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191. 发明专利

JP5978055B2 化合物、ラジカル重合開始剤、化合物の製造方法、重合体、レジスト組成物及びレジストパターン形成方法有权
标题翻译：化合物，自由基聚合引发剂，一种制造化合物，聚合物的方法，抗蚀剂组合物和抗蚀图案形成方法
公开(公告)号：JP5978055B2
公开(公告)日：2016-08-24
申请号：JP2012173408
申请日：2012-08-03
申请人：東京応化工業株式会社
发明人：内海義之 , 太宰尚宏 , 宮下健一郎 , 本池直人
IPC分类号： G03F7/039 , G03F7/038 , C07C253/30 , C08F4/04 , H01L21/027 , C07C255/65

192. 发明专利

JP2014153686A Resist composition, method for forming resist pattern, compound, radical polymerization initiator, production method of compound, and polymer 有权
标题翻译：耐蚀组合物，形成耐蚀图案的方法，化合物，自由基聚合引发剂，化合物的生产方法和聚合物
公开(公告)号：JP2014153686A
公开(公告)日：2014-08-25
申请号：JP2013026074
申请日：2013-02-13
申请人： Tokyo Ohka Kogyo Co Ltd , 東京応化工業株式会社
发明人： DAZAI NAOHIRO , UTSUMI YOSHIYUKI , TAKAGI DAICHI , KAIHO TAKAAKI
IPC分类号： G03F7/039 , C07C253/30 , C07C255/65 , C08F220/26 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithography characteristics and a pattern profile, a polymer useful for the resist composition, and an easy production method for obtaining the polymer.SOLUTION: The resist composition comprises a base component (A) which shows changes in the solubility with a developer by an action of an acid; and the base component (A) comprises a polymer having a group expressed by general formula (I-1) in at least one terminal of the main chain. In formula (I-1), Rrepresents a hydrocarbon group having 1 to 10 carbon atoms; Z represents a hydrocarbon group having 1 to 10 carbon atoms or a cyano group, and Rand Z may be bonded to each other to form a ring; X represents a single bond or a divalent connecting group which may include -O-C(=O)-, -NH-C(=O)- or -NH-C(=NH)-; and Rrepresents a tertiary ester type acid dissociable group having 4 to 20 carbon atoms (excluding a tert-butyl group).
摘要翻译：要解决的问题：提供光刻特性和图案轮廓优异的抗蚀剂组合物，可用于抗蚀剂组合物的聚合物和获得聚合物的容易制备方法。溶胶：抗蚀剂组合物包含基础组分（A）通过酸的作用显示与显影剂的溶解度的变化; 碱性成分（A）在主链的至少一个末端含有具有通式（I-1）表示的基团的聚合物。式（I-1）中，R表示碳原子数1〜10的烃基， Z表示碳原子数1〜10的烃基或氰基，兰可以相互结合形成环， X表示可以包括-O-C（= O） - ， - NH-C（= O） - 或-NH-C（= NH） - ）的单键或二价连接基团。 R表示具有4〜20个碳原子的叔酯型酸解离基（不包括叔丁基）。

193. 发明专利

JP5030474B2 For semiconductor lithography resin composition 有权
公开(公告)号：JP5030474B2
公开(公告)日：2012-09-19
申请号：JP2006138768
申请日：2006-05-18
申请人：丸善石油化学株式会社
发明人：孝則山岸 , 稔飯島
IPC分类号： G03F7/033 , C07C255/65 , C08F4/04 , C08F220/28 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/28
摘要： A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain]. The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g. dissolution contrast).

197. 发明专利

JP4217154B2 Production method of the azo compound 有权
公开(公告)号：JP4217154B2
公开(公告)日：2009-01-28
申请号：JP2003508704
申请日：2002-04-29
申请人：アルケマフランス
发明人：ボスートロ，ジヤン−ミシエル
IPC分类号： C07C245/04 , C07C253/30 , C07C255/65 , C07C255/67
CPC分类号： C07C255/65 , C07C253/30 , C07C255/67

