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    • 21. 发明授权
    • Acupuncture point position evaluating apparatus
    • 针灸点位置评估仪
    • US07818054B2
    • 2010-10-19
    • US11911464
    • 2006-04-13
    • Takenori FukumotoHisashi Akiyama
    • Takenori FukumotoHisashi Akiyama
    • A61H39/02A61B5/05A61B5/04
    • A61H39/02A61B5/05A61B5/0532A61H39/08
    • An acupuncture point position evaluating apparatus in which a current generated in a current generating section is applied to measurement points of skin of a subject through current application electrodes. The applied current and a voltage generated in the skin by the current application are measured in a measuring section. In a frequency analyzing section, the measured current and the measured voltage are provided with frequency analysis, and skin impedance Z(jf) in the respective measurement points is calculated. In a characteristics amount generating section, based on the frequency response of the skin impedance Z(jf) in the measurement points, frequency response K(f)=XZ(f)/RZ(f) as a ratio between real part RZ(f) and imaginary part XZ(f) of the skin impedance Z(jf) are calculated. In a determining section, based on the difference of the frequency response K(f), an acupuncture point position is determined from among the respective measurement points.
    • 一种针刺点位置评价装置,其中通过电流施加电极将在电流产生部分中产生的电流施加到被检体的皮肤的测量点。 在测量部分中测量施加的电流和由当前应用在皮肤中产生的电压。 在频率分析部中,对测量电流和测量电压进行频率分析,并计算各测量点的皮肤阻抗Z(jf)。 在特征量生成部中,基于测定点的皮肤阻抗Z(jf)的频率响应,作为实际部分RZ(f)之间的比率的频率响应K(f)= XZ(f)/ RZ(f) )和皮肤阻抗Z(jf)的虚部XZ(f)。 在确定部分中,基于频率响应K(f)的差异,从各个测量点中确定针刺点位置。
    • 22. 发明授权
    • Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program
    • 曝光掩模,光学邻近校正装置,光学邻近校正方法,半导体器件的制造方法和光学邻近校正程序
    • US07353493B2
    • 2008-04-01
    • US10846837
    • 2004-05-14
    • Hisashi Akiyama
    • Hisashi Akiyama
    • G06F17/50
    • G03F1/36
    • An optical proximity correction is provided that generates a corrected pattern P0 corresponding to a state M0 where the focus is in focus and the exposure dose is optimal, a corrected pattern P1 corresponding to a state M1 where the focus is in focus and the exposure dose is at the lower limit, a corrected pattern P2 corresponding to a state M2 where the focus is in focus and the exposure dose is at the upper limit, a corrected pattern P3 corresponding to a state M3 where the focus deviates to the lower side and the exposure dose is optimal, and a corrected pattern P4 corresponding to a state M4 where the focus deviates to the upper side and the exposure dose is optimal. By combining these corrected patterns P0 through P4, a composed pattern P5 is generated that reflects the scattering of the exposure dose and the deviation of the focus.
    • 提供了一种光学邻近校正,其产生对应于聚焦对焦的状态M 0并且曝光剂量最佳的校正图案P 0,对应于焦点聚焦的状态M 1的校正图案P 1和 曝光剂量处于下限,对应于焦点聚焦的状态M 2和曝光剂量处于上限的校正图案P 2,对应于状态M 3的校正图案P 3,其中焦点 偏移到下侧,曝光剂量是最佳的,并且对应于焦点偏离上侧的状态M 4的校正图案P 4和曝光剂量是最佳的。 通过组合这些校正图案P 0至P 4,产生反映曝光剂量的散射和焦点的偏差的组合图案P 5。
    • 25. 发明授权
    • Liquid crystal display device having multiple insulating films with different etch characteristics
    • 具有不同蚀刻特性的多个绝缘膜的液晶显示装置
    • US06452659B1
    • 2002-09-17
    • US09062811
    • 1998-04-20
    • Hisashi AkiyamaMitsuhiro Shigeta
    • Hisashi AkiyamaMitsuhiro Shigeta
    • G02F11343
    • G02F1/134336G02F1/13439
    • A liquid crystal display device includes a transparent substrate provided with a plurality of stripe scanning electrodes, and another substrate provided with a plurality of stripe signal electrodes orthogonal to the scanning electrodes, and a liquid crystal layer enclosed between the two transparent substrates. The scanning electrodes are provided on the transparent substrate via a color filter, under overcoat film, and a hard coat film made of hard silicon resin. In the hard coat film, in order to reduce electrode resistance of the scanning electrodes, there are provided a plurality of metal electrodes which are electrically connected individually to the scanning electrodes. The metal electrodes are also connected to the signal electrodes in the same manner as the scanning electrodes.
