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21. 发明专利

JPH04315304A PLANE ANTENNA 失效
公开(公告)号：JPH04315304A
公开(公告)日：1992-11-06
申请号：JP8238391
申请日：1991-04-15
申请人： TAKADA JUNICHI , ANDO MAKOTO , GOTO NAOHISA
发明人： TAKADA JUNICHI , ANDO MAKOTO , GOTO NAOHISA
IPC分类号： H01Q13/10 , H01Q21/06 , H01Q21/24
摘要： PURPOSE:To obtain the plane antenna with a high gain and a high efficiency by forming a radiation or reception unit located on a concentric circle of an antenna aperture with four slots. CONSTITUTION:The plane antenna is an antenna radiating or receiving a linearly polarized radio wave with lots of line slots 4 provided to a radial conductive path excited in the axial symmetrical mode, the lots of the slots 4 are placed on a concentric circle of the antenna face and plural adjacent slots 4 are used for units of radiation or reception. Then the slots for forming each unit are arranged so that a radiation or received polarized wave is in matching with a desired direction and the radiation or reception unit consists of four adjacent slots 4. Thus, it is possible to make a design in which a desired linearly polarized wave radiates and the entire reflecting coefficient of the four slots is decreased and the return characteristic of the antenna is much improved.

22. 发明专利

JP2006324693A PLASMA PROCESSING APPARATUS AND METHOD FOR GENERATING PLASMA 审中-公开
公开(公告)号：JP2006324693A
公开(公告)日：2006-11-30
申请号：JP2006218965
申请日：2006-08-10
申请人： TOKYO ELECTRON LTD , YASAKA YASUNORI , TAKAHASHI MASAAKI , ANDO MAKOTO
发明人： ISHII NOBUO , YASAKA YASUNORI , TAKAHASHI MASAAKI , ANDO MAKOTO
IPC分类号： H01L21/3065 , C23C16/505 , H01L21/205 , H05H1/46
摘要： PROBLEM TO BE SOLVED: To reduce reflected power from a slot antenna. SOLUTION: Radiation power from a slot antenna can be increased as compared with a case where the length L of a slot 26 is increased monotonously from a central part A to a circumferential edge B of an antenna plane 28, by increasing the length L of the slot 26 monotonously in the radial direction from the central part A of the antenna plane 28, allowing the length L of the slot 26 to attain a maximum length at a first intermediate part C, and sustaining the maximum length from the first intermediate part C to the circumferential edge B. Since power left in the slot antenna without being radiated from the slot antenna is reduced, the reflected power from the slot antenna is reduced. COPYRIGHT: (C)2007,JPO&INPIT

23. 发明专利

JP2003264181A PLASMA TREATMENT DEVICE AND METHOD FOR GENERATING PLASMA 审中-公开
公开(公告)号：JP2003264181A
公开(公告)日：2003-09-19
申请号：JP2002066518
申请日：2002-03-12
申请人： TOKYO ELECTRON LTD , YASAKA YASUNORI , TAKAHASHI MASAAKI , ANDO MAKOTO
发明人： ISHII NOBUO , YASAKA YASUNORI , TAKAHASHI MASAAKI , ANDO MAKOTO
IPC分类号： H05H1/46 , H01J37/32 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To reduce reflected power from a slot antenna. SOLUTION: Radiation power from a slot antenna can be increased as compared with a case where the length L of a slot 26 is increased monotonously from a central part A to the circumferential edge B of an antenna plane 28 by increasing the length L of the slot 26 monotonously in the radial direction from the central part A of the antenna plane 28 up to a maximum length at a first intermediate part C and sustaining the maximum length from the first intermediate part C to the circumferential edge B. Since power left in the slot antenna without being radiated therefrom is reduced, reflected power from the slot antenna is reduced. COPYRIGHT: (C)2003,JPO

24. 发明专利

JP2002280367A APPARATUS AND METHOD FOR PLASMA TREATMENT 失效
公开(公告)号：JP2002280367A
公开(公告)日：2002-09-27
申请号：JP2001082769
申请日：2001-03-22
申请人： TOKYO ELECTRON LTD , ANDO MAKOTO , TAKAHASHI MASAAKI , YASAKA YASUNORI
发明人： ISHII NOBUO , ANDO MAKOTO , TAKAHASHI MASAAKI , YASAKA YASUNORI
IPC分类号： H05H1/46 , B01J19/08 , H01J37/32 , H01L21/302 , H01L21/306 , H01L21/3065 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To enhance generation efficiency of a plasma. SOLUTION: The slot 36 of a radial antenna 30, which supplies an electromagnetic field into a treatment container, is arranged on a spiral line at an interval d which is nearly N times (where N is a natural number) as large as wavelength λg of the electromagnetic field inside the radial antenna 30. The electromagnetic field is supplied in a rotation mode from the central part of the radial antenna 20.

