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21. 发明授权

US07815491B2 Polishing pad, the use thereof and the method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US07815491B2
公开(公告)日：2010-10-19
申请号：US11754418
申请日：2007-05-29
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24B37/24 , B24B45/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 在膜的上表面形成低渗透性的双组分糊料，用于将基底材料以低渗透性粘附到膜上; 以及形成在膜的下表面上的低渗透性的聚氨酯浆料。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。如上所述的抛光垫防止抛光垫从抛光台板或头部分离。抛光垫易于更换，而不会在抛光台板或头部上留下残留物。

22. 发明授权

US07556555B2 Polishing pad, use thereof and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法及其制造方法
公开(公告)号：US07556555B2
公开(公告)日：2009-07-07
申请号：US11706189
申请日：2007-02-15
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24B7/22 , B24D3/28
CPC分类号： B24B37/24 , B24D3/22 , B24D11/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 以及在所述基材和所述膜的上表面之间形成的低渗透性并嵌入所述基材的纤维中的缓冲层。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。

23. 发明申请

US20080200102A1 Polishing pad, use thereof and method for manufacturing the same 有权
标题翻译：抛光垫及其制造方法及其制造方法
公开(公告)号：US20080200102A1
公开(公告)日：2008-08-21
申请号：US11706189
申请日：2007-02-15
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung
IPC分类号： B24D11/00 , B24B1/00
CPC分类号： B24B37/24 , B24D3/22 , B24D11/00
摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.
摘要翻译：本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 以及在所述基材和所述膜的上表面之间形成的低渗透性并嵌入所述基材的纤维中的缓冲层。还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。

24. 发明申请

US20080188168A1 Polishing material having polishing particles and method for making the same 有权
标题翻译：具有抛光颗粒的抛光材料及其制造方法
公开(公告)号：US20080188168A1
公开(公告)日：2008-08-07
申请号：US11702217
申请日：2007-02-05
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung , Chao-Yuan Tsai
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Yung-Chang Hung , Chao-Yuan Tsai
IPC分类号： B24D11/00
CPC分类号： B24B37/26 , B24D11/001
摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a high polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The high polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.
摘要翻译：本发明涉及具有抛光颗粒的抛光材料及其制造方法。具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和高聚合物弹性体。基材具有用于限定多个网格空间的多根纤维。抛光颗粒分布在网格空间中。高分子弹性体覆盖基材和抛光颗粒。由此，抛光粒子在研磨工序中均匀地分布在研磨工件的表面上。此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的划痕。此外，基材提供了用于扫掠小磨碎片的效果。

25. 发明申请

US20080047205A1 METHOD OF PRODUCING POLISHING PAD 有权
标题翻译：生产抛光垫的方法
公开(公告)号：US20080047205A1
公开(公告)日：2008-02-28
申请号：US11859928
申请日：2007-09-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24D3/34
CPC分类号： B24D13/147 , B24B37/30 , B24D11/001
摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
摘要翻译：本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面，其中所述纤维包括芯和围绕所述芯的包层，并且所述包层包含疏水性聚合物; （b）用弹性体溶液浸渍基材的表面; （c）凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体与纤维之间形成多个第一连续孔; （d）使基材的表面平坦化; （e）用条件聚合物溶液浸渍在步骤（d）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

26. 发明申请

US20070010175A1 Polishing pad and method of producing same 审中-公开
标题翻译：抛光垫及其制造方法
公开(公告)号：US20070010175A1
公开(公告)日：2007-01-11
申请号：US11175212
申请日：2005-07-07
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24B7/30 , B24D11/00 , B24B1/00
CPC分类号： B24D13/147 , B24B37/30 , B24D11/001
摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate; (b) impregnating the surface of the base material with an elastomer solution; (c) curing the elastomer impregnated in the surface of the base material to form a plurality of first continuous pores embedded in the elastomer and fibers; (d) impregnating the surface of the base material and elastomer obtained in the step (c) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
摘要翻译：本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基材的表面; （b）用弹性体溶液浸渍基材的表面; （c）固化浸渍在基材表面的弹性体以形成嵌入弹性体和纤维中的多个第一连续孔; （d）用条件聚合物溶液浸渍在步骤（c）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

