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21. 发明申请

WO2012039606A9 LITHOGRAPHY SYSTEM ARRANGED ON A FOUNDATION, AND METHOD FOR ARRANGING A LITHOGRAPHY SYSTEM ON SAID FOUNDATION 审中-公开
公开(公告)号：WO2012039606A9
公开(公告)日：2012-03-29
申请号：PCT/NL2011/050630
申请日：2011-09-20
申请人： MAPPER LITHOGRAPHY IP B.V. , PEIJSTER, Jerry
发明人： PEIJSTER, Jerry
IPC分类号： G03F7/20 , F16F15/04
摘要： The invention relates to a vibration isolation requiring system, such as a lithography system, arranged on a foundation (100), for example part of the floor in the room where the lithography system is arranged, and a method for arranging a lithography system on a foundation. The lithography system is arranged on top of a rigid or solid base plate (110), wherein said base plate having one or more struts (150) attached thereto for placing the lithography system onto the foundation, wherein the one or more strutsare arranged at a side of the base plate facing the foundation, and wherein the base plate is provided with a cut-out or an opening for mounting equipment (330) underneath a vacuum chamber of the lithography system.

22. 发明申请

WO2011051301A1 CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM, MODULATION DEVICE, AND METHOD OF MANUFACTURING THEREOF 审中-公开
标题翻译：充电颗粒多波束光刻系统，调制装置及其制造方法
公开(公告)号：WO2011051301A1
公开(公告)日：2011-05-05
申请号：PCT/EP2010/066195
申请日：2010-10-26
申请人： MAPPER LITHOGRAPHY IP B.V. , WIELAND, Marco Jan-Jaco , POSTMA, Ferry Michael
发明人： WIELAND, Marco Jan-Jaco , POSTMA, Ferry Michael
IPC分类号： H01J37/317 , H01J37/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a modulation device for use in a charged particle multi -beamlet lithography system. The device includes a body comprising an interconnect structure 100) provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode (132), a second electrode (134), and an aperture (135) extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element (110) formed at a first level of the interconnect structure and a second conductive element (110) formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.
摘要翻译：本发明涉及一种用于带电粒子多光束光刻系统的调制装置。该装置包括具有在互连结构内的不同级别的多个调制器和互连的互连结构100）的主体，用于使调制器能够连接到一个或多个模式数据接收元件。调制器包括第一电极（132），第二电极（134）和延伸穿过本体的孔（135）。电极位于孔的相对侧上，以产生穿过孔的电场。第一电极和第二电极中的至少一个包括形成在互连结构的第一水平处的第一导电元件（110）和形成在互连结构的第二级处的第二导电元件（110）。第一和第二导电元件彼此电连接。

23. 发明申请

WO2011034428A1 CHARGED PARTICLE OPTICAL SYSTEM WITH MULTIPLE BEAMS 审中-公开
标题翻译：带有多光束的带电粒子光学系统
公开(公告)号：WO2011034428A1
公开(公告)日：2011-03-24
申请号：PCT/NL2010/050603
申请日：2010-09-17
申请人： MAPPER LITHOGRAPHY IP B.V. , KRUIT, Pieter , ZONNEVYLLE, Aernout, Christiaan
发明人： KRUIT, Pieter , ZONNEVYLLE, Aernout, Christiaan
IPC分类号： H01J37/317 , H01J37/147
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/1477 , H01J2237/0435 , H01J2237/04924 , H01J2237/1205
摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line,said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets,wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis,wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.
摘要翻译：本发明涉及多束带电粒子光学系统，其包括：用于产生多个带电粒子子束的带电粒子源，以及用于将来自带电粒子源的带电粒子子束朝向目标，其中每个带电粒子小射束限定小射束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦对应的并且其中每个小透镜限定小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中对应的带电粒子小射束的小射束中心线穿过所述带电粒子小射束离轴小静电小透镜与小透镜光轴相距一定距离。

24. 发明申请

WO2010094802A1 PREPARATION UNIT FOR LITHOGRPAHY MACHINE 审中-公开
标题翻译： LITHOGRPAHY机械的准备单位
公开(公告)号：WO2010094802A1
公开(公告)日：2010-08-26
申请号：PCT/EP2010/052219
申请日：2010-02-22
申请人： MAPPER LITHOGRAPHY IP B.V. , DE JONG, Hendrik Jan
发明人： DE JONG, Hendrik Jan
IPC分类号： H01L21/00 , B65G1/04 , B65H1/00 , C23C16/00 , F16K1/16 , H01L21/44 , H05H1/24 , G05B24/04
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01L21/00
摘要： A charged particle lithography system comprising a preparation unit (112). The preparation unit comprises a housing having a first load port (131) for loading and/or unloading a substrate (22, 82, 122) into or out of the housing, a substrate transfer unit (127) for locating the substrate onto a substrate support structure (23, 83, 123) within the housing, and a second load port (132) for loading and/or unloading the substrate support structure supporting the substrate.
摘要翻译：一种带电粒子光刻系统，包括制备单元（112）。准备单元包括具有用于将基板（22,82,122）装载和/或卸载到壳体中的第一装载端口（131）的壳体，用于将基板定位到基板上的基板传送单元（127）支撑结构（23,83,123）以及用于装载和/或卸载支撑衬底的衬底支撑结构的第二负载端口（132）。

