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    • 193. 发明授权
    • Radiological imaging apparatus
    • 放射成像装置
    • US06920196B2
    • 2005-07-19
    • US10253492
    • 2002-09-25
    • Yuuichirou UenoKensuke AmemiyaShinichi KojimaTakashi OkazakiKikuo UmegakiHiroshi Kitaguchi
    • Yuuichirou UenoKensuke AmemiyaShinichi KojimaTakashi OkazakiKikuo UmegakiHiroshi Kitaguchi
    • G01T1/161A61B6/03G01T1/164G01T1/24G01T1/166
    • A61B6/037A61B6/032A61B6/4233A61B6/5235G01T1/1644G01T1/249
    • An imaging apparatus of a radiological imaging apparatus is provided with a first and a second radiation detectors disposed around a hole portion into which a bed is inserted. The first radiation detector includes a detecting portion formed of GaAs of a square having a side of 5 mm and having a thickness of 2 mm. The second radiation detector includes a detecting portion formed of CdTe of a cube having a side of 5 mm. The first radiation detector detects X-rays emitted from an X-ray source and transmitted through an examinee and does not detect γ-rays emitted from the examinee. The second radiation detector detects above X-rays and γ-rays. An X-ray signal processing apparatus processes an X-ray image signal from the first radiation detector and outputs intensity information thereof. A signal discriminating apparatus processes a γ-ray image signal from the second radiation detector and outputs a pulse signal. Thus, the radiological imaging apparatus capable of carrying out radiation examination of the subject by using X-rays and γ-rays can be simplified.
    • 放射线成像装置的成像装置设置有第一和第二放射线检测器,设置在孔插入其中的孔部分周围。 第一辐射检测器包括由具有5mm的方形并且厚度为2mm的正方形的GaAs形成的检测部分。 第二辐射检测器包括由具有5mm侧的立方体的CdTe形成的检测部。 第一辐射检测器检测从X射线源发射并透射通过受检者的X射线,并且不检测从受检者发射的伽马射线。 第二个辐射探测器检测上面的X射线和γ射线。 X射线信号处理装置处理来自第一辐射检测器的X射线图像信号并输出​​其强度信息。 信号识别装置处理来自第二辐射检测器的伽马射线图像信号并输出​​脉冲信号。 因此,可以简化能够通过使用X射线和γ射线对被检体进行放射线检查的放射线摄影装置。
    • 194. 发明授权
    • Dental adhesive composition
    • 牙科粘合剂组成
    • US06916858B2
    • 2005-07-12
    • US10219740
    • 2002-08-16
    • Shinichi KojimaAkishi Arita
    • Shinichi KojimaAkishi Arita
    • A61K6/00A61K6/083C08F2/48C08F230/02
    • A61K6/0023C08L33/00C08L43/02
    • A one-pack type dental adhesive composition that does not require a pre-treatment such as an etching treatment and a priming treatment and can surely adhere a dental restoration material to a tooth structure and keep an adhesive effect over a long period of time, comprised of a polymerizable composition containing (a) 1˜5% by weight of a polymerizable monomer containing a phosphoric acid group, (b) 10˜40% by weight of a polymerizable monomer containing a plurality of carboxyl groups in one molecule, or being readily reactive with water to generate a plurality of carboxyl groups in one molecule, (c) 20˜40% by weight of an acid group-free polymerizable monomer or a mixture of two or more acid group-free polymerizable monomers, both having a solubility of water at 25° C. of 25% by weight or less, and (d) 15˜50% by weight of water, with (e) 0.1˜5.0 parts by weight, based on 100 parts by weight of the polymerizable composition, of a photo-polymerization initiator and (f) a viscosity modifier having a mean particle size of 0.01˜0.05 μm, the dental adhesive composition having a viscosity of 0.1˜1 Pa·s.
