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21. 外观设计

USD663099S1 Snack food 有权
标题翻译：零食
公开(公告)号：USD663099S1
公开(公告)日：2012-07-10
申请号：US29397749
申请日：2011-07-20
申请人： Kaoru Yamada
设计人： Kaoru Yamada

22. 外观设计

USD663097S1 Snack food 有权
公开(公告)号：USD663097S1
公开(公告)日：2012-07-10
申请号：US29384759
申请日：2011-02-03
申请人： Kaoru Yamada
设计人： Kaoru Yamada

23. 发明申请

US20080314763A1 Method and device for regenerating ion exchanger, and electrolytic processing apparatus 有权
标题翻译：再生离子交换器的方法和装置，以及电解处理装置
公开(公告)号：US20080314763A1
公开(公告)日：2008-12-25
申请号：US12222733
申请日：2008-08-14
申请人： Takayuki Saito , Tsukuru Suzuki , Yuji Makita , Kaoru Yamada , Masayuki Kumekawa , Hozumi Yasuda , Osamu Nabeya , Kazuto Hirokawa , Mitsuhiro Shirakashi , Yasushi Toma , Itsuki Kobata
发明人： Takayuki Saito , Tsukuru Suzuki , Yuji Makita , Kaoru Yamada , Masayuki Kumekawa , Hozumi Yasuda , Osamu Nabeya , Kazuto Hirokawa , Mitsuhiro Shirakashi , Yasushi Toma , Itsuki Kobata
IPC分类号： C25F1/00 , C25F7/00
CPC分类号： C25F3/00 , B01J49/30 , C25F7/00
摘要： A method and device for regenerating an ion exchanger can regenerate an ion exchanger easily and quickly, and can minimize a load upon cleaning of the regenerated ion exchanger and disposal of waste liquid. A method for regenerating a contaminated ion exchanger includes: providing a pair of a regeneration electrode and a counter electrode, a partition disposed between the electrodes, and an ion exchanger to be regenerated disposed between the counter electrode and the partition; and applying a voltage between the regeneration electrode and the counter electrode while supplying a liquid between the partition and the regeneration electrode and also supplying a liquid between the partition and the counter electrode.
摘要翻译：用于再生离子交换剂的方法和装置可以容易且快速地再生离子交换器，并且可以在再生离子交换器的清洁和废液的处理时最小化负载。再生污染离子交换器的方法包括：提供一对再生电极和对置电极，设置在电极之间的隔板和设置在对电极与隔板之间的再生用离子交换器; 并在再生电极和对电极之间施加电压，同时在隔板和再生电极之间提供液体，并且还在分隔件和对电极之间供应液体。

24. 发明授权

US07427345B2 Method and device for regenerating ion exchanger, and electrolytic processing apparatus 有权
公开(公告)号：US07427345B2
公开(公告)日：2008-09-23
申请号：US10432397
申请日：2002-11-29
申请人： Takayuki Saito , Tsukuru Suzuki , Yuji Makita , Kaoru Yamada , Masayuki Kumekawa , Hozumi Yasuda , Osamu Nabeya , Kazuto Hirokawa , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata
发明人： Takayuki Saito , Tsukuru Suzuki , Yuji Makita , Kaoru Yamada , Masayuki Kumekawa , Hozumi Yasuda , Osamu Nabeya , Kazuto Hirokawa , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata
IPC分类号： C25D17/00 , C25B15/00 , B23H3/00
CPC分类号： C25F3/00 , B01J49/30 , C25F7/00
摘要： A method and device for regenerating an ion exchanger can regenerate an ion exchanger easily and quickly, and can minimize a load upon cleaning of the regenerated ion exchanger and disposal of waste liquid. A method for regenerating a contaminated ion exchanger includes: providing a pair of a regeneration electrode and a counter electrode, a partition disposed between the electrodes, and an ion exchanger to be regenerated disposed between the counter electrode and the partition; and applying a voltage between the regeneration electrode and the counter electrode while supplying a liquid between the partition and the regeneration electrode and also supplying a liquid between the partition and the counter electrode.

