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21. 发明授权

US08218284B2 Apparatus for increasing electric conductivity to a semiconductor wafer substrate when exposure to electron beam 有权
标题翻译：用于在暴露于电子束时增加对半导体晶片衬底的导电性的装置
公开(公告)号：US08218284B2
公开(公告)日：2012-07-10
申请号：US12179560
申请日：2008-07-24
申请人： Zhong-Wei Chen , Yi Xiang Wang , Juying Dou
发明人： Zhong-Wei Chen , Yi Xiang Wang , Juying Dou
IPC分类号： H01L21/683 , B23B31/28
CPC分类号： H01J37/026 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/3174 , H01J2237/0044 , H01J2237/2817 , Y10T279/17923 , Y10T279/23
摘要： An apparatus for increasing electric conductivity to a wafer substrate when exposures to electron beam irradiation is disclosed. More specifically, a more free mechanical contact between a wafer and electric contact pins (within an electrostatic chuck) is provided to significantly reduce the scratch and damage on the wafer backside.
摘要翻译：公开了当暴露于电子束照射时增加晶片衬底的导电性的装置。更具体地，提供晶片和电接触销（在静电卡盘内）之间更自由的机械接触，以显着减少晶片背面的划痕和损伤。

22. 发明授权

US08022609B2 Thermal field emission cathode 有权
标题翻译：热场发射阴极
公开(公告)号：US08022609B2
公开(公告)日：2011-09-20
申请号：US12145036
申请日：2008-06-24
申请人： Zhong-Wei Chen , Juying Dou
发明人： Zhong-Wei Chen , Juying Dou
IPC分类号： H01J1/14 , H01J19/08
CPC分类号： H01J37/063 , H01J1/16 , H01J3/027 , H01J37/065 , H01J2237/06316 , H01J2237/06375
摘要： A thermal field emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source is disclosed. Embodiments disclose changing coating shape, coating position and shorten emitter length to extend the lifetime of the field emission cathode.
摘要翻译：公开了一种在电子显微镜中使用的热场发射阴极，临界尺寸检查工具，电子束光刻机，电子束测试仪和其他电子束相关系统作为电子源。实施例公开了改变涂层形状，涂层位置和缩短发射极长度以延长场致发射阴极的寿命。

23. 发明申请

US20110084591A1 THERMAL FIELD EMISSION CATHODE 审中-公开
标题翻译：热场发射阴极
公开(公告)号：US20110084591A1
公开(公告)日：2011-04-14
申请号：US12972299
申请日：2010-12-17
申请人： Zhong-Wei CHEN , Juying Dou
发明人： Zhong-Wei CHEN , Juying Dou
IPC分类号： H01J1/20
CPC分类号： H01J37/063 , H01J1/16 , H01J3/027 , H01J37/065 , H01J2237/06316 , H01J2237/06375
摘要： A thermal field emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source is disclosed. Embodiments disclose changing coating shape, coating position and shorten emitter length to extend the lifetime of the field emission cathode.
摘要翻译：公开了一种在电子显微镜中使用的热场发射阴极，临界尺寸检查工具，电子束光刻机，电子束测试仪和其他电子束相关系统作为电子源。实施例公开了改变涂层形状，涂层位置和缩短发射极长度以延长场致发射阴极的寿命。

24. 发明申请

US20110018470A1 ELECTRON GUN WITH MAGNETIC IMMERSION DOUBLE CONDENSER LENSES 有权
标题翻译：电子枪具有磁力倾斜双重冷凝器镜头
公开(公告)号：US20110018470A1
公开(公告)日：2011-01-27
申请号：US12896110
申请日：2010-10-01
申请人： Xu Zhang , Zhong-Wei Chen
发明人： Xu Zhang , Zhong-Wei Chen
IPC分类号： H01J29/64 , H01J29/70 , H01J1/50
CPC分类号： H01J37/141 , H01J37/063 , H01J2237/065 , H01J2237/083 , H01J2237/1035 , H01J2237/1405
摘要： An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.
摘要翻译：电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。将电子发射器浸入由磁式预聚光透镜产生的磁场中。当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。预聚光透镜之后是聚光透镜。如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