    • 一种单组分型牙科粘合剂组合物,其不需要诸如蚀刻处理和底漆处理的预处理,并且可以将牙齿修复材料可靠地粘附到牙齿结构并且长时间保持粘合剂效果,包括 的聚合性组合物,其含有(a)1〜5重量%的含有磷酸基的可聚合单体,(b)10〜40重量%的在一分子中含有多个羧基的可聚合单体或易于 与水反应以在一个分子中产生多个羧基,(c)20〜40重量%的不含酸基团的可聚合单体或两种或更多种无酸基团的可聚合单体的混合物,其溶解度为 25℃的水为25重量%以下,(d)15〜50重量%的水,(e)0.1〜5.0重量份,相对于100重量份的聚合性组合物, 光聚合引发剂和(f)粘度改性 呃具有0.01〜0.05μm的平均粒径,牙科粘合剂组合物的粘度为0.1〜1Pa·s。
    • 195. 发明申请
    • Ic transfer device
    • Ic传输装置
    • US20050105351A1
    • 2005-05-19
    • US10507854
    • 2002-12-25
    • Shinichi Kojima
    • Shinichi Kojima
    • G01R31/01G01R31/26H05K13/04G11C7/00
    • H05K13/0409G01R31/01
    • An IC transfer device is provided that can combat the generation of the cracks in handling the IC packages. When the hand 3 comes in contact with the IC package 4 accommodated on the tray 5, a load cell 6 comes in contact with a bottom surface of a base 10. Reference values as to a press-down amount and a press-down speed of the hand 3 are set in a setting section so as not to cause cracks in the IC package 4 due to the instantaneous load at the time of contact between the hand 3 and the IC package 4. In a transfer operation, when detecting the contact between the hand 3 and the IC package 4, a control section 20 controls a servomotor of the hand drive mechanism 22 so that the hand 3 operates according to the reference values set in the setting section.
    • 提供了一种IC传送装置,可以防止在处理IC封装时产生裂缝。 当手3与容纳在托盘5上的IC封装4接触时,称重传感器6与基座10的底面接触。关于压入量和下压速度的参考值 手3被设置在设置部分中,以便由于手3和I​​C封装4之间的接触时的瞬时负载而不会导致IC封装4中的裂纹。在传送操作中,当检测到 手3和IC封装4,控制部20控制手驱动机构22的伺服电机,使得手3根据设定部中设定的基准值进行动作。
    • 196. 发明授权
    • Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations
    • 带电粒子束微光刻的装置和方法显示出减小的四倍像差
    • US06507027B1
    • 2003-01-14
    • US09399916
    • 1999-09-21
    • Shinichi KojimaKoichi Kamijo
    • Shinichi KojimaKoichi Kamijo
    • H01J37145
    • B82Y10/00B82Y40/00H01J37/1475H01J37/3174
    • Charged-particle-beam microlithography apparatus are disclosed that exhibit minimal deflection aberrations while providing large-magnitude deflections of the charged particle beam using a relatively small excitation current. The apparatus comprises multiple deflectors. A representative deflector comprises a toroidal deflector coil having a semi-angle of 72° and a toroidal saddle deflector coil having a semi-angle of 36°. By adjusting the dimensions and number of windings of each coil, and the excitation current applied to each coil, magnetic-field components associated with cos[3&phgr;] and with cos[5&phgr;], which are higher-order components in the deflection field, are minimized. As a result, four-fold aberrations are minimized and deflection sensitivity is increased.
    • 公开了带电粒子束微光刻设备,其使用相对较小的激励电流提供带电粒子束的大幅度偏转,其呈现最小的偏转像差。 该装置包括多个偏转器。 代表性的偏转器包括半角为72°的环形偏转线圈和半角为36°的环形鞍形偏转线圈。 通过调整每个线圈的绕组数量和施加到每个线圈的励磁电流,与cos [3phi]和cos [5phi]相关的磁场分量,它们是偏转场中的高阶分量, 最小化。 结果,四倍像差被最小化并且偏转灵敏度增加。
    • 197. 发明授权
    • Method and apparatus for enhanced detecting the presence of magnetic substances in non-magnetic products
    • 用于增强检测非磁性产品中磁性物质的存在的方法和装置
    • US06218830B1
    • 2001-04-17
    • US09141757
    • 1998-08-28
    • Yasuhiko YoshidaHiromitsu HoritaShinichi Kojima
    • Yasuhiko YoshidaHiromitsu HoritaShinichi Kojima
    • G01N2772
    • G01V3/081
    • Disclosed are a method and an apparatus for easily, sensitively and reliably detecting the presence of a magnetic substance in a non-magnetic product, and even a minuted magnetized material such as a broken needle erroneously included in a sewn product. Magnetic sensors as a sensing unit are disposed at a prescribed position between a pair of opposed magnetic shielding members made of a soft magnetic material as a magnetic flux converging unit. A non-magnetic product including a magnetic substance is passed through between the pair of magnetic shielding members. A magnetic flux generated by the magnetic substance mingled in the product is converged to the magnetic shielding members, while shutting off a magnetic field due to external disturbance, and residual magnetization of the magnetic substance is detected by the magnetic sensors. Preferably, each of the magnetic shielding members has a curved surface projecting inwardly in the form curved along the conveyance direction of the non-magnetic product, and a plurality of magnetic sensors are disposed on each of the curved surfaces at intervals of a prescribed size in the lateral direction thereof.
