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21. 发明专利

CA2457869A1 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 未知
公开(公告)号：CA2457869A1
公开(公告)日：2003-03-13
申请号：CA2457869
申请日：2002-08-28
申请人： CYMER INC
发明人： HULBURD WILLIAM G , SMITH SCOTT T , KNOWLES DAVID S , BROWN DANIEL J W , OICLES JEFFREY , ERSHOV ALEXANDER I , DAS PLASH P , UJAZDOWSKI RICHARD C , SANDSTROM RICHARD L , ONKELS ECKEHARD D , PARTLO WILLIAM N , NESS RICHARD M , FOMENKOV IGOR V , MYERS DAVID W , ANDERSON STUART L , BESAUCELE HERVE A
IPC分类号： H01S1/00 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate dischar ge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the secon d discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferr ed embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a sing le tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precisio n of less than 0.2 pm.

22. 发明专利

AU1489601A Deep ultraviolet catadioptric anamorphic telescope 未知
公开(公告)号：AU1489601A
公开(公告)日：2001-06-04
申请号：AU1489601
申请日：2000-11-15
申请人： CYMER INC
发明人： SMITH SCOTT T
IPC分类号： G02B13/08 , G02B13/14 , G02B17/08 , G02B27/09 , G03F7/20 , H01S3/00 , H01S3/10 , H01S3/225 , H01S3/08
摘要： A catadioptric anamorphic beam expanding telescope expands an optical beam in a first axis substantially perpendicular to the beam propagation axis, and deflects it in a plane substantially perpendicular to the first axis. The beam expanding telescope can include reflective, refractive, and combined reflective/refractive elements. An embodiment includes an off axis convex spheric reflector and an off axis combined reflective/reflective optical element, commonly known as a Mangin mirror, incorporating a refractive first surface and a reflective rear surface, which compensate for aberrations introduced by the off axis deflection of the beam. The telescope is particularly useful for deep ultraviolet (DUV) applications at wavelengths shorter than about 250 nm. In some applications, the telescope illuminates a diffraction grating or other wavelength dispersive element, aligned to retroreflect a preferential wavelength, thereby providing wavelength narrowing. In some applications a combined telescope and diffraction grating are incorporated within a laser optical cavity, thereby narrowing the output wavelength spectrum of the laser. Embodiments are advantageous for intracavity line narrowing in an electric discharge laser, such as a KrF excimer laser, ArF excimer laser, or F2 molecular laser. Additionally, embodiments in accordance with the present invention provide an improved general purpose DUV beam expander.

23. 发明申请

WO0139337A9 DEEP ULTRAVIOLET CATADIOPTRIC ANAMORPHIC TELESCOPE 审中-公开
标题翻译：深层超声波非线性非线性电缆
公开(公告)号：WO0139337A9
公开(公告)日：2002-08-29
申请号：PCT/US0031323
申请日：2000-11-15
申请人： CYMER INC , SMITH SCOTT T
发明人： SMITH SCOTT T
IPC分类号： G02B13/08 , G02B13/14 , G02B17/08 , G02B27/09 , G03F7/20 , H01S3/00 , H01S3/10 , H01S3/225 , H01S3/08
CPC分类号： G02B17/0856 , G02B17/0892 , G02B19/0028 , G02B19/0033 , G02B19/0095 , G02B27/0911 , G03F7/70575 , H01S3/005
摘要： A catadioptric anamorphic beam expanding telescope (2A, 2B) expands a beam in a first axis substantially perpendicular to the beam propagation axis, and deflects it in a plane substantially perpendicular to the first axis. The beam expanding telescope (2A, 2B) can include reflective, refractive, and combined reflective/refractive elements. An embodiment includes an off axis convex spheric reflector (205) and off axis combined reflective/refractive optical element, commonly known as a Mangin mirror (206), incorporating a refractive first surface and a reflective rear surface, which compensate for aberrations introduced by the off axis deflection of the beam. The telescope is particularly useful for deep ultraviolet (DUV) applications at wavelengths shorter than about 250 nm.
摘要翻译：反射折射变形光束扩展望远镜（2A，2B）在基本上垂直于光束传播轴线的第一轴线上扩展光束，并使其在基本上垂直于第一轴线的平面中偏转。扩束望远镜（2A，2B）可以包括反射，折射和组合的反射/折射元件。一个实施例包括离轴凸球面反射器（205）和离轴组合的反射/折射光学元件，通常称为Mangin镜（206），其包括折射第一表面和反射后表面，其补偿由梁的偏轴偏转。望远镜特别适用于波长短于约250 nm的深紫外（DUV）应用。

