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    • 22. 发明授权
    • Apparatus and method to deposit magnesium oxide film on a large area
    • 在大面积上沉积氧化镁薄膜的方法和装置
    • US07476302B2
    • 2009-01-13
    • US10811946
    • 2004-03-30
    • Young Wook ChoiJee Hyun Kim
    • Young Wook ChoiJee Hyun Kim
    • C23C14/00C23C14/32
    • C23C14/352C23C14/081
    • An apparatus and method to deposit a MgO film on a large substrate area. The method includes applying a voltage to one or more magnesium targets; applying an electric current to the one or more magnesium targets when the voltage stops increasing so that a power with a negative square wave, which does not cause mutual interfere, is applied to the one or more magnesium targets; and forming a MgO film on a substrate using magnesium particles emitted from the one or more magnesium targets by the power applied. The disclosed apparatus to deposit a MgO film on a large substrate area includes a magnetron part having at least one magnesium target and a permanent magnet; a power control part to apply power to the at least one magnesium target and separately provide control for each of the at least one magnesium target; a flow control part to supply gases for the at least one magnesium target; a substrate control part to control a substrate; a vacuum control part to control a vacuum state in a chamber; and a heater control part to maintain temperature in the chamber.
    • 一种在大衬底区域上沉积MgO膜的设备和方法。 该方法包括向一个或多个镁靶施加电压; 当电压停止增加时,向一个或多个镁靶施加电流,使得不会引起相互干扰的负方波的功率施加到一个或多个镁靶; 以及使用通过所施加的电力从所述一个或多个镁靶发射的镁颗粒在基板上形成MgO膜。 所公开的在大基板区域上沉积MgO膜的装置包括具有至少一个镁靶和永磁体的磁控管部分; 功率控制部分,用于向所述至少一个镁靶施加电力,并且分别为所述至少一个镁靶中的每一个分别提供控制; 用于向所述至少一个镁靶供应气体的流量控制部分; 用于控制衬底的衬底控制部分; 真空控制部,控制室内的真空状态; 以及加热器控制部件,以保持室内的温度。