25. 发明申请

US20070277930A1 Substrate Cleaning Apparatus and Substrate Processing Unit 审中-公开
标题翻译：基板清洗装置及基板处理装置
公开(公告)号：US20070277930A1
公开(公告)日：2007-12-06
申请号：US11663071
申请日：2005-09-14
申请人： Toshi Yokoyama , Seiji Katsuoka , Takahiro Ogawa , Kaoru Yamada , Kazuaki Maeda
发明人： Toshi Yokoyama , Seiji Katsuoka , Takahiro Ogawa , Kaoru Yamada , Kazuaki Maeda
IPC分类号： H01L21/304 , H01L21/683
CPC分类号： H01L21/67051 , H01L21/67207
摘要： A substrate cleaning apparatus does not need positioning of a transport system on start-up of the apparatus and can reduce the installation area of the apparatus. The substrate cleaning apparatus includes a base-integrated frame (1) in which are mounted a substrate transport device (2) for transporting a substrate, at least one substrate processing unit (3) for processing the substrate, a substrate loading port (5) for placing a substrate-housing cassette (4) on it, and a processing liquid supply apparatus (6) for supplying a processing liquid to the substrate processing unit, wherein maintenance of the substrate processing unit (3) can be performed from the backside of the apparatus.
摘要翻译：基板清洗装置不需要在装置起动时定位运输系统，并且可以减少装置的安装面积。基板清洗装置包括基底一体化框架（1），其中安装有用于输送基板的基板输送装置（2），用于处理基板的至少一个基板处理单元（3），基板装载口（5）用于将衬底容纳盒（4）放置在其上，以及处理液体供应装置（6），用于向衬底处理单元提供处理液体，其中可以从衬底处理单元（3）的背面执行维护该装置。

26. 发明申请

US20070187259A1 Substrate processing apparatus and method 审中-公开
标题翻译：基板加工装置及方法
公开(公告)号：US20070187259A1
公开(公告)日：2007-08-16
申请号：US11715971
申请日：2007-03-09
申请人： Itsuki Kobata , Mitsuhiko Shirakashi , Masayuki Kumekawa , Takayuki Saito , Yasushi Toma , Tsukuru Suzuki , Kaoru Yamada , Yuji Makita , Hozumi Yasuda
发明人： Itsuki Kobata , Mitsuhiko Shirakashi , Masayuki Kumekawa , Takayuki Saito , Yasushi Toma , Tsukuru Suzuki , Kaoru Yamada , Yuji Makita , Hozumi Yasuda
IPC分类号： B23H5/00
CPC分类号： H01L21/6708 , C25F3/00 , C25F7/00
摘要： A substrate processing apparatus can perform an electrolytic processing, which is different from a common, conventional etching, to remove (clean off) a conductive material (film) formed on or adhering to a bevel portion, etc. of a substrate, or process a peripheral portion of a substrate through an electrochemical action. The substrate processing apparatus includes: an electrode section having a plurality of electrodes which are laminated with insulators being interposed, and having a holding portion which is to be opposed to a peripheral portion of a substrate; an ion exchanger disposed in the holding portion of the electrode section; a liquid supply section for supplying a liquid to the holding position of the electrode section; and a power source for applying a voltage to the electrodes of the electrode section so that the electrodes alternately have different polarities.
摘要翻译：基板处理装置可以执行与普通的常规蚀刻不同的电解处理，以去除（清除）形成在或附着于基板的斜面部分等上的导电材料（膜）或处理通过电化学作用的衬底的周边部分。基板处理装置包括：具有多个电极的电极部，该多个电极层叠有绝缘体，并且具有与基板的周边部相对的保持部; 设置在电极部的保持部中的离子交换部; 液体供应部分，用于将液体供应到电极部分的保持位置; 以及用于向电极部分的电极施加电压使得电极交替具有不同极性的电源。

27. 发明授权

US5257485A Openable and closeable roof construction 失效
标题翻译：可开启和关闭的屋顶施工
公开(公告)号：US5257485A
公开(公告)日：1993-11-02
申请号：US809394
申请日：1991-12-18
申请人： Mamoru Kawaguchi , Toshimasa Hirasawa , Tatsuo Hatato , Kaoru Yamada , Akira Taga
发明人： Mamoru Kawaguchi , Toshimasa Hirasawa , Tatsuo Hatato , Kaoru Yamada , Akira Taga
IPC分类号： E04B1/32 , E04B7/16 , E04H3/16
CPC分类号： E04H3/165 , E04B7/163 , E04B7/166
摘要： The present invention relates to an openable roof having two pairs of half dome openable roofs provided on a ring shaped set roof having a flat upper surface. In the center of the set roof, an aperture is provided; this aperture being opened or closed by these two pairs of openable roofs. Furthermore, either respective pair of these two pairs of openable roofs may be selected and utilized to open and close the aperture as necessary.
摘要翻译：本发明涉及一种可开启屋顶，其具有设置在具有平坦上表面的环形设置屋顶上的两对半圆顶可开启屋顶。在设置的屋顶的中心，提供孔; 该孔由这两对可打开的屋顶打开或关闭。此外，可以选择这两对可开启屋顶的相应对，并根据需要利用该开口和关闭孔。

28. 外观设计

USD670067S1 Snack food 有权
公开(公告)号：USD670067S1
公开(公告)日：2012-11-06
申请号：US29397762
申请日：2011-07-20
申请人： Kaoru Yamada
设计人： Kaoru Yamada

