专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

US08062495B2 Replication tools and related fabrication methods and apparatus 有权
标题翻译：复制工具及相关制造方法和装置
公开(公告)号：US08062495B2
公开(公告)日：2011-11-22
申请号：US11814175
申请日：2006-01-20
申请人： W. Dennis Slafer
发明人： W. Dennis Slafer
IPC分类号： C25D1/00 , C25D5/02
CPC分类号： G11B7/263 , B29C33/3857 , B29C59/04 , B29L2031/757 , B82Y10/00 , B82Y40/00 , C25D1/02 , C25D1/10 , C25D3/04 , C25D3/12 , C25D3/46 , C25D3/48 , C25D5/02 , C25D5/022 , C25D7/04 , C25D17/02 , C25D17/04 , C25D17/06 , C25D17/12 , C25D21/02 , C25D21/06 , C25D21/10 , G03F7/0002 , G03F7/24 , G11B7/26 , G11B7/261
摘要： Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrode-position cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
摘要翻译：公开了耐久的无缝复制工具，用于在期望的介质（例如光学记录或数据存储介质）中复制无缝浮雕图案。公开了制造这种耐用的复制工具的方法，包括在支撑圆筒的内表面上制备记录基底，在基底中记录和显影浮雕图案，形成图案的耐久的负浮雕复制品，提取所得到的耐用的工具套并且将工具套筒安装在安装夹具上。公开了用于制造这种无缝复制工具的装置，包括用于在支撑筒的内表面上的感光层上记录期望的浮雕图案的系统。还公开了用于形成具有期望的浮雕图案的耐用工具套筒的电极位置单元。复制工具浮雕功能可能具有至微米和纳米方面的关键尺寸。

22. 发明申请

US20110013253A1 INTEGRATED PLANAR DEVICE FOR LIGHT GUIDING, CONCENTRATING, AND WAVELENGTH SHIFTING 审中-公开
标题翻译：集成平面设备，用于轻型导向，集中和波长移位
公开(公告)号：US20110013253A1
公开(公告)日：2011-01-20
申请号：US12921392
申请日：2009-03-11
申请人： Jin Ji , Lawrence A. Kaufman , W. Dennis Slafer
发明人： Jin Ji , Lawrence A. Kaufman , W. Dennis Slafer
IPC分类号： G02F1/017
CPC分类号： G02B6/1226 , B82Y20/00 , F41G1/32 , F41H3/00 , G02B5/008 , G02F1/353 , G02F2201/30 , G02F2203/10 , H01L31/0543 , H01L31/0547 , H01L31/055 , H01L31/056 , Y02E10/52
摘要： The invention relates to an integrated film which includes a plasmonic layer including a pattern configured to support plasmon waves. The plasmonic layer is configured to receive as input light energy of an incident light including at least one photon having a first wavelength and an at least one photon of light received from one or more layers in optical communication with the plasmonic layer and to re-emit as output a guided light to the one or more layers in optical communication with the plasmonic layer. The integrated film also includes a wavelength conversion layer optically coupled to the plasmonic layer. The wavelength conversion layer is configured to receive as input the at least one photon having a first wavelength and to provide as output at least one photon having a second wavelength different than the first wave length.
摘要翻译：本发明涉及一种集成膜，其包括等离子体激元层，其包括配置为支持等离子体波的图案。等离子体激元层被配置为接收入射光的入射光，该入射光包括至少一个具有第一波长的光子和至少一个从等离子体激元层光通信的一层或多层的光的光子，并重新发射输出与等离子体激元层光通信的一个或多个层的引导光。集成膜还包括光学耦合到等离子体激元层的波长转换层。波长转换层被配置为接收具有第一波长的至少一个光子作为输入，并且提供具有不同于第一波长的第二波长的至少一个光子作为输出。

23. 发明授权

US07833389B1 Replication tools and related fabrication methods and apparatus 有权
标题翻译：复制工具及相关制造方法和装置
公开(公告)号：US07833389B1
公开(公告)日：2010-11-16
申请号：US11509288
申请日：2006-08-24
申请人： W. Dennis Slafer
发明人： W. Dennis Slafer
IPC分类号： C25D1/02
CPC分类号： G03G13/32 , B29C35/0888 , B29C37/0053 , B29C41/045 , B29C41/08 , B29C41/14 , B29C2035/0827 , G03F7/24 , G03H1/028 , G11B7/265
摘要： Durable replication tools are disclosed for replication of relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including recording and developing a relief pattern on a selected surface of a support cylinder, creating a durable layer with a complementary relief replica of the pattern, separating the durable layer from the support cylinder. Apparatus are disclosed for fabricating such replication tools, including systems and apparatus for recording a desired relief pattern on a surface of a support cylinder. Also disclosed are electro deposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.
摘要翻译：公开了耐用的复制工具，用于在所需介质（例如光学记录或数据存储介质）中复制浮雕图案。公开了制造这种耐久复制工具的方法，包括在支撑圆筒的选定表面上记录和显影浮雕图案，产生具有图案的互补凸版复制品的耐用层，将耐久层与支撑筒分离。公开了用于制造这种复制工具的装置，包括用于在支撑筒的表面上记录期望的浮雕图案的系统和装置。还公开了用于形成具有期望的浮雕图案的耐用工具套筒的电沉积池。复制工具浮雕功能可能具有至微米和纳米方面的关键尺寸。