25. 发明授权

US07872236B2 Charged particle detection devices 失效
标题翻译：带电粒子检测装置
公开(公告)号：US07872236B2
公开(公告)日：2011-01-18
申请号：US11668846
申请日：2007-01-30
申请人： Xu Zhang , Joe Wang , Zhong-Wei Chen
发明人： Xu Zhang , Joe Wang , Zhong-Wei Chen
IPC分类号： G01T1/20
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2443 , H01J2237/24435 , H01J2237/2445 , H01J2237/24465
摘要： A charged particle detector consists of four independent light guide modules assembled together to form a segmented on-axis annular detector, with a center opening for allowing the primary charged particle beam to pass through. One side of the assembly facing the specimen is coated with or bonded to scintillator material as the charged particle detection surface. Each light guide module is coupled to a photomultiplier tube to allow light signals transmitted through each light guide module to be amplified and processed separately. A charged particle detector is made from a single block of light guide material processed to have a cone shaped circular cutout from one face, terminating on the opposite face to an opening to allow the primary charged particle beam to pass through. The opposite face is coated with or bonded to scintillator material as the charged particle detection surface. The outer region of the light guide block is shaped into four separate light guide output channels and each light guide output channel is coupled to a photomultiplier tube to allow light signal output from each channel to be amplified and processed separately.
摘要翻译：带电粒子检测器由四个独立的光导模块组成，组合在一起以形成分段的轴上环形探测器，其中心开口允许初级带电粒子束通过。面向样品的组件的一侧作为带电粒子检测表面涂覆或结合到闪烁体材料。每个光导模块耦合到光电倍增管，以允许通过每个光导模块传输的光信号被单独放大和处理。带电粒子检测器由一块光导材料制成，被处理成具有从一个面的锥形圆形切口，终止在与开口相对的面上以允许初级带电粒子束通过。相反的面被涂覆或与闪烁体材料结合，作为带电粒子检测表面。导光块的外部区域被成形为四个分开的光导输出通道，并且每个光导输出通道耦合到光电倍增管，以允许来自每个通道的光信号输出被单独放大和处理。

26. 发明授权

US07705301B2 Electron beam apparatus to collect side-view and/or plane-view image with in-lens sectional detector 有权
标题翻译：用透镜截面检测器收集侧视图和/或平面视图图像的电子束装置
公开(公告)号：US07705301B2
公开(公告)日：2010-04-27
申请号：US11755705
申请日：2007-05-30
申请人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
发明人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/225 , H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2449
摘要： An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if needed, an objective lens and an in-lens sectional detector. The electron source will provide an electron beam. The intermediate lenses focus the electron beam further. The objective lens is a combination of an immersion magnetic lens and a retarding electrostatic lens focuses the electron beam onto the specimen surface. The in-lens detector will be divided into two or more sections to collect secondary electrons emanating from the specimen with different azimuth and polar angle so that side-view SEM imagery can be obtained.
摘要翻译：提出了一种用于收集侧视图和平面视图SEM图像的电子束装置和方法。电子束装置包括电子源，如果需要的话，一些中间透镜，物镜和透镜内部分检测器。电子源将提供电子束。中间透镜进一步聚焦电子束。物镜是浸没式磁透镜和阻滞静电透镜的组合，将电子束聚焦在样品表面上。镜片内检测器将被分为两个或多个部分，以收集具有不同方位角和极角的样品发出的二次电子，从而可以获得侧视SEM图像。

27. 发明授权

US06960766B2 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method 有权
标题翻译：摆动目标延迟浸没透镜电子光学聚焦，偏转和信号采集系统及方法
公开(公告)号：US06960766B2
公开(公告)日：2005-11-01
申请号：US10601124
申请日：2003-06-20
申请人： Zhong-Wei Chen
发明人： Zhong-Wei Chen
IPC分类号： G01Q10/00 , G01Q30/02 , H01J37/141 , H01J37/28 , H01J37/147
CPC分类号： H01J37/28 , H01J37/141 , H01J2237/04756 , H01J2237/1035
摘要： A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens includes a magnetic lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, an electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen; a deflection system including a plurality of deflection units situated along the beam axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the magnetic lens; and a annular detection unit with a relatively small aperture, located underneath the primary beam define aperture, to capture secondary electron (SE) and backscattered electrons (BSE).
摘要翻译：一种摆动物镜延迟浸没透镜系统及其方法，其提供具有高光束电流的低电压电子束，相对高的空间分辨率，相对大的扫描场和高的信号收集效率。物镜包括用于在样本附近产生磁场以将粒子束的粒子聚焦在样本上的磁性透镜，具有向样本附近的粒子束提供延迟场的电位的电极，以减少当光束与样品碰撞时，粒子束的能量; 偏转系统包括沿着光束轴线设置的多个偏转单元，用于偏转粒子束以允许对具有大面积的样本进行扫描，位于光束的延迟场中的至少一个偏转单元，偏转的剩余部分位于磁性透镜的中心孔内的单元; 和具有相对较小孔径的环形检测单元，位于主光束下方限定孔，以捕获二次电子（SE）和反向散射电子（BSE）。