29. 发明授权

US08133380B2 Method for regenerating ion exchanger 有权
标题翻译：离子交换器再生方法
公开(公告)号：US08133380B2
公开(公告)日：2012-03-13
申请号：US12222733
申请日：2008-08-14
申请人： Takayuki Saito , Tsukuru Suzuki , Yuji Makita , Kaoru Yamada , Masayuki Kumekawa , Hozumi Yasuda , Osamu Nabeya , Kazuto Hirokawa , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata
发明人： Takayuki Saito , Tsukuru Suzuki , Yuji Makita , Kaoru Yamada , Masayuki Kumekawa , Hozumi Yasuda , Osamu Nabeya , Kazuto Hirokawa , Mitsuhiko Shirakashi , Yasushi Toma , Itsuki Kobata
IPC分类号： B23H3/10
CPC分类号： C25F3/00 , B01J49/30 , C25F7/00
摘要： A method and device for regenerating an ion exchanger can regenerate an ion exchanger easily and quickly, and can minimize a load upon cleaning of the regenerated ion exchanger and disposal of waste liquid. A method for regenerating a contaminated ion exchanger includes: providing a pair of a regeneration electrode and a counter electrode, a partition disposed between the electrodes, and an ion exchanger to be regenerated disposed between the counter electrode and the partition; and applying a voltage between the regeneration electrode and the counter electrode while supplying a liquid between the partition and the regeneration electrode and also supplying a liquid between the partition and the counter electrode.
摘要翻译：用于再生离子交换剂的方法和装置可以容易且快速地再生离子交换器，并且可以在再生离子交换器的清洁和废液的处理时最小化负载。再生污染离子交换器的方法包括：提供一对再生电极和对置电极，设置在电极之间的隔板和设置在对电极与隔板之间的再生用离子交换器; 并在再生电极和对电极之间施加电压，同时在隔板和再生电极之间提供液体，并且还在分隔件和对电极之间供应液体。

30. 发明申请

US20090090397A1 Substrate processing apparatus and substrate processing method 审中-公开
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US20090090397A1
公开(公告)日：2009-04-09
申请号：US12314197
申请日：2008-12-05
申请人： Takayuki Saito , Tsukuru Suzuki , Kaoru Yamada , Kenya Ito , Masayuki Kamezawa , Kenji Yamaguchi
发明人： Takayuki Saito , Tsukuru Suzuki , Kaoru Yamada , Kenya Ito , Masayuki Kamezawa , Kenji Yamaguchi
IPC分类号： B08B3/04
CPC分类号： H01L21/6708 , B08B3/02 , Y10S134/902
摘要： The present invention provides a substrate processing apparatus and a substrate processing method suitable for use in an etching apparatus which etches a thin film formed on a peripheral portion of a substrate. The present invention also provides a substrate processing apparatus and a substrate processing method suitable for use in a cleaning apparatus which performs a cleaning process on a substrate which has been etched. The substrate processing apparatus for use in etching includes a substrate holder 11 for holding a substrate W substantially horizontally and rotating the substrate W, and a processing liquid supply unit 15 for supplying a processing liquid onto a peripheral portion of the substrate W which is being rotated in such a manner that the processing liquid is stationary with respect to the substrate W. The substrate processing apparatus for use in cleaning a substrate includes a substrate holder 54 for holding a substrate W substantially horizontally and rotating the substrate W, and a cleaning liquid supply unit 53 having a cleaning liquid outlet 53a which is oriented from a center of the substrate W toward a peripheral portion of the substrate W with an elevation angle of not more than 45° from a surface of the substrate W. The cleaning liquid supply unit 53 supplies a cleaning liquid to the surface of the substrate W at a flow velocity of not less than 0.1 m/s.
摘要翻译：本发明提供一种适用于腐蚀形成在基板的周边部分上的薄膜的蚀刻装置中的基板处理装置和基板处理方法。本发明还提供一种适用于在已被蚀刻的基板上进行清洗处理的清洗装置的基板处理装置和基板处理方法。用于蚀刻的基板处理装置包括基板保持器11，用于基本上水平地保持基板W并旋转基板W;以及处理液体供应单元15，用于将处理液体供应到正在旋转的基板W的周边部分处理液体相对于基板W是静止的。用于清洗基板的基板处理装置包括：基板保持件54，用于基本上水平地保持基板W并旋转基板W;以及清洗液供给部单元53具有从基板W的中心朝向基板W的周边部分取向的清洗液出口53a，其与基板W的表面的仰角不大于45°。清洗液供给单元53 以不小于0.1m / s的流速将清洗液供给到基板W的表面。

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