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    • 24. 发明授权
    • Integrated optical latch
    • 集成光锁存器
    • US07848601B2
    • 2010-12-07
    • US12718584
    • 2010-03-05
    • Daniel N. Carothers
    • Daniel N. Carothers
    • G02F1/035G02F1/295G02B6/42
    • G02F1/3519G02F1/0147G02F1/225G02F2001/211G02F2203/15
    • Techniques are disclosed for optical switching and data control, without the interaction of electronic switching speeds. In one example embodiment, a common cavity optical latch is provided that that can hold an optical state for an extended period of time, and the operation of which is controlled optically. Optical phase control allows optical modal switching to be employed between two common optical cavities, using incident optical signals and the way in which the cavities manipulate the phase within them to lock in one or the other configuration, thereby forming an optical latch. The optical latch is implemented in an integrated fashion, such as in a CMOS environment.
    • 公开了用于光交换和数据控制的技术,而没有电子切换速度的相互作用。 在一个示例性实施例中,提供了公共空腔光锁存器​​,其可以将光学状态保持延长的时间段,并且其操作被光学地控制。 光学相位控制允许使用入射光学信号在两个公共光学腔之间采用光学模式切换,以及空腔操纵其中的相位以锁定在一个或另一个结构中的方式,从而形成光学锁存器。 光锁存器以集成的方式实现,例如在CMOS环境中。
    • 25. 发明申请
    • Integrated Optical Latch
    • 集成光锁
    • US20100157402A1
    • 2010-06-24
    • US12718584
    • 2010-03-05
    • Daniel N. Carothers
    • Daniel N. Carothers
    • G02F3/00
    • G02F1/3519G02F1/0147G02F1/225G02F2001/211G02F2203/15
    • Techniques are disclosed for optical switching and data control, without the interaction of electronic switching speeds. In one example embodiment, a common cavity optical latch is provided that that can hold an optical state for an extended period of time, and the operation of which is controlled optically. Optical phase control allows optical modal switching to be employed between two common optical cavities, using incident optical signals and the way in which the cavities manipulate the phase within them to lock in one or the other configuration, thereby forming an optical latch. The optical latch is implemented in an integrated fashion, such as in a CMOS environment.
    • 公开了用于光交换和数据控制的技术,而没有电子切换速度的相互作用。 在一个示例性实施例中,提供了公共空腔光锁存器​​,其可以将光学状态保持延长的时间段,并且其操作被光学地控制。 光学相位控制允许使用入射光学信号在两个公共光学腔之间采用光学模式切换,以及空腔操纵其中的相位以锁定在一个或另一个结构中的方式,从而形成光学锁存器。 光锁存器以集成的方式实现,例如在CMOS环境中。
    • 29. 发明申请
    • INTEGRATED OPTICAL LATCH
    • 集成光学锁
    • US20100053712A1
    • 2010-03-04
    • US12201784
    • 2008-08-29
    • Daniel N. Carothers
    • Daniel N. Carothers
    • G02F3/00G02B6/12
    • G02F1/3519G02F1/0147G02F1/225G02F2001/211G02F2203/15
    • Techniques are disclosed for optical switching and data control, without the interaction of electronic switching speeds. In one example embodiment, a common cavity optical latch is provided that that can hold an optical state for an extended period of time, and the operation of which is controlled optically. Optical phase control allows optical modal switching to be employed between two common optical cavities, using incident optical signals and the way in which the cavities manipulate the phase within them to lock in one or the other configuration, thereby forming an optical latch. The optical latch is implemented in an integrated fashion, such as in a CMOS environment.
    • 公开了用于光交换和数据控制的技术,而没有电子切换速度的相互作用。 在一个示例性实施例中,提供了公共空腔光锁存器​​,其可以将光学状态保持延长的时间段,并且其操作被光学地控制。 光学相位控制允许使用入射光学信号在两个公共光学腔之间采用光学模式切换,以及空腔操纵其中的相位以锁定在一个或另一个结构中的方式,从而形成光学锁存器。 光锁存器以集成的方式实现,例如在CMOS环境中。
    • 30. 发明授权
    • Integration CMOS compatible of micro/nano optical gain materials
    • 集成CMOS兼容的微/纳米光学增益材料
    • US08288290B2
    • 2012-10-16
    • US12201618
    • 2008-08-29
    • Daniel N. Carothers
    • Daniel N. Carothers
    • H01L21/302
    • H01S5/026G02B6/13G02B2006/12078G02B2006/12097H01L21/8258Y10T428/31678
    • A method is provided for the integration of an optical gain material into a Complementary metal oxide semiconductor device, the method comprising the steps of: configuring a workpiece from a silicon wafer upon which is disposed an InP wafer bearing an epitaxy layer; mechanically removing the InP substrate; etching the InP remaining on epitaxy layer with hydrochloric acid; depositing at least one Oxide pad on revealed the epitaxy layer; using the Oxide pad as a mask during a first pattern etch removing the epitaxy to an N level; etching with a patterned inductively coupled plasma (ICP) technique; isolating the device on the substrate with additional pattern etching patterning contacts, applying the contacts.
    • 提供了一种用于将光学增益材料集成到互补金属氧化物半导体器件中的方法,所述方法包括以下步骤:从硅晶片配置工件,其上设置有承载外延层的InP晶片; 机械去除InP基板; 用盐酸蚀刻留在外延层上的InP; 沉积至少一个氧化物垫显露外延层; 在第一图案蚀刻期间使用氧化物垫作为掩模,将外延移除到N电平; 用图案化电感耦合等离子体(ICP)技术进行蚀刻; 用附加图案蚀刻图案化触点隔离衬底上的器件,施加触点。