    • 液晶显示装置包括设置有多个条形扫描电极的透明基板和设置有与扫描电极正交的多条条状信号电极的另一基板以及封闭在两个透明基板之间的液晶层。 扫描电极通过滤色器在外涂膜和由硬硅树脂制成的硬涂膜上设置在透明基板上。 在硬涂膜中,为了降低扫描电极的电极电阻,设置有多个金属电极,其分别与扫描电极电连接。 金属电极也以与扫描电极相同的方式连接到信号电极。
    • 27. 发明授权
    • Ultrasonic imaging system
    • 超声波成像系统
    • US5327892A
    • 1994-07-12
    • US68172
    • 1993-05-28
    • Yasuhiro NakamuraHisashi AkiyamaSatoshi Akaishi
    • Yasuhiro NakamuraHisashi AkiyamaSatoshi Akaishi
    • A61B8/00A61B8/14G01N29/44G01S7/52
    • G01S7/52046G01S7/52034
    • An ultrasonic imaging system includes an ultrasonic probe for transmitting and receiving an ultrasonic wave, a driver unit for driving the ultrasonic probe, a detector unit for detecting an echo signal received by the ultrasonic probe, a filter unit operative to pass a detection signal from the detector unit and having a plurality of passbands which have respective flat frequency response characteristics and respective gains different from each other, a scanning conversion unit for converting the detection signal, which has passed through the filter unit, to a display signal to be displayed on a television, etc., and a display unit receiving the display signal from the scanning conversion unit to display it as a tomographic image. The filter unit operates to decrease respective amplitudes of high frequency components contained in the detection signal and to reduce a difference in brightness between adjacent scanning lines of the display unit, and flat frequency response characteristics of the filter unit prevent deterioration of frequency response characteristics of the detection signal. This makes it possible to produce a tomographic image of high resolution up to the resolution limit of the scanning lines of the display unit without impairing the image quality.
    • 超声波成像系统包括用于发送和接收超声波的超声波探头,用于驱动超声波探头的驱动器单元,用于检测由超声波探头接收到的回波信号的检测器单元,用于使检测信号从 检测器单元,具有多个通带,它们具有彼此平坦的频率响应特性和各自的增益,扫描转换单元用于将已经通过滤波器单元的检测信号转换成显示信号以显示在 电视等,以及显示单元,其从扫描转换单元接收显示信号,将其显示为断层图像。 滤波器单元操作以减小检测信号中包含的高频分量的各个振幅,并且减小显示单元的相邻扫描线之间的亮度差,并且滤波器单元的平坦频率响应特性防止频率响应特性的劣化 检测信号。 这使得可以产生高分辨率的截面图像,直到显示单元的扫描线的分辨率极限,而不损害图像质量。
    • 28. 发明授权
    • Ultrasonic diagnostic apparatus
    • 超声波诊断仪
    • US08641625B2
    • 2014-02-04
    • US12440533
    • 2007-09-10
    • Hiroshi FukukitaHisashi Akiyama
    • Hiroshi FukukitaHisashi Akiyama
    • A61B8/00
    • A61B8/14G01S7/52063G01S7/52073G01S7/52085G01S15/8925G01S15/8993
    • An object of the invention is to provide an ultrasonic diagnostic apparatus that can scan a region of interest at high speed and other regions at low speed.In the ultrasonic diagnostic apparatus of the invention, a two-dimensional array probe 1 formed by arranging a plurality of ultrasonic elements two-dimensionally transmits an ultrasonic beam to a three-dimensional region and receives a reflected signal. The ultrasonic beam scans a region on a pyramid, and the scan region is divided into a main scan region Am of a region of interest and a subscan region. The subscan region is divided into small regions As1, As2, As3, and As4. The number of main scanning times of the main scan region is larger than the number of subscanning times of the subscan region.
