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21. 发明申请

US20110000141A1 Polishing Pad, the Use Thereof and the Method for Manufacturing the Same 有权
标题翻译：抛光垫，其使用方法及其制造方法
公开(公告)号：US20110000141A1
公开(公告)日：2011-01-06
申请号：US12883446
申请日：2010-09-16
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24D11/00 , B24D3/00
CPC分类号： B24D18/00 , B24B37/22 , B24B37/24 , B24D3/26
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。如上所述的抛光垫防止抛光垫从抛光台板或头部分离。抛光垫易于更换，而不会在研磨台板或头部上留下残留物。

22. 发明授权

US07824249B2 Polishing material having polishing particles and method for making the same 有权
标题翻译：具有抛光颗粒的抛光材料及其制造方法
公开(公告)号：US07824249B2
公开(公告)日：2010-11-02
申请号：US11702217
申请日：2007-02-05
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung , Chao-Yuan Tsai
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung , Chao-Yuan Tsai
IPC分类号： B24D15/00 , B24D11/00 , B24B1/00
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles, whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid scratching of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译：本发明涉及具有抛光颗粒的抛光材料及其制造方法。具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和聚合物弹性体。基材具有用于限定多个网格空间的多根纤维。抛光颗粒分布在网格空间中。聚合物弹性体覆盖基材和抛光颗粒，由此在抛光过程中抛光颗粒均匀地分布在抛光工件的表面上。此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的刮擦。此外，基材提供了用于扫掠小磨碎片的效果。

23. 发明授权

US07815491B2 Polishing pad, the use thereof and the method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US07815491B2
公开(公告)日：2010-10-19
申请号：US11754418
申请日：2007-05-29
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24B37/24 , B24B45/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 在膜的上表面形成低渗透性的双组分糊料，用于将基底材料以低渗透性粘附到膜上; 以及形成在膜的下表面上的低渗透性的聚氨酯浆料。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。如上所述的抛光垫防止抛光垫从抛光台板或头部分离。抛光垫易于更换，而不会在抛光台板或头部上留下残留物。

24. 发明授权

US07556555B2 Polishing pad, use thereof and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法及其制造方法
公开(公告)号：US07556555B2
公开(公告)日：2009-07-07
申请号：US11706189
申请日：2007-02-15
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24B7/22 , B24D3/28
CPC分类号： B24B37/24 , B24D3/22 , B24D11/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 以及在所述基材和所述膜的上表面之间形成的低渗透性并嵌入所述基材的纤维中的缓冲层。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。

25. 发明申请

US20080200102A1 Polishing pad, use thereof and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法及其制造方法
公开(公告)号：US20080200102A1
公开(公告)日：2008-08-21
申请号：US11706189
申请日：2007-02-15
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24D11/00 , B24B1/00
CPC分类号： B24B37/24 , B24D3/22 , B24D11/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 以及在所述基材和所述膜的上表面之间形成的低渗透性并嵌入所述基材的纤维中的缓冲层。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。

26. 发明申请

US20080188168A1 Polishing material having polishing particles and method for making the same 有权
标题翻译：具有抛光颗粒的抛光材料及其制造方法
公开(公告)号：US20080188168A1
公开(公告)日：2008-08-07
申请号：US11702217
申请日：2007-02-05
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung , Chao-Yuan Tsai
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung , Chao-Yuan Tsai
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a high polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The high polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译：本发明涉及具有抛光颗粒的抛光材料及其制造方法。具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和高聚合物弹性体。基材具有用于限定多个网格空间的多根纤维。抛光颗粒分布在网格空间中。高分子弹性体覆盖基材和抛光颗粒。由此，抛光粒子在研磨工序中均匀地分布在研磨工件的表面上。此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的划痕。此外，基材提供了用于扫掠小磨碎片的效果。

27. 发明申请

US20080047205A1 METHOD OF PRODUCING POLISHING PAD 有权
标题翻译：生产抛光垫的方法
公开(公告)号：US20080047205A1
公开(公告)日：2008-02-28
申请号：US11859928
申请日：2007-09-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24D3/34
CPC分类号： B24D13/147 , B24B37/30 , B24D11/001
摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
摘要翻译：本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面，其中所述纤维包括芯和围绕所述芯的包层，并且所述包层包含疏水性聚合物; （b）用弹性体溶液浸渍基材的表面; （c）凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体与纤维之间形成多个第一连续孔; （d）使基材的表面平坦化; （e）用条件聚合物溶液浸渍在步骤（d）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