25. 发明专利

JP2002016052A PLASMA PROCESSING APPARATUS 失效
公开(公告)号：JP2002016052A
公开(公告)日：2002-01-18
申请号：JP2001129527
申请日：2001-04-26
申请人： TOKYO ELECTRON LTD , YASAKA YASUNORI , ANDO MAKOTO
发明人： ISHII NOBUO , YASAKA YASUNORI
IPC分类号： H01L21/302 , H01L21/3065 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing apparatus, which can generate a uniform plasma in a processing container and thus can provide regular processing, even if a wafer has a large diameter. SOLUTION: The plasma processing apparatus includes a processing container 4 having a mount base 10 therein, glass plate 8 for covering an upper opening of the container 4, microwave supply means 50, coaxial waveguide 52 connected at its one side to the microwave supply means 50 and having an inner conductor 52B and an outer conductor 52A, radial waveguide box 54 connected to the other end side of the outer conductor 52B of the waveguide 52 and extended downwards after expanded radially outwardly from the other end of the outer conductor 52A, disk-shaped antenna member 60 connected in its center with the other end of the inner conductor 52B for covering a lower end opening of the radial conductor box 54, and reflector 54 made of a metal for reflecting electric field, reflected by an inner wall of the container 4 at a side opposite to a part of the antenna member 60 connected to the 52B.

26. 发明专利

JP2001239154A PLASMA TREATMENT APPARATUS 失效
公开(公告)号：JP2001239154A
公开(公告)日：2001-09-04
申请号：JP2000057042
申请日：2000-03-02
申请人： TOKYO ELECTRON LTD , YASAKA YASUNORI , ANDO MAKOTO
发明人： ISHII NOBUO
IPC分类号： H05H1/46 , B01J19/08 , C23C16/511 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which can generate uniform plasma in a container to be treated and treat the container uniformly. SOLUTION: A bottomed cylindrical treatment container 53, a holding means for holding a treatment body installed in the treatment container, a dielectric window which is supported with the holding means and opens/closes the opening part of the treatment container, a ring-shaped wave guide which is formed in the shape of an endless ring and introduces microwaves into the treatment container through the dielectric window and a part of which is arranged along the dielectric window, a propagation wave guide which is connected to the ring-shaped wave guide and supplies microwaves to the ring-shaped wave guide, and a microwave supply means which is connected to the propagation wave guide and supplies microwaves to the propagation wave guide are provided, and the loop part of a standing wave is positioned in the part, which is arranged along the dielectric window, of the ring-shaped wave guide.

27. 发明专利

JP2001223171A PLASMA PROCESSING APPARATUS 失效
公开(公告)号：JP2001223171A
公开(公告)日：2001-08-17
申请号：JP2000357592
申请日：2000-11-24
申请人： TOKYO ELECTRON LTD , YASAKA YASUNORI , ANDO MAKOTO
发明人： ISHII NOBUO , YASAKA YASUNORI
IPC分类号： H05H1/46 , B01J19/08 , H01L21/205 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To suppress generation of a standing microwave in a zone between a planar antenna and plasma when a microwave is introduced into a vacuum container from the antenna through a microwave transmission window made of dielectric material to plasmatize a processing gas and to form and etch a semiconductor wafer. SOLUTION: An electromagnetic wave absorber having a large dielectric or magnetic loss is provided so as to surround a zone ranging from an antenna to a transmission window to thereby suppress reflection of microwave and suppress generation of standing wave. A plurality of annular conductor are concentrically provided in the window so that intervals between the rings in its radial direction are 1/2 λto λ (wavelength of the microwave), and so that the window can pas vertical microwave but cannot pass horizontal microwave. Or circular conductors and annular conductors may be provided concentrically in a sheath zone below the window. In this case, these conductors may be formed as a gas supply section.