24. 发明申请

US20090136657A1 METHODS AND SYSTEMS FOR FORMING FLEXIBLE MULTILAYER STRUCTURES 有权
标题翻译：形成柔性多层结构的方法和系统
公开(公告)号：US20090136657A1
公开(公告)日：2009-05-28
申请号：US12270650
申请日：2008-11-13
申请人： W. Dennis Slafer
发明人： W. Dennis Slafer
IPC分类号： B05D5/12
CPC分类号： H01Q1/364 , B82Y10/00 , B82Y40/00 , C23C18/1605 , C23C18/165 , C25D5/022 , C25D7/00 , G03F7/0002 , Y10T156/1039
摘要： Techniques are described for fabricating multilayer structures having arrays of conducting elements or apertures in a conductive grid which can be used to form frequency selective surfaces (FSSs), antenna arrays and the like on flexible substrates. Fabrication techniques can include use of a polymer mask or direct dielectric molding. In embodiments utilizing a polymer mask, a temporary 3D polymeric relief pattern is formed on a substrate and used as a mask or stencil to form the desired pattern elements. In an additive process, the conductive material is deposited over the masked surface. Deposition can be followed by mask removal In the subtractive process, the conductive layer can be deposited prior to formation of the polymer mask, and the exposed parts of the underlying conductive layer can be etched. Other embodiments utilize dielectric molding in which the molded structure itself becomes an integral and permanent part of the FSS structure.
摘要翻译：描述了用于制造具有导电栅格中的导电元件或孔的阵列的多层结构的技术，其可用于在柔性基板上形成频率选择表面（FSS），天线阵列等。制造技术可以包括使用聚合物掩模或直接电介质成型。在使用聚合物掩模的实施方案中，在基材上形成临时3D聚合物浮雕图案，并用作掩模或模板以形成所需的图案元素。在添加工艺中，导电材料沉积在掩模表面上。沉积后可以通过掩模去除在减法过程中，可以在形成聚合物掩模之前沉积导电层，并且可以蚀刻下面的导电层的暴露部分。其他实施例使用电介质模制，其中模制结构本身变成FSS结构的整体和永久部分。

25. 发明申请

US20070222096A1 Apparatus and Method for Manufacturing Pre-Formatted Linear Optical Data Storage Medium 审中-公开
标题翻译：制造预格式线性光学数据存储介质的装置和方法
公开(公告)号：US20070222096A1
公开(公告)日：2007-09-27
申请号：US10588098
申请日：2005-01-21
申请人： W. Dennis Slafer
发明人： W. Dennis Slafer
IPC分类号： B29C51/22
CPC分类号： G11B7/24009 , B29C59/005 , B29C59/04 , B29C59/046 , B29C71/0009 , B29L2017/00 , B29L2017/008 , G11B7/003 , G11B7/24082 , G11B7/26 , G11B7/263
摘要： An apparatus for manufacturing pre-formatted linear optical data storage media including an elongated linear polymer layer. The apparatus includes a drum mounted for rotation about a rotation axis, and the drum includes a circumferential outer surface having a predetermined pattern of protrusions for embossing at least one pattern of optically readable embossments in the elongated linear polymer layer as the layer is rolled on the drum. The apparatus also includes a thermal radiation source positioned adjacent the drum for heating the embossments of the elongated linear polymer layer prior to the layer being removed from the protrusions of the outer surface of the drum.
摘要翻译：一种用于制造包括细长线性聚合物层的预格式化线性光学数据存储介质的设备。该装置包括一个安装用于围绕旋转轴线转动的滚筒，滚筒包括具有预定图案的凸起的周向外表面，用于在该细长线性聚合物层中压缩至少一个光学上可读的压花图形，鼓。该设备还包括邻近滚筒定位的热辐射源，用于在层从滚筒的外表面的突出部移除之前加热细长线性聚合物层的压花。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式