24. 发明申请

WO0198012A9 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译： 4千赫气体放电激光器
公开(公告)号：WO0198012A9
公开(公告)日：2002-06-13
申请号：PCT/US0116985
申请日：2001-05-23
申请人： CYMER INC , NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以大约4,000Hz的脉冲速率产生高质量脉冲激光束。一个优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。改进的波长计配有专用软件，可监测输出光束参数，并控制非常快速的PZT驱动调谐镜和脉冲功率充电电压，以将波长和脉冲能量保持在期望的限制范围内。在一个优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间清除来自放电区域的放电碎片。

25. 发明申请

WO02061388A2 HIGH RESOLUTION ETALON-GRATING MONOCHROMATOR SPECTROMETER 审中-公开
标题翻译：高分辨率ETALON-GRATING MONOCHROMATOR SPECTROMETER
公开(公告)号：WO02061388A2
公开(公告)日：2002-08-08
申请号：PCT/US0202453
申请日：2002-01-28
申请人： CYMER INC , SANDSTROM RICHARD L , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BROWN DANIEL J W , SMITH SCOTT T
发明人： SANDSTROM RICHARD L , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BROWN DANIEL J W , SMITH SCOTT T
IPC分类号： G01J3/26 , G01J1/42 , G01J3/12 , G01J3/22 , G01J9/02 , G21K1/06 , H01S3/134 , H01S3/137 , G01N
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating spectrometer or monochromator. A preferred embodiment presents as extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser illuminates an etalon (ET). A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated (L3) and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit (2) and monitored by a light detector (PMT). When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow as about 0.034pm "FWHM" and about 0.091pm "95 percent integral". The etalon and the grating are placed in a leak-tight containment (50) filled with a gas, such a nitrogen or helium.
摘要翻译：高分辨率标准光栅光谱仪或单色仪。优选的实施例在紫外范围内呈现极窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光器的光聚焦成漫射器（D），离散扩散器的散射光照射标准具（ET）。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光被准直（L3），并且准直光照射位于大约Littrow配置中的光栅（GR1），其根据波长分散光。表示对应于所选标准具条纹的波长的分散光的一部分通过第二狭缝（2）并由光检测器（PMT）监测。当标准具和光栅调谐到相同的精确波长时，定义了狭缝功能，其极窄，约0.034pm“FWHM”和约0.091μm“95％积分”。标准具和光栅放置在充满气体（例如氮气或氦气）的密封密封（50）中。

26. 发明申请

WO0198012A3 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译：四吉兹气体放电激光
公开(公告)号：WO0198012A3
公开(公告)日：2002-05-16
申请号：PCT/US0116985
申请日：2001-05-23
申请人： CYMER INC , NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供一种准分子激光器，其能够在约5mJ或更大的脉冲能量下以约4,000Hz的脉冲速率产生高质量的脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的限度内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

27. 发明公开

EP1485686A4 HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
标题翻译：高分辨率光谱测量
公开(公告)号：EP1485686A4
公开(公告)日：2008-09-24
申请号：EP03744588
申请日：2003-01-15
申请人： CYMER INC
发明人： SANDSTROM RICHARD L , ERSHOV ALEXANDER I , PARTLO WILLIAM N , FOMENKOV IGOR V , SMITH SCOTT T , BROWN DANIEL J W
IPC分类号： G01J3/18 , G01J3/26 , G01J1/42 , G01J3/02 , G01J3/12 , G01J3/22 , G01J3/36 , G01J9/00 , G01J9/02 , G21K1/06 , H01S3/134 , H01S3/137
CPC分类号： G01J3/26 , G01J1/4257 , G01J3/02 , G01J3/0205 , G01J3/12 , G01J3/1804 , G01J3/22 , G01J9/02
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.