28. 发明授权

US08314401B2 Electron gun with magnetic immersion double condenser lenses 有权
标题翻译：电子枪与磁浸双重聚光镜
公开(公告)号：US08314401B2
公开(公告)日：2012-11-20
申请号：US12896110
申请日：2010-10-01
申请人： Xu Zhang , Zhong-Wei Chen
发明人： Xu Zhang , Zhong-Wei Chen
IPC分类号： H01J1/50
CPC分类号： H01J37/141 , H01J37/063 , H01J2237/065 , H01J2237/083 , H01J2237/1035 , H01J2237/1405
摘要： An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.
摘要翻译：电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。将电子发射器浸入由磁式预聚光透镜产生的磁场中。当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。预聚光透镜之后是聚光透镜。如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

29. 发明授权

US07928383B2 Charged particle system including segmented detection elements 失效
标题翻译：带电粒子系统包括分段检测元件
公开(公告)号：US07928383B2
公开(公告)日：2011-04-19
申请号：US12204282
申请日：2008-09-04
申请人： Joe Wang , Xu Zhang , Zhong-Wei Chen
发明人： Joe Wang , Xu Zhang , Zhong-Wei Chen
IPC分类号： H01J49/00 , B01D59/44
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2443 , H01J2237/24435 , H01J2237/2445 , H01J2237/24465
摘要： A charged particle detector consists of a plurality independent light guide modules assembled together to form a segmented in-lens on-axis annular detector, with a center hole for allowing the primary charged particle beam to pass through. One side of the assembly facing the specimen is coated with or bonded to scintillator material as the charged particle detection surface. Each light guide module is coupled to a photomultiplier tube to allow light signals transmitted through each light guide module to be amplified and processed separately. A charged particle detector is made from a single block of light guide material processed to have a cone shaped circular cutout from one face, terminating on the opposite face to an opening to allow the primary charged particle beam to pass through. The opposite face is coated with or bonded to scintillator material as the charged particle detection surface. The outer region of the light guide block is shaped into four separate light guide output channels and each light guide output channel is coupled to a photomultiplier tube to allow light signal output from each channel to be amplified and processed separately.
摘要翻译：带电粒子检测器由多个独立的光导模块组成，组合在一起以形成分段的透镜内轴环形探测器，其中心孔用于允许初级带电粒子束通过。面向样品的组件的一侧作为带电粒子检测表面涂覆或结合到闪烁体材料。每个光导模块耦合到光电倍增管，以允许通过每个光导模块传输的光信号被单独放大和处理。带电粒子检测器由一块光导材料制成，被处理成具有从一个面的锥形圆形切口，终止在与开口相对的面上以允许初级带电粒子束通过。相反的面被涂覆或与闪烁体材料结合，作为带电粒子检测表面。导光块的外部区域被成形为四个分开的光导输出通道，并且每个光导输出通道耦合到光电倍增管，以允许来自每个通道的光信号输出被单独放大和处理。

30. 发明授权

US07474001B2 Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing 有权
标题翻译：基于半导体晶片制造中的测试结构的通孔/接触孔蚀刻工艺的在线监测方法
公开(公告)号：US07474001B2
公开(公告)日：2009-01-06
申请号：US11452544
申请日：2006-06-13
申请人： Yan Zhao , Chang-Chun Yeh , Zhong-Wei Chen , Jack Jau
发明人： Yan Zhao , Chang-Chun Yeh , Zhong-Wei Chen , Jack Jau
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/76802 , H01L22/26
摘要： A method for in-line monitoring of via/contact etching process based on a test structure is described. The test structure is comprised of via/contact holes of different sizes and densities in a layout such that, for a certain process, the microloading or RIE lag induced non-uniform etch rate produce under-etch in some regions and over-etch in others. A scanning electron microscope is used to distinguish these etching differences in voltage contrast images. Image processing and simple calibration convert these voltage contrast images into a “fingerprint” image characterizing the etching process in terms of thickness over-etched or under-etched. Tolerance of shifting or deformation of this image can be set for validating the process uniformity. This image can also be used as a measure to monitor long-term process parameter shifting, as well as wafer-to-wafer or lot-to-lot variations. Advanced process control (APC) can be performed in-line with the guidance of this image so that potential electrical defects are avoided and process yield ramp accelerated.
摘要翻译：描述了一种基于测试结构进行通孔/接触蚀刻工艺在线监测的方法。测试结构由布局不同尺寸和密度的通孔/接触孔组成，使得对于某些工艺，微加载或RIE滞后引起的不均匀蚀刻速率在一些区域产生蚀刻不良并且在其它区域中过度蚀刻。使用扫描电子显微镜来区分电压对比图像中的这些蚀刻差异。图像处理和简单校准将这些电压对比图像转换成表征蚀刻工艺的“指纹”图像，就厚度过蚀刻或欠蚀刻而言。该图像的偏移或变形的公差可以设置为验证过程的均匀性。该图像也可用作监视长期过程参数移位以及晶圆到晶圆或批次间变化的度量。先进的过程控制（APC）可以与该图像的引导一起进行，以便避免潜在的电气缺陷，加速产出斜率。

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