28. 发明申请

US20070010175A1 Polishing pad and method of producing same 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20070010175A1
公开(公告)日：2007-01-11
申请号：US11175212
申请日：2005-07-07
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24B7/30 , B24D11/00 , B24B1/00
CPC分类号： B24D13/147 , B24B37/30 , B24D11/001
摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate; (b) impregnating the surface of the base material with an elastomer solution; (c) curing the elastomer impregnated in the surface of the base material to form a plurality of first continuous pores embedded in the elastomer and fibers; (d) impregnating the surface of the base material and elastomer obtained in the step (c) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
摘要翻译：本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基材的表面; （b）用弹性体溶液浸渍基材的表面; （c）固化浸渍在基材表面的弹性体以形成嵌入弹性体和纤维中的多个第一连续孔; （d）用条件聚合物溶液浸渍在步骤（c）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

29. 发明申请

US20070202780A1 Polishing pad having a surface texture and method and apparatus for fabricating the same 审中-公开
标题翻译：具有表面纹理的抛光垫及其制造方法和装置
公开(公告)号：US20070202780A1
公开(公告)日：2007-08-30
申请号：US11360412
申请日：2006-02-24
申请人： Chung-Ching Feng , Chen-Hsiang Chao , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Ching Feng , Chen-Hsiang Chao , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24D18/00 , B23K26/355 , B24B37/26
摘要： The present invention relates to a polishing pad having a surface texture and a method for fabricating the same. The fabricating method comprises the following steps: (a) providing a substrate which has a surface for polishing an object to be polished; (b) providing a freely movable high-energy laser; and (c) forming a surface texture on the surface of the substrate by using the high-energy laser. Thereby, burrs and deformation of fabricated polishing pad may not occur, and when the polishing pad is used, the slurry can maintain good flowage without scraping the object to be polished. Moreover, the desired surface texture can be fabricated rapidly and correctly by using a high-energy laser with extremely high reproducibility.
摘要翻译：本发明涉及具有表面纹理的抛光垫及其制造方法。制造方法包括以下步骤：（a）提供具有用于抛光待抛光物体的表面的基板; （b）提供可自由移动的高能激光器; 和（c）通过使用高能激光在基板的表面上形成表面纹理。因此，可能不会发生制造的抛光垫的毛刺和变形，并且当使用抛光垫时，浆料可以保持良好的流动性而不刮擦待抛光的物体。此外，可以通过使用具有非常高的再现性的高能激光器来快速且正确地制造所需的表面纹理。

30. 发明申请

US20070155268A1 Polishing pad and method for manufacturing the polishing pad 审中-公开
标题翻译：抛光垫及抛光垫的制造方法
公开(公告)号：US20070155268A1
公开(公告)日：2007-07-05
申请号：US11323651
申请日：2005-12-30
申请人： Chung-Ching Feng , Chen-Hsiang Chao , I-Peng Yao , Yung-Chang Hung , Jyh-Jen Lee
发明人： Chung-Ching Feng , Chen-Hsiang Chao , I-Peng Yao , Yung-Chang Hung , Jyh-Jen Lee
IPC分类号： B32B27/04
CPC分类号： B32B5/18 , B32B5/022 , B32B5/08 , B32B5/20 , B32B5/24 , B32B2262/0246 , B32B2262/0261 , B32B2262/0276 , B32B2262/0284 , B32B2262/12 , B32B2266/0242 , B32B2266/0257 , B32B2266/0264 , B32B2266/0271 , B32B2266/0278 , B32B2266/0285 , B32B2266/06 , B32B2432/00 , Y10T442/2361 , Y10T442/241 , Y10T442/273 , Y10T442/2861 , Y10T442/2893
摘要： A polishing pad includes a non-woven cloth and a continuous porous polymer. The non-woven cloth includes fibers. The polymer includes a plurality of holes communicated with one another. The polymer is cured in and bonded to the non-woven cloth. A surface of the polishing pad is constituted by the fibers of the non-woven cloth and the polymer.
摘要翻译：抛光垫包括无纺布和连续多孔聚合物。无纺布包括纤维。聚合物包括彼此连通的多个孔。聚合物固化并结合到无纺布上。抛光垫的表面由无纺布和聚合物的纤维构成。

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