27. 发明授权

US08491359B2 Polishing pad, use thereof and method for making the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08491359B2
公开(公告)日：2013-07-23
申请号：US12862098
申请日：2010-08-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
IPC分类号： B32B5/32 , B24B37/22
CPC分类号： B24B37/22 , B24D18/00 , Y10T428/24983 , Y10T428/249981
摘要： The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
摘要翻译：抛光垫技术领域本发明涉及一种抛光垫，其包括用于研磨基板的抛光片，包括多个孔的缓冲片和用于将缓冲片粘附到抛光片的粘合剂; 其中所述粘合剂通过聚合具有流动性的大分子形成。还提供了一种抛光包括使用抛光垫的基板的方法和用于制造上述抛光垫的方法。

28. 发明授权

US07972396B2 Method of producing polishing pad 有权
标题翻译：抛光垫的生产方法
公开(公告)号：US07972396B2
公开(公告)日：2011-07-05
申请号：US11859928
申请日：2007-09-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung
IPC分类号： B24D3/34
CPC分类号： B24D13/147 , B24B37/30 , B24D11/001
摘要： The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
摘要翻译：本发明涉及一种制造抛光垫的方法，包括以下步骤：（a）提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面，其中所述纤维包括芯和围绕所述芯的包层，并且所述包层包含疏水性聚合物; （b）用弹性体溶液浸渍基材的表面; （c）凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体和纤维之间形成多个第一连续孔; （d）使基材的表面平坦化; （e）用条件聚合物溶液浸渍在步骤（d）中获得的基材和弹性体的表面; 和（e）固化浸渍在基材表面和弹性体表面的状态聚合物，并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。

29. 发明申请

US20110070814A1 Method for Manufacturing Polishing Pad and Polishing Pad 有权
标题翻译：抛光垫和抛光垫的制造方法
公开(公告)号：US20110070814A1
公开(公告)日：2011-03-24
申请号：US12887363
申请日：2010-09-21
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang
IPC分类号： B24D3/28 , B24D11/00
CPC分类号： B24B37/24
摘要： The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.
摘要翻译：本发明涉及一种抛光垫的制造方法。本发明的方法包括从聚氨酯溶液形成抛光层的步骤，其固体含量大于约90重量％，并在约130℃至约170℃的温度下干燥聚氨酯溶液。本发明还提供通过上述方法制造的抛光垫。当应用根据本发明的抛光垫时，避免了由于抛光颗粒残留而刮擦待抛光的基板的表面的缺陷，并且抛光的基板的平坦度提高并且不良率也被消除。

30. 发明申请

US20110045744A1 Polishing Pad, Use Thereof and Method for Making the Same 有权
标题翻译：抛光垫，使用方法和制作方法
公开(公告)号：US20110045744A1
公开(公告)日：2011-02-24
申请号：US12862098
申请日：2010-08-24
申请人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
发明人： Chung-Chih Feng , I-Peng Yao , Yung-Chang Hung , Lyang-Gung Wang , Wen-Chieh Wu
IPC分类号： B24D11/00 , B24B1/00
CPC分类号： B24B37/22 , B24D18/00 , Y10T428/24983 , Y10T428/249981
摘要： The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.
摘要翻译：抛光垫技术领域本发明涉及一种抛光垫，其包括用于研磨基板的抛光片，包括多个孔的缓冲片和用于将缓冲片粘附到抛光片的粘合剂; 其中所述粘合剂通过聚合具有流动性的大分子形成。还提供了一种抛光包括使用抛光垫的基板的方法和用于制造上述抛光垫的方法。

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