28. 发明专利

JPH11354294A PLASMA PROCESSING DEVICE 失效
公开(公告)号：JPH11354294A
公开(公告)日：1999-12-24
申请号：JP17220898
申请日：1998-06-04
申请人： GOTO NAOHISA , ANDO MAKOTO , TOKYO ELECTRON LTD
发明人： GOTO NAOHISA , ANDO MAKOTO , ISHII NOBUO
IPC分类号： H05H1/46 , C23C16/00 , C23C16/511 , H01J37/32 , H01L21/00 , H01L21/203 , H01L21/3065 , H05H1/00
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing device capable of reducing reflecting electric power in the outermost part of a plane antenna member to a certain degree and capable of uniformizing the electromagnetic field distribution of a microwave. SOLUTION: In a plasma processing device for introducing an exponentially functionally attenuating microwave into a processing vessel 22 for processing a processing object by plasma through a microwave transmitting window 60 by introducing a microwave generated by a microwave generator 86 to a plane antenna member 62 through a waveguide 88, a microwave absorbing means 96 for restraining this reflecting quantity by absorbing the microwave propagating in the plane antenna member is arranged in the peripheral edge part of the plane antenna member. Thus, the electromagnetic field distribution of the microwave is uniformized by reducing reflecting electric power in the outermost peripheral part of the plane antenna member to a certain degree.

29. 发明专利

JPH07106821A CIRCULARLY POLARIZED WAVE MICROSTRIP ANTENNA 失效
公开(公告)号：JPH07106821A
公开(公告)日：1995-04-21
申请号：JP24452593
申请日：1993-09-30
申请人： JAPAN RADIO CO LTD , ANDO MAKOTO
发明人： NATSUHARA KEIICHI , ANDO MAKOTO
IPC分类号： H01Q13/08 , H01Q1/22 , H01Q1/32
摘要： PURPOSE:To obtain the circularly polarized wave microstrip antenna in which, when the circularly polarized wave microstrip antenna is fitted to the roof end of an automobile, the gain is increased only at a roof end at which the circularly polarized wave microstrip antenna is fitted at a low elevation angle of nearly 10 deg. and the gain is hardly fluctuated in other directions. CONSTITUTION:The circularly polarized wave microstrip antenna fitted to a roof end of an automobile is provided with a spacer 9 fitted between a font side of an end of a roof 12 of the automobile 11 and the circularly polarized wave microstrip antenna and tilting the circularly polarized wave microstrip antenna 5 by a predetermined angle in a direction of the outside of the end of the roof 12 of the automobile 11. As a result, the gain is increased only at the roof end.

30. 发明专利

JPH0248806A RADIAL WAVEGUIDE SLOT ANTENNA 失效
公开(公告)号：JPH0248806A
公开(公告)日：1990-02-19
申请号：JP12526289
申请日：1989-05-18
申请人： TOPPAN PRINTING CO LTD , ANDO MAKOTO
发明人： ANDO MAKOTO , OKAZAKI YASUHIRO , GOTO NAOHISA , TAKADA JUNICHI
IPC分类号： H01Q21/06 , H01Q13/10 , H01Q13/22 , H01Q21/24
摘要： PURPOSE:To make the rate of retarding a wave and to improve the performance of the antenna by selecting one of a pair slots longer than that of the other slot by a prescribed rate so as to keep an angle of each slot with respect to a diameter passing through the middle point of both the slots to a specific relation. CONSTITUTION:Many slots 18, 20 are arranged in a slot disk 1 and a guide path is formed to the inside of the antenna by an upper layer 2, an end part 5, a lower layer 8 and a coaxis 9. Then the disk 1 forming a recessed dish shape provided with a frame 3 being an end of the metallic disk in a semi-circular way and with many slots 18, 20 is sealed. The length of one slot L1 of the pair slots L1, L2 formed to the disk 1 is selected longer by 2-21% than the length of the other slot L2 and also angles theta1, theta2 of the slots L1, L2 with respect to the diameter passing through the middle point of the pair of slots L1, L2 satisfy the relation theta2=pi-theta1 and the theta1 is selected to be 30-45 deg. thereby making the rate of retarding a wave stable.

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