    • 本发明的目的是提供一种超声波诊断装置,该超声波诊断装置能够以低速等速扫描感兴趣区域。 在本发明的超声波诊断装置中,通过将多个超声波元件二维地将超声波束二维地发送到三维区域并接收反射信号而形成的二维阵列探测器1。 超声波束扫描金字塔上的区域,扫描区域被划分成感兴趣区域和副扫描区域的主扫描区域Am。 子区域分为小区域As1,As2,As3和As4。 主扫描区域的主扫描次数大于副扫描区域的副扫描次数。
    • 29. 发明申请
    • SKIN CONDUCTION MEASURING APPARATUS
    • 皮肤导电测量装置
    • US20090312666A1
    • 2009-12-17
    • US12307807
    • 2007-07-09
    • Takenori FukumotoHisashi Akiyama
    • Takenori FukumotoHisashi Akiyama
    • A61B5/053
    • A61B5/0532A61B2562/0215A61H39/02A61H2230/65
    • In this skin conduction measuring apparatus, bipolar pulse currents generated by current generator sections 11a to 11i are applied to plural measurement points of a skin 30 of a subject through nonpolarizable electrodes 3a to 3i. The conducted currents and voltages generated by the conduction are measured by a measuring section 6. A feature quantity that characterizes current conductivity at each of the measurement points is extracted by a feature quantity extracting section 7 and then the result is displayed by a display section 8. An index extracted in the feature quantity extracting section 7 is calculated based on electrical equivalent circuit parameters Rp, Cp, and Rs of the skin 30. Quantitative measurement results with sufficient reliability and reproducibility can be obtained.
    • 在该皮肤导电测定装置中,由电流发生部11a〜11i产生的双极脉冲电流通过非极化电极3a〜3i施加于被检体的皮肤30的多个测定点。 通过测量部分6测量由导通产生的传导电流和电压。通过特征量提取部分7提取表征每个测量点处的电流导电性的特征量,然后由显示部分8显示结果 根据皮肤30的电等效电路参数Rp,Cp,Rs计算在特征量提取部7中提取的索引。可以获得具有足够的可靠性和再现性的定量测量结果。
    • 30. 发明申请
    • Exposure mask, optical proximity correction device, optical proximity correction method, manufacturing method of semiconductor device, and optical proximity correction program
    • 曝光掩模,光学邻近校正装置,光学邻近校正方法,半导体器件的制造方法和光学邻近校正程序
    • US20080153009A1
    • 2008-06-26
    • US12012970
    • 2008-02-06
    • Hisashi Akiyama
    • Hisashi Akiyama
    • G03F1/00G03F7/26
    • G03F1/36
    • An optical proximity correction is provided that generates a corrected pattern P0 corresponding to a state M0 where the focus is in focus and the exposure dose is optimal, a corrected pattern P1 corresponding to a state M1 where the focus is in focus and the exposure dose is at the lower limit, a corrected pattern P2 corresponding to a state M2 where the focus is in focus and the exposure dose is at the upper limit, a corrected pattern P3 corresponding to a state M3 where the focus deviates to the lower side and the exposure dose is optimal, and a corrected pattern P4 corresponding to a state M4 where the focus deviates to the upper side and the exposure dose is optimal. By combining these corrected patterns P0 through P4, a composed pattern P5 is generated that reflects the scattering of the exposure dose and the deviation of the focus.
    • 提供了一种光学邻近校正,其产生对应于聚焦对焦的状态M 0并且曝光剂量最佳的校正图案P 0,对应于焦点聚焦的状态M 1的校正图案P 1和 曝光剂量处于下限,对应于焦点聚焦的状态M 2和曝光剂量处于上限的校正图案P 2,对应于状态M 3的校正图案P 3,其中焦点 偏移到下侧,曝光剂量是最佳的,并且对应于焦点偏离上侧的状态M 4的校正图案P 4和曝光剂量是最佳的。 通过组合这些校正图案P 0至P 4,产生反映曝光剂量的散射和焦点的偏差的组合图案P 5。