25. 发明申请

WO2010094719A1 CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER 审中-公开
标题翻译：充气颗粒沉积装置和在真空室中产生真空的方法
公开(公告)号：WO2010094719A1
公开(公告)日：2010-08-26
申请号：PCT/EP2010/052004
申请日：2010-02-17
申请人： MAPPER LITHOGRAPHY IP B.V. , DE BOER, Guido , BALTUSSEN, Sander , JAGER, Remco , PEIJSTER, Jerry, Johannes, Martinus , TEEPEN, Tijs, Frans , VAN NIEUWSTADT, Joris, Anne, Henri , WEEDA, Willem, Maurits , VAN VEEN, Alexander, Hendrik, Vincent
发明人： DE BOER, Guido , BALTUSSEN, Sander , JAGER, Remco , PEIJSTER, Jerry, Johannes, Martinus , TEEPEN, Tijs, Frans , VAN NIEUWSTADT, Joris, Anne, Henri , WEEDA, Willem, Maurits , VAN VEEN, Alexander, Hendrik, Vincent
IPC分类号： H01J37/16 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317
CPC分类号： H01J37/16 , B82Y10/00 , B82Y40/00 , H01J37/165 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317 , H01J37/3174 , H01J2237/16
摘要： The invention relates to a charged particle lithography apparatus (100) with a charged particle source (101) for creating one or more charged particle beams (123), a charged particle projector (108, 109, 110) for projecting the beams onto a wafer; and a moveable wafer stage (132) for carrying the wafer (130). The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber (140) forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.
摘要翻译：本发明涉及一种具有用于产生一个或多个带电粒子束（123）的带电粒子源（101）的带电粒子光刻设备（100），用于将光束投射到晶片上的带电粒子投影仪（108,109,110） ; 以及用于承载晶片（130）的可移动晶片台（132）。带电粒子源，带电粒子投影仪和可移动晶片台设置在形成真空环境的公共真空室（140）中。真空室还具有用于将晶片装载到室中的开口和门。

26. 发明申请

WO2010037832A3 ELECTROSTATIC LENS STRUCTURE 审中-公开
公开(公告)号：WO2010037832A3
公开(公告)日：2010-04-08
申请号：PCT/EP2009/062788
申请日：2009-10-01
申请人： MAPPER LITHOGRAPHY IP B.V. , STEENBRINK, Stijn Willem Herman Karel , KONING, Johan Joost , VELTMAN, Peter
发明人： STEENBRINK, Stijn Willem Herman Karel , KONING, Johan Joost , VELTMAN, Peter
IPC分类号： H01J37/04 , H01J37/12
摘要： An electrostatic lens comprising a first conductive plate (51) with, a first aperture, a second conductive plate (52) with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure (57) for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion (57A) in contact with the first conductive plate and a second portion (57B) in contact with the second conductive plate, the first portion having an overhanging portion (57C) and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

27. 发明申请

WO2009127659A2 BEAMLET BLANKER ARRANGEMENT 审中-公开
标题翻译：波纹棉布布置
公开(公告)号：WO2009127659A2
公开(公告)日：2009-10-22
申请号：PCT/EP2009/054468
申请日：2009-04-15
申请人： MAPPER LITHOGRAPHY IP B.V. , WIELAND, Jan Jaco , VAN VEEN, Alexander Hendrik Vincent
发明人： WIELAND, Jan Jaco , VAN VEEN, Alexander Hendrik Vincent
IPC分类号： H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J2237/0492 , H01J2237/10 , H01J2237/15
摘要： The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet projector. The beam generator is configured to generate a plurality of charged particle beamlets. The beamlet blanker is configured to pattern the beamlets. The beamlet projector is configured to project the patterned beamlets onto the target surface. The system further has a deflection device. The deflection device has a plurality of memory cells. Each memory cell is provided with a storage element and is connected to a switching electrode of a deflector.
摘要翻译：本发明涉及一种用于使用多个子束曝光靶的带电粒子多子束光刻系统。该系统具有光束发生器，子束遮挡器和小射束投影仪。束发生器被配置为产生多个带电粒子子束。子束消除器被配置为对子束进行图案化。子束投影仪被配置为将图案化的子束投影到目标表面上。该系统还具有偏转装置。偏转装置具有多个存储单元。每个存储单元设置有存储元件，并连接到偏转器的开关电极。

