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21. 发明授权

US07542217B2 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光束整形单元
公开(公告)号：US07542217B2
公开(公告)日：2009-06-02
申请号：US11015312
申请日：2004-12-17
申请人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
发明人： Wolfgang Singer , Markus Deguenther , Birgit Kuerz , Rafael Egger , Johannes Wangler , Manfred Maul
IPC分类号： G02B13/08 , G02B3/02 , G02B9/00 , G02B3/00 , G03B27/54
CPC分类号： G03F7/70108 , G03F7/70183
摘要： A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.
摘要翻译：用于微光刻投影曝光装置的照明系统的光束整形单元包括具有第一光束重塑表面的第一光束重塑元件和具有面向第一光束重塑表面的第二光束重塑表面的第二光束重塑元件。两个光束整形表面相对于光束整形单元的光轴旋转对称。至少第一光束整形表面具有凹或凸曲面的区域。

22. 发明申请

US20090021716A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置照明系统
公开(公告)号：US20090021716A1
公开(公告)日：2009-01-22
申请号：US12190308
申请日：2008-08-12
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
摘要翻译：公开了用于微光刻投影曝光装置的照明系统，以及相关系统，组件和方法。在一些实施例中，照明系统包括一个或多个散射结构和产生多个次级光源的光学积分器。

23. 发明申请

US20080225921A1 Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light 有权
公开(公告)号：US20080225921A1
公开(公告)日：2008-09-18
申请号：US11792099
申请日：2005-12-01
申请人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
发明人： Matthias Kuss , Damian Fiolka , Gerd Reisinger , Manfred Maul , Vladimir Davydenko
IPC分类号： G03F7/20 , H01S3/08 , H01S3/03
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70583
摘要： A beam delivery system of a projection exposure system comprises a laser generating a beam of laser light from a plurality of longitudinal laser modes in a cavity, wherein light generated by a single longitudinal laser mode has an average line width λlat, wherein the laser light of the beam has, at each of respective lateral positions of the beam, a second line width λlat corresponding to lateral laser modes, and wherein the laser light of the beam has, when averaged over a whole cross section thereof, a line width λb corresponding to plural lateral laser modes, and wherein λm

24. 发明授权

US07408622B2 Illumination system and polarizer for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统和偏振器
公开(公告)号：US07408622B2
公开(公告)日：2008-08-05
申请号：US10994141
申请日：2004-11-19
申请人： Damian Fiolka , Axel Scholz , Manfred Maul
发明人： Damian Fiolka , Axel Scholz , Manfred Maul
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70058 , G03F7/70566
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).
摘要翻译：一种用于微光刻投影曝光装置的照明系统，包括用于产生投影光的光源（1），用于掩蔽掩模版（R）的掩模装置（5）和用于使掩蔽装置（5）成像成像的掩蔽物镜标线（R）。用于产生线性偏振光的偏振器（10）布置在掩蔽物镜（6）中。偏振器（10）可以包括例如以彼此成角度布置的偏振选择性分束层（54,56; 154,156; 292,294），其对于第一偏振状态的光（68 ）并且以不同的第二偏振状态（70）反射光。

25. 发明申请

US20070206381A1 System for reducing the coherence of laser radiation 有权
标题翻译：减少激光辐射相干性的系统
公开(公告)号：US20070206381A1
公开(公告)日：2007-09-06
申请号：US10590537
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul , Nils Dieckmann
发明人： Damian Fiolka , Manfred Maul , Nils Dieckmann
IPC分类号： F21S8/00
CPC分类号： G03F7/70583 , G03F7/70058
摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.
摘要翻译：本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射。第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。然后将两个部分光束共同传递到照明平面。除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。谐振器主体设置有具有不同局部相位分布的相位板。

26. 发明申请

US20070206171A1 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20070206171A1
公开(公告)日：2007-09-06
申请号：US11505408
申请日：2006-08-17
申请人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
发明人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

27. 发明申请

US20060146384A1 Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
标题翻译：光束变换系统和包括光束变换系统的照明系统
公开(公告)号：US20060146384A1
公开(公告)日：2006-07-06
申请号：US11271976
申请日：2005-11-14
申请人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
发明人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
IPC分类号： G03H1/08
CPC分类号： G03F7/70183 , G02B5/32 , G02B27/09 , G02B27/0927 , G02B27/0944 , G02B27/095 , G02B27/0977 , G03F7/70108 , G03F7/70566
摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.
摘要翻译：可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射用于转化面。光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。具有转轴表面的Axicon元件可用作转换元件。

28. 发明申请

US20050237623A1 Optical unit for an illumination system of a microlithographic projection exposure apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统的光学单元
公开(公告)号：US20050237623A1
公开(公告)日：2005-10-27
申请号：US11063310
申请日：2005-02-22
申请人： Damian Fiolka , Manfred Maul
发明人： Damian Fiolka , Manfred Maul
IPC分类号： G02B26/08 , G02B27/09 , G02B27/10 , G03F7/20
CPC分类号： G02B27/095 , G02B27/0988 , G03F7/70075 , G03F7/70191
摘要： An optical unit for an illumination system of a microlithographic projection exposure apparatus has a refractive optical element which comprises an arrangement of a plurality of refractive subelements arranged next to one another in a plane. The optical unit also has a shadowing device by which at least one region on the refractive optical element can be deliberately shadowed at least partially. The shadowing makes it possible to control the angular distribution of light passing through the optical unit.
摘要翻译：用于微光刻投影曝光设备的照明系统的光学单元具有折射光学元件，该折射光学元件包括在平面中彼此相邻布置的多个折射子元件的布置。光学单元还具有阴影装置，通过该阴影装置，折射光学元件上的至少一个区域可以至少部分地有意地被遮蔽。阴影使得可以控制通过光学单元的光的角度分布。

29. 发明申请

US20050140958A1 Illumination system and polarizer for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统和偏振器
公开(公告)号：US20050140958A1
公开(公告)日：2005-06-30
申请号：US10994141
申请日：2004-11-19
申请人： Damian Fiolka , Axel Scholz , Manfred Maul
发明人： Damian Fiolka , Axel Scholz , Manfred Maul
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70566
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).
摘要翻译：一种用于微光刻投影曝光装置的照明系统，包括用于产生投影光的光源（1），用于掩蔽掩模版（R）的掩模装置（5）和用于使掩蔽装置（5）成像成像的掩蔽物镜标线（R）。用于产生线性偏振光的偏振器（10）布置在掩蔽物镜（6）中。偏振器（10）可以包括例如以彼此成角度布置的偏振选择性分束层（54,56; 154,156; 292,294），其对于第一偏振状态的光（68 ）并且以不同的第二偏振状态（70）反射光。

30. 发明授权

US09013684B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
公开(公告)号：US09013684B2
公开(公告)日：2015-04-21
申请号：US13556408
申请日：2012-07-24
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G02B26/08 , G01M11/00 , G01N21/55
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
摘要翻译：微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。每个元件基于施加到元件的控制信号偏离入射光束。该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

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