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    • 25. 发明授权
    • Lithographic apparatus, radiation system and filter system
    • 平版印刷设备,辐射系统和过滤系统
    • US07365345B2
    • 2008-04-29
    • US11317242
    • 2005-12-27
    • Arnoud Cornelis Wassink
    • Arnoud Cornelis Wassink
    • G21G4/00
    • G03F7/70916G03F7/70858H05G2/001
    • A filter system for filtering debris particles out of a predetermined cross-section of the radiation emitted by a radiation source of a lithographic apparatus includes a first set of foils and a second set of foils for trapping the debris particles, and a first heat sink and a second heat sink. Each foil of the first set is thermally connected to the first heat sink, and each foil of the second set is thermally connected to the second heat sink, so that heat is conducted substantially towards the first heat sink through each foil of the first set, and heat is conducted substantially towards the second heat sink through each foil of the second set. The first set extend substantially in a first section of the predetermined cross-section, and the second set extend substantially in a second section of the predetermined cross-section. The first and second sections are substantially non-overlapping.
    • 用于从由光刻设备的辐射源发射的辐射的预定横截面中过滤碎屑颗粒的过滤系统包括第一组箔和用于捕获碎屑颗粒的第二组箔,以及第一散热器和 第二个散热片。 第一组的每个箔热连接到第一散热器,并且第二组的每个箔热连接到第二散热器,使得热量基本上朝向第一组的每个箔的第一散热器传导, 并且基本上通过第二组的每个箔片向第二散热器传导热量。 第一组件基本上在预定横截面的第一部分中延伸,并且第二组件基本上在预定横截面的第二部分中延伸。 第一和第二部分基本上不重叠。