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    • 23. 发明申请
    • Substrate processing apparatus, control method adopted in substrate processing apparatus and program
    • 基板处理装置,基板处理装置和程序中采用的控制方法
    • US20060176928A1
    • 2006-08-10
    • US11348323
    • 2006-02-07
    • Hiroshi NakamuraToshiyuki KobayashiShinichiro HayasakaSeiichi Kaise
    • Hiroshi NakamuraToshiyuki KobayashiShinichiro HayasakaSeiichi Kaise
    • H05B7/18
    • H01L21/6719H01L21/67017
    • A substrate processing apparatus according to the present invention comprises a plurality of processing chambers, discharge systems each provided in conjunction with one of the processing chambers and a common discharge system connected with the discharge systems of at least two processing chambers among the discharge systems provided in conjunction with the individual processing chambers. The common discharge allows a switch-over between a scrubbing common discharge system that discharges discharge gas from each processing chamber after scrubbing the discharge gas at a scrubbing means and a non-scrubbing common discharge system that directly discharges the discharge gas from the discharge system of the processing chamber without scrubbing at the scrubbing means. In this substrate processing apparatus, switch-over control is executed to select either the scrubbing common discharge system of the non-scrubbing common discharge system in correspondence to the type of processing executed in the processing chamber.
    • 根据本发明的基板处理装置包括多个处理室,每个排放系统分别与处理室中的一个相连接,以及与排放系统中的至少两个处理室的排放系统连接的公共排放系统 与各个处理室结合。 公共放电允许在洗涤在洗涤装置处的排出气体之后排出来自每个处理室的排出气体的洗涤普通排放系统和从排放系统直接排出排放气体的非洗涤公共排放系统之间的切换 该处理室不在洗涤装置处洗涤。 在该基板处理装置中,执行切换控制,以对应于在处理室中执行的处理的类型来选择非擦洗普通放电系统的擦洗普通放电系统。
    • 24. 发明申请
    • Thermal processing apparatus and thermal processing method
    • 热处理设备和热处理方法
    • US20050149222A1
    • 2005-07-07
    • US11064755
    • 2005-02-01
    • Toshiyuki KobayashiYoshihiro KoyamaMitsukazu Takahashi
    • Toshiyuki KobayashiYoshihiro KoyamaMitsukazu Takahashi
    • H01L21/00H01L21/324H01L21/68G06F19/00
    • H01L21/324H01L21/67115H01L21/681
    • In a thermal processing apparatus irradiating a substrate with light from a lamp for heating the substrate, an opening is formed in a reflector for mounting a camera unit. The camera unit images three portions of an auxiliary ring supporting the substrate, for obtaining the position of the center of the auxiliary ring before the thermal processing apparatus receives the substrate therein. The camera unit further images the substrate for obtaining the position of the center of the substrate before the thermal processing apparatus receives the substrate therein and places the same on the auxiliary ring. The thermal processing apparatus moves the substrate so that the center thereof coincides with the center of the auxiliary ring, and thereafter places the former on the latter. Thus, the auxiliary ring can be so designed as to reduce overlaps of the auxiliary ring and the outer edge of the substrate while the overlaps can be rendered uniform over the entire circumference of the substrate for improving temperature uniformity of the substrate.
    • 在用于加热基板的灯的光照射基板的热处理装置中,在用于安装相机单元的反射器中形成开口。 照相机单元将支撑衬底的辅助环的三个部分成像,以在热处理装置接收衬底之前获得辅助环的中心的位置。 相机单元进一步对基板进行成像,以在热处理设备接收基板之前获得基板中心的位置,并将其放置在辅助环上。 热处理装置移动基板,使其中心与辅助环的中心一致,然后将其放置在其上。 因此,辅助环可以设计成减小辅助环和基板的外边缘的重叠,同时可以在基板的整个圆周上使重叠部分均匀,以改善基板的温度均匀性。
    • 28. 发明授权
    • Locking structure for covering element
    • 覆盖元件的锁定结构
    • US06189938B1
    • 2001-02-20
    • US09151356
    • 1998-09-10
    • Fumio NakadairaMitsuaki KumagaiTakao ObataToshiyuki Kobayashi
    • Fumio NakadairaMitsuaki KumagaiTakao ObataToshiyuki Kobayashi
    • E05C1906
    • E05C19/06A45C2011/188E05B15/1635Y10T292/0894Y10T292/0902
    • A locking structure for releasably locking a covering element in a closed position on a unit housing. The locking structure includes a resiliently engaging member integrally formed on the covering element, and a supporting member pivotably connected to the covering element. The resiliently engaging member includes a pair of resilient first supports projecting from the covering element, a bar connecting the respective free ends of the resilient first supports with each other and a pair of projections formed on the bar to be releasably engaged with the housing. The supporting member includes a base plate pivotably connected to the covering element and a second support extending from the base plate to be releasably engaged with the resiliently engaging member. In a locked position of the locking structure, the bar is stably supported by the second support so that the projections are kept in engagement with the housing.
    • 一种用于将覆盖元件可释放地锁定在单元壳体上的关闭位置的锁定结构。 锁定结构包括一体地形成在覆盖元件上的弹性接合元件和可枢转地连接到覆盖元件的支撑元件。 弹性接合构件包括从覆盖元件突出的一对弹性第一支撑件,将弹性第一支撑件的相应自由端彼此连接的杆和形成在杆上以与壳体可释放地接合的一对突起。 支撑构件包括可枢转地连接到覆盖元件的基板和从基板延伸以与弹性接合构件可释放地接合的第二支撑件。 在锁定结构的锁定位置,杆被第二支撑件稳定地支撑,使得突起保持与壳体接合。