198. 发明专利

JP2008007781A Surface modified carbonated material 审中-公开
标题翻译：表面改性碳化材料
公开(公告)号：JP2008007781A
公开(公告)日：2008-01-17
申请号：JP2007193021
申请日：2007-07-25
申请人： Centre National De La Recherche Scientifique , Hydro Quebec , イドロ−ケベックHydro−Quebec , サントル・ナショナル・ドゥ・ラ・ルシェルシュ・シャンティフィク
发明人： MICHOT CHRISTOPHE , ARMAND MICHEL , GAUTHIER MICHEL , CHOQUETTE YVES
IPC分类号： C07D233/58 , C09C3/10 , B01F1/00 , B01J31/02 , B01J31/04 , B01J31/06 , B01J31/12 , B01J31/18 , B01J31/22 , C01B31/02 , C04B41/83 , C07B37/02 , C07B37/12 , C07B41/06 , C07B61/00 , C07C45/46 , C07C45/69 , C07C67/00 , C07C255/05 , C07C255/10 , C07C255/13 , C07C255/17 , C07C255/27 , C07C255/31 , C07C255/46 , C07C255/65 , C07C257/14 , C07C309/80 , C07C311/03 , C07C311/04 , C07C311/09 , C07C311/48 , C07C317/04 , C07C317/08 , C07C317/14 , C07C317/22 , C07C317/24 , C07C317/34 , C07C317/44 , C07D207/44 , C07D207/452 , C07D213/76 , C07D219/10 , C07D231/18 , C07D233/56 , C07D233/90 , C07D239/60 , C07D241/46 , C07D241/48 , C07D249/04 , C07D249/08 , C07D249/10 , C07D249/12 , C07D251/66 , C07D251/70 , C07D253/06 , C07D277/64 , C07D277/82 , C07D279/20 , C07D285/00 , C07D285/12 , C07D285/125 , C07D285/135 , C07D285/15 , C07D285/16 , C07D303/34 , C07D303/36 , C07D307/54 , C07D307/64 , C07D311/52 , C07D311/58 , C07D311/72 , C07D311/80 , C07D311/82 , C07D319/06 , C07D333/16 , C07D333/20 , C07D333/24 , C07D405/06 , C07D407/04 , C07D409/12 , C07D417/10 , C07D417/14 , C07D487/22 , C07F1/02 , C07F1/06 , C07F7/10 , C07F7/18 , C07F9/6584 , C07F11/00 , C07F15/00 , C07F17/02 , C08F2/00 , C08F2/48 , C08F4/00 , C08F4/04 , C08F4/46 , C08F4/60 , C08F12/22 , C08F12/26 , C08F12/30 , C08F16/14 , C08F216/14 , C08F222/30 , C08F228/02 , C08G59/68 , C08G65/22 , C08G65/334 , C08G73/00 , C08G73/02 , C08G75/00 , C08G75/14 , C08G77/04 , C08G77/388 , C08G85/00 , C08J3/20 , C08J3/24 , C08J3/28 , C08J7/04 , C08L101/00 , C09B47/04 , C09B57/00 , C09B69/00 , C09B69/02 , C09B69/10 , C09C1/56 , C09D11/00 , C09K9/02 , C25B9/00 , D06M15/53 , G02F1/15 , H01B1/04 , H01B1/06 , H01B1/12 , H01B3/20 , H01G9/02 , H01G11/54 , H01M4/00 , H01M4/02 , H01M4/131 , H01M4/133 , H01M4/134 , H01M4/40 , H01M4/48 , H01M4/485 , H01M4/50 , H01M4/505 , H01M4/52 , H01M4/525 , H01M4/58 , H01M4/60 , H01M4/62 , H01M4/66 , H01M4/96 , H01M6/00 , H01M6/04 , H01M6/06 , H01M6/16 , H01M6/18 , H01M8/00 , H01M10/052 , H01M10/0525 , H01M10/0565 , H01M10/0567 , H01M10/0568 , H01M10/36
CPC分类号： B01J31/0224 , B01J31/0215 , B01J31/0222 , B01J31/0225 , B01J31/0227 , B01J31/0235 , B01J31/0239 , B01J31/0247 , B01J31/0251 , B01J31/0252 , B01J31/0267 , B01J31/0271 , B01J31/0281 , B01J31/0288 , B01J31/0289 , B01J31/04 , B01J31/06 , B01J31/068 , B01J31/124 , B01J31/1815 , B01J31/2208 , B01J2231/122 , B01J2231/14 , B01J2231/326 , B01J2231/341 , B01J2231/348 , B01J2231/4205 , B01J2231/543 , B01J2531/35 , B01J2531/824 , C07B37/02 , C07B37/12 , C07C45/46 , C07C45/69 , C07C67/00 , C07C255/10 , C07C255/17 , C07C255/27 , C07C255/46 , C07C255/65 , C07C257/14 , C07C311/03 , C07C311/04 , C07C311/09 , C07C311/48 , C07C317/04 , C07C317/08 , C07C317/14 , C07C317/22 , C07C317/24 , C07C317/34 , C07C317/44 , C07C2601/10 , C07C2602/42 , C07D207/452 , C07D213/76 , C07D219/10 , C07D231/18 , C07D233/90 , C07D239/60 , C07D241/42 , C07D249/04 , C07D249/10 , C07D249/12 , C07D251/70 , C07D277/64 , C07D277/82 , C07D285/125 , C07D285/135 , C07D285/15 , C07D285/16 , C07D303/34 , C07D307/54 , C07D307/64 , C07D311/52 , C07D311/58 , C07D311/82 , C07D319/06 , C07D333/16 , C07D333/24 , C07D405/06 , C07D409/12 , C07D417/10 , C07D417/14 , C07F17/02 , C08F4/04 , C08G65/3344 , C09B69/00 , C09B69/02 , C09B69/10 , G02F1/1525 , G02F2001/151 , H01B1/122 , H01B1/128 , H01G9/022 , H01G9/038 , H01G11/02 , H01G11/62 , H01M4/00 , H01M4/02 , H01M4/131 , H01M4/133 , H01M4/134 , H01M4/382 , H01M4/405 , H01M4/48 , H01M4/485 , H01M4/505 , H01M4/525 , H01M4/5815 , H01M4/5825 , H01M4/60 , H01M4/625 , H01M4/661 , H01M6/00 , H01M6/04 , H01M6/164 , H01M6/166 , H01M6/168 , H01M6/181 , H01M6/183 , H01M10/052 , H01M10/0525 , H01M10/0565 , H01M10/0567 , H01M10/0568 , Y02E60/13 , Y10S430/127 , Y10T29/49108 , Y10T428/2918 , C07C49/84 , C07C49/553
摘要： PROBLEM TO BE SOLVED: To graft a polymer at the surface of a carbonated material containing carboxyl, amine and/or hydroxyl functions at its surface. SOLUTION: The carbonated material is suspended in a solution comprising the polymer to be grafted, which includes the carboxy, amine and/or hydroxy function, and also comprising a solvent of the polymer. This is followed by a treatment causing dehydration into a carboxy function, an amide and/or hydroxy function and the polymer is thus grafted on the carbonated material by means of ester or amide bonds. The surface-modified carbonated material is used in the cathode or anode of an electrochemical generator, in a polymer material with low polarity, in an ink, and as a conductive deposit on flexible plastic used as electrical contact, electromagnetic protection and antistatic protection. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：待解决的问题：在其表面含羧基，胺和/或羟基官能团的碳酸盐材料的表面上接枝聚合物。解决方案：将碳酸化材料悬浮在包含待接枝的聚合物的溶液中，该溶液包括羧基，胺和/或羟基官能团，并且还包含聚合物的溶剂。然后进行处理，导致脱水为羧基官能团，酰胺和/或羟基官能团，因此聚合物通过酯或酰胺键接枝在碳酸化材料上。表面改性碳酸化材料用于电化学发生器的阴极或阳极，在低极性的聚合物材料中，在油墨中，以及用作电接触，电磁保护和抗静电保护的柔性塑料上的导电沉积物。版权所有（C）2008，JPO＆INPIT