28. 发明公开

EP1438774A4 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 有权
标题翻译： SEHR SCHMALBANDIGES GASENTLADUNGSLASERSYSTEM MIT ZWEI KAMMERN UND HOHER WIEDERHOLUNGSRATE
公开(公告)号：EP1438774A4
公开(公告)日：2006-03-08
申请号：EP02797839
申请日：2002-08-28
申请人： CYMER INC
发明人： KNOWLES DAVID S , BROWN DANIEL J W , BESAUCELE HERVE A , MYERS DAVID W , ERSHOV ALEXANDER I , PARTLO WILLIAM N , SANDSTROM RICHARD L , DAS PLASH P , ANDERSON STUART L , FOMENKOV IGOR V , UJAZDOWSKI RICHARD C , ONKELS ECKEHARD D , NESS RICHARD M , SMITH SCOTT T , HULBURD WILLIAM G , OICLES JEFFREY
IPC分类号： H01S1/00 , H01S3/225 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/00 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/0943 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/23
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.
摘要翻译：一种注入模块化气体放电激光系统（2），能够以大约4,000Hz或更高的脉冲速率和大约5mJ或更大的脉冲能量产生高质量脉冲束。提供两个独立的放电室，其中一个是主振荡器（10）的一部分，产生非常窄带的种子束，其在第二放电室中放大（12）。这些室可以分开控制，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。 ArF准分子激光器系统中的一个优选实施例被配置为MOPA，并被专门设计用作集成电路光刻的光源。在优选的MOPA实施例中，每个腔室包括单个切向风扇（10A），其提供足够的气流以允许在脉冲之间大约0.25毫秒的更短时间内通过清洁来自放电区域的碎片以4,000Hz或更高的脉冲速率进行操作。主振荡装备有线变窄组件，其具有非常快速的调谐镜，其能够以重复率4000Hz或更大的脉冲到脉冲的基础上控制中心线波长，精度小于0.2μm。

29. 发明公开

EP1339519A4 FOUR KHz GAS DISCHARGE LASER 审中-公开
标题翻译：四KHZ气体放电激光器
公开(公告)号：EP1339519A4
公开(公告)日：2006-06-28
申请号：EP01975156
申请日：2001-05-23
申请人： CYMER INC
发明人： NEWMAN PETER C , DUFFEY THOMAS P , PARTLO WILLIAM N , SANDSTROM RICHARD L , MECHER PAUL C , JOHNS DAVID M , SAETHRE ROBERT B , FLEUROV VLADIMIR B , NESS RICHARD M , RETTIG CURTIS L , SHANNON ROBERT A , UJAZDOWSKI RICHARD C , ROKNI SHAHRYAR , PAN XIAOJIANG J , KULGEYKO VLADIMIR , SMITH SCOTT T , ANDERSON STUART L , ALGOTS JOHN M , SPANGLER RONALD L , FOMENKOV IGOR V
IPC分类号： H01S3/134 , H01S3/225 , G01J1/42 , G01J9/00 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5mJ or greater. A preferred embodiments is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

30. 发明公开

EP1240694A4 LINE NARROWED LASER WITH BIDIRECTION BEAM EXPANSION 有权
标题翻译：双向扩展窄带激光束
公开(公告)号：EP1240694A4
公开(公告)日：2003-08-27
申请号：EP00991696
申请日：2000-12-15
申请人： CYMER INC
发明人： PARTLO WILLIAM N , ERSHOV ALEXANDER I , SMITH SCOTT T
IPC分类号： H01S3/1055 , G03F7/20 , H01S3/04 , H01S3/10 , H01S3/105 , H01S3/134 , H01S3/225 , H01S3/08
CPC分类号： G03F7/70025 , G03F7/70575 , H01S3/0401 , H01S3/10 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/225
摘要： A grating (16) based line narrowing unit with bi-directional beam expansion for the narrowing lasers. In a preferred embodiment a beam from the chamber of the laser is expanded in the horizontal direction with a three-prism beam expander (8, 10, 12) and is expanded in the vertical direction with a single prism (60). A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the two beam expanders into the laser chamber for amplification.

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