    • 公开了一种用于容易,灵敏和可靠地检测非磁性产品中磁性物质的存在的方法和装置,甚至是错误地包括在缝合产品中的诸如破碎的针的破碎的磁性材料。 作为感测单元的磁传感器设置在作为磁通量会聚单元的由软磁性材料制成的一对相对的磁屏蔽构件之间的规定位置处。 包含磁性物质的非磁性产品通过一对磁屏蔽部件之间。 由产品中混入的磁性物质产生的磁通量会聚到磁屏蔽部件上,同时切断由于外部干扰引起的磁场,磁性传感器检测磁性物质的剩余磁化。 优选地,每个磁屏蔽构件具有沿着非磁性产品的传送方向弯曲的形式向内突出的弯曲表面,并且多个磁性传感器以规定尺寸的间隔设置在每个弯曲表面上 其横向方向。
    • 199. 发明授权
    • DC-DC converter and power-supply switching circuit
    • DC-DC转换器和电源开关电路
    • US6104173A
    • 2000-08-15
    • US362626
    • 1999-07-20
    • Shinichi Kojima
    • Shinichi Kojima
    • H02M1/00H02M1/36G05F1/10
    • H02M1/36Y10S323/901
    • A power-supply switching portion compares an input voltage and an output voltage, after a boost converter circuit is started. Before a step-up operation is started, that is, in a condition in which the input voltage is higher than the output voltage, the power-supply switching portion provides, via a first MOSFET, the input voltage to a power-supply line. The power-supply line supplies operation power for the boost converter circuit. After the step-up operation is started, that is, in a condition in which the output voltage is equal to or higher than the input voltage, the power-supply switching portion provides, via a second MOSFET, the output voltage, instead of the input voltage, to the power-supply line.
    • 在升压转换器电路启动之后,电源开关部分比较输入电压和输出电压。 在开始升压操作之前,即在输入电压高于输出电压的条件下,电源开关部分经由第一MOSFET将输入电压提供给电源线。 电源线为升压转换器电路提供工作电源。 在升压操作开始之后,也就是说,在输出电压等于或高于输入电压的条件下,电源开关部分经由第二MOSFET提供输出电压,而不是 输入电压,到电源线。
    • 200. 发明授权
    • Charged-particle-beam microlithography methods including correction of
imaging faults
    • 带电粒子束微光刻法,包括成像故障校正
    • US6027843A
    • 2000-02-22
    • US325103
    • 1999-06-03
    • Shinichi KojimaTeruaki Okino
    • Shinichi KojimaTeruaki Okino
    • G03F7/20H01L21/027H01L21/68G03F9/00
    • H01J37/3174B82Y10/00B82Y40/00G03F7/2059
    • Charged-particle-beam (CPB) exposure methods are disclosed that resolve the problem of aberrations produced by an image-adjustment lens and the problem of limitations in the speeds in which stage-correction mechanisms can be adjusted. Adjustments of stage-correction mechanisms and image-adjustment lenses are optimized in any of various combinations depending upon exposure conditions, pattern configuration, etc. Image rotation and defocusing in CPB microlithography can be corrected by moving the reticle stage and substrate stage using respective stage-control and correction devices. Alternatively or in addition, adjustments can be made by controllably adjusting a deflector and/or an image-adjustment lens. Whenever corrections are required over a wide correction range and a relatively slow correction speed is acceptable, corrections can be made using a stage-correction mechanism. Other corrections can be made as required using the image-adjustment lens which offers substantially greater speed but a narrower correction range.
    • 公开了充电粒子束(CPB)曝光方法,其解决由图像调节透镜产生的像差的问题以及可以调整阶段校正机构的速度的限制的问题。 阶梯校正机构和图像调整透镜的调整根据曝光条件,图案配置等以各种组合进行优化.CPB微光刻中的图像旋转和散焦可以通过使用各自的阶段 - 控制和校正装置。 或者或另外,可以通过可控地调节偏转器和/或图像调节透镜来进行调整。 无论何时在宽的校正范围内进行校正,并且相对较慢的校正速度是可接受的,可以使用阶段校正机制进行校正。 可以使用提供显着更大速度但更窄校正范围的图像调节透镜根据需要进行其他校正。