATION , BAXTER, Ronald, D. , CONNERY, James, G. , FOGEL, John, D. , SILVERTHORNE, Spencer, W.
发明人： GENERAL SIGNAL CORPORATION
IPC分类号： H01L21/70
CPC分类号： H01L27/0251 , G01N27/4148 , H01L27/0248 , H01L2924/0002 , H01L2924/00
摘要： Methods, apparatus and chip fabrication techniques are described which provide electrostatic discharge (ESD) protection to ion-sensitive field effect transistors (ISFET) based device (250) used to selectively measure ions in liquid (299). According to one aspect of the invention, an ESD protection circuit, made up of conventional protective elements (201, 202, 206), is integrated onto the same silicon chip on which ISFET (250) is formed, along with interface (203) that is in contact with liquid (299) being measured and which does not open up paths for D.C. leakage currents between ISFET (250) and liquid (299). According to a preferred embodiment of the invention, a capacitor structure is used as interface (203) between protection circuit (201, 202, 206) and liquid sample (299). Further aspects of the invention are directed to methods per se for providing ESD protection for ISFET sensors utilizing interface means (203) (e.g., capacitor structure) referred to hereinabove, and processes for fabricating the novel interface on a silicone wafer.
摘要翻译：描述了为用于选择性地测量液体中的离子（299）的离子敏感场效应晶体管（ISFET）装置（250）提供静电放电（ESD）保护的方法，装置和芯片制造技术。根据本发明的一个方面，由常规保护元件（201,202,206）组成的ESD保护电路与形成有ISFET（250）的同一硅片集成在一起，以及界面（203）以及界面与被测量的液体（299）接触，并且不会打开ISFET（250）和液体（299）之间的直流泄漏电流的路径。根据本发明的优选实施例，电容器结构用作保护电路（201,202,206）和液体样品（299）之间的接口（203）。本发明的其它方面涉及利用上文提到的接口装置（203）（例如，电容器结构）为ISFET传感器提供ESD保护的方法以及用于在硅晶片上制造新界面的工艺。

22. 发明申请

WO1994027823A1 MULTI-HEAD DIE BONDING SYSTEM 审中-公开
标题翻译：多头连接系统
公开(公告)号：WO1994027823A1
公开(公告)日：1994-12-08
申请号：PCT/US1994005992
申请日：1994-05-27
申请人： GENERAL SIGNAL CORPORATION
发明人： GENERAL SIGNAL CORPORATION , BANTZ, George, H. , LAPAT, Jeffrey, A.
IPC分类号： B32B35/00
CPC分类号： H01L21/67138 , B23Q39/042 , Y10T29/53174 , Y10T29/53187 , Y10T29/53191 , Y10T29/53261 , Y10T156/17 , Y10T156/1702 , Y10T156/1768
摘要： A multi-tool bonder having a plurality of die heads (10A, 10B, 10C) flexibly mounted on a conveyor (12A, 12B) which spaces and moves the heads along a path which includes a plurality of die processing stations (14, 16, 18). An alignment mechanism (70) is provided at each stationary processing station for aligning the head at a fixed position along the path at the station. A controller controls the conveyor to position the plurality of heads at the stations and controls operation of the heads at the stations.
摘要翻译：一种具有多个模头（10A，10B，10C）的多工具连接器，其灵活地安装在沿着包括多个模具处理站（14,16， 18）。在每个固定处理站设置对准机构（70），用于将头沿着站点处的路径的固定位置对准。控制器控制输送机将多个头部定位在工位处，并控制工位处的头部的操作。

23. 发明申请

WO1991018312A1 UNIT MAGNIFICATION OPTICAL SYSTEM WITH IMPROVED REFLECTIVE RETICLE 审中-公开
标题翻译：改进反射镜的单位放大光学系统
公开(公告)号：WO1991018312A1
公开(公告)日：1991-11-28
申请号：PCT/US1991003226
申请日：1991-05-09
申请人： GENERAL SIGNAL CORPORATION
发明人： GENERAL SIGNAL CORPORATION , MARKLE, David, A.
IPC分类号： G02B17/00
CPC分类号： G03F1/62 , G02B13/26 , G02B17/008 , G02B17/08 , G02B17/0892 , G03F1/26 , G03F1/52 , G03F7/70225 , G03F7/70283
摘要： An optical projection system has been provided which is particularly suited for use in microlithography and includes a source of exposure energy (40) for generating a beam of energy. A primary lens (50) and mirror are located in the path of the beam for receiving the beam and passing only a portion of the beam therethrough. A refractive lens group (58) is located in the path of the portion of the beam for receiving and transmitting that portion. A reticle element (80) is located in the path of the portion of the beam and has a uniform thickness having a pattern on one surface thereof and an unpatterned portion adjacent thereto. The reticle element (80) is positioned for permitting the portion of the beam to pass through its thickness and for reflecting the portion of the beam back through its thickness and the refractive lens group (58) to primary lens and mirror (50).
摘要翻译：已经提供了一种光学投影系统，其特别适用于微光刻，并且包括用于产生能量束的曝光能量源（40）。主透镜（50）和反射镜位于光束的路径中，用于接收光束并且仅使一部分光束通过其中。折射透镜组（58）位于用于接收和传输该部分的光束部分的路径中。光栅元件（80）位于光束的部分的路径中，并且具有在其一个表面上具有图案的均匀厚度和与其相邻的未图案化部分。光栅元件（80）被定位成允许光束的一部分穿过其厚度并且用于将光束的该部分反射回其厚度，并将折射透镜组（58）反射到主透镜和反射镜（50）。

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