28. 发明申请

WO2009127658A1 PROJECTION LENS ARRANGEMENT 审中-公开
标题翻译：投影镜头布置
公开(公告)号：WO2009127658A1
公开(公告)日：2009-10-22
申请号：PCT/EP2009/054467
申请日：2009-04-15
申请人： MAPPER LITHOGRAPHY IP B.V. , WIELAND, Jan, Jaco , VAN VEEN, Alexander, Hendrik, Vincent
发明人： WIELAND, Jan, Jaco , VAN VEEN, Alexander, Hendrik, Vincent
IPC分类号： H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J2237/0492 , H01J2237/10 , H01J2237/15
摘要： The invention relates to a charged particle multi-beamlet system for exposing a target (11) using a plurality of beamlets (21). The system has a charged particle source (1), an aperture array (4), a beamlet manipulator, a beamlet blanker (6), and an array of projection lens systems. The charged particle source (1) is configured to generate a charged particle beam (20). The aperture array (4) is configured to define separate beamlets (21) from the generated beam. The beamlet manipulator is configured to converge groups of the beamlets towards a common point of convergence for each group. The beamlet blanker (6) is configured to controllably blank beamlets in the groups of beamlets. Finally, the array of projection lens systems (10) is configured to project unblanked beamlets of the groups of beamlets on to the surface of the target (11). The beamlet manipulator is further adapted to converge each of the groups of beamlets towards a point corresponding to one of the projection lens systems.
摘要翻译：本发明涉及一种使用多个子束（21）曝光目标（11）的带电粒子多子束系统。该系统具有带电粒子源（1），孔径阵列（4），子束操纵器，子束消除器（6）和投影透镜系统阵列。带电粒子源（1）被配置为产生带电粒子束（20）。光圈阵列（4）被配置为从所生成的光束中确定不同的子束（21）。子束操纵器被配置为将每个子束的组合朝向每个组的公共收敛点收敛。子束消除器（6）被配置为可控地遮挡子束组中的子束。最后，投影透镜系统（10）的阵列被配置成将子束组的未平片子束投影到目标（11）的表面上。子束操纵器还适于将每个子束组朝向对应于投影透镜系统中的一个的点聚焦。

29. 发明申请

WO2009106397A1 PROJECTION LENS ARRANGEMENT 审中-公开
标题翻译：投影镜头布置
公开(公告)号：WO2009106397A1
公开(公告)日：2009-09-03
申请号：PCT/EP2009/050843
申请日：2009-01-26
申请人： MAPPER LITHOGRAPHY IP B.V. , WIELAND, Jan, Jaco , KAMPHERBEEK, Bert, Jan , VAN VEEN, Alexander, Hendrik, Vincent , KRUIT, Pieter , STEENBRINK, Stijn, Willem, Herman, Karel
发明人： WIELAND, Jan, Jaco , KAMPHERBEEK, Bert, Jan , VAN VEEN, Alexander, Hendrik, Vincent , KRUIT, Pieter , STEENBRINK, Stijn, Willem, Herman, Karel
IPC分类号： H01J37/12 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/3177 , H01J2237/0435 , H01J2237/1205 , H01J2237/121 , H01J2237/151
摘要： A projection lens arrangement (10) for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates (12, 13, 14) and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses. The projection lens systems are arranged at a pitch in the range of about 1 to 3 times the diameter of the plate apertures, and each projection lens system is for demagnifying and focusing one or more of the charged particle beamlets (21) on to the target plane, each projection lens system has an effective focal length in the range of about 1 to 5 times the pitch, and demagnifies the charged particle beamlets by at least 25 times.
摘要翻译：一种用于带电粒子多子束系统的投影透镜装置（10），所述投影透镜装置包括一个或多个板（12,13,14）和一个或多个投影透镜阵列。每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。投影透镜系统以等于板孔直径的1至3倍的间距布置，并且每个投影透镜系统用于将一个或多个带电粒子子束（21）放大并聚焦到目标上平面，每个投影透镜系统具有在距离的约1至5倍的范围内的有效焦距，并且将带电粒子子束减小至少25倍。

30. 发明申请

WO2004107050A2 CHARGED PARTICLE BEAMLET EXPOSURE SYSTEM 审中-公开
标题翻译：充电颗粒光束曝光系统
公开(公告)号：WO2004107050A2
公开(公告)日：2004-12-09
申请号：PCT/NL2004/000381
申请日：2004-05-27
申请人： MAPPER LITHOGRAPHY IP B.V. , KRUIT, Pieter , WIELAND, Marco, Jan-Jaco
发明人： KRUIT, Pieter , WIELAND, Marco, Jan-Jaco
IPC分类号： G03F7/00
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/045 , H01J2237/0453 , H01J2237/0492 , H01J2237/1501
摘要： The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising: - a first aperture means comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam for forming a charged particle beamlet; - a lens system comprising at least one lens for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens; - a deflector means, substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, and - a second aperture means comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.
摘要翻译：本发明涉及一种用于带电粒子束曝光装置的带电粒子光学系统，所述系统包括： - 第一孔径装置，其包括至少第一基本上圆形的孔，用于部分屏蔽发射的带电粒子束以形成带电粒子束 ; - 透镜系统，包括至少一个透镜，用于聚焦所述透镜的图像焦平面内或附近的来自所述第一孔的带电粒子束; - 基本上位于所述图像焦平面中的偏转器装置，包括至少一个子束偏转器，用于在接收到控制信号时偏转通过的带电粒子子束;以及 - 第二孔装置，包括至少一个第二基本上圆形的孔定位在第一孔的共轭平面中，并且所述第二孔与所述第一孔和所述小梁偏转器对准，用于在所述子束偏转器偏转时阻挡所述带电粒子子束，否则传递。

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