199. 发明专利

JP2007308586A Copolymer for positive lithography, polymerization initiator for producing the copolymer and composition for semiconductor lithography 有权
标题翻译：用于阳性光刻的共聚物，用于生产共聚物的聚合引发剂和用于SEMICONDUCTOR LITHOGRAPHY的组合物
公开(公告)号：JP2007308586A
公开(公告)日：2007-11-29
申请号：JP2006138768
申请日：2006-05-18
申请人： Maruzen Petrochem Co Ltd , 丸善石油化学株式会社
发明人： IIJIMA MINORU , YAMAGISHI TAKANORI
IPC分类号： C08F220/28 , C07C255/65 , C08F4/04 , G03F7/033 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F220/28
摘要： PROBLEM TO BE SOLVED: To obtain a copolymer that is used in chemical amplification positive lithography and has excellent lithography properties such as dissolution contrast, etc.
SOLUTION: The copolymer for positive lithography has a repeating unit (A) represented by formula (A) [R
10 is a hydrogen atom or a 1-4C hydrocarbon group which may be replaced with a fluorine atom; R
11 is a 1C or 2C hydrocarbon group or a 7-12C bridged alicyclic hydrocarbon group crosslinked with an oxygen atom or a sulfur atom; n is an integer of 0 or 1; R
12 is an acid-dissociable dissolution inhibiting group] and a terminal structure (B) containing an alkali-soluble group protected with an acid-dissociable dissolution inhibiting group, represented by formula (B) [R
21 is a 3-6C hydrocarbon group which may contain a nitrogen atom; R
22 is an acid-dissociable dissolution inhibiting group; p is a binding site with a copolymer main chain].
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：获得用于化学放大正光刻中的共聚物，并且具有优异的光刻性能如溶解对比度等。解决方案：正光刻用共聚物具有代表性的重复单元（A）通式（A）[R SB 10]是氢原子或可被氟原子取代的1-4C烃基; R 11是与氧原子或硫原子交联的1C或2C烃基或7-12C桥连的脂环族烃基; n为0或1的整数; 由式（B）表示的具有酸解离性溶解抑制基团保护的碱溶性基团的末端结构（B）[R“SB 12”是酸解离性溶解抑制基] SB> 21 是可含有氮原子的3-6C烃基; R 22 是酸解离的溶解抑制基团; p是具有共聚物主链的结合位点]。版权所有（C）2008，JPO＆INPIT

200. 发明专利

JP2004533472A Production method of the azo compound 有权
公开(公告)号：JP2004533472A
公开(公告)日：2004-11-04
申请号：JP2003508704
申请日：2002-04-29
申请人：アトフイナ
发明人：ボスートロ，ジヤン−ミシエル
IPC分类号： C07C245/04 , C07C253/30 , C07C255/65 , C07C255/67
CPC分类号： C07C255/65 , C07C253/30 , C07C255/67
摘要：本発明は、アゾ化合物の製造方法に関する。詳細には、本発明はシード添加および対応するヒドラゾ化合物の酸化によってアゾ化合物を製造する